Processes Of Treating A Reaction Product Of A Solid Polymer And Ethylenic Reactant; Or Compositions Therefore E.g., Graft- Or Graft-type Polymer, Etc. Patents (Class 522/149)
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Patent number: 6759080Abstract: The invention discloses methods for making foams by photopolymerizing emulsions comprising a reactive phase and a phase immiscible with the reactive phase components. Foams made from water-in-oil emulsions, including high internal phase emulsion are disclosed. Articles and uses for the foams are also described.Type: GrantFiled: July 30, 2002Date of Patent: July 6, 2004Assignee: 3M Innovative Properties CompanyInventors: Kristin La Velle Thunhorst, Mark David Gehlsen, Robin Edgar Wright, Eric Wayne Nelson, Steven Dean Koecher, Douglas Gold
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Patent number: 6756420Abstract: This invention provides a high-solids coating composition which comprises (A) a compound which has at least one radically polymerizable unsaturated group per molecule, (B) a hydroxyl group-containing ester compound which is obtained by ester-forming addition reaction between 2,2-dimethylolalkanoic acid having 6 to 8 carbon atoms and alkanoic acid monoglycidylester, and which has an acid value of 20 mgKOH/g or less, (C) a curing agent which is reactive with the above-mentioned hydroxyl group-containing ester compound (B), and (D) a photopolymerization initiator, and also provides a process to form a coating film by spray coating of said coating composition, which process is characterized by irradiating flying paint particles which have been sprayed and/or paint which has been applied onto a substrate with active energy ray so as to make the coating composition partially react, and by subsequently heating the coating composition.Type: GrantFiled: October 9, 2002Date of Patent: June 29, 2004Assignee: Kansai Paint Co., Ltd.Inventors: Tetsuo Ogawa, Hisashi Isaka
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Patent number: 6716894Abstract: The present invention provides: a water-absorbent resin powder, which includes no fine metallic foreign substance, and in which the deterioration is suppressed; its production process; and uses. The present invention production process for a water-absorbent resin powder comprises the steps of: polymerizing an unsaturated monomer; and drying the resultant crosslinked hydrogel polymer, wherein the water-absorbent resin powder has a crosslinked structure and a mass-average particle diameter of 300 to 600 &mgr;m wherein the ratio of fine particles having particle diameters of not larger than 150 &mgr;m is less than 10 mass % of the water-absorbent resin powder, with the production process being characterized by further comprising a magnetic-flux irradiation step of passing a magnetic field having a magnetic flux density of not less than 0.05 Wb/m2 through the water-absorbent resin powder after the drying step in the production process.Type: GrantFiled: July 3, 2002Date of Patent: April 6, 2004Assignee: Nippon Shokubai Co., Ltd.Inventors: Katsuhiro Kajikawa, Toru Nishioka, Hirotama Fujimaru, Kunihiko Ishizaki
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Patent number: 6699919Abstract: Polypropylene having improved long chain branching increased melt strength obtained by irradiating polypropylene with an electron beam having an energy of at least 5 MeV and with a radiation dose of from 5 to 100 kGray in the presence of a grafting agent, the branching index of the obtained polypropylene being lower than 0.7.Type: GrantFiled: January 4, 2002Date of Patent: March 2, 2004Assignee: Atofina ResearchInventor: Yves Charlier
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Publication number: 20030236318Abstract: A curable resin composition with excellent thermal adhesiveness is constituted of the following components (A) to (C):Type: ApplicationFiled: April 14, 2003Publication date: December 25, 2003Applicant: Kuraray Co., Ltd.Inventors: Takahiro Kitano, Hirokazu Suzuki, Keiji Kubo, Masayasu Ogushi, Kazutoshi Terada, Tsuneo Kawabata, Masaki Kojima
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Publication number: 20030225180Abstract: A photocurable composition is provided which yields an excellent tack-free, hard cured product without any addition of photoinitiators. A photocurable composition which is excellent in storage stability is also provided. The photocurable composition contains a resin having an acryloyl group and a chemical structure element selected from the group consisting of &bgr;-diketone groups and &bgr;-ketoester groups, wherein the &bgr;-diketone group or the &bgr;-ketoester group has a tetra-substituted carbon atom between two carbonyl groups, which is capable of generating one or two free radicals under photoirradiation, and the photocurable composition does not increase more than 25% in viscosity when heated at 60° C. for 5 days.Type: ApplicationFiled: March 7, 2003Publication date: December 4, 2003Inventors: Kai-Uwe Gaudl, Artur Lachowicz, Ken-ichi Yatsugi, Gerwald F. Grahe
