Abstract: Described is a photosensitive material for producing metal-colored images, comprisingA) a flexible transparent plastic support film,B) a photosensitive layer comprising a polymeric binder, a photosensitive substance and a pearl luster pigment, and optionallyC) a thermoplastic adhesion-promoting layer.The material of the invention makes it possible to produce color-proofing images for metal-colored multicolor prints by combining metal-colored single-color images with single-color images in the usual primary colors as desired.

Abstract: Disclosed are a light-sensitive lithographic printing plate which comprises a support subjected to graining treatment and anodization treatment and a layer of a positive light-sensitive composition containing a o-quinonediazide compound, an alkali-soluble resin and a clathrate compound provided on the support, and a method of processing the same which comprises subjecting the plate to image exposure and then development processing with a developing agent containing an alkali metal silicate.

Abstract: The present invention provides an image-forming material which comprises a support having thereon, in the following order, (1) a photosensitive composition layer comprising (a) an o-quinonediazide compound, and (b) an additive which reacts with a photoreaction product of the o-quinonediazide compound on heating to produce an alkali-insoluble matter, and (2) a water-soluble high molecular compound layer or a silicone rubber layer. The present invention also provides an image formation process which comprises exposing an entire surface of the image-forming material to light rays which render the o-quinonediazide compound soluble in an alkaline developer, imagewise heating the image-forming material, and then developing the image forming material with an alkaline developer to remove those areas which have not been heated.

Abstract: A camera speed lithographic plate precursor composition is used for the preparation of waterless, imaged printing plates. The plates comprise a solid substrate with a first layer of a photopolymerizable, oleophilic coating; a second layer of silicone rubber; a third protective film layer; and a top or fourth layer comprising a silver halide emulsion containing polymeric binders or keying agents.

Abstract: A method for patterning a photoresist film, capable of preventing a notching phenomenon occurring upon forming a pattern of the photoresist film having a single layer structure and thereby accurately forming a pattern of a metal wiring or a gate with a desired dimension even on a layer exhibiting a severe topology by removing a portion of the photoresist film coated over the layer having a severe topology up to a depth corresponding to 30% or below of the thickness of the photoresist film to form a recess, forming an planarized inorganic material layer on the recess, and selectively removing a predetermined portion of the photoresist film under a condition that the inorganic material layer is used as a mask.

Abstract: Disclosed are a color image-formable material which comprises a support, a cushion layer provided on the support and a color light-sensitive layer containing a light-sensitive composition and a coloring agent provided on the cushion layer and gives a transferred image by forming a color image portion by imagewise exposure and developing treatment and then transferring the color image portion alone to an image-receiving material,wherein the surface at a color light-sensitive layer side of the cushion layer has an average gloss (GS (60.degree. )) of 30 or more and the color light-sensitive layer is provided on the cushion layer, a process for preparing the same.

Abstract: A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.

Abstract: A photoimageable element comprising: a substrate; a layer of a photosensitive composition comprising a photosensitive material coated on the substrate; and a protective overcoating comprising an oxygen barrier component and a moisture resistant component; wherein the oxygen barrier component has an oxygen permeability of no greater than about 10.sup.-14 cc(cm)/cm.sup.2 (sec)(Pa).

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.

Abstract: A photosensitive lithographic printing plate which provides a wide range of proper conditions for development, high impression capacity, a flexible film sufficient in adhesion to a support and excellent processing suitability with a weakly alkaline developer (pH 12.5 or less) is disclosed. The photosensitive lithographic printing plate comprises a support and a photosensitive layer provided thereon, wherein the photosensitive layer is formed from a photosensitive composition containing at least a two-equivalent coupler residue-containing compound and a photosensitive compound or a photosensitive mixture acting as a positive type.

Abstract: Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.

Abstract: The invention relates to a non-continuous matte layer that can be used with a recording material having a substrate and a radiation-sensitive layer which contains a 1,2-naphthoquinone-2-diazide and an organic, polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions. This matte layer comprises 100 to 10,000 particles per square centimeter which have a mean diameter of less than 40 .mu.m and a maximum diameter of less than 80 .mu.m and a mean height of 2 to 6 .mu.m and a maximum height of 10 .mu.m, and contains a resin which has up to 0.80 mmol of acid groups and/or salt groups per gram. The matte layer is obtained by spraying on and drying an aqueous, anionically or anionically/nonionically stabilized dispersion of the resin.

