Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product Patents (Class 430/269)
  • Patent number: 9703195
    Abstract: A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), RP represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that RP in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that RP in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: July 11, 2017
    Assignee: JSR CORPORATION
    Inventors: Hayato Namai, Kota Nishino
  • Patent number: 9644062
    Abstract: A toughener composition comprising: a) a polyol component selected from the group consisting of a polyether polyol, a polyester polyol, a polycaprolactone polyol, a hydroxyl-terminated polybutadiene, and mixtures or copolymers thereof; and b) a core shell rubber comprising a rubber particle core and a shell layer wherein said core shell rubber has a particle size of from 0.01 ?m to 0.5 ?m is disclosed. The toughener can be used in epoxy resin compositions for composite applications.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: May 9, 2017
    Assignee: Dow Global Technologies LLC
    Inventors: Rui Xie, Jeanette K. Nunley
  • Patent number: 9482901
    Abstract: The present invention prevents the shaving of an alignment film caused by a columnar spacer in a liquid crystal display device of an IPS method using photo-alignment. A plinth higher than a pixel electrode is formed at a part where a columnar spacer formed over a counter substrate touches a TFT substrate. When an alignment film of a double-layered structure is applied over the pixel electrode and the plinth, the thickness of the alignment film over the plinth reduces by a leveling effect. When photo-alignment is applied in the state, a photodegraded upper alignment film over the plinth disappears and a lower alignment film having a high mechanical strength remains. As a result, it is possible to prevent the shaving of the alignment film.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: November 1, 2016
    Assignee: Japan Display Inc.
    Inventors: Noboru Kunimatsu, Masaki Matsumori, Hidehiro Sonoda, Yasushi Tomioka, Toshiki Kaneko
  • Patent number: 9457515
    Abstract: The invention relates to a liquid radiation curable resin capable of curing into a solid upon irradiation comprising: (A) from about 0 to about 12 wt % of a cycloaliphatic epoxide having a linking ester group; (B) from about 30 to about 65 wt % of one or more epoxy functional components other than A; (C) from about 10 to about 30 wt % of one or more oxetanes; (D) from, about 1 to about 10 wt % of one or more polyols; (E) from about 2 to about 20 wt % of one or more radically curable (meth) acrylate components; (F) from about 2 to about 12 wt % of one or more impact modifiers; (G) from about 0.1 to about 8 wt % of one or more free radical photoinitiators; and (H) from about 0.1 to about 8 wt % of one or more cationic photoinitiators; wherein the liquid radiation curable resin has a viscosity at 30° C. of from about 600 cps to about 1300 cps.
    Type: Grant
    Filed: August 6, 2013
    Date of Patent: October 4, 2016
    Assignee: DSM IP Assets B.V.
    Inventors: John Southwell, Brett A. Register, Satyendra Kumar Sarmah, Paulus Antonius Maria Steeman, Beert Jacobus Keestra, Marcus Matheus Driessen
  • Patent number: 9373819
    Abstract: The invention relates to an organic light-emitting part having a functional layer stack (10), which functional layer stack has a substrate (1), a first electrode (2) above the substrate, an organic functional layer stack (4) above the first electrode, having an organic light-emitting layer (5), and a second electrode (3) above the organic functional layer stack, wherein a layer (1, 2, 3) of the functional layer stack (10) forms a carrier layer (6) for a diffusion layer (7), wherein the diffusion layer (7) has at least one first and one second organic component (71, 72) having indices of refraction that differ from each other, wherein the first organic component (71) is hydrophobic and the second organic component (72) is hydrophilic, wherein the glass transition temperature of a mixture of the first organic component (71) and the second organic component (72); lies above the room temperature and wherein the first organic component (71) and the second organic component (72) are partially segregated in the diff
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: June 21, 2016
    Assignee: OSRAM OLED GMBH
    Inventors: Nina Riegel, Thilo Reusch, Daniel Steffen Setz
  • Patent number: 9149977
    Abstract: A lens manufacturing apparatus includes a conveying unit that conveys a workpiece having a sheet member and a resin base on the sheet member, an unevenness forming unit that moves a cutting blade in a direction different from the conveying direction of the workpiece and that makes a cut in the surface of the resin base to form concave and convex portions, a resin supply unit that includes nozzles supplying a lens resin to areas, in which the concave portions are not formed, between the convex portions formed on the surface of the resin base, and a resin curing unit that cures the supplied lens resin.
