Abstract: Lubricant coatings are applied as vapor to magnetic disks. The method and apparatus include applying vaporizing heat to a pre-determined amount of liquid to form a vapor. Precision delivery of lubricant vapor allows close-loop lube thickness control. The flow of the liquid to the heater is controlled such that only a pre-determined amount from the reservoir flows to the heater at a time, the pre-determined amount is vaporized. According to an aspect, the pre-determined amount of liquid is transferred from the reservoir for the application of vaporizing heat; isolating the reservoir from the vacuum of the vacuum chamber. The method enables multiple types of lubricants to be applied to the disk. Another heater is included for applying vaporizing heat to a second liquid to form a second vapor to supply to the disk. According to an aspect, pulsed lubricant vapor delivery is provided, conserving lubricant and minimizing thermal decomposition.

Abstract: New and used parts of gas and steam turbine engines are protected by imparting a controlled residual compressive stress to given portions of the part and then coated by a CVD or PVD process at low temperatures with layers of TiN or alloys thereof at alternate selective hard and less hardened levels. The protective treatment is particularly efficacious for airfoils of compressor blades/vanes of gas turbine engines and airfoils of airfoils and certain components of steam turbine engines. This method is targeted to reduce erosion, corrosion and stress-corrosion cracking in these parts.

Abstract: A microchip is provided with a lower substrate configured as the lower portion of the microchip, an intermediate section formed on the top of the lower substrate, and an upper substrate formed on the top of the intermediate section, wherein the lower substrate, the intermediate section, and the upper substrate are made of light-transmissive and cured resin.

Abstract: A method of monitoring a coating applied to a metal surface is disclosed. Specifically, the method comprises the following: applying a sol composition to a metal surface, wherein said composition contains one or more alkoxysilyl group containing compounds, a fluorophore, and a solvent; forming a gelled coating on said surface from said composition; measuring the fluorescence of said coating with a fluorometer, wherein said fluorometer is capable of measuring reflective fluorescence emission measurements; correlating the fluorescence of said coating with the thickness or weight of said coating, and/or with the concentration of alkoxysilyl group containing compound in the coating composition; and optionally applying an additional coating to said metal surface when the thickness of the coating is less than a desired amount or adjusting the concentration of the alkoxysilyl group containing compound applied to said surface.

Abstract: An adaptive real time thermal processing system is presented that includes a multivariable controller. The method includes creating a dynamic model of the MLD processing system and incorporating virtual sensors in the dynamic model. The method includes using process recipes comprising intelligent set points, dynamic models, and/or virtual sensors.

Abstract: An apparatus and method for simultaneously coating and measuring a part including a part support, a sprayer, a part measurer including a digital camera and a display device, all of which are positioned adjacent to the part support. The sprayer applies a coating to a section of the part while the part measurer continuously measures at least two dimensions of the section. The digital camera takes at least one picture of the entire section of the part while the part is being coated and enables a user to accurately determine the cross section of the part to the optimum finished part configuration and size and also detect defects, blemishes or coating irregularities formed on the section. The apparatus and method of the present invention significantly reduces the margin of error related to the application of coatings to parts, the number of defective parts and increases the overall efficiency.

Abstract: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate.

Abstract: A sensor for detecting an amount of material deposition. The sensor includes a substrate, a heater disposed on the substrate, and a temperature sensor. The heat and the temperature sensor are separated from one another by a gap.

Abstract: A real-time system adapted to a PVD apparatus for monitoring and controlling film uniformity is described. The system includes a shielding plate, a monitoring device, and a data processing program. The shielding plate is disposed on an inner wall of a reaction chamber above a wafer stage. An opening in the center of the shielding plate exposes the wafer. The monitoring device including a scanner and a sensor respectively disposed on opposite sidewalls of the reaction chamber between the shielding plate and the wafer stage is used for measuring the flux of the particles on every portion of the wafer to acquire real-time uniformity data including a function of the wafer position and the flux. The data processing program compares the real-time uniformity data and reference uniformity data, and a feedback signal is outputted to the PVD apparatus to adjust the process parameter thereof for controlling film uniformity.

