Abstract: A metal electrode film is formed by evaporation on a tuning fork-type quartz crystal vibrator by means of a thin flat mask which has a portion of reduced thickness so that the metallic evaporant is deposited beneath the thinner portion of the mask. In forming electrodes on a tuning fork-type quartz crystal vibrator having X, Y and Z surfaces, a mask has a portion which is positioned in the X-plane between the evaporative deposition source and the inner end of the slit between the tines of vibrator so that the metallic film is prevented from being deposited on portions of the X and Y surfaces of the vibrator adjacent to the inner end of the slit.

Abstract: A screenable and strippable solder mask composition which contains a polyepoxide or polyimide/amide; a detackifier and a high-temperature resistant filler; and use thereof for protecting predetermined areas on a substrate from the solder deposition.

Abstract: A method for creating a simulated stone pattern surface or the like on a surface area in which a pattern, provided with a plurality of irregular cutouts defined by a web of interconnected strip portions, is adhereable to a surface for removal after the application thereover of a settable plastic composition, to define mortar lines, with the pattern being rectangular and designed to mate, in a plurality of orientations, with other different patterns.

Abstract: A variety of technologies have been applied in the development of a bonded rid cathode. Erosion lithography is used for making the fine-detail grid structure, combining air erosion and lithographic techniques. To obtain openings of the order of 0.001 inch (one mil) or smaller, a nozzle with a high aspect ratio exit opening is used, and the cathode grid structure is scanned. A photo resist in which the grid pattern is developed is used over the molybdenum or tungsten grid film. The metal film is removed from the grid openings by chemical etching. The photo resist over the metal grid is used as a composite mask for removing the BN insulation in the openings by erosion with Al.sub.2 O.sub.3 powder from the special nozzle on the air blast gun.

Abstract: A process is disclosed for delineating a patterned electroconductive coating on a substantially nonconductive substrate. The process can be used on substrates having a thickness in excess of 50 microinches. The process involves forming a substantially continuous electroconductive film on a substrate. An air abrasive resistant continuous mask film of metallic material is applied to the electroconductive film and etched to form masked and unmasked portions of the electroconductive film corresponding to the desired patterned coating. The unmasked portions of the electroconductive film are removed to leave the masked portions of the electroconductive film remaining on the substrate. The mask film can then be removed from the electroconductive film resulting in the desired pattern delineated in the electroconductive film on the substrate or the mask can remain in place and be used to form an integral part of the device formed with the substrate.

Abstract: A method for creating a simulated brick surface or the like on a surface area which utilizes an adhesive tape provided with two series of marks for demarking the positions of a plurality of such tapes to delineate simulated mortar line areas. A plurality of the tapes are applied in a desired pattern to a surface area, a plastic settable composition is coated over the tapes and surface area, and the tapes are removed together with the coating on the tapes prior to final setting of the composition.

Abstract: A method for chemically milling sheet metal to form three-dimensional objects comprising masking the sheet metal by selectively applying a resist material to opposite sides of the sheet metal to form a design, applying an etchant to the masked metal which erodes the metal according to the design, and simultaneously forming connecting tabs and score lines. The tabs and score lines allow certain design portions to be bent to different planes to form the three-dimensional object.

Abstract: A razor blade having guard elements deposited in recessed guard seats formed in the cutting edge and flanking surfaces of the blade. The guard elements may be deposited by electrochemical plating and their retention on the blade is enhanced by the recessed seats formed in the blade surfaces. The guard seats extend rearwardly from the blade edge a significant distance and may be interconnected by a transversely extending locking guard seat into which guard element material is also deposited.A method for applying the guard elements to the blade comprises applying a photoresist material to the blade edge and adjacent region, fixing a photographic image on the photoresist material in accordance with a predetermined guard element pattern, removing a portion of the photoresist material in accordance with the pattern and etching the underlying blade to form the guard seats.

Abstract: A polyalkylene rubber substrate is coated with a reaction product of a mixture of organic polyisocyanate and a polycaprolactone polyol having a molecular weight of 250 to 3500. The mixture from which the reaction product is prepared contains the organic polyisocyanate and polycaprolactone polyol in a ratio which provides between 0.8 and 1.35 hydroxyl groups per isocyanate group. The coating composition is dried after it has been applied to the substrate.