    Type: Grant
    Filed: July 24, 2012
    Date of Patent: October 6, 2015
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Keishi Shimizu, Shin Yasuda, Yoshio Nishihara, Tetsuro Kodera
  • Patent number: 9144491
    Abstract: A method for modifying the refractive index of an optical polymeric material. The method comprises continuously irradiating predetermined regions of an optical, polymeric material with femtosecond laser pulses to form a gradient index refractive structure within the material. An optical device includes an optical, polymeric lens material having an anterior surface and posterior surface and an optical axis intersecting the surfaces and at least one laser-modified, GRIN layer disposed between the anterior surface and the posterior surface and arranged along a first axis 45° to 90° to the optical axis, and further characterized by a variation in index of refraction across at least one of at least a portion of the adjacent segments and along each segment.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: September 29, 2015
    Assignee: University of Rochester
    Inventors: Wayne H. Knox, Dharmendra Jani, Li Ding
  • Patent number: 9128460
    Abstract: A photopolymer composition includes a polymer binder; a monomer for holographic recording; a photoinitiation system including an electron acceptor, at least one of an electron donor and a hydrogen atom donor, and a dye-sensitizer; and a solvent. The monomer for holographic recording includes N-acryloylthiomorpholine.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: September 8, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Chil-sung Choi, Kyoung-seok Pyun, Alexander Morozov, Sang-yoon Oh, Evgeny V. Vasiljev, Vladimir V. Shelkovnikov
  • Patent number: 9110371
    Abstract: Provided is a photosensitive resin composition, including: a binder polymer; a photopolymerizable compound having an ethylenically unsaturated group; a photopolymerization initiator; a benzotriazole compound; and an aliphatic diamine compound having from 8 to 30 carbon atoms.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: August 18, 2015
    Assignee: HITACHI CHEMICAL COMPANY, LTD
    Inventors: Katsutoshi Itagaki, Masanori Shindou
  • Patent number: 9034440
    Abstract: There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: May 19, 2015
    Assignee: FUJIFILM Corporation
    Inventor: Satoshi Takita
  • Publication number: 20150111176
    Abstract: The invention relates to the use of a composite resin composition comprising (a) at least one polyreactive binder, (b) a first photopolymerization initiator having an absorption maximum at a wavelength of less than 400 nm, (c) a second photopolymerization initiator having an absorption maximum at a wavelength of at least 400 nm and (d) an absorber having an absorption maximum at a wavelength of less than 400 nm, for the stereolithographic production of a dental shaped part based on composite resin. The invention also relates to a process for the stereolithographic production of a dental shaped part and the use of the composite resin composition in this process.
