Abstract: A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties.

Abstract: A droplet discharge device includes a droplet discharge head, a feed reel, a drying chamber, a drying-gas-introducing device, a take-up reel, an imaging device, an analyzing unit and a control unit. The imaging device captures an image of functional liquid discharged from nozzles of the droplet discharge head onto a sheet member between the feed reel and the take-up reel with the sheet member having been dried in the drying chamber filled with a drying gas to achieve a predetermined humidity. The analyzing unit measures an area over which the functional liquid is deposited on the sheet member from each of the nozzles, and calculates a distribution of a discharge amount of the functional liquid. The control unit adjusts a voltage applied to the drive elements so that the discharge amount of the functional liquid from each of the nozzles approximates a predetermined optimum amount.

Abstract: The present disclosure generally relates to a single-layer film and a prepreg, an industrial process of making thereof, and a reinforced component made therewith, and more specifically, to films with uniformly dispersed nanoparticles in a matrix with thermoset resin layered on a release film for storage, an industrial process for making the films, and reinforced components layered and reinforced using either the single-layer film or the prepreg.

Abstract: A method of coating by supplying a liquid material from a nozzle tip to form a film on a substrate surface facing to the nozzle, having the steps of: preparing a translation mechanism, which is capable of moving the nozzle in an in-plane direction and in a thickness direction of the substrate; making the nozzle to come gradually closer to the substrate, after positioning of the nozzle on the in-plane of the substrate, by using the translation mechanism; detecting electric current flowing through the nozzle from the substrate surface, when a semiconductor droplet supplied from the nozzle tip contacts with an electrode installed at the substrate surface; stopping accession of the nozzle to the substrate, when the electric current exceeds threshold value set in advance; and making the nozzle tip apart from the substrate farther than in the stopping, so as to coat the substrate with the liquid material.

Abstract: The invention concerns a device forcreating a printing plate including a support (1) designed to be exposed to liquid photopolymer then a film designed to constitute the base of the printing plate, a means of application (3) of the liquid photopolymer on the support (1) in a layer (2) of predetermined thickness and a means of verification (5) of the actual thickness of the layer (2) applied. The means of verification includes a detector (5), mounted on the downstream side of the means of application (3), such that it is situated over a section of the photopolymer layer (2) that has just been applied, the detector (5) generating an electric signal, on the basis of which the flow of photopolymer is adjusted, when the actual thickness of the layer (2) applied differs from the predetermined value. The invention also concerns a procedure of making a printing plate, preferably implemented via said device.

Abstract: A disclosed film deposition apparatus includes a transparent window in a ceiling plate of a vacuum chamber. A film thickness of a film deposited on a substrate is measured by emitting light to the substrate through the transparent window by a film thickness measurement system that includes optical units arranged on or above the transparent window, optical fiber cables connected to the corresponding optical units, a measurement unit to which the optical fiber cables are connected, and a control unit electrically connected to the measurement unit in order to control the measurement unit.

Abstract: A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.

Abstract: The invention relates to a method for monitoring the production of nanometric filamentary structures. The method comprises passing a gaseous phase comprising nanometric filamentary structures through a space defined between at least two electrodes generating an electric field for causing an increase of current between the electrodes and analyzing behavior of the current over a predetermined period of time and/or analyzing at least one of the size, density and shape of the nanometric filamentary structures or aggregates thereof present in the gaseous phase.

Abstract: Disclosed is a method of producing an insulated electric wire, in which a primary coating layer including at least an enamel-baking layer is formed on a metallic conductor to form a primary coated electric wire, and a secondary coating layer is extrusion-formed on the primary coating layer of the primary coated electric wire. The method includes an electric wire pre-heating process where a surface of the primary coating layer is pre-heated using an electric wire pre-heating unit, and a resin extrusion process where a secondary coating layer is extrusion-formed on the pre-heated primary coating layer using a resin extrusion unit. Further disclosed is an apparatus for producing an insulated electric wire.

