Abstract: Provided are a curable composition including a pigment, a resin, a polymerizable compound, a photopolymerization initiator, and a solvent; a film formed of the curable composition; a structural body; a color filter; a solid-state imaging element; and an image display device. The resin includes a resin A which includes a repeating unit having a graft chain of a poly(meth)acrylate structure and a repeating unit having an acid group, and the graft chain of a poly(meth)acrylate structure includes a repeating unit represented by the following formula. R1 represents a hydrogen atom or a methyl group, and R2 represents a hydrocarbon group having 1 to 20 carbon atoms. However, R1 is a hydrogen atom in a case where R2 is a methyl group, and R2 is a hydrocarbon group having 2 or more carbon atoms in a case where R1 is a methyl group.

Abstract: An additive manufacturing process for forming a metallic layer on the surface of the substrate includes fabricating a substrate from a polymerizable composition by a stereolithographic process, and contacting the reactive surface with an aqueous solution including a metal precursor. The metal precursor includes a metal, and the polymerizable composition includes a multiplicity of multifunctional components. Each multifunctional component includes a reactive moiety extending from a surface of the substrate to form a reactive surface. An interface between the reactive surface and the aqueous solution is selectively irradiated to form nanoparticles including the metal in a desired pattern. The nanoparticles are chemically coupled to the reactive surface by reactive moieties, thereby forming a metallic layer on the surface of the substrate.

Abstract: A lithographic printing plate precursor has an infrared radiation-sensitive image-recording layer containing an IR absorber, and an ozone-blocking material of 1500 or less molecular weight and has structure (I), (II), or (III): wherein R is a hydrocarbon having 14-30 carbon atoms; m is 1 or 2; n is 1-6; the sum of m and n is >2 and <8; and A is a multivalent organic moiety free of R and OH groups and has a valence m+n; wherein R1 and R2 are alkyl groups of 14-22 carbon atoms, and o is 1-3; R3C(?O)NR4R5?? (III) wherein R3 is an alkenyl with a C?C bond within a carbon-carbon chain of 16-30 carbons, and R4 and R5 are hydrogen or unsubstituted alkyls of 1-4 carbon atoms. Such ozone-blocking materials can be used to protect infrared radiation-sensitive dyes that may be degraded by ozone and thus improve imaging sensitivity.

Abstract: A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a quencher containing a sulfonium salt having the formula (A).

Abstract: [Problem] To provide a radiation curable resin composition which is suitable as a primary material for optical fibers, while having a high curing rate by means of irradiation of radiation [Solution] A radiation polymerizable composition for forming an optical fiber primary coating layer, said composition containing: (A) a urethane oligomer containing a structure represented by formula (I) (in formula (I), R represents a vinyl group; and * represents a bonding hand); (B) one or more compounds selected from among (i) maleic acid anhydride, (ii) a compound represented by formula (II) (in formula (II), RI represents a single bond or an alkanediyl group having from 1 to 6 carbon atoms; and R2 represents a hydrogen atom, a hydroxy group or a specific group represented by formula (II-1) or formula (II-2)), and (iii) a compound represented by formula (III) (in formula (III), R5 represents an alkanediyl group having from 1 to 6 carbon atoms); and (C) a radiation polymerization initiator.

Abstract: The composition contains a compound and a solvent. The compound includes a group represented by formula (1). The compound has a molecular weight of no less than 200 and has a percentage content of carbon atoms of no less than 40% by mass. In the formula (1), R1 and R2 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 taken together represent a part of an alicyclic structure having 3 to 20 ring atoms constituted together with the carbon atom to which R1 and R2 bond; Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an arene or heteroarene having 6 to 20 ring atoms; and X represents an oxygen atom, —CR3R4—, —CR3R4—O— or —O—CR3R4—.