    Type: Application
    Filed: April 11, 2013
    Publication date: April 23, 2015
    Inventors: Wolfgang Wachter, Jörg Ebert, Dieter Voser, Norbert Moszner, Volker Rheinberger, Jürgen Stampfl
  • Patent number: 8840769
    Abstract: A catalyst precursor resin composition includes an organic polymer resin; a fluorinated-organic complex of silver ion; a monomer having multifunctional ethylene-unsaturated bonds; a photoinitiator; and an organic solvent. The metallic pattern is formed by forming catalyst pattern on a base using the catalyst precursor resin composition reducing the formed catalyst pattern, and electroless plating the reduced catalyst pattern. In the case of forming metallic pattern using the catalyst precursor resin composition, a compatibility of catalyst is good enough not to make precipitation, chemical resistance and adhesive force of the formed catalyst layer are good, catalyst loss is reduced during wet process such as development or plating process, depositing speed is improved, and thus a metallic pattern having good homogeneous and micro pattern property may be formed after electroless plating.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: September 23, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Min Kyoun Kim, Min Jin Ko, Sang Chul Lee, Jeong Im Roh
  • Patent number: 8822563
    Abstract: Disclosed is a curable resin composition comprising a polymer (A) that has a main chain comprising carbon atoms and a side chain having a polymerizing unsaturated linking group and has a cyclic structure in the main chain and/or the side chain, and a compound having a polymerizing unsaturated group. The curable resin composition has good optical characteristics, good heat resistance and good moldability.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: September 2, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hiroaki Mochizuki, Naoyuki Morooka, Rie Okutsu, Tatsuhiko Obayashi
  • Patent number: 8815149
    Abstract: A semi-reflective film and reflective film for an optical recording medium, which is made of a silver alloy having a composition consisting of 0.001 to 0.1% by mass of Ca, 0.05 to 1% by mass of Mg, and a remainder containing Ag and inevitable impurities, and a target which is made of a silver alloy having a composition consisting of 0.001 to 0.1% by mass of Ca, 0.05 to 1% by mass of Mg, and a remainder containing Ag and inevitable impurities; and a semi-reflective film for an optical recording medium, which is made of a silver alloy having a composition consisting of 0.05 to 1% by mass of Mg, 0.05 to 1% by mass of one or more of Eu, Pr, Ce and Sm, and a remainder containing Ag and inevitable impurities, and an Ag alloy sputtering target for forming a semi-reflective film for an optical recording medium, which is made of a silver alloy having a composition consisting of 0.05 to 1% by mass of Mg, 0.05 to 1% by mass of one or more of Eu, Pr, Ce and Sm, and a remainder containing Ag and inevitable impurities.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: August 26, 2014
    Assignee: Mitsubishi Materials Corporation
    Inventors: Shozo Komiyama, Gou Yamaguchi, Akifumi Mishima
  • Patent number: 8802346
    Abstract: The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post-treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.
    Type: Grant
    Filed: June 27, 2009
    Date of Patent: August 12, 2014
    Assignee: Pryog, LLC
    Inventors: Mangala Malik, Joseph J Schwab
  • Patent number: 8779030
    Abstract: Continuous, conducting metal patterns can be formed from metal nanoparticle containing films by exposure to radiation (FIG. 1). The metal patterns can be one, two, or three dimensional and have high resolution resulting in feature sizes in the order of micron down to nanometers Compositions containing the nanoparticles coated with a ligand and further including a dye, a metal salt, and either a matrix or an optional sacrificial donor are also disclosed.
    Type: Grant
    Filed: April 18, 2007
    Date of Patent: July 15, 2014
    Assignee: The Arizona Board of Regents, The University of Arizone
    Inventors: Joseph W. Perry, Seth R. Marder, Francesco Stellacci
  • Patent number: 8734890
    Abstract: A method for forming a molecularly imprinted polymer biosensor includes: (a) preparing a reaction solution including an imprinting molecule, a functional monomer, an initiator, and a crosslinking agent; (b) disposing the reaction solution in a space between upper and lower substrates each of which is made of a light-transmissible material; (c) disposing on the upper substrate a photomask having a patterned hole; (d) irradiating the reaction solution through the patterned hole of the photomask and the upper substrate so that the reaction solution undergoes polymerization to form a polymer between the upper and lower substrates; (e) removing the upper substrate after the polymer is formed on the lower substrate; and (f) extracting the imprinting molecule from the polymer so that a patterned molecularly imprinted polymer film is formed on the lower substrate.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: May 27, 2014
    Assignee: National Tsing Hua University
    Inventors: Chien-Chong Hong, Po-Hsiang Chang, Chih-Chung Lin
  • Patent number: 8729148
    Abstract: Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D): (A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule; (C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and (D) a solvent.
