Vinyl Alcohol Polymer Or Derivative Patents (Class 430/909)
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Patent number: 5362600Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.Type: GrantFiled: May 25, 1993Date of Patent: November 8, 1994Assignee: Shipley Company Inc.Inventors: Roger Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro
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Patent number: 5360864Abstract: A process for preparing a compound having the structure ##STR1## which comprises heating under acidic conditions a polyvinyl alcohol and a compound of the structure ##STR2## is a polyvinyl acetal, n is an integer from 1 to 6,R is hydrogen or alkyl,m is an integer from 1 to 6,X is an anion, ##STR3## is a divalent radical having the structure ##STR4## Y is a monovalent radical having the structure ##STR5## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are hydrogen, alkyl, alkenyl, alkoxy, aralkyl, substituted alkyl, substituted alkoxy, carboxy, carboxy ester, amino, substituted amino, amido, substituted amido, cyano, hydroxy, nitro, isocyanato, sulphonyl halide, sulphonic acid and halide, and may be the same or different, or R.sub.1 taken together with R.sub.2 is methylene-dioxy, and A is a formyl or acetal group.Type: GrantFiled: April 8, 1993Date of Patent: November 1, 1994Assignee: Ulano CorporationInventor: John Curtis
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Patent number: 5358999Abstract: Polyvinyl alcohol is modified by reaction with a stilbazol quaternary salt acetal to produce a water soluble polymer capable of photodimerizing on exposure to active radiation to yield water-soluble photoresist materials.Type: GrantFiled: April 5, 1993Date of Patent: October 25, 1994Assignee: Ulano CorporationInventor: John Curtis
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Patent number: 5350660Abstract: A resist material comprising (a) a polymer having a monomer unit having a special functional group, a monomer unit having a phenolic hydroxyl group, and if necessary a third monomer unit, (b) a photoacid generator, and (c) a solvent can provide a resist film excellent in heat resistance and adhesiveness to a substrate when exposed to light with 300 nm or less such as deep UV light, KrF excimer laser light, etc., and is suitable for forming ultrafine patterns.Type: GrantFiled: January 28, 1991Date of Patent: September 27, 1994Assignee: Wako Pure Chemical Industries, Ltd.Inventors: Fumiyoshi Urano, Masaaki Nakahata, Hirotoshi Fujie, Keiji Oono
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Patent number: 5348838Abstract: A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.Type: GrantFiled: July 30, 1992Date of Patent: September 20, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Toru Ushirogouchi, Naoko Kihara, Osamu Sasaki, Tsukasa Tada, Takuya Naito, Satoshi Saito
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Patent number: 5340696Abstract: The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.Type: GrantFiled: January 29, 1993Date of Patent: August 23, 1994Assignee: Shipley Company Inc.Inventors: James W. Thackeray, Mark Denison, George W. Orsula
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Patent number: 5330877Abstract: Polyvinyl alcohol is modified by reaction with a stilbazol quaternary salt acetal to produce a water soluble polymer capable of photodimercezing on exposure to active radiation to yield water-soluble photoresist materials.Type: GrantFiled: May 29, 1992Date of Patent: July 19, 1994Assignee: Ulano CorporationInventor: John Curtis
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Patent number: 5326669Abstract: A photosensitive polymer composition comprising a compound of the structure ##STR1## wherein ##STR2## is a polyvinyl acetal, n is an integer from 1 to 6,R is hydrogen or alkyl,m is an integer from 1 to 6,X is an anion, ##STR3## is a divalent radical having the structure ##STR4## Y is a monovalent radical having the structure ##STR5## whereis a 5 or 6 membered heterocyclic ring in which Z is nitrogen, substituted nitrogen, oxygen or sulfur, and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are hydrogen, alkyl, alkenyl, alkoxy, aralkyl, substituted alkyl, substituted alkoxy, carboxy, carboxy ester, amino, substituted amino, amido, substituted amid, cyano, hydroxy, nitro, isocyanato, sulphonyl halide, sulphonic acid as halide, and may be the same or different or R.sub.1 taken together with R.sub.2 is methylenedioxy.Type: GrantFiled: May 4, 1992Date of Patent: July 5, 1994Assignee: Ulano CorporationInventor: John Curtis
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Patent number: 5286599Abstract: A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.Type: GrantFiled: September 26, 1991Date of Patent: February 15, 1994Assignee: International Business Machines CorporationInventors: Edward D. Babich, Eileen A. Galligan, Jeffrey D. Gelorme, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino, David F. Witman
