Abstract: Various embodiments of the present invention are direct to nanoscale, reconfigurable, memristor devices. In one aspect, a memristor device comprises an electrode (301,303) and an alloy electrode (502,602). The device also includes an active region (510,610) sandwiched between the electrode and the alloy electrode. The alloy electrode forms dopants in a sub-region of the active region adjacent to the alloy electrode. The active region can be operated by selectively positioning the dopants within the active region to control the flow of charge carriers between the electrode and the alloy electrode.

Abstract: A power FET (100) comprising a leadframe including a pad (110), a first lead (111), and a second lead (112); a first metal clip (150) including a plate (150a), an extension (150b) and a ridge (150c), the plate and extension spaced from the leadframe pad and the ridge connected to the pad; a vertically assembled stack of FET chips in the space between the plate and the pad, the stack including a first n-channel FET chip (120) having the drain terminal on one surface and the source and gate terminals on the opposite surface, the drain terminal attached to the pad, the source terminal attached to a second clip (140) tied to the first lead; and a second n-channel FET chip (130) having the source terminal on one surface and the drain and gate terminals on the opposite surface, the source terminal attached to the second clip, its drain terminal attached to the first clip; wherein the drain-source on-resistance of the FET stack is smaller than the on-resistance of the first FET chip and of the second FET chip.

Abstract: A method for forming a non-volatile memory device includes disposing a junction layer comprising a doped silicon-bearing material in electrical contact with a first conductive material, forming a switching layer comprising an undoped amorphous silicon-bearing material upon at least a portion of the junction layer, disposing a layer comprising a non-noble metal material upon at least a portion of the switching layer, disposing an active metal layer comprising a noble metal material upon at least a portion of the layer, and forming a second conductive material in electrical contact with the active metal layer.

Abstract: Methods are provided for forming a capacitor. In one embodiment, a method comprises providing an insulator material layer over a substrate, etching at least one via in the insulator material layer and depositing a contact material fill in the at least one via to form a first set of contacts. The method further comprises etching the insulator material layer adjacent at least one contact of the first set of contacts to form at least one void, depositing a dielectric material layer over the at least one void and over the first set of contacts and depositing a contact material fill in the at least void to form a second set of contacts.

Abstract: A process for fabricating a reconstituted wafer that includes chips having connection pads on a front side of the chip, this process including positioning of the chips on an adhesive support, front side down on the support; deposition of a resin on the support in order to encapsulate the chips; and curing of the resin. Before deposition of the resin, the process includes bonding, onto the chips, a support wafer for positioning the chips, this support wafer having parts placed on one side of the chips.

Abstract: A fan-out wafer level package may include at least two semiconductor chips; an insulating layer covering portions of a first semiconductor chip; a mold layer covering portions of a second semiconductor chip; a redistribution line pattern in the insulating layer; and/or an external terminal on the insulating layer. The first semiconductor chip may be stacked relative to the second semiconductor chip. The redistribution line pattern may be electrically connected to the at least two semiconductor chips. The external terminal may be electrically connected to the redistribution line pattern. A fan-out wafer level package may include at least three semiconductor chips; an insulating layer covering portions of first semiconductor chips; a mold layer covering portions of a second semiconductor chip; a redistribution line pattern in the insulating layer; and/or an external terminal on the insulating layer. The first semiconductor chips may be stacked relative to the second semiconductor chip.

Abstract: A power semiconductor structure with a field effect rectifier having a drain region, a body region, a source region, a gate channel, and a current channel is provided. The body region is substantially located above the drain region. The source region is located in the body region. The gate channel is located in the body region and adjacent to a gate structure. The current channel is located in the body region and is extended from the source region downward to the drain region. The current channel is adjacent to a conductive structure coupled to the source region.

Abstract: A memristor includes a first electrode of a nanoscale width; a second electrode of a nanoscale width; and an active region disposed between the first and second electrodes. The active region has a both a non-conducting portion and a source of dopants portion induced by electric field. The non-conducting portion comprises an electronically semiconducting or nominally insulating material and a weak ionic conductor switching material capable of carrying a species of dopants and transporting the dopants under an electric field. The non-conducting portion is in contact with the first electrode and the source of dopants portion is in contact with the second electrode. The second electrode comprises a metal reservoir for the dopants. A crossbar array comprising a plurality of the nanoscale switching devices is also provided. A process for making at least one nanoscale switching device is further provided.