    Type: Grant
    Filed: December 14, 2010
    Date of Patent: May 20, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Asai, Takanobu Takeda, Hideto Kato
  • Patent number: 8722322
    Abstract: A method of improving conductivity of a metal pattern (18) includes providing a developed silver pattern (14) formed from a photographic silver salt provided in a binder coated on a substrate (12); and selectively heating the silver pattern with electromagnetic radiation.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: May 13, 2014
    Assignee: Eastman Kodak Company
    Inventors: Donald R. Preuss, Mitchell S. Burberry
  • Publication number: 20140080054
    Abstract: A lithographic printing plate precursor which is excellent in both the on-press development property and the printing durability and which is excellent particularly in the on-press development property after preservation for a long period of time, wherein the lithographic printing plate precursor includes an intermediate layer containing a polymer compound including a repeating unit (a1) having a support-adsorbing group and a repeating unit (a2) having a polyoxyalkylene group having a repeating number of oxyalkylene units from 8 to 120 between a support and a polymerizable image-recording layer, and contains a compound having a molecular weight of 1,500 or less and having an oxyalkylene group in at least any of the intermediate layer and the polymerizable image-recording layer.
    Type: Application
    Filed: November 22, 2013
    Publication date: March 20, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Yu IWAI, Hidekazu OOHASHI, Takanori MORI
  • Patent number: 8663895
    Abstract: According to one embodiment, a method for manufacturing a template for imprinting includes preparing a first template having a device pattern and a plurality of identification patterns, and forming a second template by transferring the device pattern and at lest desired one of the identification patterns to a template substrate.
    Type: Grant
    Filed: September 16, 2010
    Date of Patent: March 4, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Yoshihito Kobayashi
  • Patent number: 8642234
    Abstract: A carboxyl group-containing photosensitive resin is obtained by reacting an ?,?-ethylenically unsaturated group-containing monocarboxylic acid (c) with a phenolic compound (a) containing the structure represented by the following general formula (I) and having at least two phenolic hydroxyl groups in its molecule, wherein part or the whole of the phenolic hydroxyl groups being modified into an oxyalkyl group, and further reacting a polybasic acid anhydride (d) with the resultant reaction product; wherein R1 represents either one of a hydrocarbon radical of 1 to 11 carbon atoms, a SO2 group, an oxygen atom and sulfur atom, R2 represents a hydrocarbon radical of 1 to 11 carbon atoms, “a” represents an integer of 0 to 3, “n” represents an integer of 1 to 2, and “m” represents an integer of 1 to 10.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: February 4, 2014
    Assignees: Taiyo Holdings Co., Ltd., Showa Denko K.K.
    Inventors: Nobuhito Ito, Masao Arima, Syouji Nishiguchi, Kouji Ogawa, Masayuki Kobayashi, Atsushi Sakamoto
  • Patent number: 8632956
    Abstract: The present invention provides a process for producing a photosensitive resin plate or relief printing plate having a recessed and projected pattern, which comprises the steps of: making a liquid containing an ink-repellent component (A) and a curing component (B) attach to the plate surface of the photosensitive resin plate or relief printing plate having a recessed and projected pattern prior to the post-treatment step or during the post-treatment step, wherein the ink-repellent component (A) comprises at least one compound selected from the group consisting of silicon-based compounds, fluorine-based compounds and paraffin-based compounds, and provides a treatment liquid which is suitable for the process for producing the photosensitive resin plate or the relief printing plate having the recessed and projected pattern.
    Type: Grant
    Filed: March 12, 2008
    Date of Patent: January 21, 2014
    Assignee: Asahi Kasei E-Materials Corporation
    Inventor: Kazuyoshi Yamazawa
  • Patent number: 8628698
    Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.
