Including Additional Layer Patents (Class 430/166)
  • Patent number: 5183723
    Abstract: This invention relates to a method for forming a colored image on a degradable sheet material. As a result, a negative- or positive-working color proofing sheet can be produced on a variety of printing paper stocks. Upon exposure to an actinic radiation source through a screened image and development, it can accurately reproduce the image on the degradable sheet. The construction is useful as a color proof which can be employed to accurately predict the image quality from a lithographic printing process on a variety of printing surfaces.
    Type: Grant
    Filed: December 13, 1991
    Date of Patent: February 2, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Arthur E. Procter, Thomas Dunder
  • Patent number: 5176973
    Abstract: An at least two-color low optical dot gain surlay pre-press color proof comprising a base having laminated thereto in the following order, a first adhesive layer, a first single-color image, and then at least one additional pair of thin adhesive layers and comprising a synthetic polymeric binder composition with a Tg of less than 105.degree. and a thickness of 8-30 microns which thickness is at least twice that of any one of said additional thin adhesive layers.
    Type: Grant
    Filed: September 28, 1989
    Date of Patent: January 5, 1993
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Charles J. Gifford, Jack E. Cook, Bruce W. Weeks, Julien M. Wajs
  • Patent number: 5164279
    Abstract: This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.
    Type: Grant
    Filed: December 3, 1990
    Date of Patent: November 17, 1992
    Assignee: Shipley Company Inc.
    Inventors: Peter Trefonas, III, Anthony Zampini, David C. Madoux
  • Patent number: 5162510
    Abstract: The invention relates to new mixed ester photosensitive compounds and photosensitizer compositions comprised thereof. The photosensitive compounds and photosensitizer compositions are prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide in specific ratios. Photoresist compositions comprising the photosensitive compounds and photosensitizer compositions are also disclosed. The photosensitizer compositions exhibit excellent solution stability and resistance to precipitation when formulated in alkali-soluble resin photoresist compositions. The photoresist compositions have improved shelf life.
    Type: Grant
    Filed: May 9, 1991
    Date of Patent: November 10, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Robert E. Potvin, Jonas O. St. Alban, Chester J. Sobodacha
  • Patent number: 5162193
    Abstract: A radiation sensitive device is provided with a discontinuous covering layer to improve vacuum draw down. The covering layer is produced by forming a solution or dispersion of the layer-forming material in a liquid hydrocarbon. Drops of the solution or dispersion are then sprayed onto the radiation sensitive device to form the discontinuous covering layer.
    Type: Grant
    Filed: November 19, 1990
    Date of Patent: November 10, 1992
    Assignee: Du Pont-Howson Limited
    Inventors: David E. Murray, Andrew E. Matthews
  • Patent number: 5158857
    Abstract: A light-sensitive transfer sheet is disclosed, which comprises a support having provided thereon a peeling layer comprising an alcohol-soluble polyamide, an alkali-soluble organic polymer and a basic compound, and a color material-incorporated light-sensitive resin layer or a color material layer and a light-sensitive resin layer, in that order.
    Type: Grant
    Filed: October 11, 1990
    Date of Patent: October 27, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomohisa Tago, Tomizo Namiki, Hideyuki Nakamura
  • Patent number: 5158855
    Abstract: An .alpha.-diazoacetoacetic acid ester derived from cholic acid, deoxycholic acid, lithocholic acid or a derivative thereof is effective as a sensitizer in a photosensitive resin composition containing an alkali-soluble resin to form a resist for lithography using KrF excimer laser.
    Type: Grant
    Filed: September 22, 1988
    Date of Patent: October 27, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Hisashi Sugiyama, Kazuo Nate, Akiko Mizushima, Keisuke Ebata
  • Patent number: 5143814
    Abstract: The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate on a substrate, drying, exposing to imaging energy and developing.