Abstract: A process for forming a colored image comprising, in order:(A) imagewise exposing to actinic radiation a photosensitive element comprising a carrier support, a carrier surface, a first adhesive layer and a first photosensitive layer,(B) developing the exposed first photosensitive layer,(C) laminating to the element a transfer element comprising a transfer support, and a transfer surface layer which is adjacent to a colored pattern in the element of step (A) with the proviso that the transfer element does not have an adhesive layer which transfers to the colored pattern,(D) removing said carrier support and said carrier surface, revealing said first adhesive layer,(E) laminating the element the element from step (D) to a permanent support wherein the first adhesive layer is adjacent to the permanent support; and(F) removing said transfer support and said transfer surface layer.

Abstract: A photoimageable element comprising: a substrate; a layer of a photosensitive composition comprising a photosensitive material coated on the substrate; and a protective overcoating comprising an oxygen barrier polymeric material and antiblocking particulate material wherein the oxygen barrier component has an oxygen permeability of no greater than about 10.sup.-14 cc(cm)/cm.sup.2 (sec)(Pa).

Abstract: A forming method of a fine resist pattern improve so as to form a fine pattern of high accuracy can be obtained. A positive-type photoresist 1 including naphthoquinone diazide and novolak resin is applied on a substrate. An anti-reflection film adjusted to alkalinity is applied on positive-type photoresist 1. Positive-type photoresist 1 on which anti-reflection film 9 is applied is selectively irradiated. Positive-type photoresist 1 is developed.

Abstract: Proposed is an alkali-soluble, positive-working photo-sensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate such as tantalum to exhibit excellent adhesion of the patterned resist layer to the substrate surface. The composition comprises, in addition to a novolac resin as a film-forming agent and a naphthoquinone diazide group-containing compound as a photosensitizer, an aromatic compound having two benzene rings and at least five phenolic hydroxy groups in a molecule such as pentahydroxy and hexahydroxy benzophenone compounds as an adhesion improver.

Abstract: This invention relates to a photosensitive sheet having on a substrate one or more resin layers that are peelable from the substrate and heat-fusible, and a colored photosensitive layer in this order, said substrate comprising a biaxially stretched plastic film and having a molecular orientation ratio in the range of from 1.0 to 1.4.The object of this invention is to solve the problem of misregister without decreasing productivity during the formation of plastic film (substrate) or during the production of a photosensitive sheet in a method in which said photosensitive sheet having an image formed thereon and an image receiving sheet for receiving the image are superimposed on each other, and pressed and heated for image transfer.

Abstract: A presensitized color proofing sheet and method of obtaining an image on a paper substrate is disclosed herein. The color proofing sheet is comprised of a color layer, an optional barrier layer, both being light sensitive, and non-light sensitive solvent resistant adhesive layer with the barrier layer being present to provide a means of eliminating residual toning between adjacent layers in the structure.

Abstract: A 2-diazo-1,2-quinone compound having a substituent group containing an alkyl group which is substituted by at least one fluorine atom is described. This compound has a capacity to change its polarity when exposed to light. The invention also provides an image forming material in which the invention compound is added to at least one of laminated layers. When these laminated layers are exposed to light, the adhesiveness of the compound-containing layer to its adjoining layer is reduced effectively due to the polarity-changing ability of the compound, thus making the easy delamination of the layers possible. This compound is applicable to many instances in which image receiving sheets are used, such as the formation of a multi-color image by a transfer method (a color proof, for example) and the preparation of a printing plate of the delamination development type.

Abstract: A camera speed lithographic plate precursor composition is used for the preparation of waterless, imaged printing plates. The plates comprise a solid substrate with a first layer of a photopolymerizable, oleophilic coating; a second layer of silicone rubber; a third protective film layer; and a top or fourth layer comprising a silver halide emulsion containing polymeric binders or keying agents.

Abstract: An improvement is proposed in a double-coated patterning plate, which consists of a substrate, an undercoat levelling layer and a photoresist layer thereon, as well as in the patterning method therewith. Different from conventional double-coated patterning plate in which the undercoat levelling layer is formed from poly(methyl methacrylate) resin, the layer in the invention is formed from a copolymeric resin of methyl methacrylate and glycidyl methacrylate in a specified copolymerization ratio and the resin is admixed with 2,2',4,4'-tetrahydroxybenzophenone. By virtue of the use of this unique resin composition for the undercoat levelling layer, the troubles due to intermixing between the undercoat levelling layer and the photoresist layer thereon can be avoided to impart the patterned resist layer with excellent properties.