    Type: Grant
    Filed: July 23, 2010
    Date of Patent: January 14, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Se-Young Choi, Jae-Hyun Kim, Nam-Gwang Kim, Eui-June Jeong, Sang-Kyun Kim, Kwen-Woo Han, Hyun-Hoo Sung
  • Patent number: 8557017
    Abstract: Continuous, conducting metal patterns can be formed from metal nanoparticle containing films by exposure to radiation (FIG. 1). The metal patterns can be one, two, or three dimensional and have high resolution resulting in feature sizes in the order of micron down to nanometers Compositions containing the nanoparticles coated with a ligand and further including a dye, a metal salt, and either a matrix or an optional sacrificial donor are also disclosed.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: October 15, 2013
    Assignee: The Arizona Board of Regents
    Inventors: Joseph W. Perry, Seth R. Marder, Francesco Stellacci
  • Patent number: 8545661
    Abstract: A process for the manufacture of organically developable, photopolymerizable flexographic elements on flexible metallic supports by coating a flexible metallic support with a tack-free adhesive coating composition which is insoluble and non-swelling in printing inks and organic developers, attaching an elastomeric, photopolymerizable layer to a protective film, and laminating the photopolymerizable layer to the metallic support coated with said adhesive coating composition. A photopolymerizable flexographic element comprising a photopolymerizable layer which is attached to a metallic support by means of a tack-free adhesive film that is non-swelling and insoluble in printing inks and organic developers.
    Type: Grant
    Filed: January 17, 2006
    Date of Patent: October 1, 2013
    Assignee: XSYS Print Solutions Deutschland, GmbH
    Inventors: Rolf Knöll, Thomas Telser, Hans Menn
  • Patent number: 8519017
    Abstract: A catalyst precursor resin composition includes an organic polymer resin; a fluorinated-organic complex of silver ion; a monomer having multifunctional ethylene-unsaturated bonds; a photoinitiator; and an organic solvent. The metallic pattern is formed by forming catalyst pattern on a base using the catalyst precursor resin composition reducing the formed catalyst pattern, and electroless plating the reduced catalyst pattern. In the case of forming metallic pattern using the catalyst precursor resin composition, a compatibility of catalyst is good enough not to make precipitation, chemical resistance and adhesive force of the formed catalyst layer are good, catalyst loss is reduced during wet process such as development or plating process, depositing speed is improved, and thus a metallic pattern having good homogeneous and micro pattern property may be formed after electroless plating.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: August 27, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Min Kyoun Kim, Min Jin Ko, Sang Chul Lee, Jeong Im Roh
  • Patent number: 8481161
    Abstract: A printable metal nanoparticle having a self-assembled monolayer (SAM) composed of a compound containing a thiol (—SH), isocyanide (—CN), amino (—NH2), carboxylate (—COO) or phosphate group, as a linker, formed on the surface thereof, and a method for formation of a conductive pattern using the same are provided. The metal nanoparticles of an exemplary embodiment can be easily formed into a conductive film or pattern by a printing method, and the resulting film or pattern exhibits excellent conductivity which optimally may be adjusted if desired. Therefore, the resulting metal nanoparticles of can be used to advantage in the fields such as antistatic washable sticky mats, antistatic shoes, conductive polyurethane printer rollers, electromagnetic interference shielding materials, etc.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: July 9, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong Jin Park, Sung Woong Kim, Dong Woo Shin, Sang Hoon Park
  • Patent number: 8481241
    Abstract: A radiation curing composition suitable for building a three-dimensional object by a solid freeform method is disclosed. The composition includes one or more mono-functional monomers where a respective polymer has a Glass Transition Temperature higher than about 60° C., one or more di-functional oligomers where a respective polymer has a Glass Transition Temperature lower than about 40° C. and a phase separation inducing component. The phase separation may be induced during curing, resulting in a non-clear cured material having an improved impact strength and higher elongation, when compared to similar compositions without a phase separation including component.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: July 9, 2013
    Assignee: Stratasys Ltd.
