Including Etching Of Substrate Patents (Class 430/310)
  • Patent number: 4592993
    Abstract: A process for fabrication of resist comprising a substrate and an overlying radiation sensitive layer, said overlying layer consisting essentially of a specific polymer or copolymer of vinylnaphthalene.
    Type: Grant
    Filed: October 15, 1985
    Date of Patent: June 3, 1986
    Assignee: Nippon Electric Co., Ltd.
    Inventors: Yoshitake Ohnishi, Takeshi Endo
  • Patent number: 4555302
    Abstract: Method and apparatus for etching light-sensitive photopolymerizable surfaces of printing plates. The apparatus includes a bath of etching fluid (32), a conveyor (38,40,42,52) for conveying printing plates (10) in a prescribed path (54), and transducers (46) mounted above the plates as they are conveyed within the bath and capable of forming longitudinal waves in the etching fluid at generally right angles to the surface of the printing plates. The invention is characterized by directing cleaning fluid between the acoustical radiating surface of the transducers (46) and the surface of the plates (10) in such a manner that the surface to be etched is swept with cleaning fluid of a sufficient velocity and volume as to prevent substantial cavitational erosion of the surface to be etched.
    Type: Grant
    Filed: August 24, 1984
    Date of Patent: November 26, 1985
    Inventor: John C. Urbanik
  • Patent number: 4507331
    Abstract: A dry process for forming a positive tone micro pattern by coating a substrate with an organic polymer film then with a film of an oxygen etch barrier, selected from the group consisting of films of organometallic, including organosilicon compounds and metals, exposing the etch barrier film to a low energy proton beam in a patternwise manner, and developing the pattern by means of oxygen reactive ion etching.
    Type: Grant
    Filed: December 12, 1983
    Date of Patent: March 26, 1985
    Assignee: International Business Machines Corporation
    Inventor: Hiroyuki Hiraoka
  • Patent number: 4468453
    Abstract: The actinic radiation-exposed or unexposed areas, whichever are relatively low in abrasion resistance, formed in a photosensitive composition layer superimposed on a substrate are selectively removed by blowing an abrasive material against the layer, thereby to obtain a desired image in the layer. By utilizing an article body intended for engraving a pattern as the substrate and by further blowing an abrasive material against the article body until the article body comes to have a pattern of desired depth, a pattern-engraved article can be advantageously produced. The above processes are extremely advantageous over the prior art because any solvent is not needed for the development so that the treatment of the waste solvent and the drying step can be eliminated and because a pattern-engraved article can be produced by the dry process in which the number of necessary steps is reduced.
    Type: Grant
    Filed: July 5, 1983
    Date of Patent: August 28, 1984
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Shohei Nakamura, Nobuyasu Kinoshita
  • Patent number: 4461818
    Abstract: Disclosed is a method for making a printing plate which comprises forming a toner image by electrophotography on a master plate which comprises a base and an organic photo-conductive compound-containing layer, the binder for said organic photo-conductive compound being a half ester resin of a styrene-maleic anhydride copolymer and then subjecting non-image areas other than the toner image areas to an etching treatment with a solution mainly composed of an alkali and/or an alcohol. Thus obtained printing plate is excellent in printing endurance and, besides, can be rapidly etched.
    Type: Grant
    Filed: September 24, 1982
    Date of Patent: July 24, 1984
    Assignee: Mitsubishi Paper Mills Ltd.
    Inventors: Shigeyoshi Suzuki, Koji Uchida, Jun Yamada, Takao Senga
  • Patent number: 4439516
    Abstract: This invention is for a photoresist capable of withstanding temperatures in excess of 200.degree. C. without image distortion. The photoresist comprises a high temperature diazo sensitizer, preferably an ester or amide of an o-quinone diazide sulfonic or carboxylic acid chloride, in a binder comprising a polyvinyl phenol. The sensitizer and polyvinyl phenol react with each other at elevated temperature. The sensitizer has a secondary decomposition temperature and the polyvinyl phenol has a flow temperature at least equal to the temperature where reaction between the two occurs.
    Type: Grant
    Filed: March 15, 1982
    Date of Patent: March 27, 1984
    Assignee: Shipley Company Inc.