Abstract: A method for liquid phase deposition of crystalline silicon thin films, and a high efficiency solar cell that is fabricated using crystalline silicon thin film technology, has the performance of a crystal silicon solar cell, but at the cost level per unit area of a solar cell fabricated using an amorphous silicon thin film. The crystal thin film uses only 10% or less of the amount of silicon used in a wafer-based solar cell. Because of the maturity of silicon technology in semiconductor industry, this approach not only enables high volume, automated production of solar cells on a very large, low-cost substrate, but also increases the area throughput up to 10000 cm2/min from 942 cm2/min in case of CZ crystal growth.

Abstract: An abradable and anti-encrustation coating is described for a rotating fluid machine (10) of the type comprising a casing (12), in which a shaft (14) equipped with at least one rotor (16) having a series of circumferential vanes (18) is rotatingly assembled and at least one diffuser (20) integral with the casing (12). The outer edge of each circumferential vane (18) faces an annular surface portion (28) of the diffuser (20). The annular surface portion (28) of the diffuser (20) is at least partially covered with a coating which can be abraded by the outer edge of each circumferential vane (18), said abradable coating comprising of a first lower metal-based coating layer (30), applied on the annular surface portion (28) of the diffuser (20), and a second upper polymer-based coating layer (32), applied on the first lower metal-based coating layer (30).

Abstract: An apparatus and method for applying a fluid spin-on material on a surface of first and second substrates. A spin coating device is configured to dispense the fluid spin-on material to form a first layer on the surface of the first substrate. A metrology tool is configured to measure a first thickness profile of the first layer and generate data representing the first thickness profile. A processing unit is electrically coupled with the metrology tool and is configured to analyze the data received from the metrology unit and to determine a variation in the first thickness profile. The processing unit then determines an adjustment to an operational parameter of the spin coating device predicted to reduce a variation in a second thickness profile of a second layer subsequently formed by the spin coating device on a second substrate.

Abstract: A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device, enabling the mask plate to mask film zones on the said substrate to achieve the film thickness of a design objective. When the required zones of deposition are masked, the deposition of a particular film layer is completed.

Abstract: The invention relates to a device and method for controlling the operation of a thermal spray torch (12). The inventive device and method are characterized in that an on-board camera (54) and pyrometer (70) are used to measure the properties of the jet (16) and the temperature of the deposit (24) on the part (22) and in that the correction to be made to supply parameters of the torch (12) is deduced. Furthermore, the invention is characterized in that the corrected parameters are sent to the cabinet (30) that controls the torch (12).

Abstract: An evaporation apparatus that is capable of determining the amount of organic material that is used for deposition of an organic layer (e.g. in an OLED) is presented. The apparatus evaporates an organic material through multiple stages and and includes: an evaporation source that evaporates the organic material and includes a heat source, a substrate supporter that supports a substrate, a sensor that senses a degree of evaporation of the organic material, a controller that calculates a deposition thickness of the organic material that is deposited during the stabilization stage, the deposition stage and the cooling stage by using the degree of evaporation sensed by the sensor, and a usage amount calculator that calculates a usage amount of the organic material by using a conversion factor between the deposition thickness of the organic material and the usage amount of the organic material, and the deposition thickness calculated by the controller.

Abstract: This invention relates to thermal spray processes comprising thermally depositing a high purity yttria or ytterbia stabilized zirconia powder, said powder comprising from about 0 to about 0.15 weight percent impurity oxides, from about 0 to about 2 weight percent hafnium oxide (hafnia), from about 6 to about 25 weight percent yttrium oxide (yttria) or from about 10 to about 36 weight percent ytterbium oxide (ytterbia), and the balance zirconium oxide (zirconia), onto a substrate to produce a coating having vertical segmentation cracks, essentially through the full thickness of the coating, and having from about 5 to about 200 cracks per linear inch measured in a line parallel to the plane of the coating, and having a thickness of from about 5 to about 200 mils; and having a final surface layer comprising a dipped or solution-sprayed ceramic frit coating having a thickness up to about 5 mils; and treating said surface layer with a high temperature air heat treatment to bond and adhere the surface layer.

