Antihalation Or Filter Layer Containing Patents (Class 430/510)
  • Patent number: 9165815
    Abstract: Provided is a sheet for processing a wafer. The sheet can exhibit excellent heat resistance and dimensional stability, prevent breakage of a wafer in response to residual stress due to excellent stress relaxation properties, inhibit damage to or dispersion of the wafer due to application of a non-uniform pressure, and also exhibit excellent cuttability. The sheet can effectively prevent a blocking phenomenon from occurring during wafer processing. For these reasons, the sheet can be useful for processing a wafer in various wafer preparation processes such as dicing, back-grinding and picking-up.
    Type: Grant
    Filed: December 14, 2011
    Date of Patent: October 20, 2015
    Assignee: LG CHEM, LTD.
    Inventors: Se Ra Kim, Hyo Sook Joo, Suk Ky Chang, Jung Sup Shim
  • Patent number: 8709340
    Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.
    Type: Grant
    Filed: August 21, 2013
    Date of Patent: April 29, 2014
    Assignee: Abbott Cardiovascular Systems Inc.
    Inventors: Abigail Freeman, Gregory S. Simmons, Brian D. Riggs, Robert Harrison, Dan Castro, Bin Huang
  • Patent number: 8637228
    Abstract: A color photographic element has a reflective support and a blue light sensitive color record, a green light sensitive color record, and a red light sensitive color record and can be used to provide color photographic prints. The element also has a non-light sensitive layer over the red light sensitive color record. This non-light sensitive layer has (1) a hydrophilic colloid in an amount of at least 200 mg/m2 to and including 2,000 mg/m2, (2) matte particles, and (3) an acrylate latex polymer having latex particles having an average size of less than 1 ?m and a glass transition temperature of at least 70° C. The dry weight ratio of the acrylate latex polymer to the hydrophilic colloid is at least 0.8:1 and the dry weight ratio of the acrylate latex polymer to the total matte particles is at least 15:1.
    Type: Grant
    Filed: November 8, 2012
    Date of Patent: January 28, 2014
    Assignee: Kodak Alaris Inc.
    Inventors: Jess B. Hendricks, III, Paul L. Zengerle, Andrew D. Church, Darrell B. Austin
  • Patent number: 8524151
    Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: September 3, 2013
    Assignee: Abbott Cardiovascular Systems Inc.
    Inventors: Abigail Freeman, Gregory S. Simmons, Brian D. Riggs, Robert Harrison, Dan Castro, Bin Huang
  • Patent number: 8481252
    Abstract: Silver halide photographic photosensitive materials are disclosed. A silver halide photographic photosensitive material has a support, and on or above the support, a red-sensitive silver halide emulsion layer, a first interlayer, a green-sensitive silver halide emulsion layer, a second interlayer, and a blue-sensitive silver halide emulsion layer in this order from the support, wherein the first interlayer includes a chelating agent and another silver halide photographic photosensitive material has, in the following order, a support, and provided on or above the support, a first interlayer containing a chelating agent, a blue-sensitive silver halide emulsion layer, a second interlayer, a red-sensitive silver halide emulsion layer, a third interlayer, a green-sensitive silver halide emulsion layer, and a protective layer.
    Type: Grant
    Filed: November 27, 2009
    Date of Patent: July 9, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hiroya Yoshioka, Hidekazu Sakai, Shigeru Shibayama
  • Patent number: 8409791
    Abstract: Disclosed is a double-sided color photographic paper, including, in order, a first protection layer, a first photosensitive layer, a supporting substrate, a second photosensitive layer and a second protection layer. The supporting substrate has a first surface and a second surface opposite to the first surface. A first barrier layer and at least one layer of a first shading layer are sandwiched between the first photosensitive layer and the first surface of the supporting substrate. The first barrier layer is arranged between the first photosensitive layer and the first shading layer; a second barrier layer and at least one layer of a second shading layer are sandwiched between the second surface of the supporting substrate and the second photosensitive layer, and the second barrier layer is arranged between the second shading layer and the second photosensitive layer.
    Type: Grant
    Filed: November 17, 2009
    Date of Patent: April 2, 2013
    Assignees: China Lucky Film Group Corporation, Lucky Film Co., Ltd.
    Inventors: Yaning Li, Yanfei Du, Jianguo Guo, Wengui Wang
  • Patent number: 8383331
    Abstract: A silver halide photographic light-sensitive material for movie, having a specific layer structure by using particles of at least one kind of electroconductive metal oxide and at least one kind of an electroconductive polymer.