Abstract: A presensitized plate for use in making a lithographic printing plate comprises a substrate; a photosensitive layer and a mat layer whose projections have an average diameter of not more than 100 .mu.m, an average height of not more than 10 .mu.m and whose coated amount ranges from 5 to 200 mg/m.sup.2, the photosensitive layer and the mat layer being applied onto the upper surface of the substrate; and a coating layer of an organic polymeric compound having a glass transition point of not less than 20.degree. C. and a thickness ranging from 0.01 to 8.0 .mu.m, the coating layer being applied onto the back face of the substrate. The presensitized plate makes it possible to solve the problem of the formation of scratches and the adhesion of the photosensitive layer to the back face of the PS plate even when a large number of PS plates are transported and/or stored while putting them in piles without sandwiching the PS plate between interleaves.

Abstract: An image light-transmitting transparent film comprises a first transparent resin layer which is a base film; and a second transparent resin layer, the surface of which is a roughened surface which can be smoothed out by heating and pressure, in which the roughened surface of the second transparent resin layer is formed of a second transparent resin and particles of a resin soluble into the second transparent resin.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.

Abstract: Photosensitive silicon-containing resist compositions comprising hydroxyphenylsilsesquioxanes and siloxanes partially estersified with diazonaphthoquinone sulfonyloxy groups for imageable O.sub.2 RIE barrier films. Methods for forming image patterns on substrates using these photosensitive silicon-containing resist compositions are also provided.

Abstract: A method is provided for forming a microlithographic relief image having a width of less than one half micron in a bilayer resist composition. The resist composition comprises a single component, silicon-containing photoimageable layer and a polymeric underlayer having a high optical density and a refractive index similar to the refractive index of the overlaying resist. The method provides for the formation of a relief image in the top layer using an i-line (365 nm) or deep ultra violet (170 to 300 nm) light source, followed by O.sub.2 RIE transfer of the relief image into the polymeric underlayer.

Abstract: A photosensitive material either comprises a support, a peel layer, a barrier layer and a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer, superposed in order, or comprises a support having a releasing surface, an intermediate layer instead of both the peel layer and the barrier layer as mentioned above, a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer, superposed in order. The barrier layer or the intermediate layer comprises a polymer having a glass transition temperature not higher than 70.degree. C.

Abstract: A 2-diazo-1,2-quinone compound having a substituent group containing an alkyl group which is substituted by at least one fluorine atom is described. This compound has a capacity to change its polarity when exposed to light. The invention also provides an image forming material in which the invention compound is added to at least one of laminated layers. When these laminated layers are exposed to light, the adhesiveness of the compound-containing layer to its adjoining layer is reduced effectively due to the polarity-changing ability of the compound, thus making the easy delamination of the layers possible. This compound is applicable to many instances in which image receiving sheets are used, such as the formation of a multi-color image by a transfer method (a color proof, for example) and the preparation of a printing plate of the delamination development type.

Abstract: The invention relates to a positive-working colored photosensitive recording material for the production of a color test image, composed of a temporary layer carrier, a photosensitive layer containing dyestuff or pigment, binder and quinonediazide compound and an adhesive layer which can be activated by means of heat, wherein a release layer based on polyvinyl alcohol is present on the surface of the temporary layer carrier, the photosensitive layer comprises, as the quinonediazide compound, an esterification product of a compound containing one or more phenolic hydroxyl groups and o-quinonediazide-sulfonyl chloride, and, as the binder, a novolak-free phenolic polymer resin and/or a reaction product of the phenolic polymer resin with a monoisocyanate, and the adhesive layer compresses a alkali-insoluble organic polymer and an alkali-soluble polyester. The invention also relates to a process for the production of a color test image using the recording material described.

Abstract: A lithographic printing plate precursor and process for its utilization have been discovered through which negative and positive original images can be printably reproduced on the plate precursor in substantially fewer development steps. The precursor plate is exposed sequentially to either the negative or positive original with the resultant image subsequently developable in a single process or step. The process is achieved by using a precursor plate having two coatings of significantly different photographic sensitivity to light, i.e., speed as characterized by "camera speed" or "contact speed" and imagewise exposing the originals in sequence to alternative speeds. The contact speed coating may be negative-working or positive working while the camera speed coating is negative-working. The camera speed coating is developed followed by exposure of the contact speed coating. Images produced at camera speed are removed and non-image bearing portions of the contact speed coating are removed.