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Patent number: 6649669Abstract: A single solution bonding formulation for dental applications comprising a plurality of at least one self-polymerizable polyvinyl acidic monomer or at least two different polymerizable polyvinyl acidic monomers, a calcium phosphate filler, at least one photoinitiator, optionally an accelerator, optionally a solvent, and optionally a fluoride additive is provided. Additionally, a method for treating enamel, dentin, and/or pulp with the same single solution bonding formulation is provided. The single solution bonding formulation provides for the release of calcium, phosphate and/or fluoride ions which are sufficient in situ to form hydroxyapatite and/or fluorapatite.Type: GrantFiled: December 28, 2001Date of Patent: November 18, 2003Assignee: American Dental Association Health FoundationInventor: Sabine Dickens
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Patent number: 6646022Abstract: A photocuring resin composition comprising a thermoplastic resin (a-1) having a radical polymerizing unsaturated group at its side chain and a photopolymerization initiator (a-2) and substantially not including a crosslinking compound other than (a-1), a photocuring sheet comprising a photocuring resin composition (A) laminated on a substrate sheet (B) and a process of production of the same, a photocuring decorative sheet and photocuring insert molding sheet using the same, and a process of production of a molded article using such a photocuring sheet and an insert molded article obtained by the same.Type: GrantFiled: July 3, 2001Date of Patent: November 11, 2003Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Shougo Okazaki, Yoko Kakuno, Kenji Suemura, Hiroyuki Watanabe
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Patent number: 6632854Abstract: A process for producing polypropylene having increased melt strength, the process comprising irradiating polypropylene with an electron beam having an energy of at least 5 MeV and with a radiation dose of from 5 to 100 kGray in the presence of a grafting agent for forming long chain branches on the polypropylene molecules.Type: GrantFiled: February 4, 2002Date of Patent: October 14, 2003Assignee: Atofina Research, S.A.Inventor: Yves Charlier
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Patent number: 6627673Abstract: The present invention relates to shape deformable materials, which are capable of (1) being deformed, (2) storing an amount of shape deformation, and (3) recovering at least a portion of the shape deformation when exposed to a humid environment. The shape deformable materials can advantageously be in the form of films, fibers, filaments, strands, nonwovens, and pre-molded elements. The shape deformable materials of the present invention may be used to form products, which are both disposable and reusable. More specifically, the shape deformable materials of the present invention may be used to produce products such as disposable diapers, training pants, incontinence products, and feminine care products.Type: GrantFiled: July 24, 2001Date of Patent: September 30, 2003Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Vasily A. Topolkaraev, Dave A. Soerens
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Patent number: 6624273Abstract: Non-tacky, base polymers are plasticized into pressure-sensitive adhesives and comprise: a) about 100 parts by weight of a base copolymer having a Tg greater than about 0° C., wherein the base copolymer is formed from and comprises: (1) about 50 to 70% by weight of a high Tg comonomer component, wherein the homopolymer formed from the high Tg comonomer component has a Tg of at least about 20° C.; (2) optionally, up to about 20% by weight based on the total weight of the base copolymer of an acidic comonomer; and (3) about 30 to 50% by weight of one or more low Tg (meth)acrylate comonomer, wherein the Tg homopolymer of the low Tg comonomer is less than about 20° C., and b) about 1 to about 100 parts based on the base copolymer of a nonreactive, non-volatile, non-acrylic-based plasticizing agent.Type: GrantFiled: August 13, 1999Date of Patent: September 23, 2003Assignee: 3M Innovative Properties CompanyInventors: Albert I. Everaerts, Eric B. T. Moonen, Peter A. Stark
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Patent number: 6617372Abstract: What is described is a polymeric hydrogel product of a stable, aqueous polymeric composition which composition forms a clear to translucent film upon application to a substrate, and includes, by weight, 5-75% of (a) a water-soluble polymer having (b) in situ-formed, substantially water-insoluble resinous particles of said polymer substantially uniformly dispersed therein, and (c) 25-95% of water, made by irradiating the composition with high energy electron beam or gamma-radiation.Type: GrantFiled: October 23, 2001Date of Patent: September 9, 2003Assignee: ISP Investments Inc.Inventor: Laurence Senak
