Abstract: A light-sensitive image-forming material which has on a support a coloring layer comprising a coloring agent and an alkali soluble organic macromolecular binder, and a photopolymer layer, in the order listed, with the coloring layer further containing a particular fluorine-containing surface active agent, whereby uniform film thickness is ensured to the coloring layer even when drying is carried out in a short time using simple equipment. The fluorine-containing surface active agent is a copolymer comprising as repeating units (1) an acrylate or a methacrylate which has a fluorinated alphatic group containing from 3 to 20 carbon atoms and not less than 40 wt % of fluorine atoms, with the aliphatic group having a terminal moiety containing at least 3 fluorinated carbon atoms, and (2) a poly(oxyalkylene)acrylate or a poly(oxyalkylene)methacrylate. In addition, the portion of the fluorinated aliphatic group-containing acrylate or methacrylate repeating unit is from 10 to 70% by weight.

Abstract: A presensitized plate for use in making a planographic printing plate is described, comprising an aluminum plate having an anodized film layer, a hydrophilic layer provided on said anodized film layer and a lithographically suitable light-sensitive layer on said hydrophilic layer, said hydrophilic layer comprising a hydrophilic compound having at least one amino group and at least one group selected from the class consisting of a carboxyl group in the free acid form or salt form, a sulfo group in the free acid form or salt form, and a hydroxyl group has prolonged life on the printing press and at the same time is resistant to scumming on non-image areas.

Abstract: A light-sensitive composition for use in the preparation of positive-type light-sensitive lithographic printing plate which comprises an o-naphthoquinone diazide compound and novolak resin in which the novolak resin comprises two different novolak resins each being prepared by the polycondensation or co-polycondensation of an aldehyde with at least one compound selected from the group consisting of phenol, m-cresol, o-cresol and p-cresol.

Abstract: A dually photosensitive composition useful as a photoresist in the manufacture of ICs and the like electronic devices, which is positively photosensitive by exposure to ultraviolet in a relatively small dose but negatively photosensitive by exposure to ultraviolet in a substantially larger dose than above or by exposure to far ultraviolet light, is obtained by admixing a positive-type photoresist material comprising a novolac resin and an o-naphthoquinone diazide compound with a bisazide compound such as 4,4'-diazidodiphenyl sulfide. The inventive photosensitive composition provides a possibility of developing an ingenious technique for patterning of a photoresist layer on the substrate such as a checkboard-like patterned layer by use of a photomask of a line-and-space pattern.

Abstract: A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasma etch.

Abstract: An improved process for forming multilayer resist structures for lithographic processing of a substrate having topographical features is provided. The structures are comprised of a resist layer having thereover a layer of poly(vinyl pyrrolidone). When the resist layer is a photoresist, the subject structures may optionally contain an absorptive layer directly overlying the substrate and/or a layer of contrast enhancement material overlying the planarizing layer. The poly(vinyl pyrrolidone) optionally contains from about 0.05 to about 0.1 percent by weight of a suitable surfactant, suitably a nonionic surfactant.

Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.

Abstract: A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C--O--C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.

Abstract: A dry transfer film and a method for preparing transfer characters therefrom in which the transfer film includes a carrier layer, a photosensitized color carrying layer disposed adjacent to the carrier layer and a photosensitized adhesive layer disposed adjacent to the color carrying layer. Both the color carrying and adhesive layers are photosensitive to certain respective wavelengths of the electromagnetic spectrum so that when exposed to such wavelengths, they become soluble in a respective solvent or solvents. The unexposed portions of these layers remain insoluble in such solvents.

Abstract: An improved overlay proofing film comprising a substantially transparent polyester base film which is first coated on one or both sides with a non-light sensitive composition having a refractive index of about 1.6, said non-light sensitive composition consisting essentially of a copolymer of polymethyl methacrylate and methacrylic acid, said coated polyester base film having a second coating on either side thereon, said second coating comprising a light sensitive mixture of(a) a resinous binder;(b) a colorant; and(c) a light sensitive material.

Abstract: A process for preparing a lithographic support, and the printing plate made therefrom, are described, wherein the process comprises the steps of (a) liquid-honing a surface of an aluminum sheet, and (b) electrochemically graining the surface of the aluminum sheet in an electrolyte comprises hydrochloric acid, nitric acid, or a mixture thereof.