Abstract: A method for inspecting golf balls is disclosed. The method comprises the steps of providing at least one sensor capable of obtaining images of the infrared radiation emitted from the ball, obtaining at least one image of the ball using the sensor after paint or a coating has been applied to the surface of the ball, and determining whether the liquid was applied evenly on the surface of the ball. Preferably, the image is obtained during the transient period when the solvent in the paint or coating is evaporating. A number of numerical analysis can be used to determine the evenness of the paint or coating.

Abstract: A method for inspecting golf balls is disclosed. An imager such as a camera captures a spectral image of the golf ball. The spectral image is captured line-by-line as the golf ball rotates. The lines are then packed together to form a three-dimensional spectral image of the golf ball showing full spectral information for every pixel. The resultant three-dimensional spectral image is then analyzed, such as using a pattern matching or threshold analysis tool. If a golf ball passes the inspection, it is permitted to advance in the processing. If the golf ball does not pass the inspection, it may be diverted. This inspection system is capable of detecting very subtle color differences, so the system is particularly applicable for use in inspecting primer coat coverage.

Abstract: A method and apparatus for controlling the thickness of a thin film or thin layer of discrete particles or of a heterogeneous mixture characterized in that the interfacial tension forces between the solution or suspension and its environment are used as the driving forces to evenly spread the solution, suspension or mixture while the solvent evaporates and/or dilutes.

Abstract: In a method of measuring the thickness of a coating as it is applied to a substrate, wherein the coating is applied as a thin ribbon from a spray gun, at least one surface profile of the applied coating is obtained along a line intersecting the ribbon during relative movement of the substrate and spray gun. The thickness of the applied coating is computed from the obtained surface profile.

Abstract: A method of adjusting a spacing between a gas distribution member and a substrate support includes forming a layer on a substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations.

Abstract: A method and apparatus for controlling coating material deposition on to a medical device. Images of material drops in flight are captured and an average single drop volume value is calculated by conversion of the captured drop images to a volume measurement. The average single drop volume value is used to calculate a total number of drops necessary to apply a desired amount of coating. Alternately, material is applied and the amount of material deposited is accumulated and adjustments are made to deposit only a desired amount of coating material. A drop volume is determined for either every drop or a sampling of drops as the drops are being applied. Adjustments to the coating process include changing drop size and changing a number of drops to be deposited.

Abstract: Embodiments of the present invention generally provide apparatus and methods for altering the flow and pressure differential of process gases supplied across a showerhead of a processing chamber to provide improved deposition uniformity across the surface of a substrate disposed therein. In one embodiment, a blocker plate is disposed between a backing plate and a showerhead. In one embodiment, the distance between the blocker plate and the showerhead is adjustable. In another embodiment, the blocker plate has a non-planar surface contour. In another embodiment, a regional blocker plate is disposed between a backing plate and a showerhead. In another embodiment, a central blocker plate and a peripheral blocker plate are disposed between a backing plate and a showerhead.

Abstract: A method is provided for the non-contact measurement of variations in thickness of composite materials and structures prepared from composite parts. Metrologic methods are employed to provide a 3D image of the structure or part. Variations that are greater than an acceptable amount can be corrected by adding a compensation layer to the surface of the structure or part.

Abstract: Described is a method for manufacturing a display including a substrate on which a structure, such as, for instance, a matrix structure in relief, is provided, which structure bounds a number of areas, wherein, with the aid of an inkjet printhead, substantially in each area an amount of liquid is deposited, wherein with the aid of at least one sensor a measurement is performed on the substrate to determine the position of a respective area, and on the basis of the thus determined position the printhead is controlled to deliver an amount of liquid at the correct place. Also described is an apparatus for carrying out the method, a substrate for use in the method and a display obtained with the method.

Abstract: Improved methods and apparatus for forming thin film buffer layers of chalcogenide on a substrate web through the chemical combination of a metal and chalcogen in solution form. The web and/or the solutions may be heated by one or a plurality of heating elements that may be disposed out of physical contact with the web, allowing enhanced control over the reaction speed through fine temperature control. One or more properties of the chalcogenide layer may be measured, and the temperature of the system may be adjusted in response.

Abstract: A method for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined.