    Type: Grant
    Filed: May 2, 2011
    Date of Patent: February 26, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hiroshige Nakamura, Kenichi Yamamoto, Kazuhito Miyake, Hidekazu Sakai, Shigeru Shibayama
  • Patent number: 8361695
    Abstract: There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist underlayer film forming composition for lithography comprises a linear polymer having, in a main chain thereof, at least one of an aromatic ring-containing structure and a nitrogen atom-containing structure; and a solvent, wherein to the aromatic ring or the nitrogen atom, at least one alkoxyalkyl group or hydroxyalkyl group is directly bonded.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: January 29, 2013
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yoshiomi Hiroi, Tomohisa Ishida, Takafumi Endo
  • Patent number: 8298483
    Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: October 30, 2012
    Assignee: Abbott Cardiovascular Systems Inc.
    Inventors: Abigail Freeman, Gregory S. Simmons, Brian D. Riggs, Robert Harrison, Dan Castro, Bin Huang
  • Patent number: 8034287
    Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.
    Type: Grant
    Filed: May 15, 2007
    Date of Patent: October 11, 2011
    Assignee: Abbott Cardiovascular Systems Inc.
    Inventors: Abigail Freeman, Gregory S. Simmons, Brian D. Riggs, Robert Harrison, Dan Castro, Bin Huang
  • Patent number: 8021826
    Abstract: The present invention provides an organic anti-reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05<m/(m+n)<0.95 and 0.05<n/(m+n)<0.95. The anti-reflection coating using the polymer of the invention has excellent adhesiveness and storage stability, and a very high dry etching rate, and exhibits excellent resolution in both C/H patterns and L/S patterns.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: September 20, 2011
    Assignee: Korea Kumho Petrochemicals Co., Ltd.
    Inventors: Myung-Woong Kim, Joo-Hyeon Park, Young-Taek Lim, Hyung-Gi Kim, Jun-Ho Lee, Jong-Don Lee, Seung-Duk Cho
  • Patent number: 7655381
    Abstract: The invention relates to a method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure. The resist layer at least in certain areas adjoins a conductive layer, which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by means of an electron beam. With this method the material of the resist layer and the conductive layer and the exposure parameters are adjusted to each other such that the resist layer is also exposed outside the area impinged with the electron beam such that the flanks of the relief structure obtain an inclined form.
    Type: Grant
    Filed: February 24, 2004
    Date of Patent: February 2, 2010
    Assignee: Giesecke & Devrient GmbH
    Inventor: Wittich Kaule
  • Patent number: 7588879
    Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: September 15, 2009
    Assignee: International Business Machines Corporation
    Inventors: Colin J. Brodsky, Sean D. Burns, Dario L. Goldfarb, Michael Lercel, David R. Medeiros, Dirk Pfeiffer, Daniel P. Sanders, Steven A. Scheer, Libor Vyklicky
  • Publication number: 20090228348
    Abstract: The present subject matter relates to an item and related method and system for validating the authenticity of sensitive data respective to the item for associated processing on a high speed item transport device. The sensitive data associated with the item to be processed is exposed to energy, such as a particular range of light, for validation at high volumes while maintaining data anonymity; but the data is otherwise obscured from view by a filter material that blocks light outside the range. Furthermore, verification of the sensitive data is performed without necessitating significant mechanical configuration changes or item manipulation techniques.
    Type: Application
    Filed: March 7, 2008
    Publication date: September 10, 2009
    Inventors: Mark WOOLSTON, Walter Hosiner
  • Patent number: 7524595
    Abstract: A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two curing steps to convert the fluid material into the ARC. Such a bottom anti-reflection coating with no hole over the overlay mark can improve accuracy of the overlay measurement of lithography, thereby improving the alignment accuracy of the lithography process.
    Type: Grant
    Filed: September 8, 2005
    Date of Patent: April 28, 2009
    Assignee: United Microelectronics Corp.
    Inventors: Wen-Kuang Lin, Huan-Hsin Yeh, Chung-An Chen
  • Patent number: 7514206
    Abstract: Thermally developable materials including photothermographic and thermographic materials have a buried conductive backside layer comprising one or more binder polymers in which are dispersed each of at least two types of conductive materials: (1) nanoparticles of one or more conductive metal compounds, and (2) one or more organic solvent soluble inorganic alkali metal salt antistatic compounds. These buried conductive backside coatings provide conductivity that is affected minimally by humidity.
