Abstract: A novel production method enables selective production of an isocyanuric acid N-substituted product of interest in one pot, requiring neither multiple steps nor cumbersome treatment, the method producing an N-(hydrocarbon)isocyanuric acid which includes a step N for reacting, in a solvent, a dihalogenated isocyanuric acid derivative with at least one hydrocarbonization agent selected from the group consisting of a halogenated hydrocarbon compound, a pseudo-halogenated hydrocarbon compound, and a dialkyl sulfate compound.

Abstract: Affinity ligands useful for mild elution affinity chromatography, including affinity ligands specific for immunoglobulins M, A, and E, are disclosed as are method of identifying and using such affinity ligands.

Abstract: The invention relates generally to solid supports for chromatography. In specific embodiments the invention provides for solid supports suitable for affinity chromatography along with methods, systems and kits which use the same.

Abstract: The present invention relates to a method of manufacturing semiconductor devices. According to the method, an etch target layer, a chemically amplified photoresist layer, and an Anti-Reflective Coating (ARC) layer are first sequentially formed over a semiconductor substrate. An exposure process is performed in order to form exposure portions in the photoresist layer. A thermal process is performed so that a decrosslinking reaction is generated in the ARC layer on the exposure portions. A development process is performed in order to form photoresist layer patterns and ARC layer patterns by removing the ARC layer at portions in which the decrosslinking reaction has occurred and the exposure portions. A silylation process is performed in order to form silylation patterns on sidewalls of each of the photoresist layer patterns. The ARC layer patterns and the photoresist layer patterns are removed. The etch target layer is patterned using the silylation patterns as an etch mask.

Abstract: Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.

Abstract: A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a derivative thereof, or a resin containing a structural unit derived from cyanuric acid or a derivative thereof. The structural unit is preferably represented by formula (1): and can be contained in a main chain or a side chain, or both main chain and side chain of a resin. The anti-reflective coating for lithography obtained from the composition has a high reflection reducing effect and does not cause intermixing with a resist layer to give an excellent resist pattern. It has a higher selectivity in dry-etching compared with the resists.

Abstract: A photothermographic material having, on at least an image forming layer including at least an organic silver salt and a non-photosensitive layer on the image forming layer, wherein the photothermographic material further has a non-photosensitive intermediate layer between the image forming layer and the non-photosensitive layer, and 50% by weight or more of a binder of the non-photosensitive intermediate layer is formed by a polymer latex, and the photothermographic material contains a metal phthalocyanine dye represented by formula (PC-1): wherein, M represents a metal atom, at least one of R1, R4, R5, R8, R9, R12, R13, and R16 is an electron-attracting group, and R2, R3, R6, R7, R10, R11, R14, and R15 each independently represent a hydrogen atom or a substituent. The invention provides a photothermographic material which exhibits high sharpness, preferable image tone, and excellent image storability.

Abstract: Photothermographic materials are coated with thermally developable imaging layers on both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby form a latent image in the photothermographic material that can eventually be heat developed and used for medical diagnosis. The photothermographic materials contain an opaque material that acts as a crossover control agent that absorbs radiation at the predetermined wavelength, for example at 300 to 450 nm, and has limited absorption at higher wavelengths. When the photothermographic material is heated, the opaque material loses its opacity. Additional crossover control agents, such as UV-absorbing compounds, can also be added to the support or to an antihalation layer.

Abstract: A composition for an anti-reflective layer capable of simultaneously being developed together with a photoresist layer after exposure of the photoresist layer in a photolithography process and a method for forming patterns in a semiconductor device using the composition, wherein the anti-reflective light absorbing layer composition includes a polymer having a (meth)acrylate repeating unit, a light-absorbing group of diazoquinones chemically bound to the (meth)acrylate repeating unit, a photoacid generator, a cross-linker which thermally cross-links the polymer and is decomposed from the polymer by an acid, and a catalyst for the cross-linking reaction of the polymer. The method for forming patterns in a semiconductor device involves forming an anti-reflective layer on a semiconductor substrate using the composition and simultaneously exposing the anti-reflective layer and a photoresist layer, thereby chemically transforming the anti-reflective layer so it is able to be developed.