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Patent number: 5275907Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin, an acid-substituted ternary acetal polymer, and a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.Type: GrantFiled: July 23, 1992Date of Patent: January 4, 1994Assignee: Eastman Kodak CompanyInventor: John E. Walls
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Patent number: 5275910Abstract: A positive radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3.Type: GrantFiled: October 14, 1992Date of Patent: January 4, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Hiroshi Moriuma, Hirotoshi Nakanishi, Yasunori Uetani
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Patent number: 5273862Abstract: A photopolymerizable recording material is diclosed comprising a base material, a photopolymerizable layer and a cover layer which comprises a water-soluble polymer which is substantially impermeable to atmospheric oxygen, and a polymer which binds atmospheric oxygen and is virtually completely soluble in water at 20.degree. C. The material displays reduced sensitivity to atmospheric oxygen, even on prolonged storage and at elevated ambient temperatures and elevated atmospheric humidity.Type: GrantFiled: July 17, 1992Date of Patent: December 28, 1993Assignee: Hoechst AktiengesellschaftInventors: Rudolf Zertani, Dieter Mohr
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Patent number: 5264317Abstract: The invention creates a selective oxygen barrier around individual coupler or other photographically active particles by surrounding each particle with a layer of water applicable oxygen barrier polymer such as polyvinyl alcohol (PVA), which will also act as a steric barrier to coalescence of the particles. Photographic products formed with such materials are more dye stable.Type: GrantFiled: November 12, 1992Date of Patent: November 23, 1993Assignee: Eastman Kodak CompanyInventors: Pranab Bagchi, James L. Edwards, Wendell F. Smith, Jr., Brian Thomas
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Patent number: 5262270Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and a binary acetal polymer which functions as a polymeric binder. The binary acetal polymers are comprised of recurring units which include two six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group and the other of which is substituted with an aromatic or heterocyclic moiety.Type: GrantFiled: July 30, 1991Date of Patent: November 16, 1993Assignee: Eastman Kodak CompanyInventor: John E. Walls
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Patent number: 5260161Abstract: Disclosed is a photosensitive composition comprising a diazo resin and a polymeric compound containing a structural unit represented by the following formula (I) in the molecule: ##STR1## wherein J represents a divalent linking group and n is 0 or 1. Disclosed is also a photosensitive lithographic printing using the photosensitive composition.Type: GrantFiled: July 31, 1992Date of Patent: November 9, 1993Assignees: Konica Corporation, Mitsubishi Kasei CorporationInventors: Toshiyuki Matsumura, Shinichi Matsubara, Masafumi Uehara, Shinichi Bunya, Eriko Katahashi
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Patent number: 5258257Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.Type: GrantFiled: September 23, 1991Date of Patent: November 2, 1993Assignee: Shipley Company Inc.Inventors: Roger Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro
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Patent number: 5246818Abstract: A developer composition for positive color proofing films containinga) sodium, potassium or ammonium octyl sulfate; sodium, potassium or ammonium lauryl sulfate; sodium decyl sulfate; or sodium tetradecyl sulfate; andb) sodium or potassium borate; andc) boric acid; andd) monobasic sodium or potassium phosphate; ande) sodium or potassium citrate; andf) sodium or potassium salicylate; andg) sodium, potassium or lithium benzoate; andh) sufficient water to formulate an effective developer.Type: GrantFiled: August 16, 1989Date of Patent: September 21, 1993Assignee: Hoechst Celanese CorporationInventor: Shuchen Liu
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Patent number: 5242779Abstract: A photosensitive mixture is disclosed that contains a photocurable compound, for example, a diazonium salt polycondensation product, or a photocurable combination of compounds, for example, a photopolymerizable mixture, and a polymeric binder, which binder is a graft copolymer with a polyurethane graft backbone onto which chains containing vinyl alcohol units and vinyl acetal units derived from hydroxyaldehydes are grafted. The mixture is suitable for use in the production of printing plates and photoresists, can be developed with purely aqueous solutions, and gives printing plates distinguished by high resistance to mechanical and chemical attacks.Type: GrantFiled: January 23, 1992Date of Patent: September 7, 1993Assignee: Hoechst AktiengesellschaftInventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel
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Patent number: 5238781Abstract: Photosensitive compositions comprisinga) at least one solid film-forming polyphenol,b) at least one compound of formula I ##STR1## wherein n is 2, 3 or 4, Ar is an n-valent benzene or naphthalene radical or a divalent radical of formula II ##STR2## Q is a direct bond, --O--, --SO--, --SO.sub.2 --, --CH.sub.2 --, --C(CH.sub.3)(phenyl)- or --C(CH.sub.3).sub.2 --, each of R.sub.1 and R.sub.2, independently of the other, is C.sub.1 -C.sub.8 alkyl, or phenyl or naphthyl each of which is unsubstituted or substituted by C.sub.1 -C.sub.4 alkyl, or R.sub.1 and R.sub.2 together are 1,2-phenylene or --[C(R')(R")].sub.m --, each of R' and R", independently of the other, is hydrogen, C.sub.1 -C.sub.4 alkyl or phenyl and m is 2, 3 or 4, andc) at least one compound that forms an acid under actinic radiation are described.Those compositions are used as negative resists, especially for producing printing plates, printed circuits and integrated circuits.Type: GrantFiled: February 27, 1992Date of Patent: August 24, 1993Assignee: Ciba-Geigy CorporationInventor: Ulrich Schadeli
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Patent number: 5221589Abstract: Disclosed is a photosensitive resin composition which, can be hot melt molding and and is water-developable. The composition does not need the preliminary exposure process and when cured has suitable hardness and printing properties. The photosensitive resin composition comprises;(A) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer obtained by copolymerizing 90 to 99.9 mol % of a vinyl ester and 0.1 to 10 mol % of an ionic group-containing monomer; said polyvinyl alcohol having a saponification degree of the vinyl ester unit of 60 to 75 mol % and a hot melt flow starting temperature of 95.degree. to 170.degree. C.,(B) a polymerizable compound prepared by reacting in the presence of an acid catalyst, (i) N-methylol (meth)acrylamide or N-alkoxymethyl (meth)acrylamide and (ii) a compound selected from the group consisting of monoalcohols, polyhydric alcohols, amides, haloalkylamides, aromatic compounds, ureas and mixtures thereof, and(C) a photopolymerization initiator.Type: GrantFiled: April 3, 1991Date of Patent: June 22, 1993Assignee: Nippon Paint Co., Ltd.Inventors: Osamu Nanba, Chitoshi Kawaguchi, Seiji Arimatsu, Kazunori Kanda
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Patent number: 5219699Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and an acid-substituted ternary acetal polymer which functions as a polymeric binder. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.Type: GrantFiled: July 30, 1991Date of Patent: June 15, 1993Assignee: Eastman Kodak CompanyInventors: John E. Walls, Larry D. LeBoeuf
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Patent number: 5210000Abstract: A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.Type: GrantFiled: February 6, 1992Date of Patent: May 11, 1993Assignee: Shipley Company Inc.Inventors: James Thackeray, George W. Orsula, Roger Sinta
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Patent number: 5187040Abstract: A photocurable mixture is disclosed that contains a diazonium salt polycondensation product or an organic azido compound as the photosensitive compound and a high-molecular weight polymer as the binder, the polymer being a graft copolymer with a polyurethane as the graft backbone, onto which chains containing vinyl alcohol units are grafted. The mixture is suitable for use in the production of printing plates and photoresists, which can be developed with aqueous solutions. It yields printing plates having a good ink acceptance and long shelf life that produce large print runs.Type: GrantFiled: June 21, 1990Date of Patent: February 16, 1993Assignee: Hoechst AktiengesellschaftInventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel, Karl-Josef Rauterkus
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Patent number: 5185230Abstract: The invention creates a selective oxygen barrier around individual coupler or other photographically active particles by surrounding each particle with a layer of water applicable oxygen barrier polymer such as polyvinyl alcohol (PVA), which will also act as a steric barrier to coalescence of the particles. Photographic products formed with such materials are more dye stable.Type: GrantFiled: September 3, 1991Date of Patent: February 9, 1993Assignee: Eastman Kodak CompanyInventors: Pranab Bagchi, James L. Edwards, Wendell F. Smith, Jr., Brian Thomas
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Patent number: 5173382Abstract: A photosensitive composition comprising a water-soluble polymer, a dichromate and at least one aromatic diazonium salt selected from aromatic diazonium sulfates, sulfonates and chromates has high sensitivity, and a pattern having high resolution can be formed therefrom with a shortened exposure time.Type: GrantFiled: January 9, 1990Date of Patent: December 22, 1992Assignee: Hitachi, Ltd.Inventors: Hajime Morishita, Nobuaki Hayashi, Saburo Nonogaki, Masato Ito, Masahiro Nishizawa, Kiyoshi Miura