Abstract: A positive-type photoresist composition is disclosed, which comprises:(A) an o-quinonediazide compound;(B) an alkali-soluble phenol resin; and(C) at least one compound selected from a group consisting of urea compounds, thiourea compounds and arylamine compounds; A positive-type photoresist composition which comprises:(A) an o-quinonediazide compound;(B) an alkali-soluble phenol resin; and(C) at least one compound selected from a group consisting of urea compounds, thiourea compounds, and arylamine compounds represented by general formulae (I), (II) and (III), respectively, ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 each represents a hydrogen atom, an alkyl group, an aryl group, or any two of R.sub.1, R.sub.2, R.sub.3, and R.sub.4 form at least one ring together, ##STR2## wherein R.sub.5, R.sub.6, and R.sub.

Abstract: The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.

Abstract: Block phenolic oligomers of the formula (I): ##STR1## These may be reacted alone or with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin having at least one unit of formula (II): ##STR2##

Abstract: A white, partially translucent, metallized film article which having a flexible, heat resistant, polymeric film material with opposite sides. The film material has deposited on a first side a metal coating which is spectrally reflective and partially light transmissive in the visible region of the spectrum, is capable of transmitting from about 1% to about 70% of incident visible light cast thereon; the second side having a white outermost surface, and has a visible light opacity of from about 0.5 to about 0.98.

Abstract: Laser-addressable thermal transfer materials for producing color proofs, printing plates, films, printed circuit boards, and other media are disclosed. The materials contain a substrate coated thereon with a propellant layer wherein the propellant layer contains a material capable of producing nitrogen (N.sub.2) gas at a temperature of preferably less than about 300.degree. C.; a radiation absorber; and a thermal mass transfer material. The thermal mass transfer material may be incorporated into the propellant layer or in an additional layer coated onto the propellant layer. The radiation absorber may be employed in one of the above-disclosed layers or in a separate layer in order to achieve localized heating with an electromagnetic energy source, such as a laser. Upon laser induced heating, the transfer material is propelled to the receptor by the rapid expansion of gas.

Abstract: A method of planarizing topographical features on a substrate for subsequent coating of a radiation sensitive composition thereon comprising:(1) applying thereover a coating of a planarizing coating layer comprising a planarization layer of novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent of ortho-secondary butyl phenol and a suitable solvent; and(2) heating said coated substrate to remove essentially all of said solvent therefrom and cause said coating to reflow, thereby planarizing the topographical features.

Abstract: A finely structurable resist system for a dry development process is provided. A latent image is produced in a light-sensitive layer by imaging exposure and is intensified by treatment with, for example, an organosilicon compound. The etching resistance to an oxygen plasma is simultaneously increased. The light-sensitive layer preferably comprises anhydride or epoxy groups that are suitable for reaction with the functional groups of the organosilicon compounds. A silylizing treatment can be implemented with a solution or emulsion in a simple apparatus or can be implemented in the vapor phase.

Abstract: Disclosed is a pattern forming contrast enhanced material comprising (a) a water soluble photosensitive compound selected from the group consisting of a water soluble aliphatic photosensitive compound (excluding ring compounds) having one or more of the group expressed by the formula (I), an aliphatic photosensitive quaternary ammonium salt having one or more of the group expressed by the formula (I), an aromatic photosensitive quaternary ammonium salt having one or more of the group expressed by the formula (I), and a photosensitive pyridinium salt having one or more of the group expressed by the formula (I), (b) a water soluble resin and (c) water and a pattern forming method using the same. ##STR1## According to the present invention, this material is used as a contrast enhanced layer in the exposure effected by deep ultraviolet ray such as an excimer laser beam to form a good fine pattern of a submicron order.

Abstract: The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.

Abstract: A PS plate comprises an aluminum plate which is surface-roughened and then anodized so that the amount of an anodized layer formed is not less than 1.0 g/m.sup.2 ; a hydrophilic layer which is applied onto the anodized layer and which comprises at least one compound selected from the group consisting of:(A) substituted or unsubstituted aliphatic or aromatic phosphonic acids having one or two phosphonic acid residues in the molecule and salts thereof; and(B) substituted or unsubstituted aliphatic or aromatic phosphinic acids having one or two phosphinic acid residues in the molecule and salts thereof,wherein the substituent of the compounds (A) and (B) being at least one member selected from the group consisting of hydroxyl, alkoxy, aryloxy, carboxyl, alkyl, aryl, allyl, acyl, acyloxy, nitro and cyano groups and halogen atoms; and a layer of a positive-working light-sensitive composition formed on the hydrophilic layer.