Abstract: A method which provides for a permanent planarization layer on a multilayer integrated circuit. The planarization layer resides above other circuit layers which reflect incident light. A layer of photoresist is formed over the planarization layers and imaged through a mask with circuit defining structure. During exposure of the photoresist, incident light passes through the planarization layer. Scattering from the boundary of the planarization layer and photoresist is minimized because the index of refraction of the planarization layer is substantially equal to the index of refraction of the photoresist. Light reflected from the underlaying layers is substantially absorbed by the planarization layer. Reduction of the reflected and scattered light results in improved resolution of developed images in photoresist.

Abstract: In a process for reducing halations during the imagewise irradiation of a reproduction layer exposed through a planar image original, at least one lubricant either is contained in the layer or is interposed between the layer and the image original. Suitable lubricants include organic polysiloxanes, hydrocarbon polymers, polyaryl esters, and alkanoic acids or alkenoic acids having at least 9 carbon atoms. Excluded are lubricants comprising copolymers of dimethyl dichlorosilane, ethylene oxide and propylene oxide, provided they are located in the reproduction layer.

Abstract: This invention relates to a radiation-sensitive composition having resistance to oxygen reactive-ion etching and a process for forming a pattern by using the same.The radiation-sensitive composition of this invention comprises a mixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane, said mixture containing 5 to 100 wt. % of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane, and a resist containing a phenolic resin soluble in an aqueous alkali solution.

Abstract: Positive-working photoresist elements are protected against reflection of activating radiation from the substrate by incorporation of certain butadienyl dyes in a photoresist layer, an anti-reflective layer or a planarizing layer. These dyes have superior resistance to thermal degradation or volatilization at temperatures of as high as 200.degree. C. or more. The dyes also exhibit good solubility in solvents commonly employed in processing semiconductor devices, thus permitting the dyes to be incorporated in photoresist elements in an amount sufficient to prevent resist image distortion caused by backscattered or reflected light.

Abstract: A radiation-sensitive, imageable article comprises in sequence a substrate, a vapor-deposited colorant layer capable of providing a reflection optical density of at least 0.6 to a 10 nm band of the electromagnetic spectrum between 280 and 900 nm, a vapor-deposited metal or metalloid layer of uniform composition, and a photosensitive resist layer which is non-integral with said colorant layer, the ratio of the thickness of said colorant layer to said metal or metalloid layer being at least 7:1.

Abstract: The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.

Abstract: A method for making a dry planographic printing plate, which comprises: exposing through a negative transparency a dry negative working presensitized plate comprising a base substrate having provided thereon, in order, a photosensitive layer containing an orthoquinonediazide compound and a silicone rubber layer; developing the exposed plate; exposing the developed plate to light so as to make its exposure value not less than 5% of the exposure value at the time of the exposure through the negative transparency; and then treating the exposed plate with a basic compound.

Abstract: The disclosed light-sensitive recording material is composed of an electrically conductive support, suitable for the production of printing forms or printed circuits, and a photoconductive layer system containing a photoconductor, a binder, a sensitizing dye and conventional additives. The photoconductive system comprises (A) a single photoconductive layer, or multiple layers, applied to the support and (B) a light-sensitive covering layer which contains at least one photochemically reactive compound. The use of the recording material in a process for the production of printing forms and printed circuits is also disclosed.

Abstract: Dry-film, positive-acting photoresist layers are used in the formation of many articles such as circuit boards, printing plates and the like. Laminable monolayers of photoresist suffer from slow speeds, brittleness, and narrow latitude during development and exposure. The use of a thermoplastic, crosslinked or crosslinkable integral adhesive layer on the dry-film, positive-acting photoresist layer improves the properties and performance of the photoresist.

Abstract: There are disclosed antireflecting compounds and layers used in admixture with or adjacent to a positive-working, non-silver halide photosensitive layer. The resulting antireflecting layers have unexpected thermal resistances, needed for the thermal planarization usually given to such photoresists.

Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.

Abstract: A process for manufacturing materials in the form of sheets, foils or webs comprising chemically, mechanically and/or electrochemically roughened and anodically oxidized aluminum or one of its alloys, wherein the resultant aluminum oxide layers are post-treated with an aqueous solution containing phosphoroxo anions, is performed such that a post-treatment of the aluminum oxide layers is effected by immersion in an aqueous solution containing hexametaphosphate anion. In a preferred embodiment, the aqueous solution is adjusted to a pH of 1 to 5 by addition of an acid. The resulting materials, which have reduced adsorption properties, are preferably employed as support materials for offset printing plates.

