Abstract: A thermal processing system is disclosed. The thermal processing system includes a transfer stage, one or more thermal processing chambers and an interface to a deposition equipment. The transfer stage is provided to receive workpieces for thermal processing. Further the transfer stage is provided as a mechanism to move workpieces from one chamber to another chamber. The thermal processing chamber includes a heat manipulation system to heat up or cool down the workpieces. The thermal processing chamber is designed to accommodate a platform that positions each of the workpieces vertically. As a result, all workpieces are moved together with the platform to be transferred, for example, from one chamber to another chamber. Depending on implementation, the platform may be implemented to include a fixture or a plurality of fixtures, where all of the workpieces may be removably held up by the fixture or each of the workpieces is removably held up by one of the fixtures.

Abstract: A carrier transport system transports a plurality of carriers by a transport conveyor into a heating furnace, advances a comb-shaped carrier stopper having a plurality of protrusions toward the carriers, moves the carriers by the transport conveyor in a transport direction to engage cutout grooves, provided respectively for the carriers, with the protrusions of the carrier stopper to thereby position the carriers at a time. The carrier transport system advances the carrier stopper toward the carriers to insert distal ends of the protrusions of the carrier stopper into insertion holes, and then determines, on the basis of a moved distance X of the carrier stopper, whether the carriers are properly positioned.

Abstract: This invention relates to a two or three-stage apparatus and method of use to produce high purity silicon, such as for use in solar panels and/or photovoltaics. The device of this invention includes a melting apparatus with a delivery device, a holding apparatus with a tipping or transfer mechanism, and at least one solidification apparatus for receiving a molten feedstock. The optimized designs of individual apparatuses function efficiently in combination to produce high purity silicon.

Abstract: A manufacturing method for a semiconductor device including: determining pattern dependency of a radiation factor of an element forming surface of one wafer having a predetermined pattern formed on the wafer; determining a heating surface of the wafer, based on the pattern dependency of the radiation factor; holding the one wafer having the determined heating surface and another wafer having a determined heating surface, spaced at a predetermined distance in such a manner that non-heating surfaces of the one wafer and the another wafer oppose to each other; and heating the each heating surface of the one wafer and the another wafer.

Abstract: An apparatus for preheating a batch (12) of glass cullet which is preferably enriched with raw materials for glass production, comprising a bunker (14) and flow ducts (22) formed therein, wherein the bunker (14) comprises a plurality of flow ducts (22) which are arranged vertically, and if appropriate offset, one above another and extend at an angle in relation to the vertical, in particular horizontally, wherein each flow duct (22) is composed of a profiled section (34) for forming an upper half thereof and also a heap of the batch (12) of glass cullet which is formed underneath the profiled section and forms the lower half of the flow duct (22), and wherein the profiled section has at least two limbs (36a, b) which laterally delimit the space between them.

Abstract: A preheating apparatus for particulate material comprises a containment vessel, a floor ending in a central material discharge section, and a vertically oriented outer annular preheating section which circles the center section, with said annular preheating section having an outer wall and an inner wall having a lower side that is spaced above the floor to form an arch. A ram-type plunger feeder moves reciprocally from a first retracted position located closer to the outer wall to a second extended position located between the first retracted position and the material outlet of the chamber for contacting particulate material with said pusher face and moving particulate material under the arch and toward the material outlet.

Abstract: The invention relates to a feeding device for a belt-type sintering machine, with a feeding container for receiving the material to be sintered, with a conveying device for filling the feeding container with material to be sintered, with a feeding drum and a drum chute for feeding the material to be sintered onto the sintering belt. The feeding container has two discharge openings, one of which is connected to a feeding drum and one of which is connected to a feeding chute.

Abstract: A high pressure hot gas generating device comprises a combustion furnace; an interior of the combustion furnace having a combustion chamber; a lower side of the combustion furnace having an ash exhausting opening; an upper side of the combustion furnace having a high pressure hot gas output tube; a fuel transfer mechanism installed at one side of the combustion furnace and inserted into the combustion chamber for providing solid fuel to the combustion chamber of the combustion furnace; the fuel transfer mechanism can adjust the speed and amount of the solid fuel entering into the combustion chamber; and an air inlet unit installed at one side of the combustion furnace and inserted into the combustion chamber for supplying air to the combustion chamber to be used in the initial ignition; and an ignition unit.