Abstract: An inject recording method, including: spraying droplets of an ink composition that contains organic solvent, resin, and a pigment dispersion containing a metal pigment, wherein the metal pigment contains plate-like particles, and in the case where the longitudinal diameter on the planar surface of the plate-like particle is X, the lateral diameter is Y, and the thickness is Z, the 50% average particle diameter R50 of a corresponding circle determined from the surface area in the X-Y plane of the plate-like particle is between 0.5 and 3 ?m, and the condition R50/Z>5 is satisfied; and causing the droplets to adhere to a recording medium.

Abstract: A method for manufacturing a plasma display comprises: a phosphor painting process for painting phosphor layer in ribs formed on a back plate; and a phosphor inspection process that includes the steps of: irradiating the phosphor layer with ultraviolet light; preparing an imaging system so that the imaging system images the emitted light beam to acquire information on brightness; comparing the brightness information with correlation between a shape model of the phosphor layer and brightness signal information that have been obtained in advance; and obtaining a painted state of the phosphor layer painted in the ribs; and a process for feeding back the applied state of the phosphor layer, which has been obtained in the phosphor inspection process, to the phosphor painting process so that the manufacturing equipment is controlled in the phosphor painting process.

Abstract: The hard copy has a transparent coat layer which is formed on an image recording surface of a recording medium on a side of which an image is recorded and covers at least a part of the image recording surface. The transparent coat layer has asperities corresponding to three-dimensional information of the image, materials of objects forming the image, or density variation in the surface area of the image. The size, shape, spacing, height or other features of the asperities can be varied. The hard copy creation method records the image on the recording medium on the side of the image recording surface and then forms on the image recording surface the transparent coat layer having the asperities. The hard copy is created by first printing the image, and then forming on the image a transparent coat layer with the asperities.

Abstract: Apparatus and a method for forming a thin film including a vacuum chamber, a substrate holder located on the inner upper side of the vacuum chamber to secure a substrate, an evaporation source located on the inner lower side of the vacuum chamber to evaporate a deposition material, an evaporation source shutter substantially confining the deposition material evaporated to the evaporation source, a sensor located within the vacuum chamber to detect the thickness of the deposition material deposited on itself, and a calculation portion calculating the thickness of the deposition material deposited on the evaporation source shutter using data detected by the sensor.

Abstract: This invention relates to a method for manufacturing an implantable medical device, having a surface covered with a coating that can include a desired amount of a biologically active material, using an ultraviolet (UV) laser. The invention also pertains to a method for manufacturing an implantable medical device having a surface covered with a coating having more than one layer wherein a desired portion of the top layer is ablated with an ultraviolet (UV) laser. Also, the invention relates to a method for measuring a thickness of a coating applied to an implantable medical device. Furthermore, the invention is directed to a method for manufacturing an implantable medical device having a surface covered with a coating free of webbing or cracking.

Abstract: This invention relates to spotting solutions for the production of assay articles with uniform spot size and morphology for the detection of biopolymers, comprising N-lauroyl sarcosine in a buffered solution. Optionally the spotting solution may further comprise a fluorophore or a dye. This invention further provides means for non-destructive quality control of the production of said assay articles. This invention further provides means for non-destructive quality control of the production of said assay articles.

Abstract: A method of fabricating semiconductor integrated circuits includes (1) providing a spin-on tool comprising a rotatable platen for holding and spinning a wafer disposed thereon, a fluid supply system for providing spin-on solution onto the wafer, and a detector fixed in a position above the wafer, wherein the wafer has a radius R; (2) spin-on coating the wafer by depositing the spin-on solution onto surface of the wafer from its center and spinning-off to leave a spin coat material layer; and (3) spinning the wafer and scanning the spin coat material layer by impinging an incident light beam emanated from the fixed detector and detecting a reflected light beam.

Abstract: Thermally insulating layer incorporating a distinguishing agent and method for inspecting the insulating layer are provided. The distinguishing agent may be used for determining a remaining thickness of the thermally insulating layer.