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Patent number: 5153102Abstract: An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.Type: GrantFiled: August 10, 1990Date of Patent: October 6, 1992Assignee: Industrial Technology Research InstituteInventors: Rong-Jer Lee, Chein-Dhau Lee, Wen-Shin Shen, Dhei-Jhai Lin
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Patent number: 5128232Abstract: A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.Type: GrantFiled: May 22, 1989Date of Patent: July 7, 1992Assignee: Shiply Company Inc.Inventors: James Thackeray, George W. Orsula, Roger Sinta
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Patent number: 5100763Abstract: Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises:(i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer of a vinyl ester and another copolymerizable monomer, which has a saponification degree of the vinyl ester unit of 50 to 70 mol % and a hot melt flow starting temperature of 60.degree. to 130.degree. C.,(ii) a polymerizable monomer, and(iii) a photopolymerization initiator.Type: GrantFiled: March 12, 1990Date of Patent: March 31, 1992Assignee: Nippon Paint Co., Ltd.Inventors: Koichi Kimoto, Yasushi Umeda, Chitoshi Kawaguchi, Toshitaka Kawanami
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Patent number: 5098803Abstract: Solid photopolymerizable compositions and photosensitive elements are provided that are useful in preparing optical elements, and especially holograms. The compositions contains a polymeric binder, a liquid ethylenically unsaturated monomer, and a photoinitiator system. Typical compositions have a refractive index modulation of at least 0.005 when measured per the specified test.Type: GrantFiled: February 14, 1990Date of Patent: March 24, 1992Assignee: E. I. Du Pont de Nemours and CompanyInventors: Bruce M. Monroe, William K. Smothers
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Patent number: 5061602Abstract: In a photosensitive recording material suitable for producing plates or resist patterns, the photopolymerizable recording layer contains as polymeric binder a film-forming copolymer which has a multiphase morphology, one phase having a glass transistion temperature below room temperature and a further phase having a glass transition temperature above room temperature and this copolymer having been obtained by free radical copolymerization of one or more macromers with one or more further olefinically unsaturated copolymerizable organic compounds.Type: GrantFiled: July 25, 1989Date of Patent: October 29, 1991Assignee: BASF AktiengesellschaftInventors: Horst Koch, Hans Schupp, Reinhold Schwalm
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Patent number: 5057390Abstract: A photosensitive composition characterized by comprising:(a) a vinyl alcohol polymer containing the following structural unit A and having a saponification degree of a vinyl ester unit of not less than 70 mol %: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 each represents H or a hydrocarbon group having 1 to 4 carbon atoms;(b) a radically polymerizable ethylenic unsaturated compound; and,(c) a photopolymerization initiator,having flexiblity and impact resistance which can maintain sufficient softness but are not broken particularly even at low temperature and low humidity so that resin plates showing high printing quality can be obtained from the photosensitive composition.Type: GrantFiled: November 20, 1986Date of Patent: October 15, 1991Assignee: Kuraray Company, Ltd.Inventors: Toshiaki Sato, Junnosuke Yamuchi, Takuji Okaya
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Patent number: 5049478Abstract: A novel, improved continuous process for the production of a photosensitive recording element is described, whose photopolymerizable recording layer (A) consists of two or more individual strata (a.sub.n) lying one on top of the other and firmly bonded to one another. The individual strata (a.sub.n) may be of the same or roughly the same composition or of different compositions. In the novel, improved continuous process, the mixtures (a.sub.n) used for the production of the individual strate (a.sub.n) are prepared separately from one another and melted and, as separate molten material streams (a.sub.n), are combined even before entering the nip of a calender, without the said streams mixing as a result of turbulence. During, before or directly after they have been combined, the molten material streams (a.sub.n) are formed into molten sheet-like structures (a.sub.n) lying one on top of the other, without the said streams mixing as a result of turbulence. Thereafter, the molten sheet-like structures (a.sub.Type: GrantFiled: September 26, 1989Date of Patent: September 17, 1991Assignee: BASF AktiengesellschaftInventors: Horst Koch, Karl-Rudolf Kurtz, Thomas Telser, Manfred Zuerger