Abstract: A water-based coating composition is disclosed, comprising a latex comprising a polymer impregnated with an infared absorbing compound and a water-soluble polyester or latex comprising polymer containing an active methylene group. An infrared absorbing film and a photothermographic material by use thereof are also disclosed.

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring units having the formula where X is a light-attenuating moiety, M is a metal, and each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Abstract: A water-based coating composition is disclosed, comprising a latex comprising a polymer impregnated with an infared absorbing compound and a water-soluble polyester or latex comprising polyer containing an active methylene group. An infrared absorbing film and a photothermographic material by use thereof are also disclosed.

Abstract: A method for forming a micro-pattern of a semiconductor substrate, and more particularly, to a method for preventing defects in a photoresist pattern, such as undercut or footing, due to inter-mixing between an organic anti-reflective coating and a photoresist by forming a carbonized layer on the surface of the organic anti-reflective coating by a curing process like ion implantation or E-beam curing.

Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.

Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.

Abstract: This invention comprises a photographic element for accurately recording a scene as an image comprising a support and coated on the support a plurality of hydrophilic colloid layers comprising radiation-sensitive silver halide emulsion layers forming recording layer units for separately recording blue, green and red exposures wherein, (A) the blue recording layer unit comprises at least one blue sensitive emulsion having a peak dyed absorptance of between 435 and 465 nm and an absorptance at 480 nm≧50% of the maximum peak dyed absorptance; or (B) the blue sensitive recording unit comprises a blue sensitive emulsion layer having a peak dyed absorptance of between 435 and 465 nm, and the emulsion exhibits an overall half-peak dyed absorption bandwidth of at least 50 nm.

Abstract: In one embodiment, the present invention relates to a method of making a carbonized antireflection coating involving the steps of depositing a polymer layer on a semiconductor substrate; and carbonizing at least a portion of the polymer layer in an inert atmosphere to provide the carbonized antireflection coating. In another embodiment, the present invention relates to a method of improving critical dimensional control during lithography, involving the steps of providing a semiconductor substrate; depositing a polymer layer on the semiconductor substrate; carbonizing at least a portion of the polymer layer in an inert atmosphere to provide a carbonized antireflection coating; depositing a photoresist over the carbonized antireflection coating; and patterning the photoresist.

Abstract: The present invention provides UV absorbing particles which are a polymerization reaction product of ethylenically unsaturated monomers selected from esters and amides of acrylic on methacrylic acid, vinyl esters, vinyl ethers, and vinyl nitrites; an initiator, a surfactant and an ultraviolet absorber having the general formula: ##STR1## wherein R is each independently a hydrogen, halogen, alkyl, aryl, alkoxy, acyloxy, alkylthio, arylthio, amine, alkylamino, arylamino, hydroxyl, cyano, nitro, acylamino, sulfonyl, sulfamido, acyloxy and oxycarbonyl.

Abstract: The invention describes a photopolymerizable recording material which comprises a photopolymerizable layer and a cover layer. The cover layer comprises a polymer which possesses low permeability to atmospheric oxygen and is soluble in water, and a water-soluble dye which absorbs light in the region from 300 to 700 nm and within this range has a non-absorbent region corresponding to the emission range of the copying light source.The material can be sensitized for various spectral regions, for example, for UV light, visible light or laser light and has a higher resolving power than a corresponding material which does not contain a dye in the cover layer, while its photosensitivity remains unchanged or is only slightly reduced.

Abstract: A silver halide color photographic element comprising a support, a silver halide emulsion and poly(alkylene oxide)s wherein greater than 50 percent of the poly(alkylene oxide)s have acidic functional end groups with an aqueous pKa.ltoreq.10, or end groups which will react to form acidic functional end groups with an aqueous pKa.ltoreq.10 during development, on both termini; and wherein the poly(alkylene oxide)s have a molecular weight ranging substantially between 1700 and 6000 AMU.

Abstract: This invention relates to a photographic element containing a polymeric ultraviolet absorbing polymer fromed from an ultraviolet absorbing monomer of formula (I): ##STR1## where X is a bivalent linking group, and Y contains an ethylenically unsaturated functional group.