Abstract: In a method and a device for finishing an endless fabric, the endless fabric is transported past a rotating applicator roll that is wetted with a liquor, in order to apply the liquor onto the endless fabric. On the endless fabric that has been transported onwards, after drying, the thread add-on, or its change, is measured and evaluated on an ongoing basis by a sensor, in order to regulate the rotational speed of the application roll as a function of the measuring result. A device is suitable for implementing the method.

Abstract: The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measured by means of a camera (54) and a combined pyrometer (70). The correction to be made to the supply parameters of the torch (12) are deduced therefrom and the corrected parameters are transmitted to the unit (30) controlling the torch (12).

Abstract: An apparatus for performing a coating weight control calculation and an apparatus for generating an activation timing of each process in coating weight control are separately managed. A strip welding point pass event, a completion event of scan measurement of a steel strip in a width direction by a coating weight gauge, and a constant period event are related respectively to activation timings of preset control, feedback control and feedforward control respectively of a coating weight. In a coating weight control apparatus and method, the activation timing generation apparatus is equipped with a function of calculating a timing of changing a pressure reference avoiding insufficient coating in accordance with response characteristics of a pressure as an operation terminal, and if a target coating weight is changed from thin coating to thick coating, generating a preset control activation reference in accordance with the calculation result.

Abstract: The invention relates to a device and method for controlling the operation of a thermal spray torch (12). The inventive device and method are characterised in that an on-board camera (54) and pyrometer (70) are used to measure the properties of the jet (16) and the temperature of the deposit (24) on the part (22) and in that the correction to be made to the supply parameters of the torch (12) is deduced. Furthermore, the invention is characterised in that the corrected parameters are sent to the cabinet (30) that controls the torch (12).

Abstract: The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measured by means of a camera (54) and a combined pyrometer (70). The correction to be made to the supply parameters of the torch (12) are deduced therefrom and the corrected parameters are transmitted to the unit (30) controlling the torch (12).

Abstract: A direct write process and apparatus for fabricating a desired circuit component onto a substrate surface of a microelectronic device according to a computer-aided design (CAD).

Abstract: A device for measuring thickness and/or rate of thickness increase of a film comprises at least one piezoelectric element, and first and second electrodes in contact with the piezoelectric element. A method of measuring thickness and/or rate of thickness increase of a film comprises applying a voltage across a piezoelectric element from a first electrode to a second electrode, thereby causing the piezoelectric element to vibrate, and measuring the rate of vibration of the piezoelectric element. Heat may be applied to the piezoelectric element. The piezoelectric element may be formed of quartz crystal, e.g., IT-cut or near-IT-cut.

Abstract: A substrate processing apparatus enable fouling due to deposit to be monitored in real time. To monitor deposit attached to an inner wall surface of a processing chamber in which processing is carried out on a substrate, a deposit monitoring apparatus of the substrate processing apparatus includes a sensor for measuring a capacitance between two conductors spaced apart from each other and both connected to the sensor. The capacitance between the conductors increases with increase in an mount of deposit and reflects the state of fouling due to deposit.

Abstract: A substrate processing apparatus capable of improving the degree of freedom for installation of a deposit monitoring apparatus component used for direct deposit analysis. A deposit monitoring apparatus of the substrate processing apparatus for monitoring deposit in a processing chamber in which a substrate is processed includes an optical fiber having a portion thereof exposed in the processing chamber. Incident light is emitted to the optical fiber from a light-emitting device connected to one end of the optical fiber, and light having passed through the optical fiber is received by a light-receiving device connected to another end of the optical fiber.

Abstract: A microdeposition system (20) and method deposits precise amounts of fluid material onto a substrate. A microdeposition head (50) includes a plurality of spaced nozzles. A positioning device controls a position of the microdeposition head relative to the substrate. A controller (22) includes a positioning module that communicates with the positioning device and that generates position control signals for the positioning device. A nozzle firing module communicates with the microdeposition head (50) and selectively generates nozzle firing commands to define features of at least one layer of an electrical device, such as resistors, traces and capacitors on a printed circuit board, polymer light emitting diodes, and light panels.