    Inventors: Eduardo Napadensky, David Brusilovsky
  • Patent number: 8450854
    Abstract: The present invention provides an interconnect structure in which a patternable low-k material is employed as an interconnect dielectric material. Specifically, this invention relates to single-damascene and dual-damascene low-k interconnect structures with at least one patternable low-k dielectric. In general terms, the interconnect structure includes at least one patterned and cured low-k dielectric material located on a surface of a substrate. The at least one cured and patterned low-k material has conductively filled regions embedded therein and typically, but not always, includes Si atoms bonded to cyclic rings via oxygen atoms. The present invention also provides a method of forming such interconnect structures in which no separate photoresist is employed in patterning the patterned low-k material.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: May 28, 2013
    Assignee: International Business Machines Corporation
    Inventors: Qinghuang Lin, Shyng-Tsong Chen
  • Patent number: 8415081
    Abstract: The present invention discloses a photosensitive resin composition which comprises (A) a compound having a molecule with at least one thiirane ring and a total number of a thiirane ring and/or an epoxy ring of at least 2 in the molecule, and (B) a photo acid generator, said composition having a refractive index of at least 1.6, and a method of obtaining a high refractive index periodical structure which comprises subjecting the photosensitive resin composition to photolithography.
    Type: Grant
    Filed: June 17, 2004
    Date of Patent: April 9, 2013
    Assignees: Cornell Research Foundation, Inc., Hitachi Chemical Co., Ltd.
    Inventors: Christopher K. Ober, Yasuharu Murakami
  • Patent number: 8377623
    Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component comprising a polyglycidyl epoxy compound (ii) a free radically active component (iii) a cationic photoinitiator (v) a free radical photoinitiator and optionally (iv) one or more optional components. The photocurable composition can be cured using rapid prototyping techniques to form clear, colorless three-dimensional articles having excellent mechanical properties.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: February 19, 2013
    Assignee: 3D Systems, Inc.
    Inventor: John Wai Fong
  • Patent number: 8361696
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak
  • Patent number: 8350239
    Abstract: Exemplary embodiments provide materials and methods for a pen that can include a writing end for writing an image on an erasable medium and an erasing end for locally erasing an image from the erasable medium.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: January 8, 2013
    Assignee: Xerox Corporation
    Inventors: Bryan J. Roof, Anthony S. Condello
  • Patent number: 8344039
    Abstract: There is provided a photo-curable composition that shows the suppression of a residual film formation and a high adhesion thereof to a substrate in a process for forming a three-dimensional pattern by a photo-imprinting method. A photo-curable composition for forming a three-dimensional pattern by a photo-imprinting method, comprises a monomer having a photopolymerizable group; an inorganic fine particle to which a dispersant is added; and a photopolymerization initiator. It is preferred that the inorganic fine particle (e.g., silica) has an average particle diameter of 1 to 1,000 nm, and the dispersant is a silane coupling agent, particularly a silane coupling agent containing an organic group having a carbon-carbon unsaturated bond or an organic group having an epoxy group.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: January 1, 2013
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Makoto Hanabata
  • Patent number: 8338072
    Abstract: To provide a resist composition capable of prevention of the formation of abnormal resist pattern shapes for efficient, high-precision formation of fine, high-resolution resist patterns, a resist pattern forming process capable of efficient, high-precision formation of finer, high-resolution resist patterns by using the resist composition, and a method for manufacturing a semiconductor device. The resist composition of the present invention includes a base resin, a photoacid generator, a first additive, and a second additive, wherein the pKa of the second additive is higher than the pKa of the first additive, and at a resist formation temperature, the vapor pressure of the second additive is lower than the vapor pressure of the first additive.