    Type: Grant
    Filed: April 13, 2006
    Date of Patent: April 7, 2009
    Assignee: Carestream Health, Inc.
    Inventors: Thomas J. Ludemann, Gary E. LaBelle, Thomas J. Kub, Kumars Sakizadeh, Sharon M. Simpson
  • Publication number: 20080096144
    Abstract: A silver halide photographic light-sensitive material for movie subtitles, includes: a transparent support; and at least one light-sensitive layer and at least one light-insensitive layer, directly or indirectly on the transparent support, wherein the at least one light-insensitive layer comprises at least one kind of a silicone oil.
    Type: Application
    Filed: October 19, 2007
    Publication date: April 24, 2008
    Inventors: Shin SOEJIMA, Shinichi Teramae, Hiroshige Nakamura
  • Patent number: 7361455
    Abstract: Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light or electrons. The radiation beam path altering additive may be a reflective material or a refractive material. The inclusion of such a radiation beam bath altering additive may reduce line width roughness and increase critical dimension (CD) control of interconnect lines and vias.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: April 22, 2008
    Assignee: Intel Corporation
    Inventors: Shan C. Clark, Ernisse S. Putna, Robert P. Meagley
  • Patent number: 7300730
    Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: November 27, 2007
    Assignee: Tokyo Electron Limited
    Inventors: James E. Willis, James E. Klekotka
  • Patent number: 7157214
    Abstract: High-speed aqueous-based black-and-white photothermographic materials are imageable in any suitable fashion using ultraviolet, visible, infrared, or X-radiation. They can have one or more thermally developable imaging layers on either or both sides of the support and can be imaged with or without a phosphor intensifying screen in an imaging assembly. The photothermographic emulsions and materials have a net Dmin less than 0.25, and require less than 1 erg/cm2 to achieve a density of 1.00 above net Dmin. The imaging layers include hydrophilic binders or water-dispersible latex polymer binders and chemically and spectrally sensitized photosensitive silver halide grains.
    Type: Grant
    Filed: November 2, 2004
    Date of Patent: January 2, 2007
    Assignee: Eastman Kodak Company
    Inventors: Chaofeng Zou, Doreen C. Lynch
  • Patent number: 7144689
    Abstract: The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The thin backside overcoat layer serves to protect the buried antistatic layer.
    Type: Grant
    Filed: May 9, 2006
    Date of Patent: December 5, 2006
    Assignee: Eastman Kodak Company
    Inventors: Thomas J. Ludemann, Gary E. LaBelle, Darlene F. Philip, Roland J. Koestner, Aparna V. Bhave
  • Patent number: 7118849
    Abstract: Photothermographic materials are coated with imaging layers and an antihalation layer between the support and thermally developable imaging layers on one or both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby excited to form a latent image in the photothermographic material that can eventually be used for medical diagnosis. The antihalation layers contain radiation absorbing compounds (such as a UV-radiation absorbing compounds) that absorb radiation at the predetermined wavelength (for example at 300 to 450 nm) and have limited absorption at higher wavelengths.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: October 10, 2006
    Assignee: Eastman Kodak Company
    Inventors: Robert E. Dickerson, Kurt M. Schroeder
  • Patent number: 7112399
    Abstract: Photothermographic materials are coated with thermally developable imaging layers on both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby form a latent image in the photothermographic material that can eventually be heat developed and used for medical diagnosis. The photothermographic materials contain an opaque material that acts as a crossover control agent that absorbs radiation at the predetermined wavelength, for example at 300 to 450 nm, and has limited absorption at higher wavelengths. When the photothermographic material is heated, the opaque material loses its opacity. Additional crossover control agents, such as UV-absorbing compounds, can also be added to the support or to an antihalation layer.
    Type: Grant
    Filed: August 19, 2004
    Date of Patent: September 26, 2006
    Assignee: Eastman Kodak Company
    Inventors: Robert E. Dickerson, Alphonse D. Camp
  • Patent number: 7094524
    Abstract: Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers include an amine organic base whose conjugate acid has a pKa greater than 5. These backside stabilizers can be provided particularly in non-photosensitive compositions that include an antihalation composition.