Abstract: A white, partially translucent, metallized film article which having a flexible, heat resistant, polymeric film material with opposite sides. The film material has deposited on a first side a metal coating which is spectrally reflective and partially light transmissive in the visible region of the spectrum, is capable of transmitting from about 1% to about 70% of incident visible light cast thereon; the second side having a white outermost surface, and has a visible light opacity of from about 0.5 to about 0.98.

Abstract: A developer composition for positive color proofing films containinga) sodium, potassium or ammonium octyl sulfate; sodium, potassium or ammonium lauryl sulfate; sodium decyl sulfate; or sodium tetradecyl sulfate; andb) sodium or potassium borate; andc) boric acid; andd) monobasic sodium or potassium phosphate; ande) sodium or potassium citrate; andf) sodium or potassium salicylate; andg) sodium, potassium or lithium benzoate; andh) sufficient water to formulate an effective developer.

Abstract: A photolithographic method for structure generation in bilayer processes is provided. Pursuant to the method, a dimensional reserve is produced in a top resist structure by chemical treatment with a bulging agent. The expansion preferably is performed by treatment with an aqueous solution. The expansion can be set such that the dimensional loss to be anticipated in further etchings of the bottom resist or, respectively, of the wafer is exactly compensated for.

Abstract: A method of making a lithographic printing plate comprises the steps of imagewise exposing to light a presensitized plate which comprises a hydrophilized substrate provided thereon with an organic layer comprising at least one compound selected from the group consisting of substituted or unsubstituted aliphatic or aromatic compounds represented by the following general formula:R.sup.1 (PO(OH.sub.2).sub.n (I) orR.sup.1 (PO(OH)(R.sup.2)).sub.n (II)wherein n is 1 or 2, if n is 1, R.sup.1 and R.sup.2 each represents a substituted or unsubstituted alkyl, alkoxy, aryloxy, aryl, acyl or acyloxy group and if n is 2, R.sup.1 represents a substituted or unsubstituted alkylene or arylene group and R.sup.

Abstract: The present invention concerns a phototackifiable composition useful as a coating on a substrate consisting of an optically clear blend of two or more polymers and a photosensitive compound that forms a strong acid on exposure to actinic radiation. The invention also relates to a process for coating such a composition on a support and toning the image-wise exposed composition on the support.

Abstract: A PMGI bilayer resist for integrated circuit fabrication having increased sensitivity to light and formed by the addition of cyclic anhydrides to the resist and the formation of an accompanying bilayer resist structure of a portable conforming mask having a desirable undercut profile for lift-off of patterned metallic circuitry.

Abstract: A chemical mat film having good writability and printability is disclosed which includes a transparent film, a chemical mat layer provided on one or both sides of the transparent film and containing finely divided solid particles which provide surface roughness, and an overcoat layer formed of a polymeric material and provided over the surface of the chemical mat layer, the overcoat layer having a surface roughness which is substantially coincident with that of the chemical mat layer. The chemical mat film may be used as a substrate of a photosensitive film for supporting a photosensitive layer thereon.

Abstract: This invention provides an improved negative-working or positive-working, single sheet color proofing method which can accurately reproduce images by using colored, photosensitive layers on substrates which are then overcoated with partially developable adhesive layers. The final construction is useful in predicting the image quality from a lithographic printing process. The partial removal of the adhesive layers cleans out any background stain which may remain from the incomplete removal of the photosensitive layer.

Abstract: A silylated polymeric binder, which is soluble or swellable in alkali, bears a plurality of at least one of aliphatic and aromatic hydroxyl groups, at least a portion of which are derivatized by units of the formulae I and II:[(A--B.sub.n).sub.m C]--[(D.sub.o E.sub.p)BC].sub.u (I)and[(D.sub.o E.sub.p)BC].sub.v (II)which are side chains of the polymeric binder, whereinA denotes a silanyl group containing at least 2 silicon atoms in total linked to each other, but not more than 3 silicon atoms linked to each other in an unbranched chain of silicon atoms;B denotes a bridging group;C denotes a functional group which has formed a covalent bond with an aromatic, aliphatic, or cycloaliphatic hydroxyl group of the binder, the group D, or the group E;D denotes a grafted monohydric or polyhydric aliphatic alcohol;E denotes a grafted monohydric or polyhydric aromatic alcohol;n denotes 0 or 1;m denotes 1 or 2; ando, p, u and v each denote 0 or 1.