Abstract: A travelling thermocouple dynamically profiles the actual temperature of a substrate passing through a vertical oven without entangling the thermocouple wires. Media components, such as microprocessor chips in a semiconductor wafer, are supported on a tray or plate on a driven conveyor. A thermocouple formed of two metal wires of extended length are connected at one end to the media component and at the other end to a stationary readout device and function as the temperature gauge for all trays of components passing through the oven. A C-shaped clamp or hook secured to the thermocouple wires resiliently engages a chain drive driven independently of the conveyor drive but in correlation therewith by a computer controller and pulls the wires through the oven keeping pace with the media component to which it is attached.

Abstract: A heat treatment apparatus having a heat treatment furnace into which a hydrocarbon gas and an oxidization gas are introduced, wherein an outlet opening of a valve through which a pusher for pushing a work to be heat treated in the heat treatment furnace is movable is hermetically connected to a pusher insertion port formed on a wall of the heat treatment furnace, and a seal box is connected hermetically to an inlet opening of the valve, the pusher being movable hermetically through the seal box. An elevator door for opening and closing the heat treatment furnace has a guide pin projected therefrom, and a jam having an upper hook surface for receiving the guide pin thereon, the jam being pivotally supported so that when the elevator door is lowered, the elevator door is moved by the jam toward a seal surface of the opening of the heat treatment furnace.

Abstract: The present invention refers to a wafer transfer robot for a wafer boat of a wafer processing apparatus wherein a turntable within a chamber of a turntable apparatus is provided with a prescribed number of stations formed thereon. Each of the stations is provided with protrusions that hold a wafer cassette that is transferred thereto and orientated thereon in such a manner that a base surface thereof is inclined at an angle to the outward direction. Although, while the wafer cassette is being transferred and orientated, it is transferred and orientated reliably with the base surface thereof held horizontal by an elevator apparatus. By providing a loadlock chamber of a rotational configuration, the apparatus of the present invention ensures good sealing, and also ensures that when regions within the apparatus are being evacuated or being filled with an inert gas, they are kept reliably airtight.

Abstract: High-temperature belt-type furnace apparatus utilizing a silicon carbide continuous belt design is disclosed.

Abstract: A drop-out conveyor for a pusher-type slab reheat furnace having a sloped dropout is disclosed. The drop-out conveyor comprises a plurality of reciprocating slab carts movable between a first loading position within the furnace and a second discharge position outside of the furnace. A track is provided for supporting each of the carts along the sloped dropout of the furnace between the loading position and the discharge position. A mechanism is provided for reciprocating each cart between the first position and the second position. The present invention additionally includes a device for removing the slabs from the slab cart to a roller table at the discharge position.

Abstract: A ceramic heater composed of a ceramic substrate and a resistant heating element embedded within the ceramic substrate along a predetermined planar pattern is obtained by holding a convolution of a spiral-coiled high melting metallic filament in the above predetermined planar pattern and heat-treating the convolution at a temperature not higher than a primary recrystallization commencement temperature of the high melting metal under a non-oxidative atmosphere to provide the resistant heating element, embedding the resulting resistant heating element within a ceramic shaped body, and then, sintering the ceramic shaped body.

Abstract: A substrate heat treatment apparatus includes a heat treatment furnace of a flat configuration, and having a cavity in which a substrate is accommodated. The heat treatment furnace includes a gas supply unit at one side end face, an opening for communication between the cavity and the outside world, and a gas discharge unit in the vicinity of the opening for discharging gas from the cavity at the other side end face. The heat treatment furnace further includes a cover for shutting the opening allowing opening/closing thereof. In the gas exhaust unit, an exhaust chamber is formed on the other side end face along the opening with a partition wall between the opening and the exhaust chamber. An exhaust portion is formed in communication with the outside world in the exhaust chamber.

Abstract: Furnace for storing, reheating and holding ferrometallurgical products, in which the products travel along a displacement path on members placed so as to connect, in the tranverse direction, a charging zone and a discharging zone, the reheating and holding zones including, on the one hand, product-supporting members and transporting members placed at a certain distance from the supporting members and being able to perform a rising movement with respect to these and a horizontal displacement movement making the product advance step by step.