Abstract: Quinone diazide derivatives of adamantane, and especially quinone diazide derivatives of 1,3-dialkyl-5,7-bis(hydroyphenol) adamantanes, have been found to provide unique properties when coated on metal substrate in the preparation of both positive and negative working lithographic plates. The improved lithographic plates are characterized by enhanced speed, coating oleophilicity, alkali resistance, developer latitude and development speed.

Abstract: Disclosed is a positive-working resist composition which demonstrates improved photospeed and rate of development. The resist composition contains a solvent and select proportions of a novolak resin, a naphthoquinone diazide sensitizer, a dye which absorbs light at a maximum wavelength of from about 330 to about 460 nm and an effective proportion of a trihydroxybenzophenone compound. Also disclosed is a method of forming a resist pattern on a substrate by employing the positive-working resist composition.

Abstract: A method is provided for stripping a contrast enhancement layer from the surface of a photoresist such as a novolak-based resist without substantially altering its characteristic properties for photolithographic applications. The CEL composite photoresist is immersed or treated with toluene or a mixture thereof in a particular manner.

Abstract: Multilayer photoresist recording media containing an absorptive layer are improved by forming the absorptive layer from a composition comprising PMMA or a copolymer of methylmethacrylate and methacrylic acid, certain dyes such as hydroxyazobenzoic acid or Sudan Orange G and a suitable solvent. The dyes are insoluble in the solvent of an overlying photoresist layer. The media are substantially free of loss of resolution due to dissolution of the dye into the photoresist layer.

Abstract: A multilayer, photoresist recording medium is disclosed which comprises an absorptive layer and an oxygen plasma-resistant photoresist layer thereover. The structure is substantially free of intermixing of the two layers and separation of the photoresist layer during processing. The absorptive layer is formed by a two-step curing of a composition comprising a solution of a multifunctional acrylate or methacrylate monomer, a suitable dye and a photoinitiator in a suitable solvent. A coating of this composition is rapidly solidified to form an absorptive layer by high intensity irradiation and then baked to remove residual solvent and assure complete polymerization of the monomer.

Abstract: This invention relates to an improvement in a light-sensitive copying material comprising a carrier and a light-sensitive copying layer which contains, as the light-sensitive compound, an o-quinone diazide sulfonic acid ester or an o-quinone diazide sulfonic acid amide, the improvement being that the layer also contains a compound with an aromatic or aliphatic hydroxy group which is capable of forming chelate compounds.

Abstract: A metal image forming material in which the thin metal layer can be etched in short period to provide a sharp image without a strong etchant is disclosed. Said metal image forming material comprises a support, at least one metal layer and an overlying light sensitive layer. Said metal layer is formed by vapor-depositing a metal on the support at an angle with respect to the surface of the support.

Abstract: A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.

Abstract: A process for producing negative relief copies is disclosed in which a light-sensitive material, comprising (1) a light-sensitive ester or amide of a 1,2-quinone-diazide-sulfonic acid or of a 1,2-quinone-diazide-carboxylic acid and (2) a hexamethylol melamine ether is imagewise exposed, thereafter heated, and, after cooling, exposed again without an original, and subsequently developed by means of an aqueous-alkaline developer. The disclosed process permits the production of negative copies with the aid of a material which yields positive copies when it is processed in a conventional manner.

Abstract: The present invention relates to a photosensitive masking element for plate making including a support made of a transparent film; a metal thin film layer formed on the support; and a photosensitive masking layer formed on said metal thin film layer and strongly adhering thereto. In preparing masks for various colors, the photosensitive masking material of the present invention makes it unnecessary to fill and retouch ditches corresponding to unnecessary enclosing lines with a correction liquid, resulting in a marked improvement in the efficiency of plate making.

Abstract: Dry-film, positive-acting photoresist layers are used in the formation of many articles such as circuit boards, printing plates and the like. Laminable monolayers of photoresist suffer from slow speeds, brittleness, and narrow latitude during development and exposure. The use of a laminable positive-acting photoresist integral adhesive layer on the dry-film, positive-acting photoresist layer improves the properties and performance of the photoresist.

Abstract: A method of preparing an anodized aluminum printing plate comprising treating the aluminum support with aqueous solution of a condensed aryl sulfonic acid having a neutral pH, anodizing the support before or after the treating step, and coat, radiation expose through a mask, as well as develop a radiation-sensitive composition to produce the lithographic printing plate.