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Patent number: 5023165Abstract: A printing plate having a photosensitive layer formed of a photosensitive polymer composition including the following components A, B, and C:A. 100 parts by weight of parially saponified polyvinyl acetate having a saponification degree of 60 to 99 mole %;B. 20 to 200 parts by weight of polyfunctional acrylate or methacrylate having a molecular weight of not more than 2000 and having at least two acryloyl or methacryloyl groups in the same molecule thereof and a number of a hydroxyl group or groups not more than the number of said acryloyl and methacryloyl groups in the same molecule thereof; andC. 1 to 60 parts by weight of a saturated compound having a molecular weight of not more than 1000 and a boiling point of not less than 150.degree. C. and having at least one hydroxyl group in the molecule thereof.Type: GrantFiled: February 27, 1989Date of Patent: June 11, 1991Assignee: Toray Industries, Inc.Inventor: Junichi Fujikawa
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Patent number: 4994347Abstract: Solid storage stable photopolymerizable compositions are provided that are useful in preparing optical elements, and especially holograms. The composition contains a polymeric binder, N-vinyl carbazole and a photoinitiator system that has a hydrogen donor component.Type: GrantFiled: December 23, 1988Date of Patent: February 19, 1991Assignee: E. I. du Pont de Nemours and CompanyInventor: William K. Smothers
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Patent number: 4990417Abstract: A method for forming a phosphor pattern on a panel of a cathode ray tube to prevent the peeling of a black matrix from the glass panel when treated with an inversion solvent which involves forming a protective film of a transparent photosensitive material on a glass panel on which a black matrix is formed and using the so-called outer surface exposure method to produce a color cathode ray tube having high definition.Type: GrantFiled: November 13, 1989Date of Patent: February 5, 1991Assignee: Sony CorporationInventors: Koki Inada, Norihiro Tateyama
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Patent number: 4981769Abstract: A light image forming material comprising a support having provided thereon a layer comprising microcapsules containing a leuco dye capable of developing a color through oxidation and a photo oxidizing agent, a reducing agent provided outside the microcapsules, and the layer further comprising carboxy-modified polyvinyl alcohol and epoxidated polyamide resin for imparting high water resistivity.Type: GrantFiled: August 18, 1989Date of Patent: January 1, 1991Assignee: Fuji Photo Film Co., Ltd.Inventors: Keiso Saeki, Tosiaki Endo
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Patent number: 4970134Abstract: Multilayer, photosensitive recording materials which can be developed with aqueous media contain one or more layers of a mixture which is crosslinkable by photopolymerization, soluble or dispersible in aqueous media and based on polymer containing hydroxyl and/or amide groups, as binders, compatible photopolymerizable monomers and photopolymerization initiators, which mixture contains from 0.1 to 10% by weight, based on its total amount, of an aldehyde of the general formula I ##STR1## where R is hydrogen, hydroxyl, C.sub.1 -C.sub.6 -alkyl, C.sub.1 -C.sub.6 -alkoxy, C.sub.6 -C.sub.10 -aryl or C.sub.6 -C.sub.10 -aryloxy.Type: GrantFiled: June 10, 1988Date of Patent: November 13, 1990Assignee: BASF AktiengesellschaftInventors: Bernd Bronstert, Manfred Zuerger
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Patent number: 4963462Abstract: This invention relates to positive working color proofing sheet construction which, upon exposure to an actinic radiation source through a screened image, can accuratley reprouce said image. The construction is useful as a color proofing film which can be employed to accurately predict the image quality from a lithographic printing process. The image is produced by forming a composite of a receiver base, diazo or diazide layer, photopolymerizable layer and cover sheet. Upon imagewise exposure, a positive image appears on the receiver base after dry peel apart development.Type: GrantFiled: January 8, 1990Date of Patent: October 16, 1990Assignee: Hoechst Celanese CorporationInventor: Wojciech A. Wilczak
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Patent number: 4960673Abstract: Photopolymerizable laminates suitable for producing flexible and resilient printing plates carry on a dimensionally stable base at least one intermediate layer and on top thereof a photopolymerizable layer which consists essentially of a mixture of a water-soluble copolymer or derivative of polyvinyl alcohol, a specific copolymerizable mono-functional (meth)acrylate, a photoinitiator and a thermal polymerization inhibitor.Type: GrantFiled: March 17, 1989Date of Patent: October 2, 1990Assignee: BASF AktiengesellschaftInventors: Erich Beck, Bernd Bronstert, Wolfgang Huemmer, Dieter Littmann