Abstract: An apparatus for heat treating manufactured components using microwave energy and microwave susceptor material. Heat treating medium such as eutectic salts may be employed. A fluidized bed introduces process gases which may include carburizing or nitriding gases. The process may be operated in a batch mode or continuous process mode. A microwave heating probe may be used to restart a frozen eutectic salt bath.

Abstract: A heating device provided with a cooling plate and a heating plate is formed in a low height, and floats a substrate above the cooling plate and the heating plate and moves the substrate horizontally between the cooling plate and the heating plate by the pressure of a gas. A heating device 2 includes a cooling plate 3 provided with flotation gas spouting ports 3a, and a heating plate provided with flotation gas spouting ports. The flotation gas spouting ports 3a and 3b are arranged along a wafer moving passage and are formed so as to spout the gas obliquely upward toward a first end of the wafer moving passage on the side of the cooling plate. A pushing member 51 is brought into contact with a back part of a wafer W with respect to a direction in which the wafer W is moved to move the wafer W in a direction toward the heating plate 6 opposite a direction in which the flotation gas is spouted.

Abstract: In a method for introducing waste substances and/or alternative fuels into a clinker production process, the raw materials, in the form of slurries or suspensions, are subjected to mechanical deagglomeration as a pumpable mass. The pumpable mass is ejected into risers, precalciners and/or the rotary tubular kiln. The device for carrying out the method is characterized by a tubular housing (1) including a rotor (2) mounted to be rotational substantially concentrically with the tube axis and driveable for rotation with blades (3) sweeping over the space between the rotor shaft and the housing wall, wherein a plurality of ducts and openings (6, 7, 11, 14) are connected to the shell of the tubular housing (1), and at least one duct (6) is arranged with the slurry supply and at least one duct is offset in the peripheral direction.

Abstract: In drying of a glass substrate to which a coated film is applied, the heating and drying is conducted while feeding means 10, 18, which always moves on a lower surface of the glass substrate 6 to which the coated film is applied, abuts against the substrate, in order to solve a problem that when the lower surface of the coated film is supported for a long time, supporting traces occur and thereby quality of the glass substrate is reduced. With this configuration, traces of the pin 11, 12, 21 are less likely to occur.

Abstract: The invention relates to a method for the gradual temperature control of chemical substances with defined entry and exit temperatures in a heater, said substances being maintained in a specific defined temperature range as they are conducted through the heater, and to a device for carrying out said method. The aim of the invention is to provide a suitable method and device for carrying out said method, said device permitting an economically advantageous, reliable and environmentally friendly operation, in particular during the start-up process for the device. This aim is achieved by the features according to the invention mentioned in claims 1;11 and 19; 22.

Abstract: A CMC wall (20F) may be attached to a metal wall (22F) by a plurality of bolts (28A, 28B, 28C) passing through respective holes (24A, 24B, 24C) in the CMC wall (20F) and holes in the metal wall (22F), clamping the walls (20F, 22F) together with a force that allows sliding thermal expansion but does not allow vibrational shifting. Distal ones of the holes (24A, 24B) in the CMC wall (20F) or in the metal wall (22F) are elongated toward a central one of the bolts (24C) or at alternate angles to guide differential thermal expansion (20T) of the CMC wall (20F) versus the metal wall (22F) between desired cold and hot geometries. A second CMC wall (20R) may be mounted similarly to a second metal wall (22R) by pins (39A, 39B, 39C) that allow expansion of the CMC component (201) in a direction normal to the walls (20F, 20R).

Abstract: A material supply device for diffusion furnaces includes a main body, a fixing pedestal mechanism, a transmission mechanism and a cover mechanism for a furnace door. The main body includes a base portion and a main rod. The base portion is mounted on the main rod and the main rod extends through the base portion. The fixing pedestal mechanism is mounted on the main rod and is pivotedly mounted on a fixing pedestal. The transmission mechanism is mounted on the base portion and has a transmission rod slidably mounted on the base portion. The cover mechanism for a furnace door is fixed on an end of the transmission rod which is far away from the main body and is turnablely mounted on a cover of the furnace door. Based on the above assemblies, the present invention runs smoothly and improves production quality.

Abstract: A pusher plate for use in a pusher furnace includes a shaped guidance groove in its lower surface which preferably has a bow-tie shape with a narrower central section and wider ends proximate the leading and trailing faces of the plate. The groove receives therein a guide rail which is disposed intermediate a pair of slide rails upon which the plate slides. The shape of the groove allows the plate a small amount of lateral rotation to minimize jamming during travel. Adjacent plates pivot upon contact with each other to automatically adjust their orientation during travel through the furnace. The leading and trailing faces of the plates thus contact one another over a larger surface area to reduce damage to the plates by reducing the pressure therebetween.