Abstract: In the continuous deposition of a coating on strip-type substrate, a thickness of the coating depends on the condition of various actuators. A first preliminary phase of the process includes developing a pre-setting model, a second preliminary phase includes developing an adjustment model, an intermediate pre-setting step during which the actuators are set statically, a step of measuring the thickness of the coating, and an adjustment step during which the actuators are dynamically controlled by a predictive control based on the adjustment model in order to reduce any potential difference between the coating measured thickness and a target value of the thickness.

Abstract: A spray coating apparatus comprises a spray gun (12) operable to deposit a sprayed coating via a spray nozzle (18) onto a surface, a mapping means (22) associated with the spray gun (12) operable to ascertain and store topographical characteristics of the surface, a position sensor (28) operable to ascertain the position of the spray gun (12) relative to the surface, a coating thickness monitor (26) operable to ascertain the thickness of a coating applied to the surface, and a nozzle control means (24) operable to control the deposition of the sprayed coating, wherein the nozzle control means (24), in use, control the deposition of the sprayed coating in response to information provided by the position sensor (28), the coating thickness monitor (26) and the mapping means (22).

Abstract: Provided are a method, an apparatus and a computer program for filling a liquid material, which do not require complicated parameter calculation and which do not affect the moving speed of a discharge unit. In the method for filling a gap between a substrate and a work placed thereon with the liquid material discharged from the discharge unit by utilizing a capillary action, the method is characterized in forming an application pattern made up of an application region and a non-application region along an outer periphery of the work, and correcting a discharge amount of the liquid material by extending and contracting the application region and the non-application region. The apparatus and the program for carrying out the method are also provided.

Abstract: A structure and method for instrumenting a component for monitoring wear in a coating. The method includes depositing a first thin layer of electrically insulating material, depositing a thin electrically conductive layer over the first electrically insulating layer, depositing a second thin layer of electrically insulating material over the electrically conductive layer. An overlying thickness of the coating material is deposited over the second thin layer of electrically insulating material. The thicknesses of the insulating and conducting layers is controlled to be small enough such that the overlying coating surface exposed to mechanical wear retains a desired degree of smoothness without the necessity for a separate planarization step.

Abstract: Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SMFD source apparatuses (700, 700?, 700?) and methods from volatile and non-volatile liquid and solid precursors are disclosed, e.g., a method for substantially controlling the vapor pressure of a chemical source (722) within a source space comprising: sensing the accumulation of the chemical on a sensing surface (711); and controlling the temperature of the chemical source depending on said sensed accumulation.

Abstract: Protection of elements (1) of composite material protected at its points of complex geometry, such as various edges and corners, against electric discharges to which they are potentially exposed, said elements (1) being obtained by applying a cycle of temperature and pressure to a composite material arranged in a mould (2) designed in such a way that, once the geometry of the element (1) is known, the mould (2) includes free spaces (6) intended for the accumulation of resin from the process of manufacture of said element (1), and said resin will form the dielectric protection of the various edges or corners of the element (1) as it builds up, forming layers (3) that are disposed around the free edges of the element (1), thus endowing these surfaces of various edges or corners with dielectric protection of electrical insulation that prevents possible discharges and expulsion of hot particles in the case of electric discharge on said element (1).

Abstract: An apparatus and method for simultaneously coating and measuring a part including a part support, a sprayer, a part measurer including a digital camera and a display device, all of which are positioned adjacent to the part support. The sprayer applies a coating to a section of the part while the part measurer continuously measures at least two dimensions of the section. The digital camera takes at least one picture of the entire section of the part while the part is being coated and enables a user to accurately determine the cross section of the part to the optimum finished part configuration and size and also detect defects, blemishes or coating irregularities formed on the section. The apparatus and method of the present invention significantly reduces the margin of error related to the application of coatings to parts, the number of defective parts and increases the overall efficiency.

Abstract: A method of bonding a MEMS device to a substrate to form a MEMS device assembly. A thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate is determined. An adhesive is deposited onto a mating surface of the MEMS device and/or the mating surface of the substrate. The mating surfaces of the MEMS device and substrate are brought together, such that the adhesive can bond the MEMS device to the substrate. The volume of adhesive deposited at particular locations on the mating surface is varied to compensate for local variations in the thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate.