Abstract: The invention relates to a power electronic module comprising a plurality of bridge arms mounted in parallel and a plurality of output terminals (BS) connected to the middle points of said bridge arms, characterized in that it comprises at least two semi-conductor chips (P1, P2), each of the chips including in a single-block form a plurality of semi-conductor switches (T) implemented according to a vertical technology and having active and voltage holding areas electrically insulated from each other, each switch of a chip being connected to a respective switch of another chip so as to form a bride arm. The invention also relates to a power electronic module that comprises a stack of four semi-conductor chips and five semi-conducting layers arranged alternatively so as to form a switching cell having a coaxial structure.

Abstract: A microelectronic assembly includes first and second microelectronic elements. Each of the microelectronic elements has oppositely-facing first and second surfaces and edges bounding the surfaces. The first microelectronic element is disposed on the second microelectronic element with the second surface of the first microelectronic element facing toward the first surface of the second microelectronic element. The first microelectronic element preferably extends beyond at least one edge of the second microelectronic element and the second microelectronic element preferably extends beyond at least one edge of the first microelectronic element. A first edge of the first microelectronic element has a length that is smaller than a first edge of the second microelectronic element. A second edge of the first microelectronic element has a length that is greater than the second edge of the second microelectronic element.

Abstract: An improvement for a smart, highside, high current, power switch module formed in an integrated circuit having at least one composite MOS/FET transistor switch connected to controlling and protection circuits. The power switch module has a load terminal (L), a battery input terminal (B), a control input terminal (C) and a diagnostic feedback terminal (M). The improvement provides overcurrent protection from a substantially instantaneous short circuit across an electrical load connected to the load terminal of the power switch module. The improvement is a capacitive circuit element connected between the battery input terminal (B) and the diagnostic feedback terminal (M).

Abstract: A method of fabricating a die containing an integrated circuit, including active components and passive components, includes producing a first substrate containing at least one active component of active components and a second substrate containing critical components of the passive components, such as perovskites or MEMS, and bonding the two substrates by a layer transfer. The method provides an improved monolithic integration of devices such as MEMS with transistors.

Abstract: A light emitting diode module for a line light source includes a circuit board having a wire pattern formed thereon and a plurality of LED chips directly mounted and disposed in a longitudinal direction on the circuit board and electrically connected to the wire pattern. The module also includes a reflecting wall installed on the circuit board to surround the plurality of LED chips, reflecting light from the LED chips. The module further includes a heat sink plate underlying the circuit board to radiate heat generated from the LED chip.

Abstract: Assembly of at least one microelectronic chip with a wire element, the chip comprising a groove for embedment of the wire element. The wire element is a strand with a longitudinal axis substantially parallel to the axis of the groove, comprising at least two electrically conducting wires covered with insulator. The chip comprises at least one electrically conducting bump in the groove, this bump being in electric contact with a stripped area of a single one of the electrically conducting wires of the strand.

Abstract: A method for fabricating a MOSFET (e.g., a PMOS FET) includes providing a semiconductor substrate having surface characterized by a (110) surface orientation or (110) sidewall surfaces, forming a gate structure on the surface, and forming a source extension and a drain extension in the semiconductor substrate asymmetrically positioned with respect to the gate structure. An ion implantation process is performed at a non-zero tilt angle. At least one spacer and the gate electrode mask a portion of the surface during the ion implantation process such that the source extension and drain extension are asymmetrically positioned with respect to the gate structure by an asymmetry measure.