Abstract: The present invention is a quartz-product baking method for baking a first quartz product and a second quartz product to remove a metal contained therein, the first and second quartz products being to be loaded into a heat-processing apparatus for heat-processing a semiconductor substrate so that at least a part of each quartz product is brought into contact with a heat-processing atmosphere of the heat-processing apparatus, the quartz-product baking method comprising the steps of: with the use of a jig including a first jig element and a second jig element that are disengageably stacked in a tier-like manner, placing the first quartz product on the first jig element, stacking the second jig element on the first jig element, and placing the second quartz product on the second jig member; placing on a lid member the jig in which the quartz products are placed in a tier-like manner, elevating the lid member to load the jig into a baking vertical vessel through a lower opening thereof, and hermetically sealing t

Abstract: In a method for increasing the throughput of packages of waste material of a high caloric value of rotary kiln plants which include a rotary tube with a combustion chamber and a post combustion chamber to which the combustion gases from the rotary tube are supplied and which includes at least one burner supplied by gas from a gas supply, the waste packages are supplied to the rotary tube and burned therein with oxygen containing gas and the combustion gas flows to the post combustion chamber for post combustion, the combustion process being continuously monitored in the kiln and the post combustion chamber and controlled by adjustment of the combustion conditions in the kiln and the post combustion chamber.

Abstract: A heat treatment apparatus and associated method are provided for heating a substrate. The apparatus includes a processing chamber containing a process space, first and second substrate supports, and first and second heating sources. The first substrate support is configured to support the substrate in a spaced relationship with the first heating source to define a heat exchange gap and to transfer heat energy through the heat exchange gap to elevate a temperature of the substrate to an offset temperature below a process target temperature. The second substrate support is configured to support the substrate in a spaced relationship with a second heating source to define a heat exchange gap between the second heating source and the substrate and to transfer heat energy through the heat exchange gap to elevate the temperature of the substrate from the offset temperature to the process target temperature in controlled increments.

Abstract: A paddle for the production of semiconductor wafers is provided. The paddle can be a cantilever paddle made of a ceramic such as silicon carbide and can be used with round or square wafers, such as photovoltaic wafers. The paddle exhibits excellent deflection and strength characteristics.

Abstract: A thermal processing system is disclosed. The thermal processing system includes a transfer stage, one or more thermal processing chambers and an interface to a deposition equipment. The transfer stage is provided to receive workpieces for thermal processing. Further the transfer stage is provided as a mechanism to move workpieces from one chamber to another chamber. The thermal processing chamber includes a heat manipulation system to heat up or cool down the workpieces. The thermal processing chamber is designed to accommodate a platform that positions each of the workpieces vertically. As a result, all workpieces are moved together with the platform to be transferred, for example, from one chamber to another chamber. Depending on implementation, the platform may be implemented to include a fixture or a plurality of fixtures, where all of the workpieces may be removably held up by the fixture or each of the workpieces is removably held up by one of the fixtures.

Abstract: A transfer mechanism 21 of a vertical heat treatment system 1 includes a base capable of vertical movement and turning movement, and plural substrate support devices, disposed on the base so as to be movable anteroposterior, that hold wafers W. Provided on the base 25 is a first sensor 45 that emits a light beam directed toward a direction in which the substrate support device 20 moves anteroposterior, and detects the target member upon receipt of a reflected light of the light beam. Provided on two tip end portions of the substrate support device 20 is a second sensor 40 that detects the target member upon interruption of a light beam traveling between the tip end portions by the target member. When a target member 44 provided at its specific positions with projections 49 and 50 is placed at a position in a wafer boat 8, the base 25 moves vertically and turns, and the substrate support device 20 moves anteroposterior.

Abstract: A vertical heat treatment apparatus includes: at least one loading and unloading part 3 and 4 for loading and unloading a carrying container 2 containing a plurality of process objects W into and from said vertical heat treatment apparatus; a first storage part 5 that stores a plurality of carrying containers loaded into said vertical heat treatment apparatus via the loading and unloading part; a heat treatment furnace 7 that accommodates a holder 6 holding a plurality of process objects at multiple levels to perform a predetermined heat treatment to the process objects; and a transfer 8 part that supports thereon a carrying container for transferring process objects between the holder and the carrying container, wherein an upper loading and unloading part 3 and a lower loading and unloading part 4 are provided as said at least one loading and unloading part, and a second storage part 20 that stores a carrying container is disposed between the upper and lower loading and unloading parts.