Abstract: In a method of making decorative panels, a liquid masking material is applied to a surface of a panel, and is cured to form a substantially solid masking layer on the surface. A pattern comprising at least one unmasked area and at least one masked area is formed in the masking layer either simultaneously with the application of the liquid masking material or subsequent to the curing step. The surface of the panel is then treated to render the unmasked areas of the surface of the panel visually distinguishable from the masked areas. In one embodiment of the invention the masking layer is elastomeric and the surface of the panel is treated by sandblasting, after which the masking layer is removed. The entire process may then be repeated to provide a dual density effect. In another embodiment of the invention an asphaltum masking layer is applied to a mirror forming layer on a panel, after which the portions of the mirror forming layer corresponding to the unmasked areas are chemically removed.

Abstract: A paste comprising particles of an inorganic oxide and a vehicle is printed on portions of a substrate which are not to be coated with a transparent electro-conductive film. A low valence oxide film of an electro-conductive metal oxide is deposited on the printed substrate by a vacuum deposition process. The resulting substrate is heated in an atmosphere containing oxygen, whereby the film is oxidized to form a transparent, highly electro-conductive film and the vehicle present in the paste is decomposed to yield a patterned, transparent electro-conductive film on the substrate.

Abstract: A technique for providing interconnections between pairs of contact points associated with a conductive line pattern by the use of an interconnection defining tool which is selectively alignable with respect to the conductive line. The conductive line pattern comprises at least one conductive line which is either continuous or shows interruptions, and from which lines branch off to the contact points. The tool is adapted to the conductive line and consists of a row of elements, the distance between which is dimensionally related to the distance between the branch-offs. After the tool has been adjusted to the conductive line in accordance with the respective connections, the elements of the tool are used for interrupting or connecting the conductive line at predetermined positions.

Abstract: A method for forming narrow intermetallic stripes which will carry high currents on bodies such as semiconductors, integrated circuits, magnetic bubbles structures, etc. The conductive stripe includes aluminum or aluminum copper with at least one transition metal. The aluminum and at least one transition metal are deposited onto a supporting body at a very low pressure in a substantially oxygen-free high vacuum. The composite is then annealed at a temperature between about 200.degree. C. and 525.degree. C. for a time sufficient to form an aluminum and transition metal compound within the aluminum. The conductive stripes are then formed by masking and removing portions of the annealed metallic material. The resulting conductive stripes, which may be of a width of about 6.times.10.sup.-4 inches or less, have a significantly improved electromigration performance without significantly increasing resistance in the conductive stripe.

Abstract: A method for the production of optical directional couplers has a substrate with optical waveguides formed in a surface thereof which are longitudinally coupled by having the guides extend parallel to each other for a predetermined distance. The waveguides have a higher index of refraction than the substrate. By ion implantation step, the area of the substrate adjacent the surface which is covered has its index of refraction raised, while at the same time, the exposed areas which will form the waveguides is also subjected to the ion bombardment. Thereafter, by a second ion implantation step, the ions penetrate further into the region of the substrate where the waveguides are being formed to raise the index of refraction thereof. By this technique, narrow low-light-loss bends are produced.

Abstract: A method for manufacturing a keyboard which can be utilized in a keying structure is described. It consists of layering a flat fixed plate with a conductive paint, masking a preformed insulating rubber keyboard, laying the keyboard on the conductive paint surface and thereafter applying pressure to the rubber keyboard to the extent that certain portions of the rubber keyboard are put in contact with the conductive paint.

Abstract: A method for printing and embossing thermoplastic man-made fabrics, non-wovens and other deformable materials wherein in a heat transfer printing process embossing and/or surface texturing means are introduced simultaneously with the printing means and material to be printed.