    Type: Grant
    Filed: October 8, 1991
    Date of Patent: September 1, 1992
    Assignee: Hoechst Celanese Corporation
    Inventor: Thomas R. Pampalone
  • Patent number: 5139918
    Abstract: The disclosed photoresist process employs an i-line peak containing light source, such as that of the mercury spectrum, in conjunction with a dye capable of both absorbing i-line light and withstanding subsequent those baking procedures employed in producing portable-conforming-mask (PCM) photoetchings. Applicant has found that a series of butadiene or bromine substituted butadiene dyes in general, and N,N'-Dibutyl-N,N'-Di (1-(4,4-dicyano-1,3-butadiene))-1,6-hexanediamine, in particular, are particularly well suited to these purposes. Such dyes are most preferably used in conjunction with a second dye capable of absorbing of a non-i-line light source used to expose a bottom photoresist layer of a PCM system.
    Type: Grant
    Filed: May 30, 1990
    Date of Patent: August 18, 1992
    Assignee: Hewlett-Packard Company
    Inventor: Atul Goel
  • Patent number: 5130223
    Abstract: Disclosed herein are an image-forming material and a process for forming images. Which can be applied to second originals used in the field of designing and drawing.The image-forming material comprises a roughened plastics film substrate and a transparent resin layer, colored resin layer, and photosensitive resin layer formed one over another (in the order mentioned) on the roughened surface of the substrate, said three layers being so designed as to be removed completely by dissolution or swelling during development after exposure to active rays. It permits the formation of a colored relief image without any dyeing step and gives rise to a good image free of base fogging without causing any decrease in printing sensitivity.
    Type: Grant
    Filed: March 14, 1990
    Date of Patent: July 14, 1992
    Assignee: Kimoto & Co., Ltd.
    Inventors: Kaoru Nishimura, Toshimichi Katsuoka, Yasunori Sugiyama
  • Patent number: 5128230
    Abstract: This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.
    Type: Grant
    Filed: January 23, 1991
    Date of Patent: July 7, 1992
    Assignee: Shipley Company Inc.
    Inventors: Michael K. Templeton, Anthony Zampini, Peter Trefonas, III, James C. Woodbrey, David C. Madoux, Brian K. Daniels
  • Patent number: 5100757
    Abstract: This invention relates to a method for forming a colored image on a degradable sheet material. As a result, a negative- or positive-working color proofing sheet can be produced on a variety of printing paper stocks. Upon exposure to an actinic radiation source through a screened image and development, it can accurately reproduce the image on the degradable sheet. The construction is useful as a color proof which can be employed to accurately predict the image quality from a lithographic printing process on a variety of printing surfaces.
    Type: Grant
    Filed: October 21, 1988
    Date of Patent: March 31, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Arthur E. Proctor, Thomas Dunder
  • Patent number: 5099007
    Abstract: A light-sensitive compound is described, containing a quinonediazido group and an alkylimidazole group in the same molecule and which is solubilizable in an aqueous alkali solution upon irradiation with light, and a method of forming a photoresist using the light-sensitive compound. The compound is useful, for example, in production of print substrates and in chemical milling.
    Type: Grant
    Filed: November 30, 1989
    Date of Patent: March 24, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masayuki Iwasaki
  • Patent number: 5080996
    Abstract: A photosensitive element which comprises a substrate having a release surface; a photosensitive layer having a photosensitizer, pigment, and mixture of binders with different solubility characteristics; and an adhesive layer coated directly on the photosensitive layer. The adhesive solution dissolves one of the resins in the photosensitive layer but does not dissolve the photosensitizer and the resin used to bind the pigment. During overcoating of the adhesive on the photosensitive layer, an increasing gradient of the soluble resin towards the adhesive layer and a decreasing gradient of the photosensitizer and nonsoluble resin is formed.
    Type: Grant
    Filed: January 28, 1991
    Date of Patent: January 14, 1992
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5055374
    Abstract: The invention provides an aqueous electrodeposition coating composition for a positive working resist and an image-forming method using the same. The coating composition is very stable under storage conditions and is capable of resulting in a positive working resist which is specifically useful in the preparation of a printed circuit board with mini-via-holes.
