Abstract: Some embodiments include methods of patterning a base. First and second masking features are formed over the base. The first and second masking features include pedestals of carbon-containing material capped with silicon oxynitride. A mask is formed over the second masking features, and the silicon oxynitride caps are removed from the first masking features. Spacers are formed along sidewalls of the first masking features. The mask and the carbon-containing material of the first masking features are removed. Patterns of the spacers and second masking features are transferred into one or more materials of the base to pattern said one or more materials. Some embodiments include patterned bases.

Abstract: An inorganic electron beam sensitive oxide layer is formed on a carbon based material layer or an underlying layer. The inorganic electron beam sensitive oxide layer is exposed with an electron beam and developed to form patterned oxide regions. An ultraviolet sensitive photoresist layer is applied over the patterned oxide regions and exposed surfaces of the carbon based material layer, and subsequently exposed with an ultraviolet radiation and developed. The combined pattern of the patterned ultraviolet sensitive photoresist and the patterned oxide regions is transferred into the carbon based material layer, and subsequently into the underlying layer to form trenches. The carbon based material layer serves as a robust mask for performing additional pattern transfer into the underlying layer, and may be easily stripped afterwards. The patterned ultraviolet sensitive photoresist, the patterned oxide regions, and the patterned carbon based material layer are subsequently removed.

Abstract: Provided are a method for manufacturing a transparent electrode pattern and a method for manufacturing an electro-optic device having the transparent electrode pattern. The method for manufacturing the transparent electrode pattern includes forming a transparent electrode on a light-transmissive substrate, patterning the transparent electrode by removing a portion of the transparent electrode, and forming an insulating protective layer in an edge region of the patterned transparent electrode through a printing process. In accordance with the method, the insulating protective layer is formed in the edge region of the patterned transparent electrode through the printing process so that an apparatus and method for manufacturing the insulating protective layer can be simplified, resulting in a decrease in manufacturing cost.

Abstract: A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.

Abstract: A method of forming a thin film pattern includes: providing a printing roller and a substrate including a thin film; coating the printing roller with an etch-resist solution including a base polymer, a carrier solvent, a tackifier and a surfactant; removing the carrier solvent from the coated etch-resist solution thereby transitioning the etch-resist solution from liquid phase to solid phase; patterning the solid etch-resist; transferring the patterned etch-resist from the printing roller to the substrate; and patterning the thin film corresponding to the transferred etch-resist.

Abstract: A method of manufacturing a multilayer thin film pattern includes forming a metal film over a substrate, forming a second thin film over the metal film, forming a resist pattern over the second thin film, etching the second thin film using the resist pattern as a mask, transforming the resist pattern using an organic solvent or a RELACS agent to cover an edge face of the etched second thin film and etching the metal film while the edge face of the second thin film is covered with the resist pattern.

Abstract: An inorganic electron beam sensitive oxide layer is formed on a carbon based material layer or an underlying layer. The inorganic electron beam sensitive oxide layer is exposed with an electron beam and developed to form patterned oxide regions. An ultraviolet sensitive photoresist layer is applied over the patterned oxide regions and exposed surfaces of the carbon based material layer, and subsequently exposed with an ultraviolet radiation and developed. The combined pattern of the patterned ultraviolet sensitive photoresist and the patterned oxide regions is transferred into the carbon based material layer, and subsequently into the underlying layer to form trenches. The carbon based material layer serves as a robust mask for performing additional pattern transfer into the underlying layer, and may be easily stripped afterwards. The patterned ultraviolet sensitive photoresist, the patterned oxide regions, and the patterned carbon based material layer are subsequently removed.

Abstract: In a method of manufacturing an imprint substrate, a concave pattern, which is recessed, is formed on a top surface of the mold substrate. A light blocking layer is formed on the concave pattern and the top surface of the mold substrate. After bonding an adhesive substrate to the mold substrate such that the adhesive substrate faces the mold substrate, the adhesive substrate is separated from the mold substrate, so that the light blocking layer on the top surface is removed from the mold substrate. An imprint substrate having the light blocking layer only on the concave pattern is formed.

Abstract: An actinic energy ray-curable resin is obtained by reacting an unsaturated monocarboxylic acid (c) with a terminal epoxy group of an epoxy resin having an unsaturated group and a hydroxyl group in its side chains and an epoxy group in its terminal and further reacting a polybasic acid anhydride (d) with the hydroxyl group of the above-mentioned epoxy resin, wherein the above-mentioned epoxy resin is a product of the polyaddition reaction of a reaction product (I) of a polybasic acid anhydride (a) and a compound (b) having at least one unsaturated double bond and one alcoholic hydroxyl group in its molecule, a compound (II) having at least two carboxyl groups in its molecule, and a bifunctional epoxy compound (III), wherein at least either one of the carboxyl group-containing compound (II) and the bifunctional epoxy compound (III) is a compound containing no aromatic ring.

