Carbohydrate Or Derivative Containing Patents (Class 430/515)
  • Patent number: 5871899
    Abstract: A silver halide color photographic element comprising a support, a silver halide emulsion and poly(alkylene oxide)s wherein greater than 50 percent of the poly(alkylene oxide)s have acidic functional end groups with an aqueous pKa.ltoreq.10, or end groups which will react to form acidic functional end groups with an aqueous pKa.ltoreq.10 during development, on both termini; and wherein the poly(alkylene oxide)s have a molecular weight ranging substantially between 1700 and 6000 AMU.
    Type: Grant
    Filed: April 30, 1997
    Date of Patent: February 16, 1999
    Assignee: Eastman Kodak Company
    Inventors: David A. Dickinson, George J. Burgmaier, Thomas R. Welter
  • Patent number: 5719015
    Abstract: A silver halide photographic material comprising a support having thereon at least one silver halide light-sensitive layer and at least one light-insensitive layer, wherein the support comprises a poly(alkylene aromatic dicarboxylate) having a glass transition temperature of from 50.degree. C. to 200.degree. C. and is heat-treated at a temperature of not lower than 40.degree. C., but lower than the glass transition temperature for 0.1 to 1500 hours after molding the polymer into the support and before the coating of the silver halide light-sensitive layer, and said at least one light-insensitive layer contains a dispersion of crystallites of at least one dye represented by general formula (I):D--(X).sub.y (I)wherein D represents a moiety having a chromophoric group; X represents a dissociable proton or a group having a dissociable proton which is bonded to D either directly or through a bivalent bonding group; and y represents an integer of 1 to 7.
    Type: Grant
    Filed: May 14, 1996
    Date of Patent: February 17, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiji Mihayashi, Kiyoshi Nakazyo
  • Patent number: 5278037
    Abstract: There is disclosed a silver halide photographic light-sensitive material containing a dye which can be decolored or eluted without causing a stain problem attributable to a residual color, wherein the light-sensitive material comprises a support, having provided thereon at least one light-sensitive silver halide emulsion layer and at least one hydrophilic colloid layer containing a dispersed solid form of a dye, wherein the dye is dispersed in fine particles with an anionic polymer.
    Type: Grant
    Filed: April 24, 1992
    Date of Patent: January 11, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yukio Karino
  • Patent number: 4904565
    Abstract: A high-contrast photographic element is disclosed comprising a support having thereon in order, a layer comprising a filter dye (A), at least one silver halide emulsion layer having a gamma of at least 10, and a layer comprising a filter dye (B), which is the same as or different from dye (A), wherein filter dyes (A) and (B) absorb light in the region of the spectrum to which the silver halide emulsion layer is sensitive.
    Type: Grant
    Filed: January 23, 1989
    Date of Patent: February 27, 1990
    Assignee: Eastman Kodak Company
    Inventors: Ronald J. Schmidt, Hermano P. Rocha
  • Patent number: 4745042
    Abstract: This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography.
    Type: Grant
    Filed: April 17, 1985
    Date of Patent: May 17, 1988
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masaru Sasago, Masayuki Endo, Kenichi Takeyama, Noboru Nomura
  • Patent number: 4409316
    Abstract: Photothermographic imaging elements are provided with strippable layers which have electrical conductivity in the range of 60 to 1,500 ohms/square. The elements may be exposed to radiation and then thermally developed by applying a voltage across the strippable layer which becomes resistively heated. After development, the strippable layer may be removed.
    Type: Grant
    Filed: February 26, 1982
    Date of Patent: October 11, 1983
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Jeanine I. Zeller-Pendrey, Mark C. Skinner, David A. Morgan
  • Patent number: 4262088
    Abstract: A photographic material containing a removable antihalo layer comprising an antihalo agent and a mixture of two copolymers of a low alkymethacrylate and acrylic or methacrylic acid.
    Type: Grant
    Filed: September 20, 1979
    Date of Patent: April 14, 1981
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Angelo Vallarino, Alberto Valsecchi