Abstract: Method and apparatus for pneumatically drying thickened lime mud and feeding the dried thickened lime mud to a lime reburning kiln. The thickened mud is pneumatically dried via the action of flue gas emanating from the lime reburning kiln. The dried, thickened lime is separated from the flue gas in a cyclone separator. A process loop controller determines the temperature of the separated lime and, in response, controls the feed rate of lime fed to the pneumatic dryer to ensure that the dryer possesses the requisite latent heat needed to dry thickened lime therein. In one embodiment, the feed rate of lime fed to the thickener is adjustably controlled which, in turn, adjustably varies the flow rate of the thickened mud to the dryer.

Abstract: The invention relates to a method for the continuous melting of inorganic salts and a furnace installation for realizing the method. Solid salts are fed into a furnace with the aid of a feeding unit. The salts contained in the furnace are heated. A flow of the salts is generating inside the furnace with the aid of a circulating unit. The flow generates a two-phase region containing solid and melted salt and a separate second region containing substantially solely a melt that is heated to the desired temperature. The melt is discharged from the separate second region simultaneous with the feeding of the solid salts into the furnace with the aid of a removal unit.

Abstract: A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. At least two of the process chamber modules are horizontally clustered around the substrate transfer chamber. In addition, at least two of the process chamber modules are vertically arranged with one process chamber module above the other process chamber module. The substrate transfer chamber includes one or more robotic arms for transferring semiconductor substrates between the substrate load lock chamber and the plurality of process chamber modules.

Abstract: A vertical type of thermal processing apparatus of the present invention includes a thermal processing furnace having a furnace opening at a lower portion thereof. A boat holding objects to be processed in a tier-like manner in a vertical direction is adapted to be contained in the thermal processing furnace through the furnace opening. A lid supporting the boat is capable of closing the furnace opening. A transferring chamber is connected to the furnace opening. An elevating mechanism provided in the transferring chamber is configured to move up and down the lid in order to load and unload the boat into and out from the thermal processing furnace. A connecting port provided at a wall of the transferring chamber is capable of being connected to an opening of a conveying container for containing the objects to be processed. A first containing portion provided in the transferring chamber is capable of temporarily containing unprocessed objects to be processed for a next thermal process.

Abstract: In an apparatus and a method for heating product streams, particularly food product streams containing fruits or fruit pieces, the product 47 flows through a product-carrying channel 2. The apparatus comprises means for generating high electrical alternating fields, wherein the means comprises electrodes, electrode terminals and an alternating field generator. The invention is characterized in that the electrodes are provided within the product-carrying channel.

Abstract: A cooling apparatus for a fired body includes a transporting member for transporting a firing jig in which a ceramic fired body is housed; a plurality of blowers for cooling the ceramic fired body; and a suction mechanism for changing the atmosphere inside the firing jig from an inert gas atmosphere to an air atmosphere.

Abstract: A screw conveyor includes a hollow rotatable shaft having an externally mounted flight extending along a portion of its length. Thermal applicating structure is provided at one end of the shaft for heating or cooling the screw conveyor. A thermosyphon is mounted within the shaft. The thermosyphon includes a hollow tube mounted against and in direct surface to surface contact with the shaft to rotate co-jointly with the shaft.

Abstract: The invention relates to a feeding device for a belt-type sintering machine, with a feeding container for receiving the material to be sintered, with a conveying device for filling the feeding container with material to be sintered, with a feeding drum and a drum chute for feeding the material to be sintered onto the sintering belt. The feeding container has two discharge openings, one of which is connected to a feeding drum and one of which is connected to a feeding chute.

Abstract: A substrate processing apparatus is provided which has a plurality of heat treatment apparatus blocks each comprised of a plurality of stacked heat treatment apparatuses HP each having a temperature adjustment mechanism 70 configured to be able to move a processing target substrate to a heat treatment section and adjust the temperature of the processing target substrate, and includes a cooling liquid supply mechanism 81 that supplies a cooling liquid set for a predetermined temperature to be supplied for each of the heat treatment apparatus blocks HPB, a supply mechanism 99 which branches the cooling liquid supplied from the cooling liquid supply mechanism 81 and supplies the cooling liquid to each temperature adjustment mechanism 70 of a plurality of heat treatment sections HP in one of the heat treatment apparatus blocks, and an exhaust mechanism comprised of at least one exhaust opening, on the side opposite to the temperature adjustment mechanism of the heat treatment section, for forming a flow of a gas

Abstract: An apparatus for heat treating manufactured components using microwave energy and microwave susceptor material. Heat treating medium such as eutectic salts may be employed. A fluidized bed introduces process gases which may include carburizing or nitriding gases. The process may be operated in a batch mode or continuous process mode. A microwave heating probe may be used to restart a frozen eutectic salt bath.