Abstract: A light-sensitive printing plate is disclosed. The printing plate is comprised of a support base having a light-sensitive layer positioned thereon and a matting layer comprised of a micropattern of protuberances. The protuberances are present in a regular or randomly mixed manner on the light-sensitive layer and are comprised of a copolymer. The copolymer includes a monomer (unit a) with a sulfonic acid group, a monomer (unit b) selected from the group consisting of alkyl acrylates having 1 to 10 carbon atoms in the alkyl moiety thereof and alkyl methacrylates having 4 to 10 carbon atoms in the alkyl moiety thereof and a monomer (unit c) copolymerizable with monomer (unit a) and monomer (unit b), monomer (unit c) as a copolymer having a glass transition point of 60.degree. C. or above. The matting layer does not cause staining of a film original when superposed thereon and is resistant to rubbing or pressure and provides a surface which can be vacuum contacted with a film in a short period of time.

Abstract: A light-sensitive mixture comprising a water-insoluble binder soluble in aqueous alkaline solutions, and the reaction product of a naphthoquinonediazidesulfonyl halide with a mixture composed of a low molecular weight compound having a definite structure and molecular size containing at least one phenolic hydroxyl group, and of a polymeric compound having recurring units, each of which contains at least one phenolic hydroxyl group. The mixture is useful in producing printing plates and photoresists and has the advantage that the naphthoquinonediazidesulfonic acid ester contained therein is non-explosive.

Abstract: The invention provides a positive working photosensitive composition which comprises at least one novolak resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate.

Abstract: This invention relates to a light sensitive laminate comprising a light sensitive layer of photoresist, a support therefor, and an intermediate protective layer preferably of a light transmitting material disposed between said photoresist layer and said support. In use, the photoresist layer of the laminate is adhered to a base material and the support stripped therefrom, thereby leaving a composite comprising the base material, photoresist layer and intermediate protective layer disposed over said photoresist layer. The intermediate layer serves to protect the photoresist layer from damage such as by abrasion or otherwise during processing, thereby permitting storage of the so-formed composite prior to use. Since the intermediate layer may be of a light transmitting material, photoimaging may take place through the intermediate layer with the intermediate layer subsequently removed by contact with a solvent that is a non-solvent for those areas of photoresist left after development.

Abstract: A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide compound and (ii) a second compound, to actinic radiation which is able to convert the o-quinonediazide compound to the corresponding indenecarboxylic acid compound, and subsequent to said uniformly exposing imagewise exposing said exposed photosensitive material to a laser beam to thereby render the indenecarboxylic acid compound of the imagewise exposed areas convert to the corresponding indene compound and developing with an alkaline developing solution to dissolve out the unexposed area to the laser beam, wherein said second compound reduces the rate of dissolution of the laser exposed areas in the developing solution by converting the indenecarboxylic acid to the corresponding indene compound, whereby said image results.

Abstract: This invention relates to a light-sensitive laminate comprising a light-sensitive layer of photoresist, a support therefor, and an intermediate protective layer preferably of a light-transmitting material disposed between said photoresist layer and said support. In use, the photoresist layer of the laminate is adhered to a base material and the support stripped therefrom, thereby leaving a composite comprising the base material, photoresist layer and intermediate protective layer disposed over said photoresist layer. The intermediate layer serves to protect the photoresist layer from damage such as by abrasion or otherwise during processing, thereby permitting storage of the so-formed composite prior to use. Since the intermediate layer may be of a light-transmitting material, photo-imaging may take place through the intermediate layer with the intermediate layer subsequently removed by contact with a solvent that is a non-solvent for those areas of photoresist left after development.

Abstract: An image-forming laminate is formed by the combination of a thin, frangible light opaque material on top of a photosensitive layer which changes its surfactant properties when irradiated. The photosensitive layer according to the present invention comprises a film-forming polymeric binder, a photosensitive acid generator, and a surfactant selected from nonionic surfactants, the neutral form of cationic surfactants, amphoteric surfactants, and surfactant acid salts. Preferably the frangible light opaque material is a thin metal layer. There can also be present a support layer on the other surface of the photosensitive layer, as well as there can be an adhesive layer secured to the upper surface of the frangible light opaque material. The strength of adherence of the adhesive layer to the metal should be intermediate the strength of the adherence of the light opaque material prior to and after photoactivation.

