Abstract: The disclosure is directed to a chemically strengthened glass having antimicrobial properties and to a method of making such glass. In particular, the disclosure is directed to a chemically strengthened glass with antimicrobial properties and with a low surface energy coating on the glass that does not interfere with the antimicrobial properties of the glass. The antimicrobial has an Ag ion concentration on the surface in the range of greater than zero to 0.047 ?g/cm2. The glass has particular applications as antimicrobial shelving, table tops and other applications in hospitals, laboratories and other institutions handling biological substances, where color in the glass is not a consideration.

Abstract: Mineral materials selected from lithium aluminosilicate glasses containing vanadium, precursors of glass-ceramics, and glass-ceramics colored by vanadium contain solid solution(s) of ?-quartz and/or ?-spodumene as main crystalline phase. Also disclosed are articles made from said mineral materials, as well as methods for forming said glasses, glass-ceramics and articles of said glasses and glass-ceramics. Methods involve optimizing the refining of lithium aluminosilicate glasses containing SnO2 as a fining agent in preparing glasses or glass-ceramics.

Abstract: The subject of the invention is a glass sheet, the light transmission of which is greater than or equal to 89% for a thickness of 3.2 mm and the chemical composition of which comprises bismuth oxide in a weight content between 0.05 and 1%.

Abstract: According to one aspect of the present invention, provided is glass for use in substrate for information recording medium, which comprises, denoted as molar percentages, a total of 70 to 85 percent of SiO2 and Al2O3, where SiO2 content is equal to or greater than 50 percent and Al2O3 content is equal to or greater than 3 percent; a total of equal to or greater than 10 percent of Li2O, Na2O and K2O; a total of 1 to 6 percent of CaO and MgO, where CaO content is greater than MgO content; a total of greater than 0 percent but equal to or lower than 4 percent of ZrO2, HfO2, Nb2O5, Ta2O5, La2O3 Y2O3 and TiO2; with the molar ratio of the total content of Li2O, Na2O and K2O to the total content of SiO2, Al2O3, ZrO2, HfO2, Nb2O5, Ta2O5, La2O3, Y2O3 and TiO2 ((Li2O+Na2O+K2O)/(SiO2+Al2O3+ZrO2+HfO2+Nb2O5+Ta2O5+La2O3+Y2O3+TiO2)) being equal to or less than 0.28.

Abstract: Provided is an erbium doped optical fiber (EDF) for amplification which allows an easy estimation of the amplification performance and high production stability. The fiber includes a core and a cladding. The core is mainly made of silica glass and doped with erbium at a concentration of 500 wtppm or more and 2500 wtppm or less. In the fiber, the cutoff wavelength is 850 nm or more and 1450 nm or less, the mode field diameter is 4.5 ?m or more and 6.5 ?m or less, the polarization mode dispersion is not more than 0.1 ps per 10 m, the coordination number of oxygen elements around an erbium element in the core is one or more and eight or less, and the bond length between erbium and oxygen is 0.225 nm or more and 0.235 or less.

Abstract: The invention provides a powder comprising at least 95% by number of fused grains, with the following chemical composition, as a percentage by weight based on the oxides, for a total of 100%: 0?BaO?40.8%; 0?SrO?31.8%; 27.2%?Al2O3?31.3%; 32%?SiO2?36.9%; other species ?1%; the quantity of at least one of the oxides BaO and SrO being more than 0.3%, the size of said grains being such that D5?5 ?m and D95?150 ?m.

Abstract: The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

Abstract: An ion exchangeable glass that is free of lithium and comprising 0.1-10 mol % P2O5 and at least 5 mol % Al2O3. The presence of P2O5 enables the glass to be ion exchanged more quickly and to a greater depth than comparable glasses that do not contain P2O5.

Abstract: Glasses having a low softening point and high toughness. The glasses are alkali aluminoborosilicate glasses having softening points of less than 900° C. and, in some embodiments, in a range from about 650° C. up to about 825° C., and an indenter damage threshold of at least 300 g for glasses that are not chemically strengthened. The glasses are free of alkaline earth metals, lead, arsenic, antimony, and, in some embodiments, lithium.

Abstract: A high-silica glass sheet has an average thickness of less than 150 microns and an average surface roughness over one or both of its two major surfaces of less than 1 nm. The glass sheet is formed using a roll-to-roll glass soot deposition and sintering process. The glass sheet may comprise a plurality of substantially parallel surface protrusions, which are visible only when a major surface of the glass sheet is viewed at an angle sufficiently removed from normal incidence.