    Type: Grant
    Filed: September 24, 2007
    Date of Patent: December 25, 2012
    Assignee: Fujitsu Limited
    Inventor: Junichi Kon
  • Patent number: 8338073
    Abstract: A lithographic printing plate support in which surface unevenness due to surface treatment has been suppressed and a presensitized plate of excellent sensitivity are produced from an aluminum alloy plate containing iron, silicon, titanium and boron by specifying the state in which TiB2 particles are present in the surface layer and the width of the crystal grains, and by having specific indicators relating to the respective concentrations of iron and silicon in the surface layer following graining treatment fall within specific ranges. In a method of manufacturing the lithographic printing plate support, an aluminum alloy melt having specified alloying ingredients is subjected to a specified casting process to have the amount of the alloying ingredients in solid solution following cold rolling fall within specified ranges.
    Type: Grant
    Filed: November 4, 2008
    Date of Patent: December 25, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Hirokazu Sawada, Akio Uesugi
  • Patent number: 8334025
    Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cationic photoinitiator (v) a free radical photoinitiator, and (vi) a toughening agent. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: December 18, 2012
    Assignee: 3D Systems, Inc.
    Inventors: John Wai Fong, Richard N. Leyden, Laurence Messe, Ranjana C. Patel, Carole Chapelat
  • Patent number: 8329773
    Abstract: The invention relates to holographic media containing specific photopolymers, a process for the production thereof, and unsaturated glycidyl ether acrylate urethanes as writing monomers which are suitable for the preparation of photopolymers.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: December 11, 2012
    Assignee: Bayer MaterialScience AG
    Inventors: Thomas Fäcke, Friedrich-Karl Bruder, Marc-Stephan Weiser, Thomas Rölle, Dennis Hönel
  • Patent number: 8304167
    Abstract: An optical information recording medium includes a recording layer that absorbs recording light in accordance with its wavelength, the recording light being condensed for information recording, and increases the temperature in the vicinity of a focus so as to form a recording mark and that has properties of increasing a light absorption amount with respect to the wavelength of the recording light by heating performed at a temperature of 120° C. or more.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: November 6, 2012
    Assignee: Sony Corporation
    Inventors: Yusuke Suzuki, Takao Kudo, Kazuya Hayashibe, Hiroshi Uchiyama
  • Patent number: 8293147
    Abstract: A laser-writable molding material containing A) at least one polymer material or at least one precursor compound which can be polymerised to give a polymer material, and B) a particulate salt-like compound or a mixture of particulate salt-like compounds, which under the influence of laser light changes its color or leads to a color change in the component A). In order to enlarge the range of matrix materials hitherto available for laser writing and to overcome the disadvantages of the previously used writing procedures for such matrix materials, the laser-writable molding material according to the invention is characterised in that the at least one polymer material of the component A) is selected from polymer compounds having siloxane crosslinking units.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: October 23, 2012
    Assignee: Chemische Fabrik Budenheim KG
    Inventors: Gerhard Scheuer, Joachim Markmann, Gunnar Buehler, Hans-Dieter Naegerl, Thomas Futterer, Ruediger Wissemborski
  • Patent number: 8293448
    Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: October 23, 2012
    Assignees: CMET Inc., Ube Industries, Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
  • Patent number: 8241841
    Abstract: The present invention provides a process for producing a surface-modified layer system comprising a substrate (2) and a self-assembled monolayer (SAM) (1) anchored to its surface. The SAM (1) is comprised by aryl or rigid alicyclic moiety species. The process comprises providing a polymorphic SAM (1) anchored to the substrate (2), and thermally treating (4) the SAM to change from a first to a second structural form thereof. The invention also provides a thermolithographic form of process in which the thermal treatment (4) is used to transfer a pattern (3) to the SAM (1), which is then developed.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: August 14, 2012
    Assignee: The University Court of the University of St. Andrews
    Inventors: Manfred Buck, Piotr Cyganik
  • Patent number: 8227048
    Abstract: The present invention provides a clear, low viscosity photocurable composition including (i) a cationically curable compound (ii) an acrylate-containing compound (iii) a polyol-containing mixture (iv) a cationic photoinitiator and (v) a free radical photoinitiator. The photocurable composition can be cured using rapid prototyping techniques to form opaque-white three-dimensional articles having ABS-like properties.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: July 24, 2012
    Assignee: 3D Systems, Inc.