Abstract: A system and method for cooling and coating optical fiber includes the capability to control the amount of coolant gas that is fed to and recycled through a heat exchanger for cooling the optical fiber. The capability to control the amount of fed and recycled coolant gas includes measuring at least one parameter selected from the thermal conductivity of the coolant gas, the viscosity of the coolant gas, the diameter of the primary coating on the optical fiber, and the power usage of a coating applicator for applying primary coating on the optical fiber.

Abstract: An apparatus capable of dispensing drops of material with volumes on the order of zeptoliters is described. In some embodiments of the inventive pipette the size of the droplets so dispensed is determined by the size of a hole, or channel, through a carbon shell encapsulating a reservoir that contains material to be dispensed. The channel may be formed by irradiation with an electron beam or other high-energy beam capable of focusing to a spot size less than about 5 nanometers. In some embodiments, the dispensed droplet remains attached to the pipette by a small thread of material, an atomic scale meniscus, forming a virtually free-standing droplet. In some embodiments the droplet may wet the pipette tip and take on attributes of supported drops. Methods for fabricating and using the pipette are also described.

Abstract: There are provided a thermal processing apparatus, a method for regulating a temperature of a thermal processing apparatus, and a program, by which a temperature can be easily regulated. A control part 50 of a thermal processing apparatus 1 controls the apparatus so as to deposit SiO2 films on semiconductor wafers W, and judges whether the SiO2 films satisfy an in-plane uniformity. When the in-plane uniformity is not judged to be satisfied, the control part 50 calculates a temperature of a preheating part 23 by which temperature the in-plane uniformity can be satisfied. The control part 50 controls the apparatus so as to deposit SiO2 films on semiconductor wafers W under process conditions in which the temperature of the preheating part 23 has been varied into the calculated temperature, and the temperature of the preheating parts 23 is regulated.

Abstract: Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.

Abstract: A method of determining an endpoint of a process by measuring a thickness of a layer, the layer being deposited on the surface by a prior process is disclosed. The method includes providing a sensor that is coplanar with the surface, wherein the sensor is configured to measure the thickness. The method also includes exposing the plasma chamber to a plasma, wherein the thickness is changed by the exposing, and determining the thickness as a function of time. The method further includes ascertaining a steady state condition in the thickness, the steady state condition being characterized by a substantially stable measurement of the thickness, a start of the steady state condition representing the endpoint.

Abstract: A coil is provided for use in a semiconductor processing system to generate a plasma with a magnetic field in a chamber. The coil comprises a first coil segment, a second coil segment and an internal balance capacitor. The first coils segment has a first end and a second end. The first end of the coil segment is adapted to connect to a power source. The second coil segment has a first and second end. The second end of the first coil segment is adapted to connect to an external balance capacitor. The internal balance capacitor is connected in series between the second end of the first coil segment and the first end of the second coil segment. The internal balance capacitor and the coil segments are adapted to provide a voltage peak along the first coil segment substantially aligned with a virtual ground along the second coil segment.

Abstract: A strip coating system includes a first pulley carrying a flexible metal or Al substrate wound up on the first pulley. A second, take-up, pulley is provided for taking up the coated substrate. The coating process is a continuous coating process, during which the first pulley and the second pulley are rotated to move the substrate continuously past a coating tool for depositing coating particles on a surface of the substrate. After having passed the coating section with a speed v, the substrate carrying a coating layer on the surface thereof passes an infrared spectroscopic measurement device for measuring the layer thickness of the coating layer. Feedback controls are provided to control one or more process parameters of the coating tool responsive to the measurement of the thickness of the coating layer detected by the measurement tool. Thus, an in situ online measurement of the thickness of the coating layer may be implemented.

Abstract: A method for forming a thin film by discharging a liquid including a material for forming the thin film, the material being dissolved or dispersed in a solvent, from a plurality of nozzles so as to dispose the liquid into a plurality of predetermined areas included in an effective area set on a substrate to form the thin film while the plurality of nozzles and the substrate are relatively scanned, includes: (a) forming a plurality of reception parts surrounded by a plurality of partitions and bottoms of the predetermined areas, the partitions being provided around the predetermined areas; and (b) forming a plurality of thin films by disposing the liquid from the nozzles into the reception parts. In step (a), a plan view area of at least one of the reception parts in a peripheral area of the effective area is made smaller than a plan view area of the reception part in a central area of the effective area.