    Type: Grant
    Filed: August 2, 1989
    Date of Patent: October 8, 1991
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mamoru Seio, Takeshi Ikeda, Kanji Nishijima, Katsukiyo Ishikawa
  • Patent number: 5053311
    Abstract: A planographic printing plate suitable for direct printing, which comprises a support comprised of a rubber layer, a photosensitive resin layer laminated on the support and a silicone rubber layer laminated on the photosensitive resin layer. Preferably, a barrier layer is formed between the support and the photosensitive resin layer.
    Type: Grant
    Filed: September 5, 1984
    Date of Patent: October 1, 1991
    Inventors: Fumikatsu Makino, Yoichi Shimokawa
  • Patent number: 5035976
    Abstract: The invention relates to new mixed ester photosensitive compounds and photosensitizer compositions comprised thereof. The photosensitive compounds and photosensitizer compositions are prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide in specific ratios. Photoresist compositions comprising the photosensitive compounds and photosensitizer compositions are also disclosed. The photosensitiizer compositions exhibit excellent solution stability and resistance to precipitation when formulated in alkali-soluble resin photoresist compositions. The photoresist compositions have improved shelf life.
    Type: Grant
    Filed: November 3, 1989
    Date of Patent: July 30, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Robert E. Potvin, Jonas O. St. Alban, Chester J. Sobodacha
  • Patent number: 5017457
    Abstract: A presensitized printing plate for waterless lithographic printing is described which is composed of a substrate, a printing ink-repellent crosslinked silicone elastomer coating situated thereon, an intermediate coating of amorphous silicic acid or of an exposed coating of a photosensitive organic halogen compound and a radiation-sensitive coating. The intermediate coating effects a better adhesion of the photosensitive coating to the silicone coating and, consequently, a better resistance to developer and better print run of the plate.
    Type: Grant
    Filed: September 1, 1988
    Date of Patent: May 21, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Heinz Herrmann, Susanne Billino
  • Patent number: 5008174
    Abstract: A photosensitive element which comprises a substrate having a release surface; a photosensitive layer having a photosensitizer, pigment, and mixture of binders with different solubility characteristics; and an adhesive layer coated directly on the photosensitive layer. The adhesive solution dissolves one of the resins in the photosensitive layer but does not dissolve the photosensitizer and the resin used to bind the pigment. During overcoating of the adhesive on the photosensitive layer, an increasing gradient of the soluble resin towards the adhesive layer and a decreasing gradient of the photosensitizer and nonsoluble resin is formed.
    Type: Grant
    Filed: October 21, 1989
    Date of Patent: April 16, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5006442
    Abstract: A radiation sensitive plate is provided with a discontinuous covering layer to improve vacuum drawdown. The covering layer is produced by dissolving the material which is to form the covering layer in a solvent so as to form a solution having a conductivity of from 10.sup.3 to 10.sup.9 pSm.sup.-1. The solution is then directed towards the plate while providing a potential of at least 5 kV between the solution and the plate. The potential is the sole disruptive force in the liquid and draws the liquid into ligaments and disrupts the ligaments to form drops of substantially equal size which are then deposited on the plate.
    Type: Grant
    Filed: May 31, 1989
    Date of Patent: April 9, 1991
    Assignee: Vickers PLC
    Inventors: Graham P. Cooper, Reginald T. Jones
  • Patent number: 5002850
    Abstract: A photosensitive material comprises:(I) an undercoat layer containing at least one alcohol-soluble polyamide;(II) an alcohol-insoluble barrier layer; and(III) a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer superposed in order on a support to form a laminate.
    Type: Grant
    Filed: August 3, 1989
    Date of Patent: March 26, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Kazuo Suzuki, Tamotsu Suzuki, Tomizo Namiki, Tomohisa Tago, Mikio Totsuka
  • Patent number: 4999266
    Abstract: The invention provides a photographic article having a protected image which comprisesa) a colored image disposed on a substrate; andb) a thin, transparent, colorless, thermoplastic adhesive composition directly on the surface of the image, wherein said adhesive is substantially non-tacky at room temperature, and comprises one or more thermoplastic polymers of copolymers capable of forming a flexible film, said adhesive being capable of being transferred directly to the image when the adhesive is first disposed on the release surface of a temporary support and said image and adhesive are laminated together under pressure at temperatures of between about 60.degree. C. and about 90.degree. C. and said temporary support is peeled away; andc) a non-self supporting antiblocking layer directly on said adhesive said antiblocking layer being transparent, colorless and comprises one or more organic polymers or copolymers, which coating does not cohesively block at about 50.degree. C. or less.
