Processes Of Treating A Reaction Product Of A Solid Polymer And Ethylenic Reactant; Or Compositions Therefore E.g., Graft- Or Graft-type Polymer, Etc. Patents (Class 522/149)
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Patent number: 5416127Abstract: This invention is a hot melt pressure sensitive adhesive formed by copolymerizing acrylic, or a combination of acrylic and vinyl, monomers with the functional monomer, 1-(1-isocyanato-1-methyl ethyl)-3-(1-methyl ethenyl)benzene m-TMI, to give a saturated polymer with pendant vinyl groups that are crosslinked by UV or EB radiation.Type: GrantFiled: January 26, 1994Date of Patent: May 16, 1995Assignee: National Starch and Chemical Investment Holding CorporationInventors: Rama Chandran, Roopram Ramharack, Irwin J. Davis, John C. Leighton
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Patent number: 5409971Abstract: An aqueous, radiation-curable, functionalized latex polymer composition and its preparation are disclosed. The composition is a multistaged latex polymer formed from a first stage polymer and a second stage polymer having .alpha., .beta.-unsaturated carbonyl functionalization which permits curing by UV radiation. The composition dries tack-free before curing. The final cured UV coating has excellent solvent resistance, water resistance, stain resistance, direct impact resistance and hot print resistance. The composition is useful in coatings, adhesives, inks and leather coatings, and is particularly useful as a coating on wood.Type: GrantFiled: February 4, 1994Date of Patent: April 25, 1995Assignee: Rohm and Haas CompanyInventors: Martha H. Wolfersberger, Frederick J. Schindler, Ronald S. Beckley, Ronald W. Novak
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Patent number: 5407970Abstract: The invention relates to adhesive compositions comprising terpolymers C.sub.6 to C.sub.10 unsaturated .alpha.-olefin monomers, C.sub.2 to C.sub.5 .alpha.-olefin monomers and polyene monomers and an effective amount of photoactive cross-linking agent to cross-link composition upon radiation from a source of active radiation.Type: GrantFiled: April 13, 1993Date of Patent: April 18, 1995Assignee: Minnesota Mining and Manufacturing CompanyInventors: James R. Peterson, Gaddam N. Babu
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Patent number: 5399460Abstract: Negative photoresists, and electronic devices comprising dielectric polyimide films resulting from such photoresists. The Photoresists comprise polyamic acids, which have been neutralized with tertiary amines containing double bonds of the acrylic family, the amines including acrylamines, alkylacrylamines such as for example methacrylamines, ethacrylamines, and the like. Also methods of making such amines in high purity.Type: GrantFiled: December 4, 1991Date of Patent: March 21, 1995Assignee: E. I. Du Pont de Nemours and CompanyInventors: Paul E. Aldrich, Philip Manos, Allan E. Nader
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Patent number: 5384341Abstract: There is disclosed an actinic-radiation-curing, hot-melt pressure-sensitive adhesive composition, which comprises a mixture in a limited mixing ratio of an acrylic high-molecular-weight polymer that is made up of main chain having a molecular weight of 8,000 to 100,000 and a glass transition temperature of -75.degree. to -20.degree. C., and branched chain, in which the main chains and/or branched chains have or at least one ethylenically unsaturated group; and a low-molecular-weight polymer having a molecular weight of 500 to 8,000 and a glass transition temperature of lower than 100.degree. C., which polymer has or does not have an ethylenically unsaturated group in the molecule.Type: GrantFiled: December 27, 1993Date of Patent: January 24, 1995Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Makoto Itagaki, Eiichi Kawasaki, Kazuya Shinkoda, Kousuke Suewaka
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Patent number: 5364891Abstract: Process for making a polymer with desired groups Y comprising reacting a precursor polymer having carbon- or nitrogen-bound --NH.sub.2 and/or --NH-- groups with at least one compound having a single enolic carbonyl group and at least one group Y. Also the polymer itself and a composition containing it.Type: GrantFiled: February 14, 1991Date of Patent: November 15, 1994Assignees: Imperial Chemical Industries PLC, ICI Resins BVInventors: David A. Pears, John G. Carey, Paul H. Stenson, Gerardus C. Overbeek
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Patent number: 5360835Abstract: Radiation-curable polyurethane emulsion compositions that can be diluted with water are disclosed. An emulsion of a polyurethane having active amino groups is prepared, and the emulsion is reacted, in the presence of water, with an isocyanate compound having a polymerizable unsaturated group to introduce the polymerizable unsaturated group into the polyurethane. The introduction of a polymerizable unsaturated group into the polyurethane is accomplished in the presence of water, thereby overcoming prior art problems of polymerization and gelation during the preparation of the emulsion. The present invention provides radiation-curable polyurethane emulsion compositions that can be produced on an industrial scale.Type: GrantFiled: November 30, 1993Date of Patent: November 1, 1994Assignee: Dai-Ichi Kogyo Seiyaku Co., Ltd.Inventors: Kazuo Sato, Tadayuki Sugimoto, Naofumi Saiuchi