Abstract: A control measuring and supply apparatus and method for receiving a substantially, continuous flow of fluent material from a source of supply; the assembly having a bottom-sealed diverter plate, optionally positionable to direct the fluent material, by gravity, to either one or the other of a pair of adjacent, parallel supply chambers, each of the supply chambers having lower, sealed valve plates which can be optionally opened or closed, a and visa versa, one of the supply chambers being filled with the fluent material while the other is simultaneously emptied, and power operated control motors for controlling the operation of the diverter and valve plates; the diverter plate and valve plates cooperating with seals disposed out of the path-of-movement of the fluent material.

Abstract: In a baking oven for baking a relatively planar work such as semiconductor substrates, LCD panels and integrated circuit boards, a laterally elongated slot is formed in a shutter door which is moveable in the vertical direction. The oven main body is internally provided with a rack having a plurality of shelves which are each associated with the slot of the shutter door in such a manner that the work supported by each of the shelves of the rack may be aligned with the slot of the shutter door by appropriately determining the vertical position of the shutter door. Thus, by minimizing the area of the access opening of the oven main body, not only the loss of energy is minimized but also undesirable fluctuations in the internal temperature of the oven main body is minimized.

Abstract: One aspect of this invention comprises an improved conveyance system comprises an endless flexible belt which circulates through at least two arcs, at least one gripping member attached to the belt, the gripping member having a free end and an anchoring end, and a biasing means which biases the anchoring end of the gripping member toward the surface of the conveyor belt, wherein the gripping member is open as it traverses an arced path and is closed as it traverses a straight path. A workpiece is loaded as the gripping member traverses the first arc, and offloaded as the gripping member traverses the second arc, Preferably, the first arc has a greater radius than the second arc. The inventive also comprises a heater utilizing the conveyance system.

Abstract: An apparatus and method suitable for the continuous curing of pasted battery plates. The apparatus includes a hydroset oven having an atmospherically controlled hydroset chamber in which a continuous transport conveyor is mounted. Pasted plates are automatically loaded onto the transport conveyor and moved continuously through the hydroset chamber. Plenums are positioned in the hydroset oven chamber adjacent to the transport conveyor to direct temperature and humidity controlled air over the battery plates to affect hydrosetting. Additional hydroset ovens may be provided depending on the quantity of battery plates being processed. The apparatus also includes a drying oven containing a continuous transport conveyor. The drying oven is arranged in series with the hydroset oven to receive the hydroset battery plates and dry them in a continuous process.

Abstract: An object holder is raised, a mount portion is stopped at a middle stop position higher than a lower stop position, and an object of treatment is preheated. Thereafter, the object holder is further raised, the mount portion is stopped at an upper stop position in a processing tube higher than the middle position, and the object is heat-treated. A first temperature sensor for measuring a temperature on the obverse side of the object on the mount portion is located facing the obverse side. A second temperature sensor for measuring a temperature on the reverse side of the object on the mount portion is located facing the reverse side. The temperature of the object is detected in accordance with the respective outputs of the first and second temperature sensors.

Abstract: A heat processing apparatus for subjecting heat processing to a wafer by heating includes a reaction tube for containing the wafers, a heating element provided around the reaction tube, for heating an inside of the reaction tube, a plurality of heat radiating members provided concentrically around the heating element with an airtight space between the heating element and an innermost one of the heat radiating members and airtight spaces between the heat radiating members, and a pressure-reducing device for reducing the pressure of these airtight spaces. In this heat processing apparatus, the pressures of the airtight spaces are reduced by the pressure-reducing means at least when the temperature of the inside of the reaction tube is increased.

Abstract: A heat treatment apparatus comprising a holder, a hollow cylindrical cover, a flat plate, and a processing chamber. The holder holds disk-shaped objects, each having an orientation flat portion at circumference. The objects are arranged coaxially and spaced at predetermined intervals, with the orientation flat portions aligned with one another. The cover has gas ports and surrounds the objects held by the holder and is spaced from a circumference of each object by a predetermined distance. The flat plate is mounted on an inner surface of the cover and opposes the orientation flat portions of the objects. In the processing chamber, the objects held by the holder are processed by using a process gas.

Abstract: The loader device comprises a cartridge-carrying carousel provided with a set of cartridge-holders in which sealed closed cartridges are mounted in removable manner, each cartridge being designed to contain a sample for processing in a space furnace, the device further comprising a control mechanism for imparting indexed rotary drive to the cartridge-holders. The carousel is mounted to one side of the furnace in such a manner that its axis of rotation is parallel to longitudinal axis of the furnace. Each cartridge-holder of the carousel co-operates with a transfer mechanism that includes a translation arm extending perpendicularly to the axis of rotation of the carousel to enable each cartridge to be brought successively into a working position in which the axis of the cartridge is in alignment with the longitudinal axis of the furnace. The control mechanism for imparting rotary drive to the cartridge-holders and the transfer mechanism are activated alternately by a single electric motor.