Abstract: The invention relates to a process for the production of relief printing plates, where a carrier with a polymeric substrate layer is provided and a relief is formed layer-by-layer on a surface of the substrate layer, where the relief is formed by means of a) single or multiple application of a liquid comprising at least one reactive monomer to the surface of the substrate layer, b) diffusion of the reactive monomer into the polymeric substrate layer for a prescribed exposure time and c) hardening of the relief, where in step a) the liquid is applied in accordance with an image to the surface and where, after the prescribed exposure time of step b), any liquid that remains on the surface, having not diffused into the material, is removed from the surface, and in step c) the relief that is hardened comprises the polymer of the substrate layer and reactive monomer that has diffused into the material.

Abstract: A photosensitizer formulation can be disposed on or in a mesh; net; netting; screen; curtain of strands, fibers, or monofilaments; substrate, personal protective gear, mask, or any other suitable object. The photosensitizer formulation, when in contact with molecular oxygen and activated by light or ultrasound, produces microbicidal singlet oxygen. A variety of different arrangements and applications are described. For example, an air flow device may also be included to generate a flow of air through or over the photosensitizer formulation. A fluorescent formulation may be included to monitor photobleaching. The photosensitizer formulation may be disposed in a concentration gradient to generate antigenic particles by damaging or destroying microbes.

Abstract: A resist composition comprising a base polymer and an onium salt of N-carbonylsulfonamide having iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.

Abstract: A method for coating a separator for a battery includes creating an electrostatic field and disposing a substrate material within the electrostatic field. The method further includes applying a coating material to the substrate material in a presence of the electrostatic field and drying the coating material upon the substrate material.

Abstract: The present invention relates to a pigment water dispersion containing a pigment, a crosslinked polymer and water, in which the crosslinked polymer is prepared by crosslinking a carboxy group-containing polymer with a crosslinking agent, and has an acid value of not less than 70 mgKOH/g and not more than 300 mgKOH/g; and the pigment water dispersion further contains a formaldehyde-releasing compound. The pigment water dispersion of the present invention is excellent in storage stability even when being stored under high-temperature conditions for a long period of time.

Abstract: A resist composition contains a polymer-bound acid generator, specifically a polymer comprising recurring units derived from a sulfonium or iodonium salt having a polymerizable unsaturated bond and containing iodine in the linker between the polymerizable unsaturated bond and a fluorosulfonic acid. The resist composition offers a high sensitivity and improved CDU independent of whether it is of positive or negative tone.

Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including a polymer compound (A1) which has a constitutional unit (a0) derived from a compound represented by Formula (a0-1) and a constitutional unit (a10) derived from a compound represented by Formula (a10-1) and does not have a constitutional unit represented by Formula (1). In the formulas, Rax0 and Rax1 represent a polymerizable group-containing group; Wax0 and Wax1 represent an (nax0+1)-valent or (nax1+1)-valent aromatic hydrocarbon group; nax0 and nax1 represent an integer of 1 to 3; and Z2 represents Fe, Co, Ni, Cr, or Ru.

Abstract: Provided are a pattern forming method including a step of applying a composition for forming an upper layer film, containing a resin having a C log P(Poly) of 3.0 or more and at least one compound selected from the group consisting of (A1) to (A4) described in the specification onto a resist film to form an upper layer film, a step of exposing the resist film, and a step of developing the exposed resist film with a developer including an organic solvent; a resist pattern formed by the pattern forming method; a method for manufacturing an electronic device, including the pattern forming method; and the composition for forming an upper layer film.

Abstract: A resist composition comprising a polymer-bound acid generator, i.e., a polymer comprising recurring units derived from a sulfonium or iodonium salt having a brominated linker between a polymerizable unsaturated bond and a fluorosulfonic acid offers a high sensitivity and reduced LWR or improved CDU independent of whether it is of positive or negative tone.

Abstract: The present invention relates to an aqueous coating composition system for the treatment of cellulosic articles, which includes a first aqueous composition having a pH of at least 10 and comprises potassium silicate and a penetration aiding agent, wherein the potassium silicate is present in a range of from 1.5 to 32% by weight, the molar ratio of silicon (Si) to potassium (K) of said potassium silicate is 1.2-2.1; and a second aqueous composition comprising an emulsion of at least one alkoxy silane and/or siloxane compound. The present invention further relates to a method for treating cellulosic articles and uses thereof.