Abstract: The invention provides a raw materials feeding apparatus capable of uniformly dispersing and feeding into a furnace agglomerated raw materials that are likely to undergo dusting, deformation and mutual adhesion. In a raw material feeding apparatus for a rotary hearth furnace, for feeding raw materials to a rotary hearth furnace by using a flat belt conveyor, the invention employs a construction in which a scraper for guiding the raw materials on the flat belt conveyor to a side surface of the flat belt conveyor is arranged obliquely to a traveling direction of the flat belt conveyor. Preferably, the scraper is arranged in such a manner as to guide the raw materials to both sides of the flat belt conveyor.

Abstract: The invention relates to a pusher furnace (1) for the annealing treatment of aluminum bars for instance. Rails (7) with plate-shaped sliding supports (8) are provided. Said supports cover the entire width of the rails (7) and are produced with grooves (12) on the upper sides thereof. The grooves extend in the longitudinal direction of the rails (7) in an arrow-shaped manner and serve for receiving driven material. Several sliding supports (8) are juxtaposed and thereby form arrow-shaped expansion joints. The rails (7) and the sliding supports (8) can be easier produced and assembled by virtue of the inventive embodiment of said rails (7) and sliding supports (8). Furthermore, the material (10) can be transported without jolts in as far as possible, whereby said material is mounted on sliding shoes (9).

Abstract: A vacuum heat-treatment apparatus for heat-treating a workpiece in a treating cell includes a hermetic chamber disposed at the center. A plurality of treating cells are disposed along the periphery of the hermetic chamber, and a workpiece transfer mechanism is disposed inside the hermetic chamber and transfers the workpiece from one of the treating cells to the hermetic chamber and from the hermetic chamber to one of the treating cells.

Abstract: A antireflective film 50 is formed on a thermocouple 42 arranged in a processing vessel 1 of a heat treatment apparatus in order to improve the transient response characteristics of the thermocouple 42. In a typical embodiment, the thermocouple 42 is made by connecting a platinum wire 43A and a platinum-rhodium alloy wire 43B, and the antireflective film 50 is composed by stacking a silicon nitride layer 50C, silicon layer 50B and a silicon nitride layer 50A in that order.

Abstract: A thermal processing unit of the invention includes a processing container that can contain an object to be processed therein, the processing container having a lower end provided with an opening. The opening is opened and closed by a lid. A flange is provided at a peripheral portion of the opening, and a gas-supplying unit is provided at the flange for supplying a gas into the processing container. A heating mechanism can heat the object to be processed contained in the processing container.

Abstract: The aim of the invention is to reduce the formation of scratches in a device for the thermal treatment of substrates, in particular, semiconductor substrates, in a chamber in which the substrate is placed upon support elements. According to the invention, said aim is achieved by means of displaceable support elements.

Abstract: A brazing furnace includes a housing defining an interior environment having an inlet and an outlet, a plurality of heating elements mounted within the housing and adapted to heat the interior environment to an elevated temperature, and a conveyor belt extending through the housing and supported on a plurality of driven rollers whereby an object placed upon the conveyor belt at the inlet is transported through the inlet into the interior environment and out through the outlet. The conveyor belt includes a plurality of interconnected metal links and a thermal barrier coating applied to the metal links, thereby insulating the metal links and restricting the amount of thermal energy that is absorbed by the conveyor belt as the conveyor belt moves through the interior environment.

Abstract: A processing system is provided including a process chamber defining a process chamber opening, and an apparatus for isolating the process chamber. The apparatus includes a gate member, which defines a first opening, mounted to the process chamber such that the first opening and the process chamber opening are substantially concentric. The apparatus also includes a door having a first door portion defining a second opening. The door is configured to be moveable into a first position, where the first door portion is moved over the process chamber opening until the second opening is substantially concentric with the first opening and the process chamber. The door is also configured to be moveable into a second position, where the second door portion is moved over the first opening and the process chamber opening to provide a closure for the first opening and the process chamber opening.