    Inventors: Richard N. Leyden, Laurence Messe, Frank Tran, David L. Johnson, John Wai Fong, Carole Chapelat, Ranjana C. Patel
  • Patent number: 8193307
    Abstract: A polymer for use in photoresist compositions is synthesized by effecting polymerization reaction to form a polymerization product mixture and subjecting the mixture to molecular weight fractionation by a liquid phase separation technique using a good solvent and a poor solvent. The fractionation step is iterated at least twice, and one iteration of fractionation includes adding a good solvent which is different from the good solvent added in the other iteration of fractionation.
    Type: Grant
    Filed: July 22, 2008
    Date of Patent: June 5, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takanobu Takeda, Tamotsu Watanabe
  • Patent number: 8173347
    Abstract: A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.
    Type: Grant
    Filed: August 11, 2005
    Date of Patent: May 8, 2012
    Assignee: The Trustees of Columbia University in the City of New York
    Inventors: Jeffrey T. Koberstein, Feng Pan, Kwangjoo Lee, Peng Wang
  • Patent number: 8173029
    Abstract: According to one embodiment, a cured first ultraviolet-curing resin material layer having a first three-dimensional pattern is formed on a first principal surface of a magnetic recording medium having a central hole. A cured second ultraviolet-curing resin material layer having a second three-dimensional pattern is formed on a second principal surface opposite to the first principal surface of the magnetic recording.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: May 8, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Seiji Morita, Shinobu Sugimura, Kazuyo Umezawa, Masatoshi Sakurai
  • Patent number: 8168689
    Abstract: A high optical contrast pigment and colorful photosensitive composition employing the same are disclosed. The composition comprises a solvent, an alkali-soluble resin, reactive monomer, and a modified pigment which has low crystallization. The low crystallization degree means that the grain size variation R is not more 80%, wherein the grain size variation R is represented by a formula R=G1/G0×100%, G0 is the original grain size, and G1 is the grain size after modification.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: May 1, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Chin-Cheng Weng, Kuo-Tung Huang, I-Jein Cheng, Ming-Tzung Wu, Yu-Ying Hsu, Chiang-Yun Li
  • Patent number: 8129092
    Abstract: The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern such as an ArF resist having a line pattern or the like, can thicken the resist pattern regardless of the size of the resist pattern; which has excellent etching resistance; and which is suited for forming a fine space pattern or the like, exceeding the exposure limits. The present invention also provides a process for forming a resist pattern and a method for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.
    Type: Grant
    Filed: February 27, 2006
    Date of Patent: March 6, 2012
    Assignee: Fujitsu Limited
    Inventors: Miwa Kozawa, Koji Nozaki
  • Patent number: 8106107
    Abstract: A radiation curing composition suitable for building a three-dimensional object by a solid freeform method is disclosed. The composition includes one or more mono-functional monomers where a respective polymer has a Glass Transition Temperature higher than about 60° C., one or more di-functional oligomers where a respective polymer has a Glass Transition Temperature lower than about 40° C. and a filler that comprises particles having an average diameter of less than 100 nm. The functional groups of the components may include meth(acrylic) and the composition has a viscosity of about 50-500 cps at ambient temperature. Further, the concentration of the mono-functional monomer may be at least 30% by weight elative to the total weight of the composition and the concentration of the di-functional oligomer may be at least 20% by weight elative to the total weight of the composition.
    Type: Grant
    Filed: December 8, 2010
    Date of Patent: January 31, 2012
    Assignee: Objet Geometries Ltd.
    Inventor: Eduardo Napadensky