Abstract: An apparatus for processing a plurality of circular wafers including a tubular heater, a boat and a plurality of heat transfer bodies. The tubular heater has a heating space inside and radiates heat within the heating space. The boat is loaded inside the heating space of the tubular heater and holds the wafers in parallel. Heat transfer bodies are located between the wafers.

Abstract: Nozzles that blow an air are disposed in a space between an outer wall of a process tube and a heat generating resistor. The openings of the nozzles are oriented to the process tube corresponding to an arrangement area of semiconductor wafers. An air blowing angle and alignment of the openings of the nozzles are designated corresponding to the length of the arrangement area of the semiconductor wafers. Thus, since a portion where natural heat radiation is weak is forcedly cooled, the cooling effect can become equal in the entire region of the process tube, thereby reducing temperature drop time.

Abstract: An apparatus useful for sintering unsintered abrasive grain precursor to provide sintered abrasive grain. The sintered abrasive grain can be incorporated into abrasive articles such as bonded abrasives (e.g., grinding wheels), coated abrasives, and nonwoven abrasives.

Abstract: A cement kiln having a tire injection system. The tire injection system comprises an entrance chute having an outer end portion protruding outwardly of a wall of the kiln and an inner end portion which protrudes into the kiln. The entrance chute further is disposed such that it is positioned tangentially to the kiln wall. The entrance chute includes a gate assembly having a cam follower assembly and a pivotally mounted gate member. The cam follower assembly causes the gate member to be urged pivotally between open and closed positions in response to movement of the cam follower assembly over a cylindrical camming wall positioned at a predetermined location relative to the kiln. When the cam follower assembly has caused the gate member to open, a plurality of tires or other items forming a source of supplemental fuel are injected into the entrance chute by one or more external tire injecting apparatuses synchronized in operation to rotation of the kiln.

Abstract: A slat for a transporting device for an extruded article of aluminum or an aluminum alloy in which only a worn-out portion of a heat-resistant member may be exchanged easily. The slat includes an elongated base member secured to the transporting device for the extruded article, subsidiary heat-resistant members removably mounted at terminal ends of the base member, and a main heat-resistant member arranged between the subsidiary heat-resistant members.

Abstract: A vertical heat treatment system for heat treating a large number of semiconductor wafers housed in a boat at once includes a heat treatment unit having a boat loading/unloading port, a boat section communicating with the heat treatment unit through the boat loading/unloading port, an elevator mechanism for loading/unloading the boat between the boat section and the heat treatment unit through the boat loading/unloading port, a cassette section provided adjacent to the boat section, a wafer transfer mechanism for transferring wafers between a cassette and the boat, a gas supply mechanism for supplying a non-oxidization gas into the boat section, and a gas shower means for blowing the non-oxidization gas to the wafers in the vicinity of the boat loading/unloading port.

Abstract: This invention discloses a system for chemically depositing various materials carried by a reactant gas onto substrates for manufacturing semiconductor devices. The system includes special loading and unloading sub-systems for placement of substrates to be processed into the system and subsequent extraction without contamination of the system. A special substrate handling sub-system is provided for moving the substrates to and from at least one processing sub-system without physically contacting the planar surfaces of the substrates. The processing sub-system includes a horizontal gas flow reaction chamber having a rotatable susceptor therein for rotating the single substrate supportable thereon about an axis that is normal to the center of the substrate for averaging of the temperature and reactant gas concentration variables.

Abstract: A thermal processing station is provided with a first conveyor that conveys a wafer from a first conveyor access portion and a second conveyor that conveys another wafer from a second conveyor access opening portion. The wafer conveyed from the first conveyor is conveyed along a route consisting of the second conveyor, a washing portion, the second conveyor again, the first conveyor, and a thermal processing portion. On the other hand, the wafer conveyed from the second conveyor is conveyed along a route consisting of the washing portion, the second conveyor again, the first conveyor, and the thermal processing portion. An intermediate transfer portion that is free to rotate and rise and lower is provided between the first and second conveyor. A control section does not rotate the intermediate transfer portion while the wafer is being transferred along the former route, but it does rotate the intermediate transfer portion through 180.degree.

