And Radiation-sensitive Chromium Compound Patents (Class 430/274.1)
  • Patent number: 10941225
    Abstract: This invention relates to photocurable electron deficient olefin-containing compositions, such as those containing certain 2-cyanoacrylates, 2-cyanopentadienoates, methylidene malonates, and vinylidine cyanide, and photolatent bases. When exposed to radiation in the electromagnetic spectrum, the compositions show a delay cure property.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: March 9, 2021
    Assignee: Henkel IP & Holding GmbH
    Inventors: John G. Woods, Mary Palliardi, Joel D. Schall, Anthony F. Jacobine
  • Patent number: 8389201
    Abstract: The present invention relates to a positive resist composition and to a pattern forming process using the same. The present invention provides: a positive resist composition having an enhanced etching resistance and an excellent resolution and being capable of providing an excellent pattern profile even at a substrate-side boundary face of resist, in photolithography for fine processing, and particularly in lithography adopting, as an exposure source, KrF laser, extreme ultraviolet rays, electron beam, X-rays, or the like; and a pattern forming process utilizing the positive resist composition.
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: March 5, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Akinobu Tanaka, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
  • Publication number: 20080308734
    Abstract: The radiation image conversion panel in accordance with the present invention has an aluminum substrate; an alumite layer formed on a surface of the aluminum substrate; a chromium layer covering the alumite layer; a metal film, provided on the chromium layer, having a radiation transparency and a light reflectivity; an oxide layer covering the metal film and having a radiation transparency and a light transparency; a protective film covering the oxide layer and having a radiation transparency and a light transparency; and a converting part provided on the protective film and adapted to convert a radiation image.
    Type: Application
    Filed: June 15, 2007
    Publication date: December 18, 2008
    Inventors: Takaharu Suzuki, Yutaka Kusuyama, Masanori Yamashita, Kazuhiro Shirakawa, Toshio Takabayashi
  • Publication number: 20020132187
    Abstract: A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed which comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer, characterize in that the oleophilic imaging layer comprises at least one transition metal complex of an organic acid. Materials according to the invention are characterized by an increased run length and can be used as a printing plate immediately after exposure.
    Type: Application
    Filed: November 19, 2001
    Publication date: September 19, 2002
    Applicant: Agfa-Gevaert
    Inventors: Marc Van Damme, Wim Sap