Characterized By The Substrate (epo) Patents (Class 257/E21.119)
- Substrate is crystalline semiconductor material, e.g., lattice adaptation, heteroepitaxy (EPO) (Class 257/E21.123)
- Heteroepitaxy (EPO) (Class 257/E21.124)
- Defect and dislocati on suppression due to lattice mismatch, e.g., lattice adaptation (EPO) (Class 257/E21.125)
- Group III-V compound on dissimilar Group III-V compound (EPO) (Class 257/E21.126)
- Group III-V compound on Si or Ge (EPO) (Class 257/E21.127)
- Carbon on a noncarbon semiconductor substrate (EPO) (Class 257/E21.128)