Abstract: Rolls of pre-stretched cling film are used to manually wrap and unitize bulky loads such as boxes on a pallet. Using film that has previously been plastically stretched simplifies the wrapping operation. Unfortunately, however, the pre-stretched rolls of film have edges which are prone to fail during use. The disclosed invention concerns rolls of pre-stretched cling wrap having improved edges that are less prone to fail, and the method and apparatus for producing such rolls.

Abstract: A support sleeve for supporting a high temperature process tube comprises one or more circumferential channels, each channel connected to either a feed for gas or a vacuum exhaust. One circumferential channel opens to the top surface of the sleeve, on which the process tube is supported to provide a gas/vacuum seal between the process tube and support sleeve. Another circumferential channel is connected to a gas feed and provided with gas injection holes, evenly distributed along the support sleeve perimeter to provide a cylindrically symmetrical injection of process gas into the process tube. Another circumferential channel is connected to an exhaust for gas and provided with gas exhaust holes, evenly distributed along the circumference of the support sleeve, to provide a cylindrically symmetric exhaust of process gases from the process tube.

Abstract: A pedestal for use in a high temperature vertical furnace for the processing of semiconductor wafers provides a closure and heat insulation for the lower end of the furnace and is a wafer boat support. The pedestal, comprising quartz-enveloped insulation material, supports a wafer boat at a boat support level and is provided with an upper section disposed above the boat support level. The upper section comprises enveloped insulating material. The envelope of the upper section is also formed of quartz and the insulating material in the upper section has a lower thermal conductance than the insulating material in a lower quartz enveloped section.

Abstract: A plurality of side posts (12) and a plurality of rear posts (13) are disposed on the opposite sides S and on the rear side R of the workpiece (W), respectively. The side posts (12) and the rear posts (13) are provided with grooves (14, 15) having workpiece support surfaces (14a, 15a) and formed at predetermined vertical intervals, respectively. Each support surface of each side posts (12) is formed in a wide width and extends along the circumference of the workpiece from the center axis C of the workpiece toward the front side F on the front side of the workpiece (W). Each of the support surfaces (14a, 15a) of the posts (12, 13) inclines down toward the center axis C of the workpiece.

Abstract: A processing system including a chamber defining an interior cavity having a processing tube assembly arranged within the interior cavity. A heating assembly moveable relative to the processing tube assembly from a first position where said processing tube assembly is disposed within the heating assembly and a second position where the processing tube assembly is exposed to an internal environment within the interior cavity of the chamber.

Abstract: An apparatus for automatically and simultaneously loading/unloading a plurality of wafer boats (24) onto/from a cantilever paddle includes a cantilever paddle (47-1) and a carriage (42-1) supporting the cantilever paddle First and second vertical translation mechanisms (34A,B) each include a stationary part (62,63) and a vertically moveable support (61). First and second horizontal translation mechanisms (50A,B) each have a base (86) supported by one of the vertically moveable supports and a horizontally moveable arm (51) supported by the base (86). A horizontal boat support assembly (102) supports the loaded wafer boats and has an end supported by a first horizontally moveable arm (51A) and another end supported by a second horizontally moveable arm (51B).

Abstract: A substrate processing apparatus includes at least two processing units provided around a substrate transfer chamber including a substrate transfer device for transferring substrates, wherein said at least two processing units include at least one batch processing unit, an M number of product substrates being processed simultaneously in one batch process with M being set to be less than or equal to the number of product substrates carried by a product substrate carrier, and all the product substrates contained in a product substrate carried by the product substrate carrier being processed in one batch process of said at least one batch processing unit. A method for fabricating a semiconductor device includes the step of sequentially processing plural product substrates in at least two processing units arranged around a substrate transfer chamber.

Abstract: A batch charger has a telescopic belt conveyor with a vertical take-up system for the belt when the conveyor retracts. The conveyor may pivot and/or shift laterally besides the furnace on a track. Fixed silos are positioned to refill an on conveyor bin while it is pivoting.

Abstract: A positive pressure gradient is maintained across an open access port of an interface chamber such as a load lock chamber which provides an interface between a low pressure chamber such as a transfer or buffer chamber, and a high pressure area such as a staging area or factory interface area. When the access port of the interface chamber is open to the high-pressure area, the positive pressure gradient may be used in some applications to inhibit the flow of gasses from the high-pressure area into the interior of the interface chamber.