    Type: Grant
    Filed: December 6, 1989
    Date of Patent: March 12, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Mehmet U. Yener, Stanley F. Wanat
  • Patent number: 4987048
    Abstract: An image forming material comprising a support, a coloring material-containing organic polymer layer and a photosensitive resin layer in order in the form of a laminate, wherein the organic polymer of the organic polymer layer comprises a copolymer of an aralkyl (meth)acrylate and (meth)acrylic acid.
    Type: Grant
    Filed: August 7, 1989
    Date of Patent: January 22, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomizo Namiki
  • Patent number: 4983492
    Abstract: This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.
    Type: Grant
    Filed: June 6, 1988
    Date of Patent: January 8, 1991
    Assignee: Shipley Company Inc.
    Inventors: Peter Trefonas, III, Anthony Zampini, David C. Madoux
  • Patent number: 4980260
    Abstract: A multicolor image-forming method which comprises image-exposing a light-sensitive heat-sensitive recording material having a diazo compound and a coupling component on a support using a positive image followed by developing to form a color image, image-exposing a light-solubilizing color image-forming material having a coloring material on a substantially transparent support using a positive image followed by developing to form a color image, and superposing the light-solubilizing color image-forming material having the color image on the light-sensitive heat-sensitive recording material having the color image or, further, heat-pressing the light-solubilizing color image-forming material having the color image superposed on the light-sensitive heat-sensitive recording material having the color image.
    Type: Grant
    Filed: April 25, 1988
    Date of Patent: December 25, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Mikio Totsuka, Tomizo Namiki
  • Patent number: 4975351
    Abstract: A positive-type photosensitive electrodeposition coating composition comprising as a main component a water-soluble or water-dispersible resin containing modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## or ##STR3## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule.
    Type: Grant
    Filed: November 7, 1988
    Date of Patent: December 4, 1990
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Yuu Akaki, Kenji Seko, Toshio Kondo, Naozumi Iwasawa
  • Patent number: 4957845
    Abstract: The present invention is concerned with a printing plate of which image formation is done by photoirradiation, having a front side covered waith a peelable or removable protective layer which contains a photofading material. The printing plate is safe against fogging to light and can be used under ordinary illumination.
    Type: Grant
    Filed: May 17, 1989
    Date of Patent: September 18, 1990
    Assignee: Toray Industries, Incorporated
    Inventors: Masanao Isono, Ken Kawamura, Masaya Asano, Tetuo Suzuki, Shigeo Abiko
  • Patent number: 4950577
    Abstract: Presensitized sheets for color proofing comprising a removable carrier sheet bearing a photosensitive medium sensitive to radiation within the wavelength band 325 to 700 nm and comprising photohardenable, photoadherent, photoinsolubilisable or photosolubilisable material, the sheet including a removable antihalation layer which is removed either when stripping the carrier sheet or during subsequent processing. The antihalation dyes may be positioned within a transparent carrier sheet, in a layer on the carrier sheet opposite to the photosensitive medium or in a layer positioned between the carrier sheet and light-sensitive medium.
    Type: Grant
    Filed: May 23, 1985
    Date of Patent: August 21, 1990
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Duncan M. A. Grieve, Ronald W. Burrows, John Souter
  • Patent number: 4948693
    Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: August 29, 1988
    Date of Patent: August 14, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: Richard L. Shadrach, Stephan J. W. Platzer, Gabor I. Koletar
  • Patent number: 4948697
    Abstract: The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a solvent mixture comprising propylene glycol alkyl ether and propylene glycol alkyl ether acetate, onto a substrate, drying, exposing to imaging energy and developing.