Abstract: A method of producing a light conductor structure or controllable coupler having a pair of light conductors embedded in a substrate of an electro-optical material and having electrodes arranged therebetween characterized by applying a layer of polycrystalline silicon on one surface of the substrate; etching away a portion of the layer to form a doping or diffusion mask; applying a layer of diffusion material on the mask and exposed silicon-free portions of the surface; diffusing the diffusion material into the silicon-free portions to form the light conductors; applying a layer of negative acting photo-lacquer on the layer of diffusion material and the conductors; projecting light through the substrate with the remaining portions of the silicon layer acting as a mask to expose the photo-lacquer; developing the layer of photo-lacquer to remove unexposed portions with the remaining portions of the lacquer covering the light conductors; removing the remaining portions of the silicon layer; applying a metal layer

Abstract: In a method of making decorative panels, a liquid masking material is applied to a surface of a panel, and is cured to form a substantially solid masking layer on the surface. A pattern comprising at least one unmasked area and at least one masked area is formed in the masking layer either simultaneously with the application of the liquid masking material or subsequent to the curing step. The surface of the panel is then treated to render the unmasked areas of the surface of the panel visually distinguishable from the masked areas. In one embodiment of the invention the masking layer is elastomeric and the surface of the panel is treated by sandblasting, after which the masking layer is removed. The entire process may then be repeated to provide a dual density effect. In another embodiment of the invention an asphaltum masking layer is applied to a mirror forming layer on a panel, after which the portions of the mirror forming layer corresponding to the unmasked areas are chemically removed.

Abstract: A method and structure for polysilicon lines which include a silicide layer for providing a low sheet resistance. The invention may be employed in a polysilicon gate MOSFET process for integrated circuits as well as other integrated structures. In the method a first layer of polysilicon is deposited followed by a deposition of a metal of the silicide forming type. Another polysilicon layer is then deposited on top of the silicide forming metal to produce a three layer structure. The three layer structure is subjected to heat, for example, during the reoxidation step in a gate fabrication process, the metal reacts with the polysilicon at two reaction fronts to form a silicide. The resultant silicide has a much lower resistivity than doped polysilicon and therefore provides a second conductive layer which can be used more compatibly and efficiently in connection with the normal metal layer employed in integrated circuits to give a two-dimensional degree of freedom for the distribution of signals.

Abstract: A germanium-containing silicon nitride film has a germanium content of 0.5 to 10 atomic-% that of the silicon content. Since the film has a much smaller stress than a conventional silicon nitride (Si.sub.3 N.sub.4) film, it is very suitable as a mask for fabricating a semiconductor device and an insulating or a protective film for a semiconductor device.

Abstract: A continuous method of manufacturing a plurality of sheet material blanks each having a surface uniformly coated with a tacky layer comprises passing a long length of the sheet material through a first station in which tapes are applied to a surface of the sheet material transversely to the direction of movement of the sheet material and at longitudinally spaced-apart locations, at a second station applying a continuous layer of tacky material to the surface of the sheet material and over the tapes so that tapes mask portions of the surface, at a third station removing the tapes to leave transverse regions free of tacky material and then cutting the sheet material in the regions which are free of tacky material to thereby produce a plurality of sheet material blanks.

Abstract: The mosaic image screen of a shadow mask color tube has a plurality of sets of elemental screen areas, each of which areas includes a phosphor for emitting light of one of three primary colors and a filter which is transmissive of that color but otherwise is essentially a visible light attenuator. The color filter for the first set is formed by applying a thin film of a metallic resinate of a particular color onto the faceplate, directing a laser beam to the elemental screen areas for the other two primary colors to liquify the film and to withdraw the liquefied film from these areas, and heating the entire film to raise the energy threshold at which liquefaction occurs. Second and third metallic resinate films of the other two colors are similarly processed, and then all three films are heated to volatilize their respective organic material to form the color filters.

Abstract: Articles exhibiting a micropattern carried by a surface of a support, typically microdevices comprising a micropattern of a functional material on or in a substrate of a dissimilar material, are produced by a method employing a microsubstrate comprising a substrate base, a protein layer which comprises at least a compressed monolayer of a denatured non-fibrous protein on the base, and a masking film overlying the protein layer, the material of the masking film being such as to be modified by radiant energy so as to be removable from the protein layer where irradiated. The method is flexible in the sense that it is possible to proceed via either a positive or a negative of the desired micropattern and to build a more extensive, or more complex, micropattern from an initial relatively simple micropattern.