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Patent number: 5360864Abstract: A process for preparing a compound having the structure ##STR1## which comprises heating under acidic conditions a polyvinyl alcohol and a compound of the structure ##STR2## is a polyvinyl acetal, n is an integer from 1 to 6,R is hydrogen or alkyl,m is an integer from 1 to 6,X is an anion, ##STR3## is a divalent radical having the structure ##STR4## Y is a monovalent radical having the structure ##STR5## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are hydrogen, alkyl, alkenyl, alkoxy, aralkyl, substituted alkyl, substituted alkoxy, carboxy, carboxy ester, amino, substituted amino, amido, substituted amido, cyano, hydroxy, nitro, isocyanato, sulphonyl halide, sulphonic acid and halide, and may be the same or different, or R.sub.1 taken together with R.sub.2 is methylene-dioxy, and A is a formyl or acetal group.Type: GrantFiled: April 8, 1993Date of Patent: November 1, 1994Assignee: Ulano CorporationInventor: John Curtis
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Patent number: 5358999Abstract: Polyvinyl alcohol is modified by reaction with a stilbazol quaternary salt acetal to produce a water soluble polymer capable of photodimerizing on exposure to active radiation to yield water-soluble photoresist materials.Type: GrantFiled: April 5, 1993Date of Patent: October 25, 1994Assignee: Ulano CorporationInventor: John Curtis
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Patent number: 5356947Abstract: The present invention provides controllably curable photoiniferter containing adhesive compositions which are suitable for the mounting of microelectronic devices such as flip chips onto transparent wiring boards, a method of making the adhesive compositions, and a method of using the adhesive compositions in order to bond microelectronic devices to transparent wiring boards by intermittent exposure of the adhesive composition to a radiant energy source. The adhesive compositions can be cured in a stepwise fashion by intermittent controlled exposure to a source of radiation thus providing exactly the amount of cure and hardening desired.Type: GrantFiled: October 29, 1992Date of Patent: October 18, 1994Assignee: Minnesota Mining and Manufacturing CompanyInventors: Mahfuza B. Ali, Jean M. Pujol
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Patent number: 5306744Abstract: An aqueous, radiation-curable, functionalized latex polymer composition and its preparation are disclosed. The composition is a multistaged latex polymer formed from a first stage polymer and a second stage polymer having .alpha., .beta.-unsaturated carbonyl functionalization which permits curing by UV radiation. The composition dries tack-free before curing. The final cured UV coating has excellent solvent resistance, water resistance, stain resistance, direct impact resistance and hot print resistance. The composition is useful in coatings, adhesives, inks and leather coatings, and is particularly useful as a coating on wood.Type: GrantFiled: December 18, 1992Date of Patent: April 26, 1994Assignee: Rohm and Haas CompanyInventors: Martha H. Wolfersberger, Frederick J. Schindler, Ronald S. Beckley, Ronald W. Novak
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Patent number: 5290548Abstract: A method for modifying the plastic surface of an article adapted for contacting living tissue by the gamma or electron beam irradiation induced chemical graft coating thereon of:(1) a neutral or ionic water-soluble, hydrophilic vinylic monomer or salt thereof;(2) a mixture of at least two of said monomers, or(3) a mixture of (1) or (2) with up to about 50%, by weight, based on the total monomer weight, of a member selected from the group consisting of N-vinylpyrrolidone, 2-hydroxyethyl-methacrylate, and mixtures thereof; so as to form a hydrophilic graft polymer coating on the surface.Type: GrantFiled: March 30, 1992Date of Patent: March 1, 1994Assignee: University of FloridaInventors: Eugene P. Goldberg, Ali Yahiaoui, Khalid Mentak
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Patent number: 5290663Abstract: A photopolymer useful in preparing water-developable, solid printing plates is prepared by (A) preparing a urethane prepolymer by reacting a polyoxyalkylene diol (optionally carboxylic acid grafted) with an excess of diisocyanate, followed by chain extending the resulting prepolymer mixture with a dialkylolpropionic acid and preferably with additional diols(s) such as alkane diol(s) and (meth)acrylate-containing diol(s). Use of a new (meth)acrylate-containing diol in such chain extension completes the formation of photopolymer. However, in a third operation (B) hydroxyalkylmethacrylate may be reacted with the result of (A) whether or not (meth)acrylate-containing diol is used in (A). The carboxylic acid groups of the photopolymer may also be partially neutralized with a base. The photopolymer is suitably formulated with additional photoactive (meth)acrylate monomers or oligomers and photoinitiator for casting on a substrate or extruding to form a flexographic printing plate.Type: GrantFiled: March 1, 1991Date of Patent: March 1, 1994Assignee: W. R. Grace & Co.-Conn.Inventor: Truc-Chi T. Huynh-Tran