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Patent number: 6610762Abstract: An adhesive composition which is switchable under irradiation to change from a tacky to a less tacky state which includes a switchable polymer. The polymer comprises a backbone polymeric moiety bound to a plurality of curable moieties, each of which comprises a free-radically active group and has an amine functionality. Also, the switchable polymer, processes for producing such polymers and compositions, and switchable adhesive articles comprising the adhesive compositions, such as light-switchable pressure sensitive adhesive dressings, and methods of using such articles.Type: GrantFiled: May 9, 2000Date of Patent: August 26, 2003Assignee: Smith & Nephew PlcInventor: Iain Webster
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Publication number: 20030153644Abstract: Herein is disclosed an oxygen scavenging composition, comprising an oxygen scavenging polymer comprising units having structure I: 1Type: ApplicationFiled: February 8, 2002Publication date: August 14, 2003Inventors: Hu Yang, Ta Yen Ching, Lennard Torres
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Patent number: 6599957Abstract: A UV light-curable composition comprises: (a) a first component, said first component being UV light-polymerizable polymer having a first index of refraction; and (b) a second component, the second component being UV light-polymerizable monomer having a second index of refraction, the second index of refraction being higher than said first index of refraction; wherein the first component polymerizes slower upon exposure to UV radiation than the second component.Type: GrantFiled: May 7, 2001Date of Patent: July 29, 2003Assignee: Corning IncorporatedInventors: Steven B. Dawes, Michael E. DeRosa, Robert J. Hagerty, Jianguo Wang
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Publication number: 20030134930Abstract: This invention relates to polymeric compositions that are processable and may be photochemically cured to produce crosslinked compositions useful in coating, sealants and adhesive applications. The crosslinkable composition comprises a first component having a plurality of pendent, free-radically polymerizable functional groups; a polymeric photoinitiator, and a residual content of less than 2%. The composition is melt processable at temperatures of less than or equal to 100° C.Type: ApplicationFiled: July 22, 2002Publication date: July 17, 2003Applicant: 3M Innovative Properties CompanyInventors: Babu N. Gaddam, Steven M. Hellmann, Ahmed S. Abuelyaman, Maureen A. Kavanagh, Duane D. Fansler, Kevin M. Lewandowski
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Publication number: 20030118940Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula 1Type: ApplicationFiled: January 7, 2002Publication date: June 26, 2003Applicant: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Publication number: 20030060530Abstract: The present invention relates to shape deformable materials, which are capable of (1) being deformed, (2) storing an amount of shape deformation, and (3) recovering at least a portion of the shape deformation when exposed to a humid environment. The shape deformable materials can advantageously be in the form of films, fibers, filaments, strands, nonwovens, and pre-molded elements. The shape deformable materials of the present invention may be used to form products, which are both disposable and reusable. More specifically, the shape deformable materials of the present invention may be used to produce products such as disposable diapers, training pants, incontinence products, and feminine care products.Type: ApplicationFiled: July 24, 2001Publication date: March 27, 2003Inventors: Vasily A. Topolkaraev, Dave A. Soerens
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Patent number: 6531521Abstract: A practically excellent method for preserving a photosensitive composition Containing a photopolymerization initiator and a photopolymerizable monomer and/or oligomer, which comprises placing and preserving the photosensitive composition in a light shielding vessel, wherein the product of the void ratio (%) in the vessel and the oxygen partial pressure (hPa) in the void part is 1500 (%·hPa) or more is provided; and the method imparts remarkably improved preservation stability.Type: GrantFiled: April 17, 2001Date of Patent: March 11, 2003Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Baba, Toshiya Inoue, Shigeo Hozumi