    Inventors: George J. Cernigliaro, Charles R. Shipley
  • Patent number: 4409115
    Abstract: Etching solution for dot etching photopolymerized materials which comprises an organic polymeric binder having alkali soluble groups, monomer and photoinitiator, the material having an optical density in the actinic region of at least 1.0, wherein a water-soluble salt of a water-insoluble polymeric polycarboxylic acid whose acid strength is the same or less than that of the binder is present as the etching agent.
    Type: Grant
    Filed: September 20, 1982
    Date of Patent: October 11, 1983
    Assignee: E. I. Du Pont de Nemours & Co.
    Inventor: Manfred A. J. Sondergeld
  • Patent number: 4405709
    Abstract: A reusable gravure printing plate or cylinder blank which can be readily processed into a printing plate or cylinder carrying an image to be printed. The blank comprises a non-etchable, wear-resistant layer, as of chromium, overlying at least the surface of a base, and a multiplicity of minute dot-like etchable portions, as of copper, which are of equal size and uniform placement, and which are formed at least in and isolated from each other by the non-etchable layer. The etchable portions are formed flush with the non-etchable layer. For preparation of a gravure printing plate or cylinder from this blank an etching operation is performed on the blank through a prepared etching resist, as with the use of a ferric chloride solution. The etchant forms ink-retaining cells in the etchable portions of the blank.
    Type: Grant
    Filed: March 31, 1981
    Date of Patent: September 20, 1983
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Seiji Katano, Masataka Atsumi
  • Patent number: 4394424
    Abstract: A printing plate is made in accordance with a particular method and is used in a printing process wherein it is effective to produce a substantially continuous tone printing effect. A negative screen having an overall pattern defined by rows of closely spaced substantially square-shaped areas is exposed two times on an image carrier. An image screen pattern is developed on the image carrier wherein each of the two exposures of the overall pattern on the negative screen is effected at an angle of 30.degree. with respect to each other. A unique printing screen pattern is obtained which is then used for printing a reproduced image.
    Type: Grant
    Filed: August 11, 1981
    Date of Patent: July 19, 1983
    Inventor: Frank A. Sportelli
  • Patent number: 4321105
    Abstract: A method for producing embossed designs on work surfaces such as on molds, rolls or dies. A photomechanically imageable transfer material is exposed to the design to be embossed. The material is developed and the acid resistant design material remaining on a backing sheet is mechanically transferred to the work surface by burnishing the back of the backing sheet. The surface is then etched and the acid resistant design elements removed so that the embossed work surface is ready for use.
    Type: Grant
    Filed: January 25, 1980
    Date of Patent: March 23, 1982
    Assignee: Standex International Corporation
    Inventors: Christ H. Melonio, Gilbert P. Layfield
  • Patent number: 4301234
    Abstract: This invention relates to an improvement in a light-sensitive recording material comprising a support and a light-sensitive layer including a diazonium salt polycondensation product composed of recurrent units of the general types(A--N.sub.2 X) and (B)which are connected with each other by bivalent intermediate members derived from a condensable carbonyl compound and wherein A is the radical of a diazonium salt which comprises at least two isocyclic or heterocyclic aromatic rings and which in at least one position of its molecule is capable of condensation with formaldehyde in an acid medium, B is the radical of a compound free of diazonium groups which in at least one position of its molecule is capable of condensation with formaldehyde in an acid medium, and X is the anion of the diazonium salt, the improvement that the light-sensitive layer additionally contains about 6 to 20 parts by weight of amine resin per part by weight of the polycondensation product.
    Type: Grant
    Filed: August 29, 1980
    Date of Patent: November 17, 1981
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Fritz Uhlig
  • Patent number: 4297436
    Abstract: A method for producing a multilayer printing plate comprising image-wise exposing and developing a light-sensitive printing plate material which comprises a support having an oleophilic surface having a hydrophilic metal layer thereon, the hydrophilic metal layer having thereon at least one silver halide emulsion layer either directly or on at least one subbing layer on the hydrophilic metal layer, to form a silver image resist image corresponding to the image-wise exposure by subjecting the printing plate material to a process including baking, removing the hydrophilic metal layer at non-resist image areas to uncover the oleophilic surface thereunder, and removing the resist image, or a method for producing a multilayer printing plate comprising image-wise exposing and developing a light-sensitive printing plate material which comprises a support having a hydrophilic surface having thereon at least one silver halide emulsion layer either directly or on at least one subbing layer on the hydrophilic surface to
    Type: Grant
    Filed: June 12, 1978
    Date of Patent: October 27, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kikuo Kubotera, Masamichi Sato, Akira Kashiwabara, Kotaro Sato
  • Patent number: 4284711
    Abstract: An improved presensitized printing plate comprises at least one metal working surface, a cobalt layer electroplated on the outer working surface of said at least one metal working surface, and a coating of light sensitive material directly deposited on said cobalt layer.A method is also described which makes use of metallic cobalt for the preparation of presensitized printing plates in order to provide layers that are in themselves adherent to light sensitive materials without the need of using adhesives, and are useful for directly depositing light sensitive coatings thereon.