Abstract: Micropattern devices, such as electronic microcircuits, are produced by establishing on a substrate base a film of resist material, such as a polymeric film, containing dispersed therethrough a substantial proportion of an enzyme and then producing a pattern of a metal by reactions depending upon presence of the enzyme.

Abstract: In a method of making decorative panels, a liquid masking material is applied to a surface of a panel, and is cured to form a substantially solid masking layer on the surface. A pattern comprising at least one unmasked area and at least one masked area is formed in the masking layer either simultaneously with the application of the liquid masking material or subsequent to the curing step. The surface of the panel is then treated to render the unmasked areas of the surface of the panel visually distinguishable from the masked areas. In one embodiment of the invention the masking layer is elastomeric and the surface of the panel is treated by sandblasting, after which the masking layer is removed. The entire process may then be repeated to provide a dual density effect. In another embodiment of the invention an asphaltum masking layer is applied to a mirror forming layer on a panel, after which the portions of the mirror forming layer corresponding to the unmasked areas are chemically removed.

Abstract: A tape for use in securing a sheet to a surface has adhesive extending part way across one face and the full length thereof thus leaving an uncoated portion to overlie a margin of the sheet. The line of demarcation between the coated and uncoated portion is indicated by regularly spaced indicia including angles the apeces of which preferably establish both transverse and vertical reference lines or ensure accurate tape placement relative to such reference lines.

Abstract: Selected portions of a thin film coating of metal are removed from an insulative substrate by directing a coherent beam of light energy from a laser at the coating, to heat the coating and cause the evaporation and entrapment of the substrate material at the coating-substrate interface. A positive pressure builds up at the interface resulting in an explosion which removes the coating material.

Abstract: Disclosed is a photomask and a method for the manufacture thereof. A metal stencil is disposed on a glass substrate such that only preselected areas of the glass which are to be made opaque are exposed. A grit-etch step follows in which depressions are formed in the glass substrate in the preselected areas. Fusible masking material is sprayed in the depressions through the metal stencil. The masking material is preferably in particulate form in a volatile carrier liquid. The carrier liquid is preferably first driven off and, then, the combination is exposed to a relatively high temperature that fuses the masking material to the substrate.

Abstract: Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.

Abstract: A method using a chemically vapor deposited (CVD) insulator to form a substantially planar layer of insulative material atop a conductive pattern on the surface of a substrate. The invention also features the use of a photoresist both as a mask for forming apertures in an underlying insulating layer as well as a lift-off material for a subsequently deposited conductive layer.In the method, a first insulating layer is deposited atop the substrate. Photoresist is then deposited; the resist pattern is exposed and developed; and the insulator is etched to expose selected areas of the substrate. A conductive film, preferably metal, is then deposited in blanket fashion in such quantity as to achieve the same height as the first insulator within the exposed apertures. The resist is lifted off, thereby leaving metal in the exposed apertures only. The pattern at this point consists of a single level of a conductive pattern and the insulator pattern with gaps between the conductors and the insulator.

Abstract: A decorative panel having areas of different light reflecting characteristics is manufactured by inhibiting the curing of selected areas of a resinous top coat material which is applied to a panel substrate. In one technique a curing inhibitor is applied to selected areas of the substrate surface prior to application, over the entire surface, of a top coat material containing a mixture of an alkyd resin with melamine-formaldehyde, urea-formaldehyde or a mixture thereof. Upon curing, the inhibitor treated areas cure more slowly than the untreated areas and are characterized by a roughened, diffusely reflecting surface contrasting with the untreated areas having a smooth reflecting surface.

Abstract: Patterned iron oxide films are produced on substrates by oxidative decomposition of polyvinyl ferrocene. The polymer may be applied to the substrate in the form of a solution by spinning. Resultant films may be relatively soluble or relatively insoluble in acidic media depending upon processing conditions. Soluble films are of interest for hard copy masks designed for use in the fabrication of printed circuits. Such masks may be pattern-delineated by photoresist techniques or by selective insolubilization. Alternatively, patterns may result from selective deposition or removal of the polymer prior to decomposition.