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Patent number: 6517910Abstract: In one aspect the invention provides an energy efficient polymerization method comprising irradiating a polymerizable composition and a photoinitiator with a source of essentially monochromatic radiation where the photoinitiator and the wavelength of the radiation source are selected such that the extinction coefficient of the photoinitiator at the peak wavelength of the source is greater than about 1000 M−1 cm−1 and such that the photoinitiator absorbs at least two percent of the actinic radiation incident on the coating. In another aspect the invention provides energy efficient methods of polymerizing polymerizable compositions and crosslinking crosslinkable compositions by irradiating the respective compositions with a low power source of essentially monochromatic radiation. The low power energy sources have an input power of less than about 10 W/cm.Type: GrantFiled: February 6, 2001Date of Patent: February 11, 2003Assignee: 3M Innovative Properties CompanyInventors: Robin E. Wright, George F. Vesley
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Patent number: 6518327Abstract: Graft copolymers are prepared, in a non-oxidizing atmosphere, by (1) irradiating a particulate olefin polymer material with high energy ionizing radiation, (2) treating the irradiated olefin polymer material with at least one grafting monomer that is capable of forming side chains on the olefin polymer material, in the presence of at least one additive to control the molecular weight of the side chains of the polymerized grafting monomer selected from (a) at least one hydroxylamine derivative polymerization inhibitor, and (b) at least one thio-, nitro-, or halogen-substituted aliphatic or aromatic compound or an aliphatic or aromatic phosphine derivative, and (3) deactivating the residual free radicals in the resulting grafted olefin polymer material and removing any unreacted vinyl monomer from the material. Graft copolymers with low molecular weight side chains are produced that are easier to process and have improved internal and surface morphology.Type: GrantFiled: November 2, 2000Date of Patent: February 11, 2003Assignee: Basell Poliolefine Italia S.p.A.Inventors: Vu A. Dang, Tam T. M. Phan, Jeanine A. Smith, Cheng Q. Song
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Publication number: 20030018097Abstract: A process for forming a light emitting polymer wherein photopolymerization is carried out using a reactive mesogen having an endgroup susceptible to photopolymerization, e.g., by a radical polymerization process. Also, the light emitting polymer produced and methods for using the light emitter in displays, backlights, electronic apparatus and security viewers.Type: ApplicationFiled: July 3, 2001Publication date: January 23, 2003Inventors: Mary O'Neill, Stephen Malcolm Kelly, Adam Edward Alexander Contoret, Gary James Richards
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Patent number: 6506540Abstract: A photopolymerizable composition comprising (A) a polymer binder, (B) a photopolymerizable monomer and (C) a photopolymerization initiator, wherein the component (B) is at least one compound represented by the following formula (1):Type: GrantFiled: May 15, 2001Date of Patent: January 14, 2003Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Akira Kumazawa, Shinichiro Ishino, Hiroyuki Obiya, Kenji Tazawa
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Publication number: 20030008935Abstract: A fluororesin heated at a temperature at or above the melting point of the resin is exposed in an inert gas atmosphere having an oxygen concentration of not more than 10 Torr to an ionizing radiation at a radiation dose of 0.1 kGy to 10 MGy to prepare a crosslinked fluororesin. The crosslinked fluororesin is exposed to an ionizing radiation at a radiation dose of 10 kGy to 5 MGy, and is then brought into contact with a functional group-containing organic compound to cause a graft reaction. By virtue of this constitution, a modified fluororesin is provided which has satisfactory mechanical strength and, at the same time, has, imparted thereto, for example, ion-exchange capacity, hydrophilicity, adhesive property, or abrasion resistance.Type: ApplicationFiled: June 8, 2001Publication date: January 9, 2003Inventors: Yasuaki Yamamoto, Hiroo Kusano, Hideki Yagyu, Hajime Nishi
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Patent number: 6486229Abstract: Provides high vinyl, radial multi-block styrene-butadiene-styrene-containing hot melt adhesive compositions that are radiation-curable to yield pressure-sensitive adhesive films with improved peel adhesion and cohesive strength, especially at elevated temperatures. These pressure-sensitive adhesive tapes are ideally suited for tape and label applications requiring good cohesive strength at elevated temperatures and yet are readily removed from painted or other surfaces leaving no adhesive residue.Type: GrantFiled: March 2, 2000Date of Patent: November 26, 2002Assignee: National Starch and Chemical Investment Holding CorporationInventors: Ziyi Hu, Charles W. Paul