    Type: Grant
    Filed: October 15, 2003
    Date of Patent: August 22, 2006
    Assignee: Eastman Kodak Company
    Inventors: Steven H. Kong, Kumars Sakizadeh, William D. Ramsden
  • Patent number: 7087364
    Abstract: The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The thin backside overcoat layer serves to protect the buried antistatic layer.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: August 8, 2006
    Assignee: Eastman Kodak Company
    Inventors: Thomas J. Ludemann, Gary E. LaBelle, Darlene F. Philip, Roland J. Koestner, Aparna V. Bhave
  • Patent number: 7087366
    Abstract: A photothermographic emulsion is prepared by chemically sensitizing silver halide grains formed by oxidative decomposition of a diphenylphosphine sulfide compound on or around the silver halide grains. This procedure uses a unique sequence of steps and provides increased photographic speed and manufacturing reproducibility.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: August 8, 2006
    Assignee: Eastman Kodak Company
    Inventors: Lilia P. Burleva, Kumars Sakizadeh, David R. Whitcomb, Sharon M. Simpson
  • Patent number: 7083906
    Abstract: A heat-developable photosensitive material having on a support at least one light-sensitive layer comprising an organic silver salt, a light-sensitive silver halide and a reducing agent and at least one light-insensitive layer, which comprises an antihalation dye causing no decoloration by heat and provides tone represented by an inequality L*?92 on the CIELAB space in a background after heat development.
    Type: Grant
    Filed: March 7, 2003
    Date of Patent: August 1, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiichi Suzuki, Hideyasu Ishibashi
  • Patent number: 7063941
    Abstract: A photothermographic emulsion is prepared by chemically sensitizing silver halide grains by oxidative decomposition of an organic sulfur-containing compound on or around the silver halide grains. This procedure uses a unique sequence of steps and provides increased photographic speed and manufacturing reproducibility. The resulting photothermographic emulsion can be used to prepare photothermographic materials.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: June 20, 2006
    Assignee: Eastman Kodak Company
    Inventors: Lilia P. Burleva, Mark C. Skinner, Kumars Sakizadeh, Sharon M. Simpson
  • Patent number: 7029834
    Abstract: Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers are nitrogen-containing aromatic heterocyclic compounds. These backside stabilizers can be provided particularly in non-photosensitive compositions that include an antihalation composition.
    Type: Grant
    Filed: October 15, 2003
    Date of Patent: April 18, 2006
    Assignee: Eastman Kodak Company
    Inventors: Steven H. Kong, Kumars Sakizadeh
  • Patent number: 6974662
    Abstract: Improved compounds and base precursors that undergo thermal decomposition are disclosed. Thermal base precursors, and in particular, a novel class of salts of arylsulfonylacetic acids as bleaching agents or promoting for photothermographic use are disclosed. Compositions employing these thermal base precursors are suitable for use in acutance and antihalation systems, bleachable filter dye materials, and in promoting unblocking of various components such as blocked developers, especially in photothermographic elements.
    Type: Grant
    Filed: August 4, 2003
    Date of Patent: December 13, 2005
    Assignee: Eastman Kodak Company
    Inventors: Ramanuj Goswami, Wojciech K. Slusarek, David H. Levy
  • Patent number: 6964842
    Abstract: Aqueous-based photothermographic materials comprise a hydrophilic binder, preformed silver halides, an organic silver salt, a reducing agent composition, and one or more benzothiazolium, benzoselenazolium, or benzotellurazolium salts as antifoggants. These photothermographic materials can be used in combination with phosphor intensifying screens for radiographic imaging.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: November 15, 2005
    Assignee: Eastman Kodak Company
    Inventors: Chaofeng Zou, Roger L. Klaus
  • Patent number: 6942960
    Abstract: Aqueous-based thermally sensitive emulsions and photothermographic imaging materials include photosensitive silver halide grains that comprise at least 15 mol % iodide based on total silver in the grains and are doped with bismuth (+3). These materials have increased photographic speed especially in the infrared region of the electromagnetic spectrum.