Abstract: An optical glass having optical constants of a refractive index (nd) of 1.78 or over, an Abbe number (?d) of 30 or below, and a partial dispersion ratio (?g, F) of 0.620 or below comprises SiO2 and Nb2O5 as essential components, wherein an amount of Nb2O5 in mass % is more than 40%. The optical glass further comprising, in mass % on oxide basis, less than 2% of K2O and one or more oxides selected from the group consisting of B2O3, TiO2, ZrO2, WO3, ZnO, SrO, Li2O and Na2O wherein a total amount of SiO2, B2O3, TiO2, ZrO2, Nb2O5, WO3, ZnO, SrO, Li2O and Na2O is more than 90% and TiO2/(ZrO2+Nb2O5) is less than 0.32.

Abstract: Ceramics are made of preceramic paper or board structures in a particular shape previously represented in a paper structure, in which the preceramic papers or boards have a content of ceramic fillers between 30 and 95 wt-%, with the ceramic fillers having a particle size <30 ?m. A method for manufacturing such ceramics and the use thereof are also provided.

Abstract: A glass substrate having an oleophobic surface. The surface is substantially free of features that form a reentrant geometry and includes a plurality of gas-trapping features extending from the surface to a depth below the surface and a coating comprising at least one of a fluoropolymer and a fluorosilane. The gas-trapping features are substantially isolated from each other, and trap gas below droplets to prevent wetting of the surface.

Abstract: A glass composition for use as a laser medium, a method for producing the glass composition, and a laser apparatus including the glass composition are provided. The glass composition includes a host glass; a 3p component having a concentration of about 5 mole percent to about 10 mole percent; and at least one of a 6p component having a concentration of about 1 mole percent to about 5 mole percent and a 5p component having a concentration of about 1 mole percent to about 5 mole percent.

Abstract: The present invention relates to a silicate glass article, such as a glass container, with a modified surface region. The modified surface has, among other advantageous properties, an improved chemical durability, an increased hardness, and/or an increased thermal stability, such as thermal shock resistance. In particular the present invention relates to a process for modifying a surface region of a silicate glass article by heat-treatment at Tg in a reducing gas atmosphere such as H2/N2 (1/99). The concentration of network-modifying cations (NMC) in the surface region of the silicate glass article is lower than in the bulk part, and the composition in the surface region of the network-modifying cations is a consequence of an inward diffusion.

Abstract: An LAS-type float glass, which is substantially free of As2O3 and/or Sb2O3 and precipitates a ?-quartz solid solution or a ?-spodumene solid solution as a main crystal by heat treatment, wherein, when C1 [mass %] represents the content of SnO2 at a glass surface, C0 [mass %] represents the content of SnO2 at a depth of 0.5 mm from the glass surface, and k [mass %/mm] represents an SnO2 concentration gradient defined by k=(C1-C0)/0.5, the LAS-type crystallized glass satisfies relationships of K?2 and C0?0.8 with respect to at least one surface thereof.

Abstract: A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member.

Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising: a step of washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less, and so that a concentration of aluminium thereon is 10 ng/cm2 or less, before accommodating the synthetic silica glass block in the mold; a step of heating high purity carbon powders in which a content of copper is 40 wt.ppb or less and a content of aluminium is 100 wt.ppb or less at a temperature condition of 1200° C. to 1900° C.; a step of heating the mold at a temperature condition of 1700° C. to 1900° C.

Abstract: A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A manufacturing method and an optical member for EUV lithography are also provided.

Abstract: A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C.

Abstract: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.

Abstract: In the nanoimprint lithography, titania-doped quartz glass having an internal transmittance distribution of up to 10% at wavelength 365 nm is suited for use as nanoimprint molds.

Abstract: A solar unit glass plate having a composition comprising the following constituents, the amounts of which are expressed as percentages by weight: SiO2 60-75%; Al2O3 0-5%; Na2O 10-18%; K2O 0-5%; CaO 0-11%; MgO 0-5%; SO3 0-1%; Fe2O3<0.15%; and one or both of: SrO 0-15% and BaO 0-15%, with the proviso that the summed amount of SrO and BaO is greater than 1%. Also a glass plate for use as a cover plate or backing plate for a solar unit, the plate having a composition comprising the following constituents, similarly expressed: SiO2 65-74%; Al2O3 0-3%; Na2O 12-15%; K2O 0-2%; CaO 0-11%; MgO 0-2%; SO3 0-1%; Fe2O3 (total iron)<0.1%; and one or both of: SrO 2-10% and BaO 1.5-10%, with the proviso that the summed amount of SrO and BaO is greater than 2%.