Abstract: A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.

Abstract: Imageable printing forms are irradiated by radiant energy corresponding to the image information, the energy being absorbed in the printing form. The energy coupled in this manner is available for patterning the printing form surface. A printing form having a plurality of substantially planar functional zones, which have at least one informational zone that is modifiable in accordance with image information and an absorption zone for absorbing energy from a radiation is distinguished in that a buffer zone is provided which differs at least partially from the absorption zone, receives energy from the absorption zone, and releases energy to the informational zone.

Abstract: To provide production methods for a 3-D mold, a finely processed product, and a fine pattern molded product in which the depth and the line width can be formed with high precision, a 3-D mold, a finely processed product, a fine-pattern molded product, and an optical element formed with high precision.

Abstract: A method of manufacturing an electronic device is provided wherein an interconnect is made using 193 nm lithography. No deformation of the desired linewidth takes place in that during a plasma gas is used which dissociates in low-weight ions. The electronic device is particularly an integrated circuit.

Abstract: A nozzle plate for a micro-fluid ejection head, a method of making a hydrophobic nozzle plate, and a method for improving the resiliency of a nozzle plate. The nozzle has a photoimageable hydrophobic polycyclic polyolefin layer derived from an epoxy functionalized polynorbornene.

Abstract: A photosensitive planographic printing plate comprising a substrate and a photosensitive layer including a photopolymerizable compound, wherein the photosensitive layer and the substrate are provided between them with an undercoat layer including a (co)polymer having structural units having ethylenically unsaturated groups bonded with silicon atoms and phosphonic acid groups.

Abstract: According to an aspect of the invention, there is provided a pattern forming method comprising forming an underlayer film on a film to be worked which has been formed on a semiconductor substrate, subjecting the underlayer film to an oxidizing treatment, forming an intermediate film which becomes a mask of the underlayer film, forming a resist film on the intermediate film, exposing the resist film to light to form a resist pattern, transferring the resist pattern onto the intermediate film to form an intermediate film pattern, and transferring the intermediate film pattern onto the underlayer film to form an underlayer film pattern.

Abstract: A CD-SEM (critical dimension-scanning electron microscope) system may utilize a technique for characterizing and reducing shrinkage carryover due to CD-SEM measurements. The system may identify the affects of CD-SEM measurements on the resist and adjust the operating parameters for a particular resist to avoid or significantly reduce shrinkage carryover. In this manner, the system may obtain more reliable CD measurements and avoid damage to the measured feature.

Abstract: A method for structuring a surface includes, by an assigned modification device, creating a latent structure of at least a first layer of the surface, which has a polymer therein, so as to form hydrophilic and hydrophobic regions for producing a printing form for offset printing, by selectively applying a gaseous, readily volatile solvent as a modifying agent to at least one locally limited region of the surface over at least one exposure time interval. A device for performing the method, a printing form exposer, a printing unit and a printing machine including the surface-structuring device according to the invention, are also provided.

Abstract: In order to simplify the sequence of creating a mask, in particular for producing a printing plate, and at the same time to improve the quality of the printing plate produced by means of a mask, the use of laser-induced thermal transfer is provided. The structure information is applied directly to the surface of a printing plate carrier during the creation of a mask, by means of a thermal transfer film and a laser image-setting unit, so that by means of the structure information applied, differentiation with regard to image points and non-image points can be carried out directly in order to produce a printing plate.

Abstract: This invention relates to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10, 110, 210) is formed having a substrate (12, 112, 212) and a charge dissipation layer (20, 120, 220), and a patterned imageable relief layer, (16, 116, 216) formed on a surface (14, 114, 214) of the substrate (10, 110, 210) using radiation. The template (10, 110, 210) is used in the fabrication of a semiconductor device (344) for affecting a pattern in the device (344) by positioning (338) the template (10, 11, 210) in close proximity to semiconductor device (344) having a radiation sensitive material (334) formed thereon and applying a pressure (340) to cause the radiation sensitive material to flow into the relief image present on the template (10, 110, 210).

Abstract: The present invention provides a patterned substrate and methods of forming patterns on a substrate, in which a thermally sensitive composition composed of an inorganic nanopaste is applied onto a surface of a substrate to form a layer. The layer may be imaged and developed to form a pattern area that adheres to the surface of the substrate. The patterned substrate may be used in the production of printing plates and masks.

Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm, particularly 193 nm. Resists of the invention comprise a polymer that is preferably substantially free of aromatic moieties and comprises photoacid-labile repeat units, a photoactive components such as one or more photoacid generator compounds and a solvent component that comprises methyl isoamyl ketone (5-methyl-2-hexanone).

Abstract: A method is disclosed for the induction of a suitable band gap and electron emissive properties into a substance, in which the substrate is provided with a surface structure corresponding to the interference of electron waves. Lithographic or similar techniques are used, either directly onto a metal mounted on the substrate, or onto a mold which then is used to impress the metal. In a preferred embodiment, a trench or series of nano-sized trenches are formed in the metal.

Abstract: A method of creating an undercut sidewall profile within an opening formed in a positive resist layer disposed upon a transparent substrate includes the step of forming a positive resist layer on the upper surface of the substrate, and optically patterning the resist layer by selectively directing light at the resist layer from above the upper surface of the substrate. The lower surface of the substrate is flooded with light to partially expose the lowermost region of the resist layer, and the exposed resist is dissolved to form patterned openings therein. The resulting sidewalls of the patterned resist openings have an enlarged width adjacent the upper surface of the substrate. The sidewalls of the resist layer are then flooded with light from above the substrate, the upper region of the resist layer is cured by an electron beam, and the resist layer is developed a second time to dissolve exposed portions of the resist sidewalls, thereby forming an undercut resist sidewall profile.

Abstract: A manufacturing method of a stamper for optical information medium comprises forming a photoresist layer on a substrate, irradiating the photoresist layer with laser beam to form a latent image thereon, developing the latent image so that a protrusion/depression pattern is formed to produce a photoresist master, and then transferring the protrusion/depression pattern to a metal film, wherein a photoresist master having an organic material layer provided in contact with the photoresist layer between the substrate and the photoresist layer is used.

Abstract: This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (20, 30, 42) is formed having a substrate (22, 32) and a template pedestal (24, 34) having formed thereon an uppermost surface an etched pattern or relief image (26, 36, 48). The template (20, 30, 42) is used in the fabrication of a semiconductor device (44) for affecting a pattern in the device (44) by positioning the template (20, 30, 42) in close proximity to semiconductor device (44) having a radiation sensitive material (50) formed thereon and applying a pressure (52) to cause the radiation sensitive material (50) to flow into the relief image (48) present on the template (42).

Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.

Abstract: In order to simplify the sequence of creating a mask, in particular for producing a printing plate, and at the same time to improve the quality of the printing plate produced by means of a mask, the use of laser-induced thermal transfer is provided. The structure information is applied directly to the surface of a printing plate carrier during the creation of a mask, by means of a thermal transfer film and a laser image-setting unit, so that by means of the structure information applied, differentiation with regard to image points and non-image points can be carried out directly in order to produce a printing plate.

Abstract: A system and apparatus is provided for preventing damage to gate oxide due to ultraviolet radiation associated with semiconductor processes. Included is a substrate and a gate formed on the substrate. The gate includes a gate material layer and a gate oxide layer stacked on the substrate. A pair of spacers are situated on opposite sides of the gate. Deposited over the gate and the spacers is an ultraviolet radiation blocking material for preventing the ultraviolet radiation from damaging the gate oxide layer of the gate. Finally, at least one metal and intermetal oxide layer is positioned over the ultraviolet radiation blocking material. In an alternate embodiment, instead of the ultraviolet radiation blocking material being deposited over the gate and the spacers, the spacers are constructed from an ultraviolet radiation blocking material for preventing the ultraviolet radiation from damaging the gate oxide layer of the gate.

Abstract: A method for producing at least one decorative pattern on an item includes providing a support having at least one surface and treating a first portion of the surface of the support. The treatment renders the first portion of the surface resistant to metallic coating by at least one type of metallic coating procedure. In addition, the method includes coating a second portion of the surface of the support with a metallic coating such that the metallic coating delimits a decorative pattern. The first portion of the surface corresponds to the decorative pattern.

Abstract: A method of manufacturing a cantilever with tip comprising the steps of forming a tip-like indent in a substrate, depositing a photoresist layer which fills said tip-like indent and covers at least a part of said substrate, and photolithographically structuring said photoresist layer to form said cantilever with tip out of said photoresist.