Abstract: A holding plate holding a number of chip components coated with electrode paste is carried into a furnace body. The furnace body includes a rotator which is intermittently rotated about a shaft. The rotator is provided with a plurality of radial blades, each of which is provided with a pair of inward holding grooves for holding both side portions of the holding plate. The holding plate is carried to an inlet portion and outlet portion by a conveyor and the plate is inserted into the holding grooves by an introduction arm. The furnace is provided with heaters and fans to dry the electrode paste during rotation of the rotator.

Abstract: A semiconductor wafer boat used in a vertical CVD apparatus includes four columns fixed to upper and lower support plates. Each of the columns has a plurality of first grooves arranged at regular intervals in the vertical direction so as to place wafers in substantially parallel to each other, and a plurality of second grooves formed alternately with the first grooves. A plate ring is provided for each of the second grooves so as to improve the uniformity of thickness of a film to be formed on each wafer. Each ring has an outer diameter larger than that of a wafer, and an inner diameter smaller than that of the wafer. Each ring is placed such that there is a clearance for transferring each wafer between each ring and each wafer in the vertical direction.

Abstract: Carbon bodies to be graphitized are clamped together in a horizontal train, n which adjacent end faces of said bodies adjoin each other, and are heated by a flow of electric current in a graphitizing zone and subsequently cooled in a cooling zone. Individual carbon bodies are added to the train at the entrance of the graphitizing furnace and individual carbon bodies which have been graphitized are removed from the train at the exit of the furnace. To ensure that the train will desirably be held to be self-supporting, adjacent carbon bodies are interconnected at adjoining end faces by axial plugs.

Abstract: A semiconductor device manufacturing apparatus has a heat retaining tube which can be freely placed in and pulled out of a processing chamber of the apparatus. When located within the processing chamber, the heat retaining tube surrounds a boat with the semiconductor wafers mounted thereon. After the thermal processing of the semiconductor wafers has been completed, the heat retaining tube and the semiconductor wafers are pulled out of the processing chamber together. In this way, the difference in the temperature of the center and periphery of the semiconductor wafer is decreased, and semiconductor devices, which have excellent performance and which are free from crystalline defects or dislocation, can thus be manufactured.

Abstract: The invention is directed to improved centrifugal rotary electric furnaces which are used for the heating and or fusion of minerals, such as quartz, and other materials having a high melting point. The furnace includes a generally cylindrical furnace shell and a decreasing diameter stepped end member attached to each end of the shell which is intended to more closely conform the end of the furnace to the shape of fused ingot or melted charge formed inside the furnace, while still providing a sufficient depth of unmelted charge between the fused or melted material and the end member to insulate the end member from excessive heat and the warpage and other damage caused thereby.

Abstract: The invention relates to a method for increasing the thermal radiation heat transfer between a metallurgical reheat furnace and the object being heated within the furnace by increasing the distance between the water cooled skid pipes and the object itself thereby reducing the shadow effect of the support structure on the object being heated.

Abstract: Carbon bodies to be graphitized are clamped together in a horizontal train, n which adjacent end faces of said bodies adjoin each other, and are heated by a flow of electric current in a graphitizing zone and subsequently cooled in a cooling zone. Individual carbon bodies are added to the train at the entrance of the graphitizing furnace and individual carbon bodies which have been graphitized are removed from the train at the exit of the furnace. To ensure a desirable handling of the train in the furnace, the train being moved through the graphitizing furnace is moved at least in a portion of the cooling zone through a bed of carbonaceous bulk material and outside said bed of bulk material is moved in said furnace through a protective gas atmosphere and the train is held to be self-supporting at least in the graphitizing zone between the furnace electrodes.

Abstract: A vertical heat-treating apparatus which allows effective use of an installation space and improved productivity is disclosed. In this system, a plurality of housings, each accommodated with a vertical reactor, are aligned with each other. A gas feed unit and the like are arranged in front of each housing with a space disposed therebetween for conducting maintenance work. A rail is installed along the rear side of the housings. A boat liner is located on the rail for carrying a boat to the housings. An interface mechanism including a horizontal-vertical conversion handling unit for supplying the boat in a vertical state to the boat liner is disposed near the rail.

Abstract: A method for enhancing the efficiency of a thermal process such as calcination. The incoming solid particulate material is preheated in the conveyor by partially cooled exhaust vapors from the thermal processor. In passage through the conveyor, the cooled, intermediate temperature vapors contact, fluidize and heat the particulate solids to increase the available throughput of the system.