    Type: Grant
    Filed: July 5, 1989
    Date of Patent: August 14, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham
  • Patent number: 4943511
    Abstract: Positive photoresist compositions are provided which contain (a) a mixture of mono-, di-, and triesters of 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazo-4-sulfonic acid and (b) a novolak resin selected from resins prepared from a phenolic component having a high p-cresol content or from a mixture of formaldehyde and an aromatic aldehyde.
    Type: Grant
    Filed: July 6, 1989
    Date of Patent: July 24, 1990
    Assignee: Morton Thiokol, Inc.
    Inventors: Richard M. Lazarus, Edward J. Reardon, Sunit S. Dixit
  • Patent number: 4937169
    Abstract: A light-sensitive printing plate for waterless planographic printing is disclosed comprising a support, a superimposed light-sensitive layer, an outer, ink-repellent silicone rubber layer, and an inner, ink-repellent silicone layer between the light-sensitive layer and the outer silicone rubber layer, the outer silicone rubber layer having a higher degree of crosslinking than the inner layer. The printing plate is less sensitive to scratching and, at the same time, shows good developability and image resolution.
    Type: Grant
    Filed: September 15, 1988
    Date of Patent: June 26, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Hans-Joachim Schlosser
  • Patent number: 4920028
    Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
    Type: Grant
    Filed: August 2, 1988
    Date of Patent: April 24, 1990
    Assignee: Morton Thiokol, Inc.
    Inventors: Richard M. Lazarus, Randall Kautz, Sunit S. Dixit
  • Patent number: 4902770
    Abstract: The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.
    Type: Grant
    Filed: May 20, 1987
    Date of Patent: February 20, 1990
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Wataru Ishii, Shozo Miyazawa, Shinji Tsuchiya, Hisashi Nakane, Akira Yokota
  • Patent number: 4898803
    Abstract: A light-sensitive composition comprises at least one polyuretane resin having repeating unit represented by formula (I) and/or repeating unit represented by formula (II) and which is insoluble in water and soluble in aqueous alkaline solution; and at least one positive-working light-sensitive compound: ##STR1## wherein R.sub.1 represents a bivalent aliphatic or aromatic hydrocarbon which may have a substituent; R.sub.2 represents hydrogen atom or an alkyl, an aralkyl, an aryl, an alkoxy or an aryloxy group which may be substituted with a substituent; R.sub.3, R.sub.4 and R.sub.5 may be the same or different and independently represent a single bond or a bivalent aliphatic or aromatic hydrocarbon group which may have a substituent and Ar represents a trivalent aromatic hydrocarbon group which may have a substituent.
    Type: Grant
    Filed: November 12, 1987
    Date of Patent: February 6, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Keitaro Aoshima, Akira Nagashima
  • Patent number: 4889787
    Abstract: A positive-acting photosensitive proofing element is constructed with a thermal adhesive layer having a Tg between 45.degree. C. and 60.degree. C., said adhesive comprising a polymer or copolymer derived from an ethylenically unsaturated monomer and 0.5 to 40% by weight of a polyvinyl ether polymer as a flexibilizer.
    Type: Grant
    Filed: April 25, 1988
    Date of Patent: December 26, 1989
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Arlene K. Musser
  • Patent number: 4882260
    Abstract: The photosensitive composition, which is suitable as a photoresist material in fine patterning works for the manufacture of semiconductor devices, contains, as a photoextinctive agent, a combination of an alkali-insoluble dye and an alkali-soluble dye each having absorptivity of light in the wavelength region from 230 to 500 nm in a specified amount and in a specified ratio between them. By virtue of the formulation of combined dyes, the undesirable phenomenon of halation by the underlying aluminum coating layer on the substrate surface is greatly decreased so that patterned resist layer obtained with the composition is a high-fidelity reproduction of the original pattern even in a submicron range of fineness with good rectangularity of the cross sectional form of the patterned lines.