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Patent number: 5276069Abstract: Synthetic resins are obtainable by chemically bonding one or more compounds of the general formula I ##STR1## where R.sup.1 is --OH, --NH.sub.2, ##STR2## --NHR.sup.3 or ##STR3## R.sup.2 is --H, --CH.sub.3 or --C.sub.2 H.sub.5, R.sup.3 is --C.sub.m H.sub.2m+1, where m is from 1 to 6, R.sup.4 is --H or --CH.sub.3 and n is from 1 to 12, via the oxygen or nitrogen atom of R.sup.1 to one or more polymers A which consist ofa) from 50 to 100% by weight of one or more esters of acrylic or methacrylic acid with monohydric alcohols of 1 to 18 carbon atoms or a mixture of these esters (monomers a) andb) from 0 to 50% by weight of other copolymerizable monomers (monomers b) in polymerized form,in amounts such that the synthetic resin contains from 0.01 to 1 mole of double bonds per kg of polymer A.After exposure to ultraviolet light or to electrons, these synthetic resins are suitable as contact adhesives.Type: GrantFiled: May 3, 1991Date of Patent: January 4, 1994Assignee: BASF AktiengesellschaftInventors: Gerd Rehmer, Gerhard Auchter, Helmut Jaeger
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Patent number: 5254431Abstract: A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.Type: GrantFiled: November 23, 1992Date of Patent: October 19, 1993Assignee: Vickers plcInventors: Terence Etherington, Victor Kolodziejczyk
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Patent number: 5244962Abstract: There are provided pressure-sensitive adhesives which comprise free radical cured mixtures of at least one crosslinkable olefin polymer and at least one tackifying organic additive, preferably a hydrogenated additive, which is substantially nonresponsive to action of free radicals and present in an amount sufficient to tackify the cured mixture of polymer and additive.Type: GrantFiled: August 14, 1991Date of Patent: September 14, 1993Assignee: Avery Dennison CorporationInventors: Sebastian S. Plamthottam, Roger H. Mann, John O. Landers
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Patent number: 5216122Abstract: Residual ethylene oxide is removed from poly(ethylene oxide) by the steps of adding to particles of high molecular weight poly(ethylene oxide) a finely divided solid particulate material which is capable of coating the poly(ethylene oxide) particles and impeding their agglomeration under conditions of heating, heating the particles of poly(ethylene oxide) at a temperature of at least 40.degree. C. and preferably which is near their crystalline melting point, and maintaining the temperature for a sufficient time to reduce the ethylene oxide in the particles of poly(ethylene oxide) to ten ppm or less. In one embodiment, the poly(ethylene oxide) is heated by holding the particles in a heated enclosure; in another, it is heated as a slurry in a liquid medium; in yet another, it is heated by warm gas in a gaseously-fluidized bed; and in a fourth, it is heated by microwave radiation.Type: GrantFiled: May 21, 1991Date of Patent: June 1, 1993Assignee: Union Carbide Chemicals & Plastics Technology CorporationInventors: Walter T. Reichle, Geoffrey A. D'Netto, Guy M. Troy, Meyer R. Rosen, Elke M. A. Clark
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Patent number: 5206113Abstract: Disclosed is a graft polymer comprising a polyurethane graft backbone and grafted-on chains comprising vinyl alcohol units and units with lateral styrylpyridinium or styrylquinolinium groups, and also a photocurable mixture comprising the graft polymer and a photosensitive compound, such as a photosensitizer of a negative-working diazo compound. The mixture is suited for the production of printing plates, in particular planographic printing plates, and photoresists. Printing plates prepared from the mixture are distinguished by high photospeed, good developability with aqueous solutions and long print runs.Type: GrantFiled: August 31, 1990Date of Patent: April 27, 1993Assignee: Hoechst AktiengesellschaftInventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel
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Patent number: 5204222Abstract: A photocurable elastomeric mixture is described which comprises a compound which contains at least one terminal ethylenically unsaturated group and is polymerizable by free radical polymerization, a photopolymerization initiator and, as binder, a graft polymer which is soluble or dispersible in water or an aqueous solution, the graft base of which is a polymer of diol components and diisocyanate components having at least 2 urethane groups in the molecule, onto which polymer carboxylic acid vinyl ester units having 3 to 20 carbon atoms, or their saponification products, are grafted. The mixture is suitable for the production of relief printing plates, in particular flexographic printing plates, and can be developed with water or aqueous solutions.Type: GrantFiled: August 6, 1991Date of Patent: April 20, 1993Assignee: Hoechst AktiengesellschaftInventors: Joachim Gersdorf, Matthias Kroggel, Karl-Josef Rauterkus
