Abstract: A cured product of a silanol composition comprising a cyclic silanol containing a silanol group and having a cyclic structure formed by a siloxane bond, and a dehydration condensation product thereof, wherein an area ratio of a peak derived from SiO—H stretching observed at 2600 to 3800 cm?1 to an area of a peak derived from Si—O—Si stretching observed at 960 to 1220 cm?1 (SiO—H stretching/Si—O—Si stretching area ratio) is 0.01 or more in an IR spectrum.

Abstract: Organosilicon chemistry, polymer derived ceramic materials, and methods. Such materials and methods for making polysilocarb (SiOC) and Silicon Carbide (SiC) materials having 3-nines, 4-nines, 6-nines and greater purity. Processes and articles utilizing such high purity SiOC and SiC.

Abstract: A fabrication method and application of topological elastomers with highly branched structures, low modulus and high elasticity. The topological elastomers comprise dendritic macromolecules. The fabrication method includes direct crosslinking, post-crosslinking, grafting, and copolymerization. The performance of the elastomer can be easily tuned via changing the topology of the polymer network. The breakthrough of this invention lies in that these topological elastomers with highly branched structures are having low modulus and high elasticity, which would expand its application in the field of elastomer. Notably, the variety of topological elastomers, the versatility of curing chemistries, the availability of a wide variety of monomers, and the various polymerization methods are enabling the fabrication of topological elastomers with feasibility and efficiency.

Abstract: A heating element is used, a periphery of the heating element is covered with a net-shaped conductor, the conductor and a carbon fiber bundle are electrically connected with a connecting tool at one end of the heating element, a periphery of the conductor is covered with an outer skin having flexibility, thermal conductivity and an insulating property, and the other end of the heating element is provided with a power supply terminal configured to supply power.

Abstract: A method of forming a hydrophobic and oleophobic surface. The method including spin coating an F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface. The F-POSS has a structure: Each Rf represents a nonreactive, fluorinated organic group, R1 represents a first monovalent organic group comprising at least two carbon atoms, and R2 represents hydrogen or a second monovalent organic group comprising at least two carbon atoms. The F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane are then dried on the inert surface.

Abstract: A method of forming a hydrophobic and oleophobic surface. The method including spin coating an F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface. The F-POSS has a structure: Each Rf represents a nonreactive, fluorinated organic group, R1 represents a first monovalent organic group comprising at least two carbon atoms, and R2 represents hydrogen or a second monovalent organic group comprising at least two carbon atoms. The F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane are then dried on the inert surface.

Abstract: The invention relates to novel conjugated polymers containing repeating units comprising a halogenated benzene ring, a silolobithiophene moiety, and a benzofused heteroaromatic moiety, to methods for their preparation and educts or intermediates used therein, to polymer blends, mixtures and formulations containing them, to the use of the polymers, polymer blends, mixtures and formulations as organic semiconductors in organic electronic (OE) devices, especially in organic photovoltaic (OPV) devices and organic photodetectors (OPD), and to OE, OPV and OPD devices comprising these polymers, polymer blends, mixtures or formulations.

Abstract: Novel photoactive polymers, as well as related photovoltaic cells, articles, systems, and methods, are disclosed.

Abstract: Diphenylamine-benzobisthiazole-diphenylamine monomers having two-photon absorption cross-sections and high solubility in organic solvents are provided. Also provided are the corresponding organo-soluble, wholly conjugated and two-photon absorbing benzobisthiazole-triarylamine polymers.

Abstract: Provided herein are silicon-based compositions, which after curing is a coating composition having strong substrate adhesion and scratch resistance. The compositions are formed from a mixture of constituents comprising: from about 20% to about 90% (w/w) of a first siloxane selected from the group consisting of silsesquioxane, methylmethoxysiloxane, and combinations thereof; and from about 10% to about 80% (w/w) of one or more silicon compounds selected from the group consisting of a second siloxane, silane, and silazane. Optionally, the compositions may comprise from about 0.1% to about 5% (w/w) alkyltitanate.

Abstract: There is provided herein a functionalized ionic silicone composition comprising a silicone of the formula (I): M1aM2bM3cD1dD2eD3fT1gT2hT3iQj??(I) which contains a monovalent radical bearing ion-pairs and having the formula (II): -A-Ix?Mny+; where A is a spacing group having at least 2 spacing atoms selected from a divalent hydrocarbon or hydrocarbonoxy group, where I is an ionic group such as sulfonate —SO3?, carboxylate —COO?, phosphonate —PO32? group and phosphate —OPO32?, where M is hydrogen or a cation independently selected from alkali metals, alkali earth metals, transition metals, metals, quaternary ammonium and phosphonium groups; or, zwitterions having the formula (III): —R?—NR?2+—R??—I??(III) where I is defined as above, and where the subscript a, b, c, d, e, f, g, h, i, j are zero or positive subject to the following limitations: 2?a+b+c+d+e+f+g+h+i+j?6000, b+e+h>0 and c+f+i>0.

Abstract: Photoactive polymers are provided, as well as related photovoltaic cells, articles, systems, and methods comprising these photoactive polymers.

Abstract: Photovoltaic cells with silole-containing polymers, as well as related systems, methods and components are disclosed.

Abstract: Disclosed are novel polyorganosiloxane, a polycarbonate resin composition comprising the same and a modified polycarbonate resin. Disclosed is also a novel polyorganosiloxane derivative which may be utilized in various applications and is used in particular as an impact modifier, a modifier or a comonomer of polycarbonate resin.

Abstract: The HBP Free-POSS compounds of Formula I are superior to prior HB polymers and linear polymers in space and electronic applications because they have better resistance to electrons, protons and atomic oxygen, have superior out-gassing performance, and are transparent. They are used as coatings, films, adhesives, sealants and elastomers.

Abstract: Lateral hydroxymethyl-substituted organopolysiloxanol are prepared by reacting a silanol-stopped organosiloxane with a hydrolyzable methyleneoxy-group-containing organosilicon compound.

Abstract: A monomer composition for polymerizing a branch-type silsesquioxane polymer is disclosed. The monomer composition includes hydroxy-substituted cyclic siloxane in a solvent, and the hydroxy-substituted cyclic siloxane includes stereoisomers of cyclic siloxane of cis, trans, random and twist structures at controlled ratios. Also disclosed are a branch-type silsesquioxane polymer synthesized by polymerizing the monomer composition for polymerizing a branch-type silsesquioxane polymer, and a method for synthesizing the same. In accordance with the disclosure, the isomers can be isolated stably at desired ratios. The isolated isomers may be polymerized into polymers of various types. Since the polymers exhibit low dielectric property, they may be utilized as low dielectric materials.

Abstract: A low-dielectric constant thin film prepared from a silsesquioxane polymer matrix as a precursor and a method for preparing the same which comprises preparing silsesquioxane sol by adding a stereoisomer of a multi reactive cyclosiloxane to an alkoxysilane are provided. The low-dielectric-constant thin film retains a stable film state even at a curing temperature of ?500° C. without being decomposed, a very uniform surface property with a low surface modulus, and a superior coatability as to be coatable smoothly with no crack even with a thickness of 500 nm or larger.

Abstract: The present invention provides a novel organosilicon compound and polysiloxane which are useful as electronic materials, optical materials, coating materials, sealing materials and catalyst carriers and which can be used as additives for improving various physical properties such as flame retardancy, heat resistance, weatherability, light resistance, electric insulating property, a surface characteristic, hardness, a