Abstract: A stacked structure includes a first substrate bonded to a second substrate such that a first pad structure of the first substrate contacts a second pad structure of the second substrate. A transistor gate is formed over the second substrate, and a first conductive structure extends through the second substrate and has a top surface that is substantially planar with a top surface of the second substrate. An interlayer dielectric (ILD) layer is disposed over the transistor gate, and a passivation layer is disposed over the ILD layer and includes a second pad structure that makes electrical contact with the second conductive structure. The ILD layer includes at least one contact structure that extends through the ILD layer and makes electrical contact with the transistor gate. A second conductive structure is disposed in the ILD layer and is at least partially disposed over a surface of the first conductive structure.

Abstract: A semiconductor device system and a method for modifying a semiconductor device is disclosed. In one embodiment, a function provided by a circuit positioned on the semiconductor device is replaced, modified, and/or supplemented by a function provided by a circuit positioned on a further semiconductor device.

Abstract: According to the present invention, a power module in which the thermal stress between a semiconductor chip and a substrate is relaxed by liquefaction of a solder layer, by which the semiconductor chip is positioned on the substrate, such that generation of cracks between the semiconductor chip and the substrate can be prevented and bonding strength is ensured is provided. Further, the following is provided: a power module 1 comprises a semiconductor chip 2 and a substrate 3 on which the semiconductor chip 2 is positioned The power module further comprises a solder layer 4 provided between the semiconductor chip 2 and the substrate 3, the solder layer 4 liquefying due to heat generated by the semiconductor chip 2 and a resin material 5 that connects the semiconductor chip 2 and the substrate 3, the resin material 5 deforming to follow the thermal expansion difference between the semiconductor chip 2 and the substrate 3 that is generated upon the heat generation.

Abstract: A monolithic semiconductor device has an insulating layer formed over a first substrate. A second substrate is disposed over the first insulating layer. A power MOSFET with body diode is formed over the second substrate. A Schottky diode is formed over the second substrate in proximity to the MOSFET. An insulation trench is formed within the second substrate between the MOSFET and Schottky diode. The isolation trench surrounds the MOSFET and first Schottky diode. A first electrical connection is formed between a source of the MOSFET and an anode of the Schottky diode. A second electrical connection is formed between a drain of the MOSFET and a cathode of the Schottky diode. The Schottky diode reduces charge build-up within the body diode and reverse recovery time of the first power MOSFET. The power MOSFET and integrated Schottky can be used in power conversion or audio amplifier circuit.

Abstract: An integrated circuit includes flash memory cells, and peripheral circuitry including low voltage transistors (LVT) and high voltage transistors (HVT). The integrated circuit includes a tunnel barrier layer comprising SiON, SiN or other high-k material. The tunnel barrier layer may comprise a part of the gate dielectric of the HVTs. The tunnel barrier layer may constitute the entire gate dielectric of the HVTs. The corresponding tunnel barrier layer may be formed between or upon shallow trench isolation (STIs). Therefore, the manufacturing efficiency of a driver chip IC may be increased.

Abstract: A semiconductor integrated circuit device with higher integration density and a method of fabricating the same are provided. The semiconductor integrated circuit device may include trench isolation regions in a semiconductor substrate that define an active region and a gate pattern that is used for a higher voltage and formed on the active region of the semiconductor substrate. Trench insulating layers may be formed in the semiconductor substrate on and around edges of the gate pattern so as to be able to relieve an electrical field from the gate pattern. The depths of each of the trench insulating layers may be defined according to an operating voltage. Source and drain regions enclose the trench insulating layers and may be formed in the semiconductor substrate on both sides of the gate pattern. Therefore, the semiconductor integrated circuit device may have a higher integration density and may relieve an electrical field from the gate pattern.

Abstract: A semiconductor device is provided, in which a well contact diffusion layer pattern (13) and a sub-contact diffusion layer pattern (14) are arranged between a P-ch transistor diffusion layer pattern (11) and an N-ch transistor diffusion layer pattern (12), and a CMP dummy pattern (15) is arranged around a P-ch and N-ch transistor arrays. In the device, a data rate exceeding 75% when the well contact diffusion layer pattern and the sub-contact diffusion layer pattern are formed into lines, is reduced to fall within a range of 25% to 75% by forming at least either of the well contact diffusion layer pattern and the sub-contact diffusion layer pattern into dots.