Abstract: A method of constructing a relatively thick, self-supporting mask suitable for electron beam projection processes. Thickness is achieved by multiple steps of coating with resist, exposure and development. Either positive or negative resist may be used for second and subsequent coatings. Second and subsequent exposures are directed through the first relatively thin mask formed and through the substrate to eliminate critical alignment of subsequent masks. When desired thickness is achieved an even thicker frame may be fabricated for support purposes and the mask may then be lifted off the substrate on which it had rested during the fabrication steps.When positive resist is employed, the resist remaining after development is baked on to give added structural strength to the mask. This baked resist can be coated with an additional layer of metal by evaporation or sputtering to give greater mechanical strength.

Abstract: A method for forming flat display panel phosphor dots is disclosed wherein a conventional printing method or procedure is used in combination with an optical method.The paste film containing the phosphor, photoresist and powdered glass is coated on the surface of the dielectric layer, e.g. lead glass layer by means of the printing method. The paste layer is irradiated by a ultraviolet light through a mask, and after the development of the paste layer has been completed, the remaining hardened portions of the paste layer are subjected to a heat treatment. In this way, phosphor dots having a desired shape can be formed very firmly and very exactly at certain predetermined portions on said dielectric layer.

Abstract: A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.

Abstract: An electric heater plate is disclosed comprising a sheet of tempered glass with a metallized aluminum circuit extending over the face thereof for carrying an electrical heating current. At the terminals of the metallized aluminum circuit there is provided a terminal area of silver between the glass and the metallized aluminum coating, which silver terminals are each exposed through a small opening in the metallized aluminum coating such that lead wires may be soldered to the silver through said openings.

Abstract: In the manufacture of a semiconductor device, when an epitaxially-grown layer is formed on a semiconductor substrate partially formed with an oxide, a polycrystalline layer is formed on the oxide; the polycrystalline part is used as an isolation region for elements to be formed in the epitaxially-grown layer. The oxide for growing the polycrystalline layer is buried and formed in the semiconductor substrate at a depth at which a breakdown voltage between the elements is attained, whereby the width of the isolation region can be made small, so as to increase the density of integration of the semiconductor device.

Abstract: A process for electrically interconnecting a group of integrated-circuit chips embedded in plastic is described. Multilayer conductors are plated in grooves photoformed in successively applied plastic layers and connected to the chip pads and to conductors on other layers through vias also photoformed in the plastic. Photoformation of wiring grooves and layer-interconnecting vias is accomplished by ultraviolet irradiation of photosensitized liquid polyester resin.

Abstract: A ceramic green sheet material is metallized by laminating a thin organic material, preferably MYLAR, to a ceramic green sheet surface, and then employing an electron beam to define a predetermined pattern of openings extending through the organic material and selectively into and through the green sheet. The resulting channels and via holes are then filled with a metal paste. The organic mask is removed by peeling subsequent to the metal paste deposition step.

Abstract: A process for metallizing a ceramic green sheet having via holes or recessed grooves formed therein by depositing a mask forming material over the green sheet, the mask forming material being non-wettable by a composition, either conductive or nonconductive, to be subsequently deposited in the via holes or recessed grooves. After the depositing step, a metal paste is spread or wiped into the vias and grooves and then the sheets are laminated and fired to form a multi-layer ceramic interconnection package whereby the mask forming material is volatized and eliminated from the structure without the necessity of removing the mask forming material in the conventional etching or peeling away methods.

Abstract: A process for providing a margin in a metallized resin film for a condenser element which is characterized by providing on a dielectric resinous layer a water-soluble coating layer having a pattern corresponding to a margin pattern, providing a metal deposition layer on the resinous layer including a coated part and a non-coated part and removing the water-soluble coating layer and the metal deposition layer thereon by washing with water. According to the process, a metallized resin film having an arbitrary margin pattern and a superior electrical property can be readily obtained, with completely eliminating any complexity of the procedure and disadvantage in conventional processes for providing a margin.