Abstract: Techniques for controlling optical behavior of a multi-view display apparatus comprising a first layer comprising first optical elements and a second layer comprising second optical elements.

Abstract: A hydrophilic siloxane copolymer of siloxane and hydrophilic organic monomer/s The copolymers can be functionalized to make them capable of undergoing further polymerization by thermal or actinic radiations. The hydrophilicity of these polymers can be varied by varying the siloxane versus organic monomer ratio thereby going from water dispersible to soluble states. The siloxane content can be tuned accordingly in order to provide moderate to high oxygen permeability. These copolymers can be used as a single component curable composition which results in hydrogels to minimize the presence of leachable components thus by reducing the processing cost. The polymers may also find applications in personal care formulations as copolymers, film-formers, hydrogels, coating, emulsions/latex etc.

Abstract: Provided is a sheet for processing a wafer. The sheet can exhibit excellent heat resistance and dimensional stability, prevent breakage of a wafer in response to residual stress due to excellent stress relaxation properties, inhibit damage to or dispersion of the wafer due to application of a non-uniform pressure, and also exhibit excellent cuttability. The sheet can effectively prevent a blocking phenomenon from occurring during wafer processing. For these reasons, the sheet can be useful for processing a wafer in various wafer preparation processes such as dicing, back-grinding and picking-up.

Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.

Abstract: A color photographic element has a reflective support and a blue light sensitive color record, a green light sensitive color record, and a red light sensitive color record and can be used to provide color photographic prints. The element also has a non-light sensitive layer over the red light sensitive color record. This non-light sensitive layer has (1) a hydrophilic colloid in an amount of at least 200 mg/m2 to and including 2,000 mg/m2, (2) matte particles, and (3) an acrylate latex polymer having latex particles having an average size of less than 1 ?m and a glass transition temperature of at least 70° C. The dry weight ratio of the acrylate latex polymer to the hydrophilic colloid is at least 0.8:1 and the dry weight ratio of the acrylate latex polymer to the total matte particles is at least 15:1.

Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.

Abstract: Silver halide photographic photosensitive materials are disclosed. A silver halide photographic photosensitive material has a support, and on or above the support, a red-sensitive silver halide emulsion layer, a first interlayer, a green-sensitive silver halide emulsion layer, a second interlayer, and a blue-sensitive silver halide emulsion layer in this order from the support, wherein the first interlayer includes a chelating agent and another silver halide photographic photosensitive material has, in the following order, a support, and provided on or above the support, a first interlayer containing a chelating agent, a blue-sensitive silver halide emulsion layer, a second interlayer, a red-sensitive silver halide emulsion layer, a third interlayer, a green-sensitive silver halide emulsion layer, and a protective layer.

Abstract: Disclosed is a double-sided color photographic paper, including, in order, a first protection layer, a first photosensitive layer, a supporting substrate, a second photosensitive layer and a second protection layer. The supporting substrate has a first surface and a second surface opposite to the first surface. A first barrier layer and at least one layer of a first shading layer are sandwiched between the first photosensitive layer and the first surface of the supporting substrate. The first barrier layer is arranged between the first photosensitive layer and the first shading layer; a second barrier layer and at least one layer of a second shading layer are sandwiched between the second surface of the supporting substrate and the second photosensitive layer, and the second barrier layer is arranged between the second shading layer and the second photosensitive layer.

Abstract: A silver halide photographic light-sensitive material for movie, having a specific layer structure by using particles of at least one kind of electroconductive metal oxide and at least one kind of an electroconductive polymer.

Abstract: There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist underlayer film forming composition for lithography comprises a linear polymer having, in a main chain thereof, at least one of an aromatic ring-containing structure and a nitrogen atom-containing structure; and a solvent, wherein to the aromatic ring or the nitrogen atom, at least one alkoxyalkyl group or hydroxyalkyl group is directly bonded.

Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.

Abstract: Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.

Abstract: The present invention provides an organic anti-reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05<m/(m+n)<0.95 and 0.05<n/(m+n)<0.95. The anti-reflection coating using the polymer of the invention has excellent adhesiveness and storage stability, and a very high dry etching rate, and exhibits excellent resolution in both C/H patterns and L/S patterns.

Abstract: The invention relates to a method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure. The resist layer at least in certain areas adjoins a conductive layer, which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by means of an electron beam. With this method the material of the resist layer and the conductive layer and the exposure parameters are adjusted to each other such that the resist layer is also exposed outside the area impinged with the electron beam such that the flanks of the relief structure obtain an inclined form.

Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.

Abstract: The present subject matter relates to an item and related method and system for validating the authenticity of sensitive data respective to the item for associated processing on a high speed item transport device. The sensitive data associated with the item to be processed is exposed to energy, such as a particular range of light, for validation at high volumes while maintaining data anonymity; but the data is otherwise obscured from view by a filter material that blocks light outside the range. Furthermore, verification of the sensitive data is performed without necessitating significant mechanical configuration changes or item manipulation techniques.