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Patent number: 6376609Abstract: The present invention relates to a novel photosensitive resin which can be developed in water and which can be used as a photosensitive resin composition. More specifically, the present invention relates to a composition which is useful as a photosensitive soldering resist for printed circuit board.Type: GrantFiled: February 14, 2001Date of Patent: April 23, 2002Assignee: Ajinomoto Co., Inc.Inventors: Shigeo Nakamura, Tadahiko Yokota
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Patent number: 6372813Abstract: The present invention provides solid supports (e.g., glass) and polymer hydrogels (particularly polymer hydrogel arrays present on a solid support) comprising one or more reactive sites for the attachment of biomolecules, as well as biomolecules comprising one or more reactive sites for attachment to solid supports and polymer hydrogels. The invention further provides novel compositions and methods for the preparation of biomolecules, solid supports, and polymer hydrogels comprising reactive sites. The invention also provides for preparation of crosslinked solid supports, polymer hydrogels, and hydrogel arrays, wherein one or more biomolecules is attached by means of the reactive sites in a photocycloaddition reaction. Advantageously, according to the invention, crosslinking of the hydrogel and attachment of biomolecules can be done in a single step.Type: GrantFiled: June 25, 1999Date of Patent: April 16, 2002Assignee: MotorolaInventors: Travis Johnson, John McGowen, Allyson Beuhler, Charles Kimball Brush, Robert Emil Lajos
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Patent number: 6365323Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an interger of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.Type: GrantFiled: March 16, 1999Date of Patent: April 2, 2002Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6342322Abstract: Disclosed are a photosensitive composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photosensitive composition. The photosensitive composition comprises (A) a carboxyl group-containing photosensitive polymer obtained by the reaction of a copolymer of (a) a compound containing an unsaturated double bond and a carboxyl group and (b) an unsaturated double bond-containing compound with (c) a compound containing an unsaturated double bond and an epoxy group, (B) a diluent, (C) a photopolymerization initiator, (D) an inorganic powder, and (E) a stabilizer. The composition may be in the form of paste or in the form of a dry film. When the photosensitive composition is in the form of paste, the paste is applied to a substrate and then dried to form a film. When the photosensitive composition is in the form of a dry film, the film is laminated on the substrate.Type: GrantFiled: February 25, 1999Date of Patent: January 29, 2002Assignee: Taiyo Ink Manufacturing Co., Ltd.Inventors: Masahisa Kakinuma, Hideaki Kojima, Nobuyuki Yanagida
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Patent number: 6340506Abstract: The invention relates to novel crosslinkable, photoactive polymers from the class of polyimides, polyamide acids and esters thereof, and to their use as orientation layers for liquid crystals and in the construction of unstructured and structured optical elements and multi-layer systems. The polymers contain as side-chains photo-crosslinkable groups of the following formula: The broken line indicates the point of linkage to the polymer main chain. In addition, A, B each independently of the other represents unsubstituted or optionally fluoro-, chloro-, cyano-, alkyl-, alkoxy-, fluoroalkyl- or fluoroalkoxy-substituted phenylene, pyridine-2,5-diyl, pyrimidine-2,5-diyl, cyclohexane-1,4-diyl, piperidine-1,4-diyl, piperazine-1,4-diyl; C represents unsubstituted or optionally fluoro-, chloro-, cyano-, alkyl-, alkoxy-, fluoroalkyl- or fluoroalkoxy-substituted phenylene, or pyrimidine-2,5-diyl, pyridine-2,5-diyl, 2,5-thiophenylene, 2,5-furanylene, 1,4- or 2,6-naphthylene.Type: GrantFiled: March 23, 2000Date of Patent: January 22, 2002Assignee: Rolic AgInventors: Richard Buchecker, Guy Marck, Olivier Muller
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Patent number: 6339112Abstract: The present invention relates to radiation curable compositions comprising at least one metallocene polyolefin. The radiation curable compositions are useful for a variety of applications, particularly as coatings and adhesives. The radiation curable composition may comprise a single metallocene polyolefin, or blend thereof. The ultraviolet curable compositions further comprise at least one photoinitiator and/or at least one photoinduced coupling agent. For pressure sensitive adhesive applications, the radiation curable composition also preferably comprises other ingredients such as a tackifying resins and plasticizers.Type: GrantFiled: November 13, 1998Date of Patent: January 15, 2002Assignee: H.B. Fuller Licensing & Financing Inc.Inventors: Thomas F. Kauffman, John P. Baetzold, Margarita Acevedo