Abstract: The system comprises at least one coolant-carrying tubular support carrying at least one rider. The latter consists of a heat-resistant cast housing provided with at least one cutout into which a ceramic carrier is inserted. The carrier is of sufficient compressive strength even at a temperature in excess of 1,200.degree. C. The housing remains at a temperature below 1,200.degree. C. and therefore provides a very good support for the carrier which it holds and transfers the loads that occur into the tubular support. The housing is detachably connected with the tubular support by means of a bolt.

Abstract: A heating furnace for heating a porous preform made of fine particles of highly pure quartz glass for an optical fiber, which furnace comprises a cylindrical furnace body, a heater installed in said furnace body and a muffle tube installed inside said heater to separate a heating atmosphere from said heater, wherein said muffle tube is made of highly pure carbon and coated with a gas impermeable carbon, which furnace prevents contamination of the preform with impurities and has long life.

Abstract: A refractory hearth for use in an industrial heat treat furnace is disclosed whereby the hearth contains no alloy parts with the exception of the pusher assembly and the roller chain attached to it. L-shaped ceramic, refractory or silicon carbide tile are placed in position to support material being heat treated, while at the same time preventing the roller chain from rising up out of place. The outside edges of said L-shaped tile shall act as guides to move stock trays in a straight path. Refractory material used to hold hearth in place will also support radiant tubes used to supply heat.

Abstract: A workpiece support for supporting a disc-shaped workpiece in a vacuum chamber, comprises a support member with a support surface for carrying the workpiece. A plurality of bores extend from the support surface and through the support member. The bores communicate with a distribution chamber defined on a side of the support member which is opposite from the support surface. The distribution chamber is substantially co-extensive with the support surface and is connected to a gas feed line for supplying gas to the distribution chamber. The bores each have respective diameters which are substantially shorter than their respective lengths through the support member. In this way, gas supplied through the bores from the distribution chamber is distributed between the support surface and the workpiece as a heat transfer medium which is substantially independent from the gas flow at an inlet of each bore in the distribution chamber.

Abstract: Screens for limiting heat losses from heated material, e.g. bars and slabs in rolling mills. Screens are provided in the form of strings of heat insulating bodies composed of metal shells containing insulating material. These screens may form curtains and/or covers for the hot material. Containing chambers for the hot material may be provided with such strings of elements and the chambers may also comprise structure for limiting heat conduction losses through the material supports therein. The screens may be collapsed over the hot material thereby completely surrounding and insulating the material from loss of heat. A displaceable chamber installation may also be provided for limiting heat loss when holding and transferring hot material between processing stages.

Abstract: A plurality of semiconductor chips are sequentially mounted on a rotary table, heated on the rotary table for a predetermined time, and ejected from the rotary table. The semiconductor chips ejected from the rotary table are fed to a bonding apparatus. The semiconductor chips are heated while the rotary table is stationary and are held to the rotary table by a vacuum chuck. The position of a semiconductor chip is adjusted before the semiconductor chip is ejected from the rotary table.

Abstract: Semiconductor wafers within a supporting vertical wafer tower are positioned within a vertical process chamber through a lower gate valve fixed to a supporting framework. The gate valve is sealed to a similar gate valve at the upper end of a movable load lock on the framework, within which the wafers are subjected to pre-treatment and post-treatment processes. Two load locks are alternately used in conjunction with the process chamber and a wafer loading station on the framework. In addition, a cleaning element is movably mounted on the framework for periodically maintaining the interior surfaces of the process tube within the process chamber.

Abstract: Components for semiconductor diffusion furnaces are constructed of a high purity impervious silicon carbide or silicon nitride matrix deposited on a pre-shaped fibrous matrix of silicon carbide, carbon, or carbon coated silicon carbide. The high purity of the matrix prevents undesired gaseous components from contaminating the atmosphere of the furnace, and the fibrous re-enforcement provides strength combined with light weight.

Abstract: A surface formed by grate bars in pasteurizers and the like. The grate bars are movable so as to perform a pilgrim step-like or reciprocating movement. The grate bars are placed on sectional girders. The ends of the grate bars placed on the sectional girders are Z-shaped. Each sectional girder has at its upper end face a groove-shaped recess and an elongated slot-like recess vertically spaced from the groove-shaped recess. The end of each grate bar has an opening for inserting the grate bar into the slot-like recess of the sectional girder. By inserting an end of a grate bar into the slot-like recess and raising the end of another opposite grate bar, the two facing grate bar ends are vertically and laterally centered.