Abstract: Disclosed in this specification is a multiphase buck converter package and process for forming such package. The package includes at least four dice and several parallel leads. The dice are electrically connected through a plurality of die attach pads, thus eliminating the need for wirebonding.

Abstract: This invention provides a semiconductor device that can prevent a deviation of work function by adopting a gate electrode having a uniform composition and exhibits excellent operating characteristics by virtue of effective control of a Vth. The semiconductor device is characterized by comprising a PMOS transistor, an NMOS transistor, a gate insulating film comprising an Hf-containing insulating film with high permittivity, a line electrode comprising a silicide region (A) and a silicide region (B), one of the silicide regions (A) and (B) comprising a silicide (a) of a metal M, which serves as a diffusing species in a silicidation reaction, the other silicide region comprising a silicide layer (C) in contact with a gate insulating film, the silicide layer (C) comprising a silicide (b) of a metal M, which has a smaller atom composition ratio of the metal M than the silicide (a), and a dopant which can substantially prevent diffusion of the metal M in the silicide (b).

Abstract: A tunable antifuse element (102, 202, 204, 504, 952) includes a substrate material (101) having an active area (106) formed in a surface, a gate electrode (104) having at least a portion positioned above the active area (106), and a dielectric layer (110) disposed between the gate electrode (104) and the active area (106). The dielectric layer (110) includes a tunable stepped structure (127). During operation, a voltage applied between the gate electrode (104) and the active area (106) creates a current path through the dielectric layer (110) and a rupture of the dielectric layer (110) in a rupture region (130). The dielectric layer (110) is tunable by varying the stepped layer thicknesses and the geometry of the layer.

Abstract: A rectifier for rectifying alternating current into direct current is described, in which a three-phase generator includes a three-phase stator winding. The phases of the stator winding are triggered via switching elements of a power circuit. The power circuit is controlled via a control part, which includes a controller component. The rectifier includes a control part (control module) having control terminals and a power circuit (power module) controlled by the control module and optionally provided with a cooling device, in which all the power-conducting components are designed as power MOS components and integrated in a stacked construction.

Abstract: The invention relates to an electronic circuit comprising a first terminal (100) and a second terminal (200, 300) and at least three transistors (1) arranged in parallel, each transistor having a control terminal (2) connected to said first terminal (100) for receiving a control signal, and an output terminal (3, 4) connected to said second terminal (200, 300) for providing an output signal, said output signal depending on the control signal. The transistors (1) are arranged symmetrically with regard to a point of symmetry, in a manner such that the contribution to the heating of a transistor by heat received from the other transistors, is substantially the same for all of said transistors. The invention also relates to a method for manufacturing an electronic circuit.

Abstract: A capacitor comprises a first conducting film 12 formed on a substrate 10, a first dielectric film 14 formed on the first conducting film, a second conducting film 18 formed on the first dielectric film, a second dielectric film 22 formed above the second conducting film, covering the edge of the second conducting film, a third conducting film 34 formed above the second dielectric film, covering a part of the second dielectric film covering the edge of the second conducting film. The capacitor further comprises an insulation film 28 covering the edge of the second conducing film or the part of the second dielectric film. An effective thickness of the insulation film between the second conducting film and the third conducing film in the region near the edge of the second conducting film can be increased, whereby concentration of electric fields in the region near the edge of the second conducting film. Consequently, the capacitor can have large capacitance without lowering voltage resistance.

Abstract: A method of fabricating an MIM capacitor is provided, by which higher capacitance can be secured per unit volume or area by forming a dual-stack type capacitor to increase an effective area of the capacitor. The method includes patterning a first metal layer, forming a planarized second insulating layer having a trench exposing a portion of the patterned first metal layer, forming a second metal layer within the trench, forming a first dielectric layer on the second metal layer, forming first via holes exposing the patterned first metal layer, forming first plugs filling the trench and first via holes, forming a third metal layer thereover, forming a second dielectric layer on the third metal layer, forming a patterned fourth metal layer on the second dielectric layer, patterning the second dielectric layer and the third metal layer, forming a planarized third insulating layer having second via holes therein, and forming a patterned fifth metal layer on the third insulating layer.