Abstract: In a known exterior deposition method for producing synthetic quartz glass, amorphous quartz glass powder particles (13) are fed to a reaction zone (12), the quartz glass powder particles are heated in the reaction zone (12) and deposited on the exterior side of a carrier (10) rotating about an axis of rotation. In order, proceeding from this, to specify a method which is distinguished by a high deposition efficiency, according to the invention it is proposed that amorphous quartz glass powder particles having a particle size of at least 3 ?m together with a silicon-containing starting substance (14) are fed to the reaction zone (12), wherein the silicon-containing starting substance (14) is converted to SiO2 particles in the reaction zone, and the SiO2 particles are deposited in Co-15 deposition with the quartz glass powder particles on the carrier to form an SiO2-containing layer (11) in which the quartz glass powder particles (13) make up a proportion by weight of SiO2 in the range of 30% to 95%.

Abstract: A glass that is down-drawable and ion exchangeable. The glass has a temperature T35kp which the viscosity is 35 kilopoise. T35kp less than the breakdown temperature Tbreakdown of zircon.

Abstract: An optical glass has a refractive index (nd) of 1.60 or over and excellent transmittance and internal quality. The optical glass comprises 0.1-4 mass % of Ta2O5 to total mass of glass calculated on oxide basis, has ratio of 0.95<Ta2O5/(Ta2O5+(ZrO2)+TiO2+Nb2O5+WO3)×5)?1.00, and further comprises SiO2+B2O3+Al2O3+BaO in a total amount of 81% or over.

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.

Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E? centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ?T, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (?) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.

Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.

Abstract: Embodiments of compositions comprising materials satisfying the general formula AM1?xM?xM?yO3+y are disclosed, along with methods of making the materials and compositions. In some embodiments, M and M? are +3 cations, at least a portion of the M cations and the M? cations are bound to oxygen in trigonal bipyramidal coordination, and the material is chromophoric. In some embodiments, the material forms a crystal structure having a hexagonal unit cell wherein edge a has a length of 3.50-3.70 ? and edge c has a length of 10-13 ?. In other embodiments, edge a has a length of 5.5-7.0 ?. In particular embodiments, M? is Mn, and Mn is bonded to oxygen with an apical Mn—O bond length of 1.80 ? to 1.95 ?. In some embodiments, the material is YIn1?xMnxO3, x is greater than 0.0 and less than 0.75, and the material exhibits a surprisingly intense blue color.

Abstract: Embodiments relate to a transparent body comprising a matrix material and a plurality of non-metal particles positioned in the matrix material. The matrix material may be selected from the group consisting of glass materials, ceramic materials, and semiconductor materials. The non-metal particles may have a mean particle size of no greater than 150 nm. The non-metal particles may be present in the body at a volume fraction of no greater than 3 percent. The non-metal particles may have a composition different than that of the matrix. Other embodiments are described and claimed.

Abstract: A method of producing a glass having a SiO2—Al2O3—B2O3—RO based composition, where RO is at least one of MgO, CaO, BaO, SrO and ZnO, a melting temperature corresponding to 102.5 poise of 1570° C. or higher and an alkali content of 0.01 to 0.2% and a ZrO2 content of 0.01 to 0.3%, as expressed in % by mass. And, a method of producing a glass having a SiO2—Al2O3—B2O3—RO based composition, where RO is at least one of MgO, CaO, BaO, SrO and ZnO, a density of 2.5 g/cm3 or less, an average thermal expansion coefficient of 25 to 36×10?7/° C. in a temperature range of 30 to 380° C., a strain point of 640° C. or higher and an alkali content of 0.01 to 0.2% and a ZrO2 content of not less than 0.01% and less than 0.4%, as expressed in % by mass.

Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.

Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.

Abstract: To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm.sup.2-ppb).sup.-1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm.sup.2) by the laser, to be 0.Itoreq.R.Itoreq.0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.