Abstract: A reheating, accumulation and holding furnace for blooms comprises a first section in which the blooms are moved along a runway by a first pusher, and a second section in which said blooms are moved by the lift and shifting movement of longitudinal members parallel to the direction of movement of the blooms. Said longitudinal members are constructed with two different surface heights and are mobile at two different levels. At the lesser level only those blooms in a central position in the furnace are reached and moved, whereas at the greater level all the blooms present on the longitudinal members are reached and moved. The combination of bloom movements obtained by the pusher and the two different heights of the longitudinal members determines the passage, accumulation and de-accumulation of the blooms within the furnace.

Abstract: Atmospheric door closure for sealing of the orifice of a process tube. A quartz end plate positions at the end of a plurality of spring loaded quartz rods to seal against the orifice of the process tube. The quartz rods slide against spring pressure behind Teflon sleeves contained in horizontal tubes. Springs in the horizontal tubes provide pressure against the quartz end plate when the quartz plate engages a process tube. A clamp and adjusting assembly secures to the paddle support shaft, and provides for alignment of the quartz rods and plate with respect to the paddle support shaft and the orifice of the process tube.

Abstract: A purge tube for protecting a boat(s) of wafers. This purge tube does not enter the furnace. A floating end cap within the tube moves to substantially seal the furance opening during processing. The floating end cap is withdrawn back to the closed end of the tube when the wafer boat(s) is withdrawn into the tube.

Abstract: A workpiece heating and feeding device having a lid which is installed above a heating block which heats the workpieces, the lid having an opening formed in the central portion thereof wherein a transparent heat-resistant plate covers the opening in the lid. The lid may alternately be entirely made of a heat-resistant material. Since the heating block is covered, no dirt or dust can enter the interior of the device. In addition, since the lid has either a transparent plate or is itself made of a transparent heat-resistant material, working conditions can easily be monitored and adjustments to the feeding of the workpiece facilitated.

Abstract: A truck running on a rail laid in the firing furnace comprises a metallic frame body and a refractory base assembled thereon. At least an outside portion of the refractory base is comprised of car-top bricks each provided at its inward lower part with a foot portion and refractory base bricks located beneath the car-top bricks each provided with an engage portion engaging with a foot portion.

Abstract: An apparatus is disclosed which can automatically load semiconductor wafers into a vertical type heat treatment furnace and unload treated semiconductor wafers out of the heat treatment furnace. The semiconductor wafer treating apparatus comprises exchange unit for exchanging the semiconductor wafers between the cassette and the wafer boat in a predetermined exchange position, transfer unit for allowing the wafer-held boat to be transported between the exchange position and a respective, vertical type heat treatment furnace and for allowing the transfer of the wafer boat to be effected between the transfer unit and the respective heat treatment furnace, and an elevator unit provided in the heat treatment furnace and adapted to receive the wafer boat from the transfer unit and to load the wafer boat into a vertically erect process tube and unload the wafer boat from the process tube.

Abstract: An ingot pusher furnace includes means for reducing heat loss from the charging and discharging ends of the furnace so as to produce a more efficient and uniform heating of the ingots. The pusher furnace includes support rails which extend between a first opening in the front wall and a second opening in the rear wall and terminates inside of the charging and discharging doors. The charging and discharging doors extend below the support rails in their closed position so as to provide a positive seal. A first rail drawbridge is arranged adjacent the charging door to facilitate movement of the ingots into the furnace enclosure. The second rail drawbridge is arranged adjacent the discharging door to facilitate movement of the ingots out of the furnace enclosure.

Abstract: A heat-treating apparatus includes a furnace for heat-treating wafers, installed so as to set its longitudinal direction vertically and having an opening which is formed in its lower end so as to allow a boat having semiconductor wafers mounted thereon to be loaded, a heat-insulating cylinder on which the boat is placed and which is adapted to keep the boat hot, a lifting unit for lifting and loading the boat and the heat-insulating cylinder into the furnace, and for lowering and unloading them from the furnace, a moving unit for pivoting the heat-insulating cylinder and retracting the cylinder from below the boat, and a handler unit for supporting and vertically moving the boat. After the wafers are heat-treated, the boat is moved downward by the lifting unit. The heat-insulating cylinder is retracted from below the boat by the moving unit while the boat is supported by the handler unit. Subsequently, the boat is further lowered by the handler unit so as to completely remove the boat from the furnace.