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Patent number: 6294593Abstract: Crosslinkable polymers which can exhibit second order nonlinear optical properties and methods of forming and crosslinking such polymers are disclosed. The crosslinkable polymers are combined with a crosslinking agent. Optionally, the crosslinking agent can exhibit second order nonlinear optical properties. In one embodiment, the crosslinking agent is thermally reactive. Alternatively the crosslinking agent is photoreactive. The combined polymer and crosslinking agent are exposed to an electric field which is sufficient to cause a component of the polymer which can exhibit second order nonlinear optical properties to be poled. The polymer is then crosslinked by the crosslinking agent. The crosslinking agent can be a guest compound that is-covalently bound to the polymer, which operates as a host compound.Type: GrantFiled: October 28, 1992Date of Patent: September 25, 2001Assignee: University of Massachusetts LowellInventors: Ru Jong Jeng, Jayant Kumar, Braja K. Mandal, Sukant Kishore Tripathy
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Patent number: 6248811Abstract: A process is disclosed for preparing bioactive, covalently fixed coatings on the surfaces of substrates, by grafting to a surface of the substrate a coating polymer which contains the following monomers in copolymerized form: (i) at least one monomer of the general formula: R—(A)a (I), in which R is a mono- or diolefinically unsaturated organic radical having a valence a, A is a carboxyl group, a sulfuric acid group, a sulfonic acid group, a phosphoric acid group, a phosphonic acid group, a phosphorous acid group, a phenolic hydroxyl group, or a salt of one of these acid groups, and a is 1, 2 or 3; and (ii) at least one monomer which is sensitive to UV radiation.Type: GrantFiled: January 5, 1998Date of Patent: June 19, 2001Assignee: Huels AktiengesellschaftInventors: Peter Ottersbach, Britta Mensing, Gerard Helary, Marcel Jozefowicz, Veronique Migonney, Jean-Pierre Vairon
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Patent number: 6235353Abstract: Production of a dielectric coating on a substrate whereby a poly(arylene ethers) or fluorinated poly(arylene ethers) layer is cured by exposure to electron beam radiation. A wide area electron beam is used which causes chemical reactions to occur in the polymer structure which are thought to cause crosslinks between polymer chains. The crosslinks lead to higher mechanical strength and higher glass transition temperature, lower thermal expansion coefficient, greater thermal-chemical stability and greater resistance to aggressive organic solvents. The polymer layer may also be optionally heated, thermally annealed, and/or exposed to UV actinic light.Type: GrantFiled: February 5, 1999Date of Patent: May 22, 2001Assignee: AlliedSignal Inc.Inventors: James S. Drage, Jingjun Yang, Dong Kyu Choi
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Patent number: 6174645Abstract: The present invention provides crosslinked polymeric networks that are reversibly crosslinked upon exposure to light of a suitable wavelength. In one embodiment photocrosslinkable branched hydrophilic polymers containing photochromic groups are synthesized. Cinnamylidene groups and derivatives of cinnamylidene are preferably used as the photochromic agents or photocrosslinking agents.Type: GrantFiled: May 3, 1999Date of Patent: January 16, 2001Assignee: University of PittsburghInventors: Alan J. Russell, Eric J. Beckman, Fotios M. Andreopoulos, William R. Wagner
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Patent number: 6165563Abstract: This invention relates to star-branched polymers containing pendent olefinic groups which have been crosslinked using actinic radiation and the use of these polymers in adhesives and coating applications.Type: GrantFiled: November 12, 1998Date of Patent: December 26, 2000Assignee: National Starch and Chemical Investment Holding CorporationInventors: Rama S. Chandran, Smita M. Shah, Paul B. Foreman
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Patent number: 6166100Abstract: A cationically polymerizable pigmented composition comprising (A) a cationically polymerizable binder component containing at least one resin or compound selected from the group consisting of (A-1) a cationically polymerizable acrylic resin consisting of a copolymer of (a) a (meth) acrylic ester monomer having C.sub.6-31 aliphatic hydrocarbon group, (b) a polymerizable unsaturated monomer containing a polymerizable unsaturated group and at least one cationically polymerizable moiety selected from the group consisting of an epoxy group and an oxetane ring, and optionally (c) other polymerizable unsaturated monomer, and (A-2) a fatty acid-modified epoxy compound containing C.sub.6-32 aliphatic hydrocarbon group and epoxy group, (B) a cationic polymerization initiator initiating polymerization by irradiation or heating, and (C) a color pigment.Type: GrantFiled: July 22, 1999Date of Patent: December 26, 2000Assignee: Kansai Paint Co., Ltd.Inventors: Noriko Hiwara, Kenji Seko, Yoshiyuki Yukawa, Michitomo Kato, Takeshi Matuda