Abstract: A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.

Abstract: A silver halide photographic material is disclosed, comprising a support having thereon photographic constituent layers with at least one layer thereof containing water-insoluble polymers, wherein at least one of the water-insoluble polymers is a polymer containing an aromatic ring and having a number average molecular weight of 4,000 or less and the weight percentage of the aromatic ring in the polymer molecule is 40% or more.

Abstract: In accordance with this invention, a photographic film especially suited for motion imaging film applications such as motion picture film or television film has on one side of a support material, in order, a process surviving, electrically conductive subbing layer, a photographic emulsion, and a protective overcoat; and on the opposite side a carbon black-containing backing layer, and optionally, a lubricant that overlies the backing layer. The carbon black-containing layer provides antihalation and antistatic protection for the unprocessed film. The conductive subbing layer retains its antistatic properties after processing so that the motion imaging film is protected from the generation of static charge after the carbon black-containing layer is removed during processing. The conductive subbing layer has a resistivity of less than 5.times.10.sup.9 .OMEGA./.quadrature. after film processing.

Abstract: A method of forming a resist pattern comprising forming a photoresist layer on a substrate, forming a transparent anti-reflective film on said photoresist layer by applying an anti-reflective material onto said photoresist layer, said anti-reflective material comprising a fluorinated resin which is soluble in an organic hydrocarbon solvent, exposing a light to said resist layer through said transparent anti-reflective film, removing said anti-reflective film using an organic hydrocarbon solvent, and developing said photoresist layer.

Abstract: A silver halide photographic material comprising a support having thereon at least one silver halide light-sensitive layer and at least one light-insensitive layer, wherein the support comprises a poly(alkylene aromatic dicarboxylate) having a glass transition temperature of from 50.degree. C. to 200.degree. C. and is heat-treated at a temperature of not lower than 40.degree. C., but lower than the glass transition temperature for 0.1 to 1500 hours after molding the polymer into the support and before the coating of the silver halide light-sensitive layer, and said at least one light-insensitive layer contains a dispersion of crystallites of at least one dye represented by general formula (I):D--(X).sub.y (I)wherein D represents a moiety having a chromophoric group; X represents a dissociable proton or a group having a dissociable proton which is bonded to D either directly or through a bivalent bonding group; and y represents an integer of 1 to 7.

Abstract: Reduction of reflection from an integrated circuit substrate during exposure of a photoresist layer on a surface such as an integrated circuit wafer is minimized by incorporating an antireflective coating between the photoresist layer and the integrated circuit substrate. The antireflective layer, after exposure and development of the photoresist layer, is preferably removed by exposing the non-masked antireflective layer to activating radiation while heating the coating to induce a solubilizing reaction in an antireflective coating and a curing reaction in an overlying photoresist mask. Thereafter, the exposed portions of the antireflective layer are removed by treatment with a suitable developer.

Abstract: There is disclosed a silver halide photographic light-sensitive material containing a dye which can be decolored or eluted without causing a stain problem attributable to a residual color, wherein the light-sensitive material comprises a support, having provided thereon at least one light-sensitive silver halide emulsion layer and at least one hydrophilic colloid layer containing a dispersed solid form of a dye, wherein the dye is dispersed in fine particles with an anionic polymer.

Abstract: A silver halide color photographic material comprising a support having thereon at least one silver halide emulsion layer, wherein a silver halide emulsion contained in at least one of the silver halide emulsion layers is a silver halide emulsion in which 30% by number of the total number of whole silver halide grains have a diameter of not more than 0.3 .mu.m, as a diameter of equivalent sphere, and the silver halide color photographic material contains a compound capable of releasing upon a reaction with an oxidation product of a developing agent a compound which is capable of releasing development inhibitor upon a reaction with another molecular of an oxidation product of a developing agent.The silver halide color photographic material has excellent color reproducibility and sharpness as well as a broad exposure latitude.