Abstract: A liquid crystal material dispensing apparatus includes a spacer height measuring unit for measuring a height of a spacer on a substrate, and a liquid crystal material dispensing system for determining an amount of the liquid crystal material to be dispensed on the substrate based upon the measured spacer height and for dispensing the liquid crystal material onto the substrate.

Abstract: A method of controlling film thickness of dielectric multilayer film with high precision, an optical film thickness controlling apparatus and a dielectric multilayer film manufacturing apparatus that can control the film thickness. An optical film thickness controlling apparatus includes a film formation device having a rotatable substrate and a sputtering target, a photodiode that detects each of a plurality of monochromatic light beams applied to the rotatable substrate along a radius thereof at predetermined intervals, in which a movable shutter that moves along the direction of the radius of the rotatable substrate to shut off film formation on the substrate between the substrate and the target. From each of the monochromatic light beams, a quadratic regression function of reciprocal transmittance is calculated by a least squares method, and a CPU and a motor driver move the movable shutter to shut off the film formation at the film formation region.

Abstract: A microdeposition system (20) and method deposits precise amounts of fluid material onto a substrate. A microdeposition head (50) includes a plurality of spaced nozzles that fire droplets having a deposited width when deposited on the substrate. A positioning device moves the microdeposition head (50) relative to the substrate at a head speed. A controller (22) generates over-clocking signals at a rate that is substantially greater than the head speed divided by the droplet width to improve resolution. The controller (22) includes a positioning module that generates position control signals for the positioning device. The controller (22) includes a nozzle firing module (114) that generates nozzle firing commands based on the over-clocking rate to fire the nozzles to form droplets that define features on the substrate.

Abstract: The plating method comprises the steps of dividing a region, to be plated, into a group of mesh-like zones, measuring a plating area of each of the zones, comparing the measurement values of the plating areas and judging whether or not the plating area has any variance, and conducting a design change, on patterns contained in this zone, to eliminate the variance.

Abstract: A method and an arrangement in connection with a production line for optic cable, wherein optical fibers (1) are guided to a coating point (3), where filling gel is applied around the fibres, and a loose tubular casing is formed around the fibres and the filling gel. The fibres (1) are guided to the coating point through a device (4) that is formed from three parts (4a, 4b, 4c), said device being supported on a first base (5) and on a second base (6) moving in the travel direction of the fibres. Sensors (7, 8) are arranged in the first and second bases (5, 6) for measuring the force acting on the bases (5, 6). The arrangement further comprises means (9) for calculating the difference between said measured values for determining the friction force between the fibres and the tubular device (4).

Abstract: A method of film deposition in a sub-atmospheric chemical vapor deposition (CVD) process includes (a) providing a model for sub-atmospheric CVD deposition of a film that identifies one or more film properties of the film and at least one deposition model variable that correlates with the one or more film properties; (b) depositing a film onto a wafer using a first deposition recipe comprising at least one deposition recipe parameter that corresponds to the at least one deposition variable; (c) measuring a film property of at least one of said one or more film properties for the deposited film of step (b); (d) calculating an updated deposition model based upon the measured film property of step (c) and the model of step (a); and (e) calculating an updated deposition recipe based upon the updated model of step (d) to maintain a target film property. The method can be used to provide feedback to a plurality of deposition chambers or to control a film property other than film thickness.

Abstract: Within a method of making an optical interference filter, sample spectra and measurements of a predetermined characteristic associated with respective spectra are provided. Upon selection of an initial number of filter layers and a thickness for each layer, a transmission spectrum is determined. Each sample spectrum is applied to a regression formula that relates interaction of light with the transmission spectrum to a regression value. A comparison relationship between the calculated regression values and the sample measurements is defined and optimized, wherein thickness of each layer is an optimization variable.

Abstract: Method for manufacturing a workpiece by a vacuum treatment process includes providing a vacuum treatment system with first second parts in a vacuum chamber. Either a sensor or an adjusting element with first signal connection is mounted on the second part. An electronic unit in the chamber has a reference potential and a second electric signal connection. The first part is connected to a system reference potential. A workpiece goes into the chamber and the method includes operating the second part at a further electric potential different from the system reference potential by at least 12 V. The method includes connecting the first electric signal connection to the second electric signal connection and maintaining the reference connection during operation on the further electric potential by metallically connecting the reference connection to the second part.