Abstract: Multilayer photosolubilizable litho element comprising (1) support, (2) photosolubilizable dye or pigment-containing layer having an optical density in the visible region of the spectrum of at least 2.0 comprising a quinone diazide and at least one acidic polymeric binder, and (3) photosolubilizable layer comprising a quinone diazide compound and at least two acidic polymeric binders having carboxylic acid substituents, one binder having an acid number below 110, preferably poly(methylmethacrylate/methacrylic acid). The element is useful as a single exposure positive contact litho film.

Abstract: An image-forming laminated plate, particularly a dry planographic printing unprocessed plate, comprising a base substrate, a photosensitive layer containing a substance with quinonediazide structure and a silicone rubber layer in laminating order is treated with a base after imagewise exposure. In addition, the image-forming laminated plate may be subjected to a whole surface slight exposure to the extent that 5 to 60 molar % of the quinonediazide structure in the photosensitive layer to be exposed is photo-decomposed into carboxylic acid structure before or after the usual imagewise exposure for obtaining a negative working plate, or the image-forming laminated plate may be subjected to a imagewise slight exposure to the same extent without the usual imagewise exposure for obtaining a positive working plate.

Abstract: A presensitized lithographic printing plate, which comprises a support having a hydrophilic surface. A non-silver light-sensitive layer capable of having formed therein a lipophilic image pattern and a direct positive light-sensitive silver halide emulsion layer are provided on the support in that sequence. The non-silver light-sensitive layer is provided with an adjacent hydrophilic colloid layer in which a resin is dispersed in fine particle form. The resin is a copolymer comprising (A) a recurring unit derived from at least one monomer of acrylic acid and methacrylic acid, and (B) a recurring unit derived from at least one monomer of an aralkyl acrylate and an aralkyl methacrylate.

Abstract: Bilayer photosensitive imaging articles comprising a substrate coated with an image layer and a resist layer are disclosed. The substrate may be transparent, translucent or opaque to give imaging articles useful in different applications. The image layer which should be from about 0.3-3.0 microns in thickness includes an organic film-forming vehicle from the group of copolymers of the formula: ##STR1## where P is styrene, ethylene or methyl vinyl ether; m is 1-3; n is 1,10; X is OH, OHN.sub.2, ONH.sub.4, OR, ONH.sub.3 R, ONH.sub.2 R.sub.2, ONHR.sub.3, ONH.sub.3 RNH.sub.2, ONa, OK, OLi; R is an alkyl group in the range C.sub.1 -C.sub.10 optionally including a functional group such as ketone, alcohol, esther, ether alcohol or aryl; m=1-3, n=1-10; and the molecular weight is between 1,000-150,000. The image layer may also include a coloring medium. The resist layer, which should be from about 0.5 to about 2.

Abstract: A process for the production of a thermo-developable type diazo copying material which comprises the steps of adding a heat fusible color assistant having a melting point of 50.degree. to 150.degree. C. to at least one selected from the group consisting of (a) an aqueous dispersion A containing a diazonium salt and fine particles of a hydrophobic resin consisting of a polymer of vinyl chloride, vinylidene chloride, styrene, acrylic ester, mechacrylic ester or olefin or a copolymer containing at least one member of aforesaid monomers as the constitution unit or a mixture of said polymer with said copolymer and (b) an aqueous solution or dispersion B containing coupler; then applying these aqueous dispersion A and aqueous solution or dispersion B onto a substrate in the order named; and drying same.

Abstract: A resist system for semiconductor device fabrication comprised of bottom positive resist layer of a diazoquinone/novolak resist applied to a substrate and overcoated with a like or different diazoquinone/novolak top resist layer which has been sensitized with pyrene and/or its derivatives.

Abstract: An improved anodized support material comprising an anodized support material which has been treated with an alkali metal salt of a condensed aryl sulfonic acid following or during anodization; an improved radiation sensitive element comprising the above improved supports to which has been applied a radiation-sensitive composition and improved lithographic printing plates prepared from said elements.

Abstract: This invention is for a photoresist capable of withstanding temperatures in excess of 200.degree. C. without image distortion. The photoresist comprises a high temperature diazo sensitizer, preferably an ester or amide of an o-quinone diazide sulfonic or carboxylic acid chloride, in a binder comprising a polyvinyl phenol. The sensitizer and polyvinyl phenol react with each other at elevated temperature. The sensitizer has a secondary decomposition temperature and the polyvinyl phenol has a flow temperature at least equal to the temperature where reaction between the two occurs.