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Patent number: 5198476Abstract: An ultraviolet-curable silicone composition comprising(A) 100 parts by weight of an epoxy-functional polyorganosiloxane which comprises structural units represented by the formula R.sup.1 R.sup.2 SiO, wherein R.sup.1 represents hydrogen atom or a monovalent hydrocarbon group and R.sup.2 represents hydrogen atom, a monovalent hydrocarbon group, or a monovalent epoxy-functional organic group, and in which at least two of all the organic groups are a monovalent epoxy-functional organic group;(B) from 1 to 80 parts by weight of at least one copolymer for regulating peel strength, which is soluble in component (A), selected from the group consisting of (i) a copolymer represented by a unit structure of MQ or M.sup.A Q, (ii) a copolymer represented by a unit structure of M.sup.A T, MT.sup.A or M.sup.A T.sup.A, and (iii) a copolymer represented by a unit structure of M.sup.A DQ, MD.sup.A Q or M.sup.A D.sup.A Q, wherein M represents an R.sup.3.sub.3 SiO.sub.1/2 unit, M.sup.A represents an R.sup.3.sub.2 R.sup.4 SiO.Type: GrantFiled: June 27, 1991Date of Patent: March 30, 1993Assignee: Toshiba Silicone Co., Ltd.Inventors: Keiji Kobayashi, Katsuya Kanemaru
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Patent number: 5196487Abstract: A corrosion preventive resin having in the molecule at least one chelate forming group selected from among groups represented by the formula ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and are each a hydrogen atom or alkyl having 1 to 8 carbon atoms, and groups represented by teh general formula ##STR2## wherein R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are the same or different and are each a hydrogen atom, alkyl having 1 to 8 carbon atoms or a group forming a bivalent o-phenylene group along with two carbon atoms attached thereto. A photopolymerizable composition which includes (a) a resin having in the molecule at least one mole of polymerizable double bond per 1000 g of the resin and having per molecule at least one chelate forming group selected from among the groups represented by formula (II) and formula (III), and (b) a photopolymerization initiator is also disclosed.Type: GrantFiled: June 10, 1991Date of Patent: March 23, 1993Assignee: Kansai Paint Company, LimitedInventors: Hideo Kogure, Heihachi Murase, Naozumi Iwasawa
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Patent number: 5182332Abstract: Disclosed is a dental composition comprising a (meth)acrylic ester compound as the principal component and containing a polymerization initiator, which is characterized by having incorporated therein a grafted rubber obtained by polymerizing at least one ethylenically unsaturated monomer in the presence of a rubber. This dental composition can be cured to yield a cured product having excellent strength properties and, therefore, is particularly useful in applications such as a molar restoration material and a denture base resin.Type: GrantFiled: August 1, 1990Date of Patent: January 26, 1993Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Naoki Yamamoto, Nobuhiro Mukai, Hitoshi Ige, Junko Atarashi
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Patent number: 5171655Abstract: A photohardenable composition comprises a microgel carrying a group of the formula (I) or (II); or a microgel carrying a group of the formula (III) and at least one acidic group, such as --SO.sub.3 H, --CONHSO.sub.2, --OCO--NH'SO.sub.2 --, --CONHCO--, --SO.sub.2 NH--, a phenolic hydroxyl group and/or --COCH.sub.2 COO--: ##STR1## (wherein R.sup.1 and R.sup.2 each represents a hydrogen atom, a halogen atom, or an alkyl or aryl group, provided that R.sup.1 and R.sup.2 may form a ring together with the carbon atoms to which they are bonded; R.sup.3 represents a hydrogen atom or a methyl group; R.sup.4, R.sup.5 and R.sup.6 each represents a hydrogen atom, a halogen atom, or a substituted or unsubstituted C.sub.1 to C.sub.20 alkyl, aryl, alkoxy or aryloxy group; X.sup.1 represents --CO--O--, --CO--NH-- or --O--; andY.sup.1 represents, for instance, a single bond or a methylene group).Type: GrantFiled: August 2, 1990Date of Patent: December 15, 1992Assignee: Fuji Photo Film Co., Ltd.Inventor: Keitaro Aoshima
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Patent number: 5164424Abstract: A polymer is disclosed which has a betaine structure on at least one side chain. The polymer according to this invention is suitable for use as a material for producing a pervaporation membrane. A process is described for producing the polymer according to this invention whereby betaine groups are introduced into a starting polymer. The betaine groups are introduced into the starting polymer by irradiation of the starting polymer with ionizing radiation and then treatment of the irradiated starting polymer with monomers that are capable of a graft reaction. Monomers that either already contain a betaine function or are capable of forming such a function are used. The betaine can be formed, e.g., by alkylating quaternation of a nitrogen atom present in the monomer if an acid group is introduced simultaneously with the alkylating agent.Type: GrantFiled: March 25, 1991Date of Patent: November 17, 1992Assignee: Deutsche Carbone AGInventors: Hartmut E. A. Brueschke, Guenter F. Tuesel, Guido Ellinghorst, Axel Niemoeller
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Patent number: 5134053Abstract: Disclosed is a photocurable mixture which is suited for the production of printing plates, in particular planographic printing plates, and photoresists. The mixture comprises a graft polymer comprised of a polyurethane as the graft backbone and grafted-on chains containing vinyl alcohol units and units with lateral, polymerizable or crosslinkable double bonds, and a photosensitive compound, such as a photoinitiator or a negative-working diazo compound.The printing plates prepared from the mixture are distinguished by high photospeed, good developability with aqueous solutions and long print runs.Type: GrantFiled: July 27, 1990Date of Patent: July 28, 1992Assignee: Hoechst AktiengesellschaftInventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel
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Patent number: 5130347Abstract: A dental cement system containing a photocurable ionomer, reactive powder and water undergoes both a conventional setting reaction and a photocuring reaction.The cement system can provide a long working time and can be cured on demand by exposure to an appropriate source of radiant energy. The surface of the cement cured in this manner is then hard enough to allow subsequent clinical procedures to be performed, while the ongoing chemical-cure "setting" reaction hardens the remainder of the cement.Type: GrantFiled: February 19, 1991Date of Patent: July 14, 1992Assignee: Minnesota Mining and Manufacturing CompanyInventor: Sumita B. Mitra
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Patent number: 5087552Abstract: The invention provides a photosensitive resin composition useful as a solder resist, etching resist or plating resist in the manufacture of printed circuit boards to exhibit excellent resistance against heat and chemicals and good adhesion to the substrate surface. The composition essentially comprises (a) a copolymeric resin of an .alpha.,.beta.-unsaturated dicarboxylic acid anhydride and an ethylenically unsaturated polymerizable compound, of which the acid anhydride units are partially esterified with an unsaturated alcohol and a saturated alcohol, and (b) a photopolymerization initiator. The composition may further comprise optional ingredients such as (c) a photopolymerizable monomeric compound, (d) an epoxy-based resin and (e) an aromatic diamine compound.Type: GrantFiled: October 13, 1989Date of Patent: February 11, 1992Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoki Horigome, Kenji Tazawa, Toshimi Aoyama
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Patent number: 5079313Abstract: Polymer dispersing agent comprising a graft polymer prepared by graft-polymerizing an organopolysiloxane having a mercapto group on the side chain with at least one acrylic or methacrylic monomer, and epoxy resin composition comprising epoxy resin, silicone resin and the above polymer dispersing agent. The polymer dispersing agent has an excellent effect for dispersing the silicone resin into the epoxy resin, and thereby the epoxy resin composition thus prepared has high dispersion stability and exhibits improved impact resistance and relaxation of residual internal stress and is useful as a sealing agent for IC, a coating agent, a paint composition, an adhesive, and a prepreg.Type: GrantFiled: November 15, 1989Date of Patent: January 7, 1992Assignee: Sunstar Giken Kabushiki KaishaInventors: Tatsuya Okuno, Hiromu Okamoto, Masahiro Uemori
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Patent number: 5070000Abstract: Disclosed is an electrodeposition coating composition for use in printed circuit board photo resist, comprising (a) an acrylic resin containing (meth)acryloyl group and obtained by use of diacetone (meth)acrylamide as an essential monomer component, said acrylic resin being a water-soluble or water-dispersible photo-curable unsaturated resin having an acid value of 20 to 300, a degree of unsaturation of 0.2 to 4.5 moles/kg, a number average molecular weight of 1,000 to 100,000 and a glass transition temperature of 0.degree. to 100.degree. C., and (b) a water-insoluble photopolymerization initiator.Type: GrantFiled: November 1, 1988Date of Patent: December 3, 1991Assignee: Kansai Paint Co., Ltd.Inventors: Kenji Seko, Yuu Akaki, Naozumi Iwasawa, Toshio Kondo
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Patent number: 5066728Abstract: A multiblock copolymer comprising endblocks of phenylbutadiene and an elastomeric midblock of a conjugated diene such as isoprene or butadiene is disclosed. The copolymer is crosslinkable by EB radiation such that the crosslinks are confined primarily to the endblock domains in the polymer with minimal crosslinking occurring in the rubbery matrix. Also disclosed are blends of the copolymers with tackifier resins compatible with the midblock regions. The blends provide a curable PSA having enhanced cohesive strength while maintaining adhesive properties.Type: GrantFiled: September 27, 1990Date of Patent: November 19, 1991Assignee: Exxon Chemical Patents Inc.Inventor: Jay D. Audett
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Patent number: 5061603Abstract: Photopolymerizable polyvinyl alcohols including a group of formula ##STR1## wherein R.sub.1 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a hydrogen atom; R.sub.2 represents a substituted or unsubstituted alkyl group, a primary, secondary or tertiary amino group, a cyano, hydroxy or nitro group, a halogen or hydrogen atom or, together with the pyridine ring to which it is attached, part of a quinolyl group; R.sub.3 represents a chlorine or hydrogen atom or, together with the benzene ring to which it is attached, part of a naphthyl group; and X.sup.- represents an anion, and photocurable compositions for producing screen printing stencils including such polyvinyl alcohol derivatives. Compositions of the invention show high light sensitivity with low levels of photocrosslinkable groups grafted to the polyvinyl alcohol.Type: GrantFiled: December 12, 1989Date of Patent: October 29, 1991Assignee: Sericol Group LimitedInventors: John Hamilton, Peter Dickinson