    Type: Grant
    Filed: August 12, 2003
    Date of Patent: September 13, 2005
    Assignee: Eastman Kodak Company
    Inventors: Joe E. Maskasky, David A. Dickinson, Victor P. Scaccia, Richard L. Gaines
  • Patent number: 6849373
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
    Type: Grant
    Filed: July 14, 2001
    Date of Patent: February 1, 2005
    Inventors: Edward K. Pavelchek, Manuel DoCanto
  • Patent number: 6844145
    Abstract: High-speed black-and-white photothermographic materials can be imaged in any suitable fashion using ultraviolet, visible, infrared, or X-radiation. They can have one or more thermally developable imaging layers on either or both sides of the support and can be imaged with or without a phosphor intensifying screen in an imaging assembly. The photothermographic emulsions and materials have a net Dmin less than 0.25, and require less than 1 erg/cm2 to achieve a density of 1.00 above net Dmin.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: January 18, 2005
    Assignee: Eastman Kodak Company
    Inventors: Chaofeng Zou, Doreen C. Lynch
  • Patent number: 6828070
    Abstract: A photosensitive material comprising a substrate and a reversibly decolorable colored layer disposed thereon, wherein the reversibly decolorable colored layer is reversibly colored and decolored, the reversibly decolorable colored layer is in a colored state at 25 ° C., and a temperature at which the color density of the reversibly decolorable colored layer is reduced to 50% based on that at 25 ° C. is 50 to 120 ° C. A method for forming an image using the photosensitive material is also provided.
    Type: Grant
    Filed: June 22, 2001
    Date of Patent: December 7, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shunichi Ishikawa, Yoshiharu Yabuki
  • Patent number: 6800429
    Abstract: An imaging material comprising a support having disposed thereon: a) at least one image-formning layer, and b) at least one transparent electrically conductive antistatic layer that comprises electronically conductive polymer particles, a neutral-charge conductivity enhancer, and a polymeric binder comprising gelatin or gelatin derivatives.
    Type: Grant
    Filed: December 26, 2001
    Date of Patent: October 5, 2004
    Assignee: Eastman Kodak Company
    Inventors: Mark Lelental, Charles C. Anderson, John M. Pochan, James L. Wakley, James F. Elman
  • Patent number: 6780575
    Abstract: The present invention is directed to a method of scanning silver-halide-containing color photographic and photothermographic film. In particular, the present invention comprises record shifting by means by employing at least one infrared dye in a color unit of the film, thereby forming at least one image record in the infrared. This expedient leads to the formation of high quality images, especially when scanning photothermographic elements in which the silver halide, metallic silver, and/or any organic silver salts have not been removed.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: August 24, 2004
    Assignee: Eastman Kodak Company
    Inventor: Richard P. Szajewski
  • Publication number: 20040146813
    Abstract: A photothermographic material that comprises a support having thereon one or more thermally-developable imaging layers comprising a binder and in reactive association, a photosensitive silver halide, a non-photosensitive source of reducible silver ions, and a reducing composition for the non-photosensitive source reducible silver ions. The thermally-developable layers further comprises one or more radiation absorbing compounds that provide a total absorbance of greater than 0.6 and up to and including 3 in the thermally-developable imaging layer(s). These photothermographic materials are independently coated and dried while the material is conveyed at a rate of at least 5 meters per minute.
    Type: Application
    Filed: January 8, 2004
    Publication date: July 29, 2004
    Inventors: Bryan V. Hunt, Steven H. Kong, William D. Ramsden, Gary E. Labelle
  • Patent number: 6764749
    Abstract: A method to improve the resolution of a photolithography system by using one or more coupling layers between a photo resist and an anti-reflective coating. The coupling layer(s) compensate for a mis-match in indexes of reflection between the photo resist and anti-reflective coating and minimize the amount of energy which is reflected back into the photo resist, thereby improving the quality of the resulting image which is formed on the photo resist during the process.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: July 20, 2004
    Assignee: LSI Logic Corporation
    Inventors: Michael J. Berman, George E. Bailey
  • Patent number: 6762013
    Abstract: Nonpolymeric fluorochemicals defined as by the following Structure I are useful in thermally developable materials. The fluorochemicals are defined as follows: Rf—R—N(R1)(R2)(R3)+X−  (I) wherein Rf is a straight or branched chain perfluoroalkyl group having 4 to 18 carbon atoms, R is a divalent linking group comprising at least 4 carbon atoms and a sulfide group in the chain, R1, R2, R3 are independently hydrogen or alkyl groups or any two of R1, R2, and R3 taken together can represent the carbon and nitrogen atoms necessary to provide a 5- to 7-membered heterocyclic ring with the cationic nitrogen atom, and X− is a monovalent anion.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: July 13, 2004
    Assignee: Eastman Kodak Company
    Inventors: Kumars Sakizadeh, Gary E. LaBelle, Aparna V. Bhave
  • Publication number: 20040115558
    Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the &ggr;-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.