Abstract: This resist pattern forming method comprises: a step for coating a substrate with a chemically amplified resist; a subsequent step for forming a latent image of a pattern by exposing the resist film on the substrate; a subsequent step for irradiating the exposed resist film selectively with infrared light from a first heating source having wavelengths 2.0-6.0 ?m; a subsequent step for heating the substrate by means of a second heating source that is different from the first heating source for the purpose of diffusing an acid that is produced in the resist film by exposure; and a subsequent step for forming a pattern of the resist film by supplying a developer liquid to the substrate. Consequently, roughening of sidewalls of the resist pattern can be suppressed.

Abstract: A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of specific structure has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.

Abstract: Embodiments of the inventive concepts provide a method for manufacturing a semiconductor device. The method includes forming a stack structure including insulating layers and sacrificial layers which are alternately and repeatedly stacked on a substrate. A first photoresist pattern is formed on the stack structure. A first part of the stack structure is etched to form a stepwise structure using the first photoresist pattern as an etch mask. The first photoresist pattern includes a copolymer including a plurality of units represented by at least one of the following chemical formulas 1 to 3, wherein “R1”, “R2”, “R3”, “p”, “q” and “r” are the same as defined in the description.

Abstract: Pre-ceramic monomer formulations for creating self-propagating polymer waveguides, and a system and method of using the same, is disclosed. The formulation includes a plurality of unsaturated molecules, wherein the unsaturated molecules contain a significant amount of non-carbon atoms, a molecule having structure of R?—X1-H (e.g., X1=O, S, N), and a photoinitiator. R? can also have non-carbon atoms. The system includes a light source, a reservoir having a monomer formulation and a patterning apparatus configured to guide a light beam from the light source into the pre-ceramic monomer formulation to form at least one self-propagating polymer waveguide and can be directly converted to interconnected three-dimensional ceramics.

Abstract: A lithographic printing plate precursor includes (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, and (ii) a coating including a photopolymerisable layer, characterised in that the photopolymerisable layer includes a compound including at least one free radically polymerisable group and at least one moiety having a structure according to Formula (I): wherein X represents O or NR* and R* represents hydrogen, an optionally substituted alkyl, aryl, aralkyl or heteroaryl group; and * denotes the linking positions to the rest of the compound.

Abstract: A dental cement hardened by a cement reaction involving the specific polymerizable polyacidic polymer and optionally additional crosslinkable groups, has reduced shrinkage and improved mechanical properties, in particular with regard to flexural strength and fracture toughness. Moreover, the specific polymerizable polyacidic polymer of the present invention contains a high number of acidic groups which is not reduced by the presence of polymerizable moieties, whereby water solubility of the uncured polymer is not impaired by the presence of the polymerizable moieties.

Abstract: A process for producing a water-soluble, hydrolysis-stable, polymerizable polymer, comprising a) a step of copolymerizing a mixture comprising (i) a first copolymerizable monomer comprising at least one optionally protected carboxylic acid group and a first polymerizable organic moiety, and (ii) a second copolymerizable monomer comprising one or more optionally protected primary and/or secondary amino groups and a second polymerizable organic moiety, for obtaining an amino group containing copolymer; b) a step of coupling to the amino group containing copolymer a compound having a polymerizable moiety and a functional group reactive with an amino group of repeating units derived from the second copolymerizable monomer in the amino group containing copolymer obtained in the first step wherein the optionally protected amino group is deprotected, so that polymerizable pendant groups are linked to the backbone by hydrolysis-stable linking groups, and, optionally, a step of deprotecting the protected carboxylic ac

Abstract: Disclosed are a packaging structure, a packaging method and a template used in packaging method. The packaging structure comprises: a substrate; a chip mounted on the substrate; bonding wires for electrically connecting the substrate to the chip; and a protective layer which is formed on the substrate and is used for covering the chip, the bonding wires and bonding pads connected to the bonding wires, the size of the protective layer being smaller than that of the substrate. The packaging structure, the packaging method and the template used in packaging method can solve the problems in the prior art of the great difficulty in designing a mold chase, a complicated molding process, a high manufacturing cost and a high molding material consumption.