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Patent number: 5061602Abstract: In a photosensitive recording material suitable for producing plates or resist patterns, the photopolymerizable recording layer contains as polymeric binder a film-forming copolymer which has a multiphase morphology, one phase having a glass transistion temperature below room temperature and a further phase having a glass transition temperature above room temperature and this copolymer having been obtained by free radical copolymerization of one or more macromers with one or more further olefinically unsaturated copolymerizable organic compounds.Type: GrantFiled: July 25, 1989Date of Patent: October 29, 1991Assignee: BASF AktiengesellschaftInventors: Horst Koch, Hans Schupp, Reinhold Schwalm
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Patent number: 5002977Abstract: An unsaturated resin composition curable with an active energy ray, comprising a reaction product between an acid group-containing vinylic resin and an alicyclic epoxy group-containing unsaturated compound; and an unsaturated resin composition curable with an active energy ray, comprising a reaction product between an alicyclic epoxy group-containing vinylic resin and an acid group-containing unsaturated compound.Type: GrantFiled: May 17, 1989Date of Patent: March 26, 1991Assignee: Kansai Paint Co., Ltd.Inventors: Kenji Seko, Naozumi Iwasawa
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Patent number: 4996243Abstract: A composition of matter comprising an acrylamido-acyl or methacrylamido-acyl oligomer derived from at least one nucleophilic oligomer having at least one amino-, hydroxyl-, or thiol-substituted polyoxyalkylene, polyalkyleneimine, polyester, polyolefin, polyacrylate, or polysiloxane oligomer, said nucleophilic oliogmer having a molecular weight in the range of 200 to 20,000 is disclosed. Also disclosed are free radially polymerizable monomer-containing compositions containing said oligomers as well as acrylamido- and methacrylamido-acylated polymers which are the thermal or photocured products of said oligomers. In addition, a process is disclosed for providing said acrylamido- and methacrylamido-acylated oligomers which are useful, for example, in coatings, films, printing inks, adhesives, and saturants.Type: GrantFiled: January 16, 1990Date of Patent: February 26, 1991Assignee: Minnesota Mining and Manufacturing CompanyInventors: Jerald K. Rasmussen, Steven M. Heilmann, Frederick J. Palensky
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Patent number: 4968524Abstract: The present invention relates to an electric material, and particularly it relates to an organic substance having a polyacetylene linkage which exhibits electrical conductivity and nonlinear optical effect.More particularly, the present invention provides a process for producing an organic substance having a polyacetylene linkage which can be utilized, for example, as an electric material, said process comprising immersing a substrate having a hydrophilic surface in a solution of a substance containing an acetylene (--C.tbd.C--) group and a chlorosilane (--SiCl.sub.3) group dissolved in a nonaqueous organic solvent, thereby subjecting the substance containing an acetylene group and a chlorosilane group to chemical adsorption on the surface of the substrate, subjecting said substance to polymerization reaction by the use of radiation such as X-rays, electron beams, .gamma.-rays, or the like, and thereby producing a polyacetylene.Type: GrantFiled: October 12, 1988Date of Patent: November 6, 1990Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Kazufumi Ogawa, Hideharu Tamura, Norihisa Mino
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Patent number: 4921923Abstract: Oligomeric condensation products of certain diketones and phenols can be end-capped with a vinylbenzyl moiety and certain other moieties, especially alkyl groups, to afford thermosetting resins particularly valuable in making laminated circuit boards. Resins prepared by the reaction of 1 molar proportion of diacetylbenzene with from 3.5 to 4.0 molar proportions of phenol and end-capped with from 50 to 100% vinylbenzyl groups with the remainder being alkyls of 1 through 11 carbon atoms are particularly useful.Type: GrantFiled: November 18, 1988Date of Patent: May 1, 1990Assignee: Allied Signal Inc.Inventors: Joseph J. Zupancic, Jean M. J. Frechet, Andrew M. Zweig, Jeffrey P. Conrad
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Patent number: 4920037Abstract: Disclosed herein is a photopolymerizable composition containing at least (A) a high-molecular compound with a weight-average molecular weight of not less than 10,000 having a polymerizable double bond in the side chain, and (B) a polymerizable monomer represented by the following formula (I): ##STR1## (wherein R.sup.1, R.sup.2 and R.sup.3 represent hydrogen atom, ##STR2## and two or more of them are not hydrogen atom at the same time).Type: GrantFiled: September 13, 1989Date of Patent: April 24, 1990Assignee: Mitsubishi Kasei CorporationInventors: Noriaki Takahashi, Noriko Watanabe