    Type: Grant
    Filed: June 5, 1987
    Date of Patent: November 21, 1989
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hidekatsu Kohara, Nobuo Tokutake, Masanori Miyabe, Toshimasa Nakayama, Shingo Asaumi, Hatsuyuki Tanaka, Yoshiaki Arai
  • Patent number: 4869993
    Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The element is composed of a substrate, colored photosensitive layer and adhesive layer. The adhesive layer contains an optical brightener compound which reduces residual yellow staining derived from the naphthoquinone diazide sensitizer.
    Type: Grant
    Filed: August 29, 1988
    Date of Patent: September 26, 1989
    Inventors: Wahib Farahat, Dennis J. Bellville, Richard L. Shadrach
  • Patent number: 4853313
    Abstract: A printing plate formed of a substrate and laminated thereon in the following order a primer layer and a photosensitive layer containing a quinonediazide compound and a silicone rubber layer, wherein the primer layer contains 0.1 to 25% by weight of a quinonediazide group. The printing plate of the present invention is excellent in dot reproduction, hardly causes cracking in the photosensitive layer, and has a wide latitutde in production.
    Type: Grant
    Filed: April 10, 1987
    Date of Patent: August 1, 1989
    Assignee: Toray Industries, Inc.
    Inventors: Yoichi Mori, Shigeo Abiko, Mikio Tsuda, Chikara Ichijo
  • Patent number: 4853314
    Abstract: A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C-O-C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.
    Type: Grant
    Filed: June 10, 1988
    Date of Patent: August 1, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans Ruckert, Ralf Ohlenmacher
  • Patent number: 4845008
    Abstract: A positive-working light-sensitive composition is herein disclosed, which comprises a mixed organic solvent consisting of (i) at least one organic solvent having a boiling point of at least 40.degree. C. and less than 100.degree. C., (ii) at least one organic solvent having a boiling point of at least 100.degree. C. and less than 140.degree. C., and (iii) at least one organic solvent having a boiling point of at least 140.degree. C. and less than 210.degree. C.; or (a) at least one organic solvent as defined in the above item (i), (b) at least one organic solvent as defined in the item (ii), (c) at least one organic solvent having a boiling point of at least 210.degree. C.
    Type: Grant
    Filed: February 11, 1987
    Date of Patent: July 4, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nishioka, Toshimi Hirano, Keiji Akiyama
  • Patent number: 4842988
    Abstract: A presensitized printing plate suitable for waterless planographic printing is disclosed, which comprises a layer support, a radiation-sensitive layer, an outer, ink-repellent, cross-linked silicone elastomer layer, and an intermediate layer of amorphous silicic acid, by which the adhesion of the silicone elastomer layer to the radiation-sensitive layer is improved. The adhesive layer is physiologically safe and effects a good anchoring of the silicone elastomer layer. The process of making and using the presensitized printing plate are also disclosed.
    Type: Grant
    Filed: August 20, 1987
    Date of Patent: June 27, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Heinz Herrmann, Hans-Joachim Schlosser
  • Patent number: 4842982
    Abstract: Disclosed is a radiation-sensitive recording material comprising a support, a radiation-sensitive recording layer and a rough covering layer which is applied by spraying and drying a solution which has substantially the same composition as the recording layer. Due to its rough surface, the material provides for accelerated vacuum contact in the copying process. Also disclosed is a process for producing the radiation-sensitive recording material described above.
    Type: Grant
    Filed: June 9, 1987
    Date of Patent: June 27, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Markus Seibel, Guenther Kaempf
  • Patent number: 4839256
    Abstract: Light-sensitive perfluoroalkyl group-containing 1,2-naphthoquinone diazide compounds and reproduction materials comprising a support and a light-sensitive layer containing such compounds useful in producing planographic printing plates for waterless printing. The 1,2-naphthoquinone diazide compounds correspond to the formula I. ##STR1## wherein Ar denotes a mononuclear to trinuclear aromatic radicalD is a 1,2-naphthoquinone-2-diazide-4-sulfonyl radical or a 1,2-naphthoquinone-2-diazide-5-sulfonyl radical,R.sub.F is a perfluoroalkyl radical having from 5 to 15 carbon atoms,W is a single bond or is selected from the group consisting of______________________________________ (CH.sub.2).sub.m COO (CH.sub.2).sub.m OOCCHR.sup.2O (CH.sub.2).sub.m OC.sub.o H.sub.2oCOO (CH.sub.2).sub.m OOC (CH.sub.2).sub.m OOCC.sub.o H.sub.2oCOO (CH.sub.2).sub.m SO.sub.2 NH (CH.sub.2).sub.m OOCCHCHCOO C.sub.6 H.sub.4 SO.sub.2 NH (CH.sub.2).sub.m CO (CH.sub.2).sub.m CONH (CH.sub.2).sub.m SO.sub.3 (CH.sub.2).sub.m OOCC.sub.o H.sub.