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Patent number: 6124372Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.Type: GrantFiled: August 29, 1996Date of Patent: September 26, 2000Assignee: Xerox CorporationInventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
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Patent number: 6121340Abstract: The present invention relates to a photodefinable dielectric composition comprising a photoinitiator and a polycyclic addition polymer comprising polycyclic repeating units that contain pendant silyl functionalities containing hydrolyzable substituents. Upon exposure to a radiation source the photoinitiator catalyzes the hydrolysis of the hydrolyzable groups to effect the cure of the polymer and adhesion of the polymer to desired substrates.Type: GrantFiled: November 4, 1997Date of Patent: September 19, 2000Assignee: The B. F. Goodrich CompanyInventors: Robert A. Shick, Saikumar Jayaraman, Edmund Elce, Brian L. Goodall
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Patent number: 6117967Abstract: Disclosed is a polymer of the formula ##STR1## wherein A is ##STR2## or a mixture of ##STR3## wherein R is a hydrogen atom, an alkyl group, an aryl group, or mixtures thereof, B is one of specified groups, such as ##STR4## or mixtures thereof, and n is an integer representing the number of repeating monomer units.Type: GrantFiled: June 4, 1999Date of Patent: September 12, 2000Assignee: Xerox CorporationInventors: Timothy J. Fuller, John F. Yanus, Damodar M. Pai, Markus R. Silvestri, Ram S. Narang, William W. Limburg, Dale S. Renfer
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Patent number: 6090895Abstract: A method is provided for making crosslinked acidic polymers useful as ion conductive membranes, such as crosslinked sulfonated polyether ketones, sulfonated polysulfones, sulfonated polystyrenes, and other acidic polymers, by crosslinking with a species which generates an acidic functionality. The crosslinker preferably binds to acid functions by conversion of acid groups to imide functionality, which, due to the acidity of the N-H bonds therein, compensate for the acidity lost by the occupation of the acid groups and thus preserve membrane conductivity while contributing to membrane strength and resistance to swelling.Type: GrantFiled: May 22, 1998Date of Patent: July 18, 2000Assignee: 3M Innovative Properties Co.,Inventors: Shane S. Mao, Steven J. Hamrock, David A. Ylitalo
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Patent number: 6027857Abstract: A photosensitive composition is prepared containing a polymer of the formula B(X)(Y) wherein B represents an organic backbone, each X independently is an acidic group or salt thereof and each Y independently is a photocurable group and a photoinitiating compound or compounds. Preferably, free-radically polymerizable multi-functional monomer and/or oligomer is added to the photosensitive composition. The photosensitive composition can be coated on a suitable substrate for planographic printing plate applications. Imagewise irradiation causes the light struck regions to photocure, becoming insoluble in aqueous and organic mediums, while the non-light struck regions remain highly soluble/dispersable. Printing plates of this construction do not require processing prior to being run on a press.Type: GrantFiled: April 28, 1999Date of Patent: February 22, 2000Assignee: Minnesota Mining and Manufacturing CompanyInventors: Minyu Li, James P. Gardner, John E. Kluge, Sumita B. Mitra
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Patent number: 6007966Abstract: A photosensitive composition is disclosed particularly for making printed circuit boards. It contains: (a) a polymer binder; (b) a photoinitiator; and (c) an unsaturated photomonomer. The polymer binder is prepared from a reaction among the following reactants: (i) a styrene-maleic anhydride resin containing repeating units of styrene and anhydride groups, (ii) an unsaturated compound containing at least one hydroxy group and at least three acrylic groups, and (iii) a saturated alcohol. The styrene-maleic anhydride resin is prepared from a polymerization reaction of styrene and maleic anhydride in a molar ratio ranging from 3:1 to 1:1, and preferably has a molecular weight between 800 and 100,000.Type: GrantFiled: September 9, 1998Date of Patent: December 28, 1999Assignee: Industrial Technology Research InstituteInventor: Hsien-Kuang Lin