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Patent number: 4920030Abstract: A photosensitive coating emulsion for a plastic film comprising an emulsion ontaining a film-forming polymer and a photocrosslinkable polyvinyl alochol containing a photocrosslinkable constituent unit, which further comprises (1) an aliphatic alcohol having eight carbon atoms as an anti-foaming agent, or (2) a dispersion medium of the emulsion composed of 95 to 50% by weight of water and 5 to 50% by weight of at least one lower aliphatic alcohol selected from the group consisting of methyl, ethyl, n-propyl and i-propyl alcohols, or (3) an acetylenic glycol or alcohol as an anti-foaming agent. These emulsions can give a coating film free from unevenness in coating.Type: GrantFiled: January 19, 1989Date of Patent: April 24, 1990Assignees: General Director of the Agency of Industrial Science and Technology, Daicel Chemical Industries, Ltd.Inventors: Kunihiro Ichimura, Keiji Kubo
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Patent number: 4916045Abstract: The invention provides a novel photosensitive recording material in the shape of a multilayer element comprising(i) a photopolymerizable or photocrosslinkable relief-forming layer (RL) of a thickness from 0.1 to 6000 .mu.m and(ii) a dimensionally stable support layer.The said relief-forming layer (RL) consists essentially of an ionic polymer, of one or more photoinitiators and, if desired, of one or more photopolymerizable monomers.The said ionic polymer contains(A) from about 45 to 90% by weight, based on the ionic polymer, of a polymer main chain formed from an alkadiene polymer A',(B) from about 6 to about 45% by weight, based on the ionic polymer, of one or mored olefinically unsaturated side radicals having the structure (I), ##STR1## where R.sup.1 and R.sup.2 are different and are each H or a carbon atom of A',R.sup.3 is a polyvalent, straight-chain or branched C.sub.1 -C.sub.Type: GrantFiled: March 30, 1989Date of Patent: April 10, 1990Assignee: BASF AktiengesellschaftInventors: Horst Koch, Wolfgang F. Mueller, Reiner Hofmann, Peter Richter
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Patent number: 4904737Abstract: An active-energy-ray curable coating composition comprising 99 to 50 parts by weight of an acrylic copolymer (A) having (meth)acryloyloxy groups linked to functional groups of side chains and 1 to 50 parts by weight of an unsaturated compound (B) having two or more crosslinkable bonds.Type: GrantFiled: December 7, 1987Date of Patent: February 27, 1990Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Mitsuo Sato, Masaki Niimoto
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Patent number: 4891300Abstract: A photosensitive resin composition comprising a photosensitive saponified poly(vinyl acetate) derivative containing in the backbone thereof at least one of a first group of photosensitive units which are represented by the general formula (I) ##STR1## wherein represents a vinyl alcohol residue in the backbone of the saponified poly(vinyl acetate) derivative; Y represents a member selected from the group consisting of the following general formulae (II) and (III) ##STR2## m denotes an integer of 1-6; n denotes 0 or 1; R.sub.1 represents a member selected from a hydrogen atom, an unsubstituted alkyl and an unsubstituted aralkyl group, a hydroxyl group, a carbamoyl group, an ether bond and an unsaturated bond; R.sub.2 represents a member selected from a hydrogen atom and a lower alkyl group; and X.sup.Type: GrantFiled: September 23, 1987Date of Patent: January 2, 1990Assignees: Director-General of Agency of Industrial Science & Technology Ministry of International Trade and Industry, Oji Kako Co., Ltd.Inventors: Kunihiro Ichimura, Hiroshi Itoh, Shuuichi Nakazato, Hideaki Takazawa
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Patent number: 4869995Abstract: A positive type photosensitive resinous composition which is specifically useful in a photoresist for printed circuit board, integrated circuit board and the like and in a lithographic plate is provided.The resinous composition is characterized by comprising a resin having in its side chains or at the end portions of main chain at least one iminosulfonate group of the formula: ##STR1## in which R.sub.1 and R.sub.2 each is selected from hydrogen atom, an alkyl, an acyl, a phenyl, a naphthyl, an anthryl and a benzyl group, or R.sub.1 and R.sub.2 may, taken together, form an alicyclic ring, the iminosulfonate content being 1.5.times.10.sup.-4 to 2.5.times.10.sup.-3 equivalent/g and the resin being free from glycidyl group or the like which may cause polymerization in the presence of sulfonic acid.Type: GrantFiled: May 27, 1988Date of Patent: September 26, 1989Assignee: Nippon Paint Co., Ltd.Inventors: Masamitsu Shirai, Masahiro Tsunooka, Makoto Tanaka, Kanji Nishijima, Katsukiyo Ishikawa
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Patent number: 4865743Abstract: For producing solution/diffusion membranes, homogeneous dense films prepared by melt extrusion or casting from synthetic polymers, having a melting temperature above 140.degree. C., a glass transition temperature above 0.degree. C. and long time stability against boiling ethanol are irradiated with accelerated electrons and submitted to a subsequent radical graft copolymerization. After graft polymerzation, the functional groups are converted into the dissociated salts.Type: GrantFiled: December 29, 1986Date of Patent: September 12, 1989Assignee: GFT Gesellschaft fur Trenntechnik mbhInventors: Guido Ellinghorst, Bernd Goetz, Axel Niemoeller, Horst Scholz, Hartmut E. A. Brueschke, Guenter Tusel