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Patent number: 4942112Abstract: Solid photopolymerizable compositions and photosensitive elements are provided that are useful in preparing optical elements, and especially holograms. The composition contains a polymeric binder, a liquid ethylenically unsaturated monomer, and a photoinitiator system. Typical compositions have a refractive index modulation of at least 0.005 when measured per the specified test.Type: GrantFiled: January 15, 1988Date of Patent: July 17, 1990Assignee: E. I. Du Pont de Nemours and CompanyInventors: Bruce M. Monroe, William K. Smothers
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Patent number: 4940646Abstract: A polyvinyl acetal is described which contains 4 to 40 mol-% vinyl alcohol units, 1 to 20 mol-% vinyl acetate units, 0 to 85 mol-% vinyl acetal units derived from an aldehyde free of OH groups and 1 to 85 mol-% vinyl acetal units derived from an aldehyde containing OH groups. The polymer is suitable as binder for photosensitive mixtures, in particular for the preparation of printing plates and photoresists. The layers obtained therewith can be developed with neutral or weakly alkaline, purely aqueous solutions and produce printing plates with a high print run performance and good ink receptivity.Type: GrantFiled: December 21, 1987Date of Patent: July 10, 1990Assignee: Hoechst AktiengesellschaftInventor: Georg Pawlowski
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Patent number: 4935333Abstract: Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises:(i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer which is obtained from copolymerizing 0 to 20 mol % of a monomer not having an ionic group (hereinafter referred to as "nonionic monomer"), 0 to 10 mol % of an ionic group-containing monomer (hereinafter referred to as "ionic monomer") and the remaining amount of a vinyl ester in the presence of a thiolic acid wherein the total content of the ionic monomer and nonionic monomer is 0.1 to 20 mol %; said polyvinyl alcohol having a terminal mercapto group, a saponification degree of the vinyl ester unit of 50 to 70 mol %, and a hot melt flow starting temperature of 60.degree. to 130.degree. C.(ii) a polymerizable monomer, and(iii) a photopolymerization initiator.Type: GrantFiled: January 15, 1988Date of Patent: June 19, 1990Assignee: Nippon Paint Co., Ltd.Inventors: Koichi Kimoto, Yasushi Umeda, Chitoshi Kawaguchi, Toshitaka Kawanami
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Patent number: 4933260Abstract: A water-based photopolymerizable resin composition is disclosed which is suitable for the preparation of a relief printing plate by the photolithographic techniques. The inventive composition, which basically comprises a water-soluble polymer, e.g., poly(vinyl alcohol), a photopolymerizable monomer and a photopolymerization initiator, is characterized in that at least a part of the photopolymerizable monomer is N-tetrahydrofurfuryloxymethyl acrylamide or N-tetrahydrofurfuryloxymethyl methacrylamide. By virtue of this unique ingredient in the composition, the printing plate prepared from the inventive composition is imparted with improved fidelity of pattern reproduction and durability in printing as a consequence of increased hardness and pliability to be freed from the drawback of crack formation in printing even on a cylinder of small diameter under a cold and low-humidity condition.Type: GrantFiled: August 31, 1989Date of Patent: June 12, 1990Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Naoya Katsumata, Syunzi Nakazato, Katsuyuki Ohta, Toshimi Aoyama
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Patent number: 4927737Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a binder resin having the general formula--A--B--C--wherein a plurality of each of components A, B and C occur in ordered or random sequence in the resin and wherein A is present in said resin at about 5% to about 20% by weight and comprises groups of the formula ##STR1## B is present in said resin at about 4% to about 30% by weight and comprises groups of the formula ##STR2## and C is present in said resin at about 50% to about 91% by weight and comprises acetal groups consisting of groups of the formulae ##STR3## where R is lower alkyl or hydrogen, and wherein said group I is present in component C from about 75% to about 85%, group II is present in component C from about 3% to about 5%; and group III is present in component C from about 10% to about 22%;(b) a photoinitiator; and(c) an acrylic monomer having one or more unsaturated groups.Type: GrantFiled: May 26, 1988Date of Patent: May 22, 1990Assignee: Hoechst Celanese CorporationInventors: John E. Walls, Carlos Tellechea, Major S. Dhillon