    Type: Application
    Filed: September 30, 2003
    Publication date: June 17, 2004
    Inventors: Seok-Yoon Yang, Gil-Lae Kim, Chan-Seok Park, Choon-Ho Park, Soo-Guy Rho
  • Patent number: 6746830
    Abstract: A silver halide photosensitive material having a substrate, a heat-responsive-discolorable coloring layer and a photosensitive layer coated thereon and having a silver halide, dye-providing compound and a binder, the heat-responsive-discolorable coloring layer containing a heat-responsive-discolorable coloring composition, which is colored at a temperature lower than its discoloration initiation temperature (T) of 60 to 200° C.; which is substantially discolored at a temperature equal to or higher than T; and which does not recover its color once discolored, even when its temperature is lowered to a temperature lower than T again, and the heat-responsive-discolorable coloring composition containing a polymer having a glass transition temperature of 60 to 200° C.
    Type: Grant
    Filed: October 25, 2002
    Date of Patent: June 8, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Jun Arakawa, Takahiro Ishizuka
  • Patent number: 6740480
    Abstract: The invention provides a photographic element comprising a transparent polymer sheet, at least one layer containing negative working photosensitive silver halide and at least one upper protective shield to protect the surface of said transparent polymer.
    Type: Grant
    Filed: November 3, 2000
    Date of Patent: May 25, 2004
    Assignee: Eastman Kodak Company
    Inventors: Peter T. Aylward, Alphonse D. Camp, Robert P. Bourdelais
  • Patent number: 6740469
    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring units having the formula where X is a light-attenuating moiety, M is a metal, and each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: May 25, 2004
    Assignee: Brewer Science Inc.
    Inventors: Vandana Krishnamurthy, Charles J. Neef, Juliet A. M. Snook
  • Publication number: 20040096758
    Abstract: This invention relates to a photothermographic element comprising a support, at least one photothermographic imaging layer, and at least one filter layer, wherein the filer layer comprises a heat-bleachable composition comprising a benzothiazine arylidiene filter dye, which filter dye is in the presence of an effective amount of a base precursor.
    Type: Application
    Filed: November 20, 2002
    Publication date: May 20, 2004
    Inventors: Ramanuj Goswami, Margaret J. Helber, Teresa J. Hosmer, David H. Levy
  • Patent number: 6737230
    Abstract: The present invention relates to a thermal developing photographic element comprising a radiant energy absorbing material incorporated into said photothermal film.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: May 18, 2004
    Assignee: Eastman Kodak Company
    Inventors: Timothy W. Stoebe, Mark E. Irving, David H. Levy, Kevin W. Williams
  • Patent number: 6730462
    Abstract: This invention relates to a photothermographic element comprising a support, at least one photothermographic imaging layer, and at least one filter layer, wherein the filer layer comprises a heat-bleachable composition comprising a barbituric acid arylidene filter dye is in the presence of an effective amount of a base precursor.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: May 4, 2004
    Assignee: Eastman Kodak Company
    Inventors: Ramanuj Goswami, Margaret J. Helber, Cynthia A. MacMillan, Mary C. Brick
  • Patent number: 6730454
    Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.
    Type: Grant
    Filed: April 16, 2002
    Date of Patent: May 4, 2004
    Assignee: International Business Machines Corporation
    Inventors: Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu-Song Huang, Arpan P. Mahorowala, David R. Medeiros, Ratnam Sooriyakumaran
  • Patent number: 6727057
    Abstract: A heat-developable photosensitive material comprising at least one light-sensitive layer containing an organic silver salt, light-sensitive silver halide and a reducing agent and at least one light-insensitive layer on a support, wherein the heat-developable photosensitive material comprises a water-soluble metal phthalocyanine compound.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: April 27, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiichi Suzuki, Yoshiharu Yabuki
  • Publication number: 20040067419
    Abstract: A holographic recording medium includes a holographic recording carrier including a first light transmittable substrate, a second light transmittable substrate and a holographic recording layer sandwiched therebetween, a first antireflection film formed on the surface of the first light transmittable substrate and a second antireflection film formed on the surface of the second light transmittable substrate, and optical characteristics of the first antireflection film and those of the second antireflection film are determined to be different from each other the thus constituted holographic recording medium can achieves improved data recording characteristics and data reproducing characteristics using an object beam and a reference beam, and concurrently enables desired positioning of an object beam and a reference beam, or only the reference beam, and detection of the address of the region in which data are being recorded or from which data are being reproduced using a position control beam.
    Type: Application
    Filed: October 1, 2003
    Publication date: April 8, 2004
    Applicant: TDK Corporation
    Inventor: Tetsuro Mizushima