Abstract: According to an embodiment of the invention, a method for repairing a coated high pressure turbine blade, which has been exposed to engine operation, to restore coated airfoil contour dimensions of the blade, and improve upon the prior bond coat is disclosed. The method comprises providing an engine run high pressure turbine blade including a base metal substrate made of a nickel-based alloy and having thereon a thermal barrier coating system. The thermal barrier coating system comprises a diffusion bond coat on the base metal substrate and a top ceramic thermal barrier coating comprising a yttria stabilized zirconia material. The top ceramic thermal barrier coating has a nominal thickness t. The method further comprises removing the thermal barrier coating system, wherein a portion of the base metal substrate also is removed, and determining the thickness of the base metal substrate removed. The portion of the base metal substrate removed has a thickness, ?t.

Abstract: The present invention is a substrate treatment method in which a treatment by supplying a treatment solution from a nozzle to a substrate is successively performed for a plurality of substrates, which comprises the step of, during the performance of the successive treatments, performing between the treatments a plurality of pre-dispenses for different purposes of the treatment solution, wherein at least a recipe of the treatment solution to be pre-dispensed or a start condition of the pre-dispense is determined for each of the pre-dispenses. According to the present invention, the pre-dispense can be performed at a necessary and sufficient frequency to shorten the suspension time due to the pre-dispenses in the substrate treatment. This improves the throughput and reduces the number of pre-dispenses, resulting in reduced consumption of the treatment solution.

Abstract: A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.

Abstract: An apparatus for dispensing an amount of fluid is disclosed where the amount of fluid and the pressure thereof is controlled by the height of the fluid relative to the spray mechanism that can dispense the fluid. A reservoir is positioned above the spray mechanism such that a column of fluid constitutes the reservoir of fluid. The height of the fluid reduces upon actuation of the spray mechanism. A controller detects the initial height of fluid and the height of the fluid after the dispensing operation to determine the amount of fluid dispensed. The controller is programmed with a parameter for the amount of fluid to be dispensed. If the determined amount of fluid dispensed is not within the parameters, the controller operates an iterative process to refill the reservoir to an amount such that during subsequent spraying operations, the amount dispensed approaches the parameter amount of fluid.

Abstract: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and an appropriate amendment can be performed.

Abstract: In a method and an apparatus for coating an object with photosensitive material, a roller stabilizes a supply amount of the photosensitive material and is disposed between the object and a slit coater, so that the stabilized photosensitive material is supplied to the object through the slit coater. The photosensitive material includes additives for controlling amount of a solid powder, a boiling point and a surface tension thereof. Accordingly, the photosensitive material may be uniformly coated on the object.

Abstract: In a method of monitoring the formation of a coating on a single particle (P), an apparatus is used which comprises means (2,5,6,9) for arranging said particle (P) at a given spatial location, and a fluid supply unit (3) adapted to apply a coating fluid to the particle (P) such that the coating is formed. Further, the apparatus has a measurement unit (4) which is adapted to perform a spectrometric measurement on the coating during formation thereof, and to derive a measurement value of at least one principle parameter related to the coating. This, such principle parameters, for example the thickness, thickness growth rate and physical and/or chemical properties related to the quality of the coating, as well as heat, mass and momentum transfer, can be continuously and non-invasively monitored during the coating process on the single particle (P).

Abstract: The optical thickness of a film formed on a substrate is controlled precisely to manufacture an optical filter having an accurate optical thickness. Time is counted during a film being formed on a substrate to note time points t with respect to a reference time set in advance. At least one of two optical characteristics of energy transmittance and energy reflectance when the film being formed on the substrate is irradiated with monitoring light is expressed by a function f(t) of the time points t based on a theoretical formula of the optical characteristic. The optical characteristic is measured by irradiating the film with the monitoring light at the time points t. A designed thickness achieving time at which the optical thickness of the film designed thickness is predicted. The film formation is stopped at the designed thickness achieving time, thereby obtaining the optical filter.