Abstract: An antistatic silver halide photographic light-sensitive material having a support, provided thereon, at least one light-sensitive layer and at least one non-light-sensitive layer is disclosed. Said at least one non-light-sensitive layer comprises a polymer compound consisting essentially of a repeated structural unit represented by Formula [I], and a formamide compound represented by Formula [II]; ##STR1## wherein Z, and Z.sub.2 represent the group of the atoms necessary to form a six-membered ring with--N.sup..sym. --; R represents a divalent group; R.sub.1 and R.sub.2 represent independently one selected from the group consisting of an alkyl group and an aryl group; R.sub.3 represents a hydrocarbon group; R.sub.5 and R.sub.6 represent independently a hydrogen atom or an alkyl group; X.sub.1.sup..crclbar. and X.sub.2.sup..crclbar. represent an anion; a and l represent an integer of 0 and 1.

Abstract: A photothermographic recording article comprises in sequence:(a) a substrate,(b) a prime coat/antihalation layer comprising a pigmented acrylic polymer binder system,(c) a photothermographic dispersion comprising a binder, a non-light sensitive silver source material, photographic silver halide in catalytic proximity to silver source material, and(d) optionally, a topcoat layer,said article further comprising a reducing agent for silver ion and at least one development accelerator in at least one of the layers of the substrate.

Abstract: This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography.

Abstract: Silver halide photographic elements comprising a support on which there is spread a plurality of photosensitive layers of gelatin incorporating silver halides and containing coupling agents, and further being associatd with auxiliary gelatin layers tend to suffer from brittleness. An improved element comprises, spread over said support and under said plurality of photosensitive layers, a layer of gelatin in which there is dispersed a fragility reducing quantity of droplets of a water-immiscible high boiling organic solvent, and an adhesion promoting quantity of a vinyl addition polymer latex.

Abstract: A photothermographic element having a strippably-adhered, radiation-absorbing, antihalation layer is disclosed. The element comprises at least one imageable layer adhered to one surface of a support base, and an antihalation layer having a resistance greater than 1500 ohms per square, strippably adhered to any exposed surface of said element, said antihalation layer having a delaminating resistance in the range of 6 to 50 g/cm, a layer strength in g/cm greater than its delaminating resistance, and an optical density of at least 0.1.

Abstract: Photothermographic imaging elements are provided with strippable layers which have electrical conductivity in the range of 60 to 1,500 ohms/square. The elements may be exposed to radiation and then thermally developed by applying a voltage across the strippable layer which becomes resistively heated. After development, the strippable layer may be removed.

Abstract: Photographic elements are provided with a magnetic stripe that is useful for sound recording by applying a magnetic striping composition, containing finely-divided magnetic particles and an acrylated epoxy resin, over the anti-halation layer of the element. The striping composition penetrates the anti-halation layer to contact the support and is cured to an alkali-insoluble cross-linked stripe which is composite with the anti-halation layer and strongly bonded to the support so as to resist removal by alkaline photographic processing solutions.

Abstract: This invention relates to a recording material containing diazo compounds, in particular a microfilm, comprising a film base which is at least partially pervious to visible radiation, a light-sensitive layer and, on the reverse side of the film base, a filter layer which absorbs light in the long-wave ultraviolet spectral range and in the short-wave visible spectral range, wherein the filter layer is composed of a polymer which is insoluble or has been rendered insoluble by cross-linking, and of at least one yellow to orange-colored dye which is compatible with the constituents of the polymer and absorbs light in the range between about 360 nm and about 500 nm. The invention also relates to a process for the manufacture of a recording material.

Abstract: A photographic material containing a removable antihalo layer comprising an antihalo agent and a mixture of two copolymers of a low alkymethacrylate and acrylic or methacrylic acid.

Abstract: A support convenient for preparing a printing plate in situ using a liquid photosensitive resin of an unsaturated polyurethane resin is disclosed. This support consists of a base plate and coated thereon a layer of a composition consisting of a mercapto-containing ester obtained by polycondensing a thiocarboxylic acid or thioalcohol with a polyglycol or polycarboxylic acid or an aromatic tertiary amine and a polymer binder. The support of this invention, which has a broadened base of a sectionally trapezoidal configuration, provides a relief image that is firmly adhered to the support.