Abstract: The formation of cracks is suppressed in a drying process for a water-containing wet gel without modifying the gel and without using a reagent. A water-containing wet gel is dried by removing water and then removing the remaining solvent. For example, a wet-gel container storing water-containing wet gel, containing a wet gel and a solvent, is heated. The solvent is vaporized into an upper space of the wet-gel container. The solvent-containing gas diffuses into a dehydrating agent container, and water is removed by a dehydrating agent. This state is maintained for one to two days to remove almost all amount of water from the solvent. Thereafter, the dehydrating agent container is detached and the wet gel, from which water has been removed, is heated to almost completely remove the solvent, and further heated at a higher temperature to completely remove the solvent to obtain a crack-free dry gel.

Abstract: Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fusion process) are also disclosed.

Abstract: Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes of specific siloxane unit formulas etc., a process for their production using hydrolysis/condensation, a process for the production of silica type glass moldings with an optical transmittance of 90% to 100% in the vacuum-UV region to UV region and an optical transmittance of 98% to 100% in the visible region to near infrared region by curing said cyclic dihydrogensiloxanes or said hydrogenpolysiloxanes in a mold, said silica type glass moldings, optical elements made up of the silica type glass, a process for the production of optical elements having such a silica type glass film layer by coating an optical element with the hydrogenpolysiloxanes and curing them, and optical elements having such a silica type glass film layer.

Abstract: Mesoscopically ordered, hydrothermally stable metal oxide-block copolymer composite or mesoporous materials are described herein that are formed by using amphiphilic block polymers which act as structure directing agents for the metal oxide in a self-assembling system.

Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C.

Abstract: The process of making synthetic silica glass occurs in a combustion chamber of a muffle furnace. It includes producing a gas flow containing a fuel, an oxidizer, and a silicon compound that is converted by flame hydrolysis and/or by chemical oxidation to SiO2 particles, and depositing them on a target to form a roll-shaped silica glass body. The combustion chamber is provided with a gas inlet and a gas outlet arranged at opposite ends of the combustion chamber, which widens from the inlet to the outlet. The gas flow is produced by a central nozzle for the silicon compound, a first concentric ring-shaped nozzle for the oxidizer, and a second concentric ring-shaped nozzle for the fuel. The process is characterized by a ratio of areas of ring gaps of the ring-shaped nozzles of from 1:4 to 1:6.1. The apparatus for the process is also part of the invention.

Abstract: A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.

Abstract: An alkali resistant glass composition having improved durability to withstand highly alkali environments at elevated temperatures, such as curing of cementitious products in an autoclave, is conveniently formed from economical and abundant materials. The glass composition includes increased levels of calcium and iron, and relatively low levels of alkali metals, as compared to many other alkali resistant glass products, and comprises essentially of, by weight, >35% Si2O3, 1-25% CaO, 1-15% Fe2O3, 1-10% R2O, and an amount of Al2O3 such that the ratio of Si2O3:Al2O3 is greater than or equal to 1. Alkali resistance can be improved by forming a passivity layer on the surface of glass articles by treating the articles hydrothermally in a basic environment. Optionally zirconia and/or titania may be added to the composition to further improve alkali resistance.

Abstract: Coatings containing particulate metal alloy are disclosed. The coatings provide corrosion protection to a substrate, such as a metal substrate. The coatings contain zinc-metal-containing alloy in flake form, most particularly an alloy flake of zinc and aluminum. The coating can be from compositions that are water-based or solvent-based. The compositions for providing the coating may also contain a substituent such as a water-reducible organofunctional silane, or a hexavalent-chromium-providing substance, or a titanate polymer, or a silica substance constituent. the coating may desirably be topcoated.

Abstract: An optical member comprising OD-doped silica glass, optionally doped with fluorine. The optical member is particularly advantageous for use in connection with radiation having a wavelength shorter than about 248 nm. In certain embodiments the optical member can be advantageously used for wavelength as short as about 157 nm.

Abstract: A method of fabricating doped quartz component is provided herein. In one embodiment, the doped quartz component is a yttrium doped quartz ring configured to support a substrate. In another embodiment, the doped quartz component is a yttrium and aluminum doped cover ring. In yet another embodiment, the doped quartz component is a yttrium, aluminum and nitrogen containing cover ring.

Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Abstract: A dielectric composition for plasma display panel and a plasma display panel including the same are disclosed. The dielectric composition includes about 3 to 10 parts by weight of SiO2, about 13 to 35 parts by weight of B2O3, about 25 to 48 parts by weight of ZnO, and about 10 to 20 parts by weight of BaO.