Abstract: A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L?-C(CF3)2(OH). L? is a divalent linking group comprising at least one carbon and the starred bond of L? is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.

Abstract: Fingerprint-erasing cured films for rendering fingerprint depositions on various surfaces quickly less visible, or invisible; a manufacturing method therefor; a display or touch panel using the same; and electronic devices using these are provided. A liquid coating film including a solvent and a polymerizable resin composition curable by an activating energy beam is formed. In a state of the solvent being included within the film, the film is cured to form a cured film containing the solvent, preferably using a release material whose surface has undergone matte processing; and the solvent is evaporated in a subsequent drying step, whereby a cured film with a multitude of micropores on the surface is formed. Fingerprint soiling is rendered not readily visible or invisible. By using the cured film, there are obtained displays, touch panels, and electronic devices having fingerprint-erasability. To improve fingerprint-erasability, adding a water-absorbent compound to the film composition is preferable.

Abstract: The present invention provides a conductive material including: (A) a ?-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively represented by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more metal oxide nanoparticles whose metal oxide is selected from indium-tin oxides, tin oxides, antimony-tin oxides, antimony-zinc oxides, antimony oxides, and molybdenum oxides having a particle diameter of 1 to 200 nm. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.

Abstract: A photocurable relief image printing element is described. The photocurable relief image printing element comprises (a) a support layer; (b) one or more photocurable layers disposed on the support layer, wherein the one or more photocurable layers comprise: (i) a binder; (ii) one or more monomers; (iii) a photoinitiator; and (iv) an additive selected from the group consisting of phosphites, phosphines, thioether amine compounds, and combinations of one or more of the foregoing; (c) a laser ablatable masking layer disposed on the one or more photocurable layers, the laser ablatable masking layer comprising a radiation opaque material; and (d) optionally, a removable coversheet. The photocurable relief image printing element provides improved surface cure in digital relief image printing elements.

Abstract: A photoresist composition comprising: a resin (A1) which has an acid-labile group; a resin (A2) which comprises a structural unit represented by formula (I); wherein R1 represents a C1-C13 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1-C6 alkanediyl group, or *-A2-X1-(A3-X2)a-(A4)b-, and R2 represents a C1-C18 hydrocarbon group; and an acid generator.

Abstract: A photosensitive resin composition for CTP flexographic printing original plate containing at least a hydrophobic polymer obtained from water-dispersible latex (A), a hydrophilic polymer (B), a photopolymerizable unsaturated compound (C), a photopolymerization initiator (D), and if necessary, rubber (E), characterized in that, the photopolymerizable unsaturated compound (C) comprises a photopolymerizable oligomer containing no hydroxyl group (C-1), a hydroxyl group-containing photopolymerizable monomer having a pentaerythritol skeleton, a dipentaerythritol skeleton or a glycerol skeleton (C-2) and, optionally, a photopolymerizable monomer containing no hydroxyl group (C-3). The content of the hydroxyl group-containing photopolymerizable monomer (C-2) is 1 to 20% by mass of the photosensitive resin composition. The content of the rubber (E) is preferably 0.5 to 15% by mass of the photosensitive resin composition.

Abstract: A method of producing a relief image printing element from a photocurable printing blank. The method includes the steps of a) providing a photocurable printing blank, the photocurable printing blank comprising (i) a backing or support layer; and (ii) one or more photocurable layers disposed on the backing or support layer. The one or more photocurable layers are selectively imaged by exposing the layers to actinic radiation to selectively crosslink and cure portions of the one or more photocurable layers, and then developed to remove uncured portions of the one or more photocurable layers and reveal the relief image therein. The relief image comprises a plurality of relief printing dots, including relief printing dots that have a rounded top and relief printing dots that have a flat top.

Abstract: A polymer compound for a conductive polymer including one or more repeating units represented by general formula (1), which has been synthesized by ion-exchange of a lithium salt, sodium salt, potassium salt, or nitrogen compound salt of a sulfonic acid residue, and has a weight average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or methyl group, R2 represents a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms which may have either or both of an ether group and an ester group, and Z represents a phenylene group, naphthylene group, or ester group. There can be provided a polymer compound for a conductive polymer having a specific super strongly acidic sulfo group, which is soluble in an organic solvent, and suitably used for a fuel cell or dopant for a conductive material.