Abstract: Methods are provided for producing relief images having improved fidelity and resolution. The methods comprise positioning an image-bearing negative transparency closely adjacent and substantially parallel to a layer of a photocurable material; positioning on the other side of the negative from the photocurable material and in substantially parallel relationship thereto; providing a collimator that has first and second opposing major faces and comprises at least one cell that extends from said first collimator face to said second collimator face and is defined by at least one surface that substantially absorbs actinic radiation incident upon said surface; positioning said collimator opposite a photographic negative that is adjacent a layer of photocurable material; and passing actinic radiation through said collimator for a time sufficient to form a latent relief image in the photocurable material.

Abstract: Methods for fabricating nano-structured surfaces having geometries in which the passage of elementary particles through a potential barrier is enhanced are described. The methods use combinations of electron beam lithography, lift-off, and rolling, imprinting or stamping processes.

Abstract: The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for effective deprotection of acid-labile moieties of the polymer.

Abstract: Printing plates having a photoresist layer thereon that can be exposed by a computer controller laser have improved sensitivity and do not require a photomask step. We have found photoresists that include a film forming polymer, an organo azide and a photosensitive dye that absorbs light at the frequency of the patterning laser and converts it to heat energy. The heat energy in turn elevates the temperature of the organo azide above its dissociation temperature, destroying the azide in areas exposed to the light source, and solubilizing those regions.Flood exposure with ultraviolet light hardens the resist and can be performed prior to or after pattern exposure.

Abstract: The present invention provides a dye solution for a photosensitive lithographic printing plate requiring no fountain solution comprising a photosensitive layer and a silicone rubber layer provided in this order on a support, which comprises at least one basic dye, at least one organic solvent having a water solubility of less than 10% at 20.degree. C., at least one hydrotrope agent, and at least one anionic surface active agent represented by the following general formula (I):R.sup.1 O--(CH.sub.2 CH.sub.2 O).sub.n --SO.sub.3 M.sup.1 (I)whereinR.sup.1 represents an alkyl, aryl, aralkyl, alkenyl or alkynyl group;M.sup.1 represents an alkaline metal, NH.sub.4, NH(C.sub.2 H.sub.4 OH).sub.3, NH.sub.2 (C.sub.2 H.sub.4 OH).sub.2 or NH.sub.3 (C.sub.2 H.sub.4 OH); andn represents an integer 1 to 100.

Abstract: In a method of producing master and working pattern plates for etching to form a shadow mask, various etching patterns are needed, for example, a pattern of predetermined holes for passing electron beams, a pattern of register marks necessary for accurate alignment of a pair of obverse and reverse working pattern plates, and a frame pattern for cutting off a portion which is to be a shadow mask from a metal plate by etching process. These individual pattern data required for etching are first prepared and then subjected to logical operation to prepare data representative of a synthetic pattern which is to be finally drawn on a photosensitive plate. Then, all the necessary patterns, including the frame pattern, register mark pattern, hole pattern, etc.

Abstract: Provided is an electrophotographic photoreceptor which comprises an electrically conductive support and a photoconductive layer comprising at least an organic photoconductive compound and an alkali and/or alcohol soluble binder resin provided on said support and which is used for making a lithographic printing plate therefrom by electrophotographically forming a toner image and decoating the photoconductive layer of non-image portion other than the toner image portion by contacting with an alkaline decoating solution, wherein an arithmetical mean deviation of profile (Ra.sub.1) of the surface of said electrically conductive support having said photoconductive layer thereon is 0.3-1.0 .mu.m and a ratio of Ra.sub.2 /Ra.sub.1 of an arithmetical mean deviation of profile (Ra.sub.2) of the surface of said photoconductive layer and the (Ra.sub.1) is 0.5-1.0. The image formed on the printing plate is free from indentation at the edge of the image. Resolution and sharpness of the image are improved.

Abstract: A process for making a metal ledge on one side of a metal screen involves exposing through the stencil screen a photoresist layer, removing unexposed photoresist areas, plating the metal stencil screen where the unexposed photoresist has been removed and removing the exposed photoresist.

Abstract: A method and apparatus for forming a dielectric thin film or pattern thereof is provided in which a positive or negative resist of a desired pattern if formed on various substrates including a semiconductor substrate by contact of the resist with a liquefied gas or super critical fluid of CO.sub.2, NH.sub.3 or the like. Alternatively, a thin film of an organic or inorganic compound dissolved or dispersed in an organic solvent which has been formed on substrate becomes substantially free of any organic matter or functional groups by contact with the liquefied gas or super critical fluid. Semiconductor devices of high performance and high reliability are ensured.