    Type: Grant
    Filed: August 21, 1979
    Date of Patent: August 18, 1981
    Inventor: Armando Birlain-Noris
  • Patent number: 4283471
    Abstract: A printing plate is made in accordance with a particular method and is used in a printing process wherein it is effective to produce a substantially continuous tone printing effect. A negative screen having an overall pattern defined by rows of closely spaced substantially square-shaped areas is exposed a plurality of times on an image carrier. An image screen pattern is developed on the image carrier wherein each of the plurality of exposures of the overall pattern on the negative screen is effected at a different angle with respect to each other. A unique printing screen pattern is obtained which is then used for printing a reproduced image.
    Type: Grant
    Filed: November 2, 1979
    Date of Patent: August 11, 1981
    Inventor: Frank A. Sportelli
  • Patent number: 4268612
    Abstract: Disclosed is a method for making relief deepenings in solid, hydrophylic, adhesive printing plate materials.The surface of the plate with an image unaffected by water is treated before making pressurized contact with another solid substance, i.e. removal medium. Non-imaged areas of the plate surface are softened and rendered actively adhesive by aforesaid treatment of water and are bonded to removal medium by said contact. Bond formed between plate parts and removal medium is terminated when the removal medium and the plate are forcefully separated; the removal medium carrying away the adhered plate material.Various embodiments of this basic method include the mode of plate surface treatment, means for controlling formation of image supporting sidewalls and different forms of removal medium.The method is employable with solid hydrophylic adhesive materials of organic or synthetic origin.
    Type: Grant
    Filed: September 13, 1979
    Date of Patent: May 19, 1981
    Inventor: Vaclav Misek
  • Patent number: 4268608
    Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: May 25, 1979
    Date of Patent: May 19, 1981
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 4233110
    Abstract: Process for etching a nickel-polyester layered offset plate, which is made by electroless nickel-plating of polyester and subsequently coated on the nickel-layer by a photoresist layer. After exposure of the photoresist layer under a transparent master and development of the offset-plate, the offset-plate is etched by an aqueous etching solution containing copper(II) ions, as the only etching agent together with Cl.sup.- ions. An offset printing plate is prepared from the etched nickel-polyester layered plate. The nickel layer of the nickel-polyester layered plate is etched with the aqueous etching solution. The etching solution additionally contains:(a) a salt which is inert as against the nickel-polyester layered plate, or 10 to 40 weight percent of an organic solvent, which is miscible or nonmiscible with water and which is inert as against the nickel-polyester layered plate, and 60 to 90 weight percent of de-ionized water; and(b) a wetting agent or pyridine.
    Type: Grant
    Filed: March 23, 1979
    Date of Patent: November 11, 1980
    Assignee: Swiss Aluminum Ltd.
    Inventors: Siegfried Richter, Josef Vinkovic
  • Patent number: 4196003
    Abstract: A light-sensitive copying layer containing an o-quinone-diazide compound and at least one of a secondary amine and a tertiary amine.
    Type: Grant
    Filed: February 2, 1977
    Date of Patent: April 1, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masaru Watanabe
  • Patent number: 4179292
    Abstract: This invention relates to an improvement in a negative-working light-sensitive copying composition comprising at least one condensation product of a diazonium salt, at least one water-soluble synthetic polymer and at least one acrylic resin which is soluble or at least swellable in an aqueous alkaline solution, the immprovement that the water-soluble synthetic polymer is a copolymer of a C.sub.3 to C.sub.16 alkyl acrylate and an N-vinyl-N-alkyl carboxylic acid amide, the alkyl and carboxylic acid groups of which contain 1 to 6 carbon atoms each. The invention also relates to a process for the preparation of a planographic printing foil using the novel light-sensitive composition.
    Type: Grant
    Filed: November 16, 1977
    Date of Patent: December 18, 1979
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Kurt-Walter Klupfel, Heide Sprengel