    Type: Grant
    Filed: August 21, 1987
    Date of Patent: June 13, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Werner H. Muller
  • Patent number: 4835086
    Abstract: A photosensitive article which comprises a substrate, a first light sensitive layer on the substrate, a polysulfone layer and a second light sensitive layer. The first light sensitive layer preferably comprises a depolymerizable polymethyl methacrylate polymer and the second light sensitive layer preferably comprises on o-quinone diazide in admixture with a water insoluble, aqueous alkaline soluble binder resin.
    Type: Grant
    Filed: February 12, 1988
    Date of Patent: May 30, 1989
    Assignee: Hoechst Celanese Corporation
    Inventor: Sangya Jain
  • Patent number: 4833065
    Abstract: In a process for producing a support for a lithographic printing plate, at least one surface of an aluminum sheet is subjected to roughening treatment and subsequently to anodic oxidation treatment at a current density of at least 1 A/dm.sup.2 in an electrolytic solution containing 0.1 to 5% by weight of an alkaline electrolyte. Even if scratches are formed on non-image areas of a printing plate prepared from the support according to the invention, such scratches cause less stains on a printed matter.
    Type: Grant
    Filed: October 1, 1986
    Date of Patent: May 23, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Haruo Nakanishi, Hirokazu Sakaki
  • Patent number: 4826752
    Abstract: A dry photosensitive lithographic printing plate has a base, a photosensitive layer formed on the base and a silicone rubber layer formed on the photosensitive layer. The silicone rubber layer is formed from a silicon rubber composition containing an organopolysiloxane and a reactive aromatic aminosilane compound.
    Type: Grant
    Filed: June 18, 1987
    Date of Patent: May 2, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Susumu Yoshida, Hiroshi Takahashi, Hisashi Aoki, Kiyohiro Kondow, Tetsuya Mayuzumi
  • Patent number: 4824757
    Abstract: A process for preparing a positive-acting photosensitive lithographic printing plate precursor is described, comprising a combination of the steps of (a) electrolytically graining an aluminum plate in a nitric acid-based electrolyte, (b) etching the grained plate with an alkali, (c) anodizing the etched plate, and (d) forming a photosensitive layer containing an o-quinonediazide on the anodized plate.
    Type: Grant
    Filed: February 8, 1988
    Date of Patent: April 25, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koichiro Aono, Hirokazu Sakaki
  • Patent number: 4818658
    Abstract: The subject invention involves reduction of light reflection into a photoresist coating over a reflective substrate by the use of a photoactive compound in a photoresist formulation that is the reaction product of a diazooxide and curcumin.
    Type: Grant
    Filed: April 17, 1987
    Date of Patent: April 4, 1989
    Assignee: Shipley Company Inc.
    Inventors: Robert L. Martin, M. Martha Rajaratnam, Pamela Turci
  • Patent number: 4814246
    Abstract: The disclosed light-sensitive recording material is composed of an electrically conductive support, suitable for the production of printing forms or printed circuits, an a photoconductive layer system containing a photoconductor, a binder, a sensitizing dye and conventional additives. The photoconductive system comprises (A) a single photoconductive layer, or multiple layers, applied to the support and (B) a light-sensitive covering layer which contains at least one photochemically reactive compound. The use of the recording material in a process for the production of printing forms and printed circuits is also disclosed.
    Type: Grant
    Filed: April 16, 1987
    Date of Patent: March 21, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Peter Lehmann, Manfred Michel