Abstract: A method and apparatus for controlling the thickness of a thin film or thin layer of discrete particles or of a heterogeneous mixture characterized in that the interfacial tension forces between the solution or suspension and its environment are used as the driving forces to evenly spread the solution, suspension or mixture while the solvent evaporates and/or dilutes.

Abstract: A method for manufacturing a current perpendicular to plane magnetoresistive sensor that allows for dynamic adjustment of free layer biasing to compensate for variations in thickness of an electrically insulating layer that separates the hard bias layers from the free layer. During fabrication of the sensor, the actual thickness of the insulation layers is measured. Then, to maintain a desired magnetic stabilization of the free layer one of three options can be utilized. Option one; adjust the stripe height target to maintain the desired magnetic stabilization. Option two; adjust the hard magnet thickness to maintain the desired magnetic stabilization. Option three; use a combination of option one and option two, adjusting both the stripe height target and the hard magnet thickness to maintain the desired magnetic stabilization.

Abstract: A method for inspecting golf balls is disclosed. An imager such as a camera captures a digital image of the golf ball. The golf ball image is separated into regions, and a brightness level is determined for each region using a histogram tool. The brightness level of the region is compared with a reference level. If the brightness level of the region is significantly different from the reference level, then the golf ball is diverted. The regions are located from image to image using pattern matching and/or edge finding tools. The environmental light conditions are altered to facilitate the pattern matching and edge finding.

Abstract: A method for controlling the thickness and uniformity of a dip coated layer, using a coating apparatus under conditions of controlled temperature and controlled low humidity, includes the following steps: under normal coating conditions of ambient temperature and relative humidity, forming on a metal substrate having a thickness of at least about 500 microns a series of coated layers using variations in coating solution viscosity m, coating substrate withdrawal speed v, capillary number Ca, coating solution surface tension S, and boiling point bp (a correlative of evaporation rate) of the coating solution solvent, a coated layer including at least a portion of uniform thickness T(even) and, optionally, a portion of non-uniform thickness L(uneven); statistically analyzing measurements carried out on the series of coated layers and generating the constants, a, b, c, d, and e for Equations 2, 3, and 4: T(even)=a+b(m*v) ??(Equation 2) L(uneven)=c+d*(v*bp)+e*(Ca*bp) ??(Equation 3) v(even)=?c/bp*(d+e*m/S) ??(Equ

Abstract: A method for controlling the thickness and uniformity of a dip coated layer, using a coating apparatus in a normal coating environment, includes the following steps: forming under normal coating conditions of ambient temperature and relative humidity a series of coated layers on a metal substrate having a thickness of at least about 500 microns, using variations in coating solution viscosity m, coating substrate withdrawal speed v, capillary number Ca, coating solution surface tension S, and boiling point bp (a correlative of evaporation rate)of the coating solution solvent, a coated layer including at least a portion of uniform thickness T(even) and, optionally, a portion of non-uniform thickness L (uneven); statistically analyzing measurements carried out on the series of coated layers and generating the constants, a, b, c, d, and e for Equations 2, 3, and 4: T(even)=a+b(m*v) ??(Equation 2) L(uneven)=c+d*(v*bp)+e*(Ca*bp) ??(Equation 3) v(even)=?c/bp*(d+e*m/S) ??(Equation 4) using Equation 4, determining

Abstract: The invention describes a sensor system (3) for measuring the thickness of flat material (2), which (1) [sic] is moved relative to the sensor system (3), said sensor system having a first sensor device (14) for measuring the thickness of the flat material (2) as well as means for generating an air cushion (23), which means are disposed in such a way that there results an air cushion (23) between that at least one side (16) [sic: (15)] of the sensor device (15) [sic: 14)] that faces the flat material (2) and the flat material (2) during operation. In the region of the air cushion (23), the first sensor device (14) comprises surface sections comprising porous material and/or material that is provided with micro-holes.