Abstract: A method is provided for producing relief images having improved image fidelity and resolution. The method comprises positioning an image bearing negative transparency closely adjacent and substantially parallel to a layer of a photocurable material; positioning on the other side of the negative from the photocurable material and in substantially parallel relationship thereto at least one louver having a plurality of open cells, each cell extending through the louver along an axis perpendicular to the negative and having reflective side surfaces contoured to reflect and redirect rays of radiant energy incident thereon to a direction more normal to the negative surface; and passing radiant energy which is capable of curing the photocurable material through the louver and the negative and onto and through the photocurable material for a time sufficient to form a latent relief image in the photocurable material.

Abstract: A method for manufacturing lithographic printing plates which comprises developing a presensitized plate for use in making lithographic printing plates imagewise opposed to light with an alkaline developer utilizing an automatic developing machine and then treating the developed presensitized plate with a finisher, wherein an initial pH of the finisher ranges from 2 to 8 and a pH of the finisher is controlled during running in proportion to concentration of the developer included in the finisher. The method makes it possible to prevent the formation of gel-like insoluble matters in the bath for treatment with the finisher due to the presence of the developer carried over from a developing bath and to stably process a large amount of lithographic printing plates over a long time period.

Abstract: A system for the preparation of dot etched lithographic films, consisting essentially of a light sensitive silver halide material for tanning development and an etching solution, in which system the light sensitive material of various layers contains at least one colorant, e.g., pigment or dye with acid groups, which is stable in the processing baths and forms with bases salts soluble in organic solvents, and the etching solution contains a base that ionizes the colorant, and a solvent for the resulting ion pair.

Abstract: A burn-in gumming composition for irradiated and developed offset printing plates comprises water and a water-soluble polymer or copolymer for protecting the plate surface during the burning-in step and during long-term storage. The polymer or copolymer used contains sulfonic acid groups and/or alkali metal sulfonate or ammonium sulfonate groups.

Abstract: A system for the preparation of dot etched lithographic films, consisting essentially of a light sensitive silver halide material for tanning development and an etching solution, in which system the light sensitive material of various layers contains at least one colorant, e.g., pigment or dye with acid groups, which is stable in the processing baths and forms with bases salts soluble in organic solvents, and the etching solution contains a base that ionizes the colorant, and a solvent for the resulting ion pair.

Abstract: A photoengraving article is provided formed of an essentially zinc-free magnesium-based alloy which also contains an amount of calcium effective to control lateral etching and improvement the sharpness of the resultant etched pattern. A method of forming a photoengraved article is also provided. The method comprises the steps of forming a photoengraving article from a photoengraving alloy and etching a pattern on the article in an etching bath. The improvement that comprises forming the photoengraving article from essentially zinc-free magnesium-based alloys containing an amount of calcium effective to control the lateral etching and improve the clarity of the resultant pattern. The article and method do not release zinc into the etching bath. Ultimate release of zinc into the environment is also reduced.

Abstract: A radiation-sensitive recording material comprising a support and first and second radiation-sensitive layers is disclosed. The first radiation-sensitive layer comprises a 1,2-quinone diazide as the radiation-sensitive compound and the second radiation-sensitive layer comprises (a) a compound which forms a strong acid under the action of actinic radiation, (b) a compound which has at least one acid-cleavable C-O-C bond and (c) a polymeric binder. The recording material has an improved storage stability as compared with materials which comprise only radiation-sensitive layers based on acid-cleavable compounds.

Abstract: A method for fabricating a multilayer interconnection system that is fully planar with completely sealed and corrosion resistant conductors separated by dielectric material.

Abstract: A photoengraving article is provided formed of an essentially zinc-free magnesium-based alloy which also contains an amount of calcium effective to control lateral etching and improvement the sharpness of the resultant etched pattern. A method of forming a photoengraved article is also provided. The method comprises the steps of forming a photoengraving article from a photoengraving alloy and etching a pattern on the article in an etching bath. The improvement that comprises forming the photoengraving article from essentially zinc-free magnesium-based alloys containing an amount of calcium effective to control the lateral etching and improve the clarity of the resultant pattern. The article and method do not release zinc into the etching bath. Ultimate release of zinc into the environment is also reduced.

Abstract: A reinforced hard porous ink roll assembly and a method of making same. The ink roll assembly of the invention comprises a hard porous material suitable for inking, the improvement comprising a hard ink resistant material encompassing a substantial portion of the outside surface of the roll to provide reinforcement therefor. A method of making the roll of the invention is also provided in which the hard porous inking material is made by metering the polymeric material which is used to form said hard porous material into a mold in increments, and applying pressure to the mold and polymeric material at each increment. After the mold is filled with the polymeric material, the polymeric material is cured. The roll is cooled and a strip of the mold material is milled to expose a small portion of the hard porous inking material in a straight strip parallel to the longitudinal axis of the roll.