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Patent number: 4895788Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a binder resin having the general formula-A-B-C-wherein a plurality of each of components A, B and C occur in ordered or random sequence in the resin and wherein A is present in said resin at about 5% to about 20% by weight and comprises groups of the formula ##STR1## B is present in said resin at about 4% to about 30% by weight and comprises groups of the formula ##STR2## and C is present in said resin at about 50% to about 91% by weight and comprises acetal groups consisting of groups of the formulae ##STR3## where R is lower alkyl or hydrogen, and wherein said group I is present in component C from about 75% to about 85%, group II is present in component C from about 3% to about 5%; and group III is present in component C from about 10% to about 22%;(b) a photoinitiator;(c) a photopolymerizable mixture of(1) a polyethoxylate diacrylate monomer; aType: GrantFiled: May 26, 1988Date of Patent: January 23, 1990Assignee: Hoechst Celanese CorporationInventors: John E. Walls, Frank C. Pagano
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Patent number: 4859562Abstract: A photosensitive mixture that contains a photosensitive compound, for example, a photoinitiator or a diazo compound, and a reaction product of a polymer containing active hydrogen with an olefinically unsaturated compound represented by the formula ##STR1## wherein X and Y are the same or different and denote oxygen or sulfur,R.sub.1 is an olefinically unsaturated aliphatic radical containing 2 to 8 carbon atoms andR.sub.2 is a saturated aliphatic radical containing 1 to 8 carbon atoms or an aryl radical containing 6 to 10 carbon atoms,is suitable for producing photoresists and printing plates.Type: GrantFiled: May 8, 1987Date of Patent: August 22, 1989Assignee: Hoechst AktiengesellschaftInventors: Georg Pawlowski, Hans-Jerg Kleiner, Thomas Gerdau
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Patent number: 4849307Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3).Type: GrantFiled: December 8, 1987Date of Patent: July 18, 1989Assignee: BASF AktiengesellschaftInventors: Gerhard Hoffmann, Horst Koch, Guenther Schulz
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Patent number: 4839254Abstract: A photosensitive mixture contains a photosensitive compound and a polymeric binder which s a reaction product of a compound represented by the formula ##STR1## wherein X and Y are the same or different, and each denotes oxygen or sulfur,R.sub.1 and R.sub.2 are the same or different, and each denotes an unsubstituted or substituted alkyl, cycloalkyl or alkoxy radical containing from 1 to 6 carbon atoms; an unsubstituted or substituted aryl or aryloxy radical containing from 6 to 10 carbon atoms; or, together with the phosphorus atom, a 5- or 6-membered heterocyclic ring which is unsubstituted or substituted or which carries a fused benzene ring,with a polymer containing active hydrogen. The novel binders used in the mixture can be easily prepared and yield photosensitive layers of good developability and developer resistance.Type: GrantFiled: May 8, 1987Date of Patent: June 13, 1989Assignee: Hoechst AktiengesellschaftInventors: Georg Pawlowski, Hans-Jerg Kleiner
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Patent number: 4830947Abstract: A light-sensitive material comprising a light-sensitive layer containing silver halide, a hydrophilic polymer adsorbed on the silver halide, a reducing agent and a polymerizable compound provided on a support, characterized in that the hydrophilic polymer comprises gelatin and a water soluble vinyl polymer having a high physical retardance is disclosed. The ratio of the vinyl polymer to the gelatin ranges from 0.1 to 20 weight %. The physical retardance of the vinyl polymer is not less than 25.0, which is defined as a value measured according to PAGI method.Type: GrantFiled: October 6, 1987Date of Patent: May 16, 1989Assignee: Fuji Photo Film Co., Ltd.Inventor: Yutaka Oka
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Patent number: 4828963Abstract: A printing plate having a photosensitive layer formed of a photosensitive polymer composition including the following components A, B, and C:A. 100 parts by weight of partially saponified polyvinyl acetate having a saponification degree of 60 to 99 mole %;B. 20 to 200 parts by weight of polyfunctional acrylate or methacrylate having a molecular weight of not more than 2000 and having at least two acryloyl or methacryloyl groups in the same molecule thereof and a number of a hydroxyl group or groups not more than the number of said acryloyl and methacryloyl groups in the same molecule thereof; andC. 1 to 60 parts by weight of a saturated compound having a molecular weight of not more than 1000 and a boiling point of not less than 150.degree. C. and having at least one hydroxyl group in the molecule thereof.Type: GrantFiled: December 17, 1987Date of Patent: May 9, 1989Assignee: Toray Industries, Inc.Inventor: Junichi Fujikawa