Abstract: The accuracy of the coating concentration when applying a catalytically active coating to suitable carrier bodies can be increased if, following raw coating with a relatively wide fluctuation range in the coating concentration, excessive or insufficient coating applied is if appropriate corrected iteratively. Excessive coating suspension applied is removed, for example by subsequent suction, while the coating is still in the wet state, whereas insufficient coating suspension applied is topped up, for example by spraying on additional coating suspension.

Abstract: Methods and apparatus provide for: applying an inorganic barrier layer to at least a portion of a flexible substrate, the barrier layer being formed from a low liquidus temperature (LLT) material; and sintering the inorganic barrier layer while maintaining the flexible substrate below a critical temperature.

Abstract: The present invention provides a processing system, a processing method and a program, which can readily control a gas flow rate. A vertical-type heating apparatus 1 includes a plurality of gas supply pipes 16 to 20 each adapted for supplying a processing gas into a reaction vessel 2 configured to contain therein semiconductor wafers W. For the gas supply pipes 16 to 20, flow rate control units 21 to 25 are provided, respectively, for controlling each flow rate. In a control unit 50, processing conditions including the flow rate of the processing gas and a film thickness-flow rate-relationship model indicative of a relationship between the flow rate of the processing gas and a film thickness, are stored.

Abstract: Systems and methods for applying liquid coating materials to a substrate, such as an electronic component or circuit board. A control system (18, 24, 26) of a coating system (10) controls an applicator (16) and a robot (14) moving the applicator (16) to apply the liquid coating material to the substrate (12) in accordance with the information contained in a coating program. The control system (18, 24, 26) determines a volume of liquid coating material actually dispensed onto the substrate (12) during the coating program, and compares the dispensed volume to a desired dispensed volume of liquid coating material to produce an error signal representing the difference between the calculated and desired volume values. The control system (18, 24, 26) uses the error signal to change the dispensed volume of liquid coating material on a subsequent substrate by a future coating program.

Abstract: The present invention facilitates multi-zone furnace (102) based deposition processes by iteratively adjusting deposition time and zonal setpoint temperatures to mitigate deviations from desired target thickness(es). Coupled feedback loops are employed to update the deposition time (520) and the zonal setpoint temperatures (510) lot to lot and batch to batch while mitigating deviations fro the desired target thickness(es). Error checking is performed by computing an error metric (506) and only updating the setpoint temperatures on the error metric being within an acceptable value (508). Additionally, an excitation parameter (512) is determined that indicates variations in furnace operation.

Abstract: An enhanced sputtered film processing system and associated method comprises one or more sputter deposition sources each having a sputtering target surface and one or more side shields extending therefrom, to increase the relative collimation of the sputter deposited material, such as about the periphery of the sputtering target surface, toward workpiece substrates. One or more substrates are provided, wherein the substrates have a front surface and an opposing back surface, and may have one or more previously applied layers, such as an adhesion or release layer. The substrates and the deposition targets are controllably moved with respect to each other. The relatively collimated portion of the material sputtered from the sputtering target surface travels beyond the side shields and is deposited on the front surface of the substrates.

Abstract: A method for intermittently applying thin-film coatings is realized, by which a coating of extremely thin film reduced to 20 ?m or less in thickness is deposited intermittently with high productivity and at the same time, the trailing coating edge of the thin film is formed in a highly accurate shape having good linearity. This is achieved as follows. A band-shaped substrate (1) traveling in one direction is kept looped over a stationary reference-roller (4) and a movable actuation roller (7), and is brought into contact with an application roller (19) which carries a coating agent (18) on its circumferential surface and rotates in a direction opposite to the direction of travel of the substrate (1). The actuation roller (7) is moved to come into or out of contact with the substrate (1) with a predetermined timing.

Abstract: A fabrication method of an ultra low-k dielectric layer is provided. A deposition process is performed, under the control of a temperature varying program or a pressure varying program, by reacting a dielectric matrix to form porous low-k dielectric layers with a gradient density on a barrier layer over a substrate.