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Patent number: 6001534Abstract: A photosensitive resin composition is comprised of (A) a polyimide resin having a weight-average molecular weight of from 5,000 to 150,000, represented by the general formula (I): ##STR1## wherein X is a specified tetravalent organic group having two benzene rings, Y is a member comprised of 30-100 mol % of a specific organic group having two benzene rings and 70-0 mol % of another specific divalent aromatic organic group, Z is a divalent organic group represented by the general formula (VI): ##STR2## wherein b is an integer of 5 to 80; and m and n each represent a number satisfying that m/(m+n) is 0.98 to 0.70 and n/(m+n) is 0.02 to 0.30; (B) an agent selected from a sensitizer and a photopolymerization initiator; and (C) an organic solvent. From this composition, polyimide films having a superior adhesion to substrates and also having no corrosive properties can be formed by low-temperature heat treatment.Type: GrantFiled: March 30, 1998Date of Patent: December 14, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Hideto Kato
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Patent number: 6001488Abstract: A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and as the crosslinking agent, a curing agent for epoxy resins or a photoreactive substance is provided. The resin composition is suitable for use as an insulating material.Type: GrantFiled: June 29, 1998Date of Patent: December 14, 1999Assignees: Nippon Zeon Co., Ltd., Fujitsu LimitedInventors: Hideaki Kataoka, Eiko Yuda, Shigemitsu Kamiya, Masahide Yamamoto, Yoshikatsu Ishizuki, Yasuhiro Yoneda, Daisuke Mizutani, Kishio Yokouchi
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Patent number: 6001894Abstract: A process for modifying the surface of a polymer substrate which comprises (1) pretreating the polymer substrate with a photoinitiator or thermoinitiator and at least one ethylenically unsaturated monomer, and (2) subjecting said pretreated polymer substrate to graft polymerization by said at least one monomer, optionally in the added presence of at least one ethylenically unsaturated monomer that is the same or different from the monomer of step (1), and products produced thereby.Type: GrantFiled: April 14, 1998Date of Patent: December 14, 1999Assignee: Huels AktiengesellschaftInventors: Peter Ottersbach, Martina Inhester
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Patent number: 5994425Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.Type: GrantFiled: August 29, 1996Date of Patent: November 30, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller, Thomas W. Smith, David J. Luca, Ralph A. Mosher
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Patent number: 5994426Abstract: A solid-polymer-electrolyte membrane for a polymer-electrolyte fuel cell is formed of a synthetic resin. The synthetic resin includes a main chain, and a hydrocarbon-based side chain. The main chain is formed as a film, and formed of a copolymer made from a fluorocarbon-based vinyl monomer and a hydrocarbon-based vinyl monomer. The hydrocarbon-based side chain involves a sulfonic group. The solid-polymer-electrolyte membrane exhibits a high strength and flexibility, but a low electric resistance, and can be produced at a reduced manufacturing cost. Thus, the solid-polymer-electrolyte membrane can be effectively applied to construct polymer-electrolyte fuel cells.Type: GrantFiled: January 23, 1998Date of Patent: November 30, 1999Assignee: Aisin Seiki Kabushiki KaishaInventors: Shinji Nezu, Masaki Gondo
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Patent number: 5994033Abstract: A screen printing stencil made from a composition comprising polyhydroxy compounds having a plurality of 1,2- or 1,3-diol groups along a polymer backbone, the diol groups grafted thereto a compound of formula (I) (where A is an arylene or an alkylene group; X is an oxygen atom, a sulfur atom, a carbon-carbon bond, or a group of formula (a), (b) or (c); R is a hydrogen atom or a methyl group; R.sup.1 is a (C.sub.1 -C.sub.4) alkyl group; m is an integer of from 1 to 8; n is an integer of from 1 to 3; and p is 1 or 2); or an acetal of the polyhydroxy, compound with ethylene glycol.Type: GrantFiled: June 2, 1999Date of Patent: November 30, 1999Assignee: Sericol LimitedInventors: Robert S. Davidson, Stuart J. Palmer, Julie E. Pratt, Stephen P. Wilson
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Patent number: 5989627Abstract: The specification describes processes for synthesizing vinyl ether functionalized oligomers or polymers, and methods for coating optical fibers with formulations containing these oligomers or polymers. Optical fibers coated with these formulations can be highly transparent to radiation used to write optical gratings in the optical fibers.Type: GrantFiled: September 28, 1998Date of Patent: November 23, 1999Assignee: Lucent Technologies Inc.Inventors: Lee Landis Blyler, Jr., Mark Anthony Paczkowski, Debra Ann Simoff, Ulrike Varlemann, Nanze Patrick Wang