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Patent number: 4855215Abstract: A photosetting polymer composition comprises:a base polymer comprising a denatured copolymer which is produced by reacting a copolymer of maleic anhydride and an unsaturated hydrocarbon compound with a specific aminocarboxylic acid, an alcohol or a cellosolve derivative, and a glycidyl (meth)acrylate compound under specific conditions;5-500 weight parts of a photopolymerizable monomer per 100 weight parts of the base polymer; and1-50 weight parts of a photopolymerization initiator per 100 weight parts of the base polymer.Type: GrantFiled: October 15, 1987Date of Patent: August 8, 1989Assignee: Ube Industries, Ltd.Inventors: Tsunetomo Nakano, Toshikazu Hayashi, Toshinori Tsukada
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Patent number: 4849307Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3).Type: GrantFiled: December 8, 1987Date of Patent: July 18, 1989Assignee: BASF AktiengesellschaftInventors: Gerhard Hoffmann, Horst Koch, Guenther Schulz
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Patent number: 4808510Abstract: A photographically negative-working patternable mordant composition is disclosed containing a photocrosslinkable polymer comprised of, for providing both mordanting and crosslinking sites, repeating units of the formula: ##STR1## wherein Ar is an aromatic linking group,R is a methylene group,R.sup.1 is independently in each occurrence a lower alkyl group,R.sup.2 is a divalent linking group,X is a photocrosslinking group, andZ is a charge balancing counter ion.The mordant composition can be coated on a support to form a photographic element.Type: GrantFiled: August 20, 1987Date of Patent: February 28, 1989Assignee: Eastman Kodak CompanyInventors: Robert A. Snow, Hugh G. McGuckin, Ignazio S. Ponticello, Robert C. Daly, Laurel J. Pace, Sandra K. Fischer, Michael J. Hanrahan
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Patent number: 4786657Abstract: A crosslinkable polyurethane or polyurethane/polyurea comprises the reaction product of a composition comprising a macrodiol or macrodiamine, 2-gl;yceryl acrylate or 2-glyceryl methacrylate, a diisocyanate, and optionally a small glycol or small diamine as chain extender. The performance properties of the polyurethanes and polyurethane/polyureas can be controlled by adjustment of the crosslink level and/or curing parameters.Type: GrantFiled: July 2, 1987Date of Patent: November 22, 1988Assignee: Minnesota Mining and Manufacturing CompanyInventors: W. James Hammar, John S. Staral
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Patent number: 4741969Abstract: An aqueous ink recording sheet is described which is prepared by coating on the surface of a substrate sheet a resin composition containing as the chief ingredient a mixture comprising (A) 10 to 90 wt % of photo polymerizable, double bonded anionic synthetic resin, and (B) 90 to 0 wt % of partially or completely saponified polyvinyl alcohol, or partially or completely saponified polymer resin composed of 20 to 100 wt % of vinyl acetate and 80 to 0 wt % of other polymerizable monomer or derivatives thereof, and/or (C) 90 to 0 wt % of homopolymer resin of N-vinylpyrrolidone or copolymer resin of other polymerizable monomer therewith, with the weight ratio of (A)/[(B)+(C)] being 90/10 to 10/90, drying the coated resin composition, and then curing the resin composition by the irradiation with actinic rays so as to form a resin coating layer on the substrate.Type: GrantFiled: October 10, 1986Date of Patent: May 3, 1988Assignee: Mitsubishi Petrochemical Co., Ltd.Inventors: Kazuhide Hayama, Akira Yamashita
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Patent number: 4701497Abstract: A process for producing a novel photosensitive resin having cinnamic groups, comprising reacting a polyallylamine represented by the general formula (I) ##STR1## (wherein n is at least 10) or an inorganic acid salt thereof with a compound having a cinnamic group in the presence of a solvent. The process is free from drawbacks as experienced in the production of a conventional photosensitive resin (e.g. polyvinyl cinnamate), such as formation of by-products during the polymerization of a monomer (e.g. vinyl cinnamate).Type: GrantFiled: July 3, 1986Date of Patent: October 20, 1987Assignee: Nitto Boseki Co., LimitedInventors: Hajime Serizawa, Keizo Ogihara, Kiyoshi Shimizu, Susumu Harada
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Patent number: 4688053Abstract: A liquid jet recording head having a liquid passage communicated to a liquid discharging outlet provided on a substrate surface is obtained, said passage being formed by subjecting a layer of a resin composition curable with an active energy ray to a predetermined pattern exposure with the use of said active energy ray to thereby form a cured region of said resin composition and removing the uncured region from said layer, said resin composition comprising:(i) a linear polymer having a glass transition temperature of 50.degree. C. or higher and a weight average molecular weight of about 3.0.times.10.sup.4 or higher;(ii) a monomer having an ethylenically unsaturated bond;(iii) an epoxy resin comprising at least one compound having one or more epoxy groups in the molecule; and(iv) a polymerization initiator capable of generating a Lewis acid by irradiation with an active energy ray.Type: GrantFiled: July 8, 1986Date of Patent: August 18, 1987Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Tadayoshi Inamoto, Megumi Munakata