Abstract: A shrink material is provided comprising a polymer comprising recurring units of formula (1) and a solvent containing an anti-vanishing solvent. A pattern is formed by applying a resist composition comprising a base resin and an acid generator onto a substrate to form a resist film, exposing, developing in an organic solvent developer to form a negative resist pattern, applying the shrink material onto the pattern, and removing the excessive shrink material with an organic solvent for thereby shrinking the size of holes and/or slits in the pattern.

Abstract: An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4 and R5 each independently represent a monovalent hydrocarbon group, or the like. R6 and R7 each independently represent a monovalent hydrocarbon group, or the like. R8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R9 represents a monovalent hydrocarbon group, or the like. R10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R11 and R12 each independently represent a monovalent hydrocarbon group, or the like. R13 and R14 each independently represent a monovalent hydrocarbon group, or the like.

Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

Abstract: An electrically responsive composite material (1110) specially adapted for touch screen, comprising a carrier layer (1301) having a length and a width and a thickness (1303) that is relatively small compared to said length and said width. The composite material also comprises a plurality of electrically conductive or semi-conductive particles (201). The particles (201) are agglomerated to form a plurality of agglomerates (104, 1403) dispersed within the carrier layer such that each said agglomerate comprises a plurality of the particles (201). The agglomerates are arranged to provide electrical conduction across the thickness of the carrier layer in response to applied pressure such that the electrically responsive composite material has a resistance that reduces in response to applied pressure.

Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Abstract: The present invention provides a polymer compound which comprises both repeating unit “a” represented by the following general formula (1-1) and repeating unit “b” represented by the following general formula (1-2), and has a weight average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or a methyl group, R2 represents a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms which may have either or both of an ether group and an ester group, Z represents a phenylene group, a naphthylene group, or an ester group, and “a” and “b” satisfy 0<a<1.0 and 0<b<1.0. There can be provided a polymer compound having a specific super strongly acidic sulfo group, which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material.

Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

Abstract: The present invention has an objective of providing a composition for a lithographic printing plate, which provides an image-forming layer exhibiting superior ink receptivity and uniformity, and in which a coating solution containing the composition possesses a good defoaming property and can effectively form an image-forming layer at high speed. In addition, the present invention has another objective of providing a lithographic printing plate precursor or a dummy plate which can be produced at high speed with superior production efficacy. The present invention provides a composition for a lithographic printing plate containing a fluoroaliphatic group-containing copolymer having a specific chemical structure, the lithographic printing plate precursor or a dummy plate containing a layer having the aforementioned composition.

Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, m and Z1+ are defined in the specification.

Abstract: Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.

Abstract: A photocurable relief image printing element is described. The photocurable relief image printing element comprises (a) a support layer; (b) one or more photocurable layers disposed on the support layer, wherein the one or more photocurable layers comprise: (i) a binder; (ii) one or more monomers; (iii) a photoinitiator; and (iv) an additive selected from the group consisting of phosphites, phosphines, thioether amine compounds, and combinations of one or more of the foregoing; (c) a laser ablatable masking layer disposed on the one or more photocurable layers, the laser ablatable masking layer comprising a radiation opaque material; and (d) optionally, a removable coversheet. The photocurable relief image printing element provides improved surface cure in digital relief image printing elements.

Abstract: A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.

Abstract: There is disclosed an acid generator generating a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: As a result, there is provided a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of exposure margin and MEF particularly without degradation of resolution and can be effectively and widely used, a chemically amplified resist composition using the same, and a patterning process.

Abstract: A fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). And a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

Abstract: A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 ?m, to reduce the sodium content of the polymerization initiator solution to not more than 300 ppb with respect to the weight of the polymerization initiator. Further, the method for producing a copolymer for semiconductor lithography includes a polymerization step wherein the polymer for semiconductor lithography is synthesized by a radical polymerization reaction in the presence of a polymerization initiator purified by the above purification method.