Abstract: A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two curing steps to convert the fluid material into the ARC. Such a bottom anti-reflection coating with no hole over the overlay mark can improve accuracy of the overlay measurement of lithography, thereby improving the alignment accuracy of the lithography process.

Abstract: Thermally developable materials including photothermographic and thermographic materials have a buried conductive backside layer comprising one or more binder polymers in which are dispersed each of at least two types of conductive materials: (1) nanoparticles of one or more conductive metal compounds, and (2) one or more organic solvent soluble inorganic alkali metal salt antistatic compounds. These buried conductive backside coatings provide conductivity that is affected minimally by humidity.

Abstract: A silver halide photographic light-sensitive material for movie subtitles, includes: a transparent support; and at least one light-sensitive layer and at least one light-insensitive layer, directly or indirectly on the transparent support, wherein the at least one light-insensitive layer comprises at least one kind of a silicone oil.

Abstract: Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light or electrons. The radiation beam path altering additive may be a reflective material or a refractive material. The inclusion of such a radiation beam bath altering additive may reduce line width roughness and increase critical dimension (CD) control of interconnect lines and vias.

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

Abstract: High-speed aqueous-based black-and-white photothermographic materials are imageable in any suitable fashion using ultraviolet, visible, infrared, or X-radiation. They can have one or more thermally developable imaging layers on either or both sides of the support and can be imaged with or without a phosphor intensifying screen in an imaging assembly. The photothermographic emulsions and materials have a net Dmin less than 0.25, and require less than 1 erg/cm2 to achieve a density of 1.00 above net Dmin. The imaging layers include hydrophilic binders or water-dispersible latex polymer binders and chemically and spectrally sensitized photosensitive silver halide grains.

Abstract: The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The thin backside overcoat layer serves to protect the buried antistatic layer.

Abstract: Photothermographic materials are coated with imaging layers and an antihalation layer between the support and thermally developable imaging layers on one or both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby excited to form a latent image in the photothermographic material that can eventually be used for medical diagnosis. The antihalation layers contain radiation absorbing compounds (such as a UV-radiation absorbing compounds) that absorb radiation at the predetermined wavelength (for example at 300 to 450 nm) and have limited absorption at higher wavelengths.

Abstract: Photothermographic materials are coated with thermally developable imaging layers on both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby form a latent image in the photothermographic material that can eventually be heat developed and used for medical diagnosis. The photothermographic materials contain an opaque material that acts as a crossover control agent that absorbs radiation at the predetermined wavelength, for example at 300 to 450 nm, and has limited absorption at higher wavelengths. When the photothermographic material is heated, the opaque material loses its opacity. Additional crossover control agents, such as UV-absorbing compounds, can also be added to the support or to an antihalation layer.

Abstract: Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers include an amine organic base whose conjugate acid has a pKa greater than 5. These backside stabilizers can be provided particularly in non-photosensitive compositions that include an antihalation composition.

Abstract: A photothermographic emulsion is prepared by chemically sensitizing silver halide grains formed by oxidative decomposition of a diphenylphosphine sulfide compound on or around the silver halide grains. This procedure uses a unique sequence of steps and provides increased photographic speed and manufacturing reproducibility.

Abstract: The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The thin backside overcoat layer serves to protect the buried antistatic layer.

Abstract: A heat-developable photosensitive material having on a support at least one light-sensitive layer comprising an organic silver salt, a light-sensitive silver halide and a reducing agent and at least one light-insensitive layer, which comprises an antihalation dye causing no decoloration by heat and provides tone represented by an inequality L*?92 on the CIELAB space in a background after heat development.

Abstract: A photothermographic emulsion is prepared by chemically sensitizing silver halide grains by oxidative decomposition of an organic sulfur-containing compound on or around the silver halide grains. This procedure uses a unique sequence of steps and provides increased photographic speed and manufacturing reproducibility. The resulting photothermographic emulsion can be used to prepare photothermographic materials.

Abstract: Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers are nitrogen-containing aromatic heterocyclic compounds. These backside stabilizers can be provided particularly in non-photosensitive compositions that include an antihalation composition.

Abstract: Improved compounds and base precursors that undergo thermal decomposition are disclosed. Thermal base precursors, and in particular, a novel class of salts of arylsulfonylacetic acids as bleaching agents or promoting for photothermographic use are disclosed. Compositions employing these thermal base precursors are suitable for use in acutance and antihalation systems, bleachable filter dye materials, and in promoting unblocking of various components such as blocked developers, especially in photothermographic elements.

Abstract: Aqueous-based photothermographic materials comprise a hydrophilic binder, preformed silver halides, an organic silver salt, a reducing agent composition, and one or more benzothiazolium, benzoselenazolium, or benzotellurazolium salts as antifoggants. These photothermographic materials can be used in combination with phosphor intensifying screens for radiographic imaging.

Abstract: Aqueous-based thermally sensitive emulsions and photothermographic imaging materials include photosensitive silver halide grains that comprise at least 15 mol % iodide based on total silver in the grains and are doped with bismuth (+3). These materials have increased photographic speed especially in the infrared region of the electromagnetic spectrum.

Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.

Abstract: High-speed black-and-white photothermographic materials can be imaged in any suitable fashion using ultraviolet, visible, infrared, or X-radiation. They can have one or more thermally developable imaging layers on either or both sides of the support and can be imaged with or without a phosphor intensifying screen in an imaging assembly. The photothermographic emulsions and materials have a net Dmin less than 0.25, and require less than 1 erg/cm2 to achieve a density of 1.00 above net Dmin.

Abstract: A photosensitive material comprising a substrate and a reversibly decolorable colored layer disposed thereon, wherein the reversibly decolorable colored layer is reversibly colored and decolored, the reversibly decolorable colored layer is in a colored state at 25 ° C., and a temperature at which the color density of the reversibly decolorable colored layer is reduced to 50% based on that at 25 ° C. is 50 to 120 ° C. A method for forming an image using the photosensitive material is also provided.

Abstract: An imaging material comprising a support having disposed thereon: a) at least one image-formning layer, and b) at least one transparent electrically conductive antistatic layer that comprises electronically conductive polymer particles, a neutral-charge conductivity enhancer, and a polymeric binder comprising gelatin or gelatin derivatives.

Abstract: The present invention is directed to a method of scanning silver-halide-containing color photographic and photothermographic film. In particular, the present invention comprises record shifting by means by employing at least one infrared dye in a color unit of the film, thereby forming at least one image record in the infrared. This expedient leads to the formation of high quality images, especially when scanning photothermographic elements in which the silver halide, metallic silver, and/or any organic silver salts have not been removed.

Abstract: A photothermographic material that comprises a support having thereon one or more thermally-developable imaging layers comprising a binder and in reactive association, a photosensitive silver halide, a non-photosensitive source of reducible silver ions, and a reducing composition for the non-photosensitive source reducible silver ions. The thermally-developable layers further comprises one or more radiation absorbing compounds that provide a total absorbance of greater than 0.6 and up to and including 3 in the thermally-developable imaging layer(s). These photothermographic materials are independently coated and dried while the material is conveyed at a rate of at least 5 meters per minute.

Abstract: A method to improve the resolution of a photolithography system by using one or more coupling layers between a photo resist and an anti-reflective coating. The coupling layer(s) compensate for a mis-match in indexes of reflection between the photo resist and anti-reflective coating and minimize the amount of energy which is reflected back into the photo resist, thereby improving the quality of the resulting image which is formed on the photo resist during the process.

Abstract: Nonpolymeric fluorochemicals defined as by the following Structure I are useful in thermally developable materials. The fluorochemicals are defined as follows: Rf—R—N(R1)(R2)(R3)+X−  (I) wherein Rf is a straight or branched chain perfluoroalkyl group having 4 to 18 carbon atoms, R is a divalent linking group comprising at least 4 carbon atoms and a sulfide group in the chain, R1, R2, R3 are independently hydrogen or alkyl groups or any two of R1, R2, and R3 taken together can represent the carbon and nitrogen atoms necessary to provide a 5- to 7-membered heterocyclic ring with the cationic nitrogen atom, and X− is a monovalent anion.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the &ggr;-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

Abstract: A silver halide photosensitive material having a substrate, a heat-responsive-discolorable coloring layer and a photosensitive layer coated thereon and having a silver halide, dye-providing compound and a binder, the heat-responsive-discolorable coloring layer containing a heat-responsive-discolorable coloring composition, which is colored at a temperature lower than its discoloration initiation temperature (T) of 60 to 200° C.; which is substantially discolored at a temperature equal to or higher than T; and which does not recover its color once discolored, even when its temperature is lowered to a temperature lower than T again, and the heat-responsive-discolorable coloring composition containing a polymer having a glass transition temperature of 60 to 200° C.

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring units having the formula where X is a light-attenuating moiety, M is a metal, and each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Abstract: The invention provides a photographic element comprising a transparent polymer sheet, at least one layer containing negative working photosensitive silver halide and at least one upper protective shield to protect the surface of said transparent polymer.

Abstract: This invention relates to a photothermographic element comprising a support, at least one photothermographic imaging layer, and at least one filter layer, wherein the filer layer comprises a heat-bleachable composition comprising a benzothiazine arylidiene filter dye, which filter dye is in the presence of an effective amount of a base precursor.

Abstract: The present invention relates to a thermal developing photographic element comprising a radiant energy absorbing material incorporated into said photothermal film.

Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.

Abstract: This invention relates to a photothermographic element comprising a support, at least one photothermographic imaging layer, and at least one filter layer, wherein the filer layer comprises a heat-bleachable composition comprising a barbituric acid arylidene filter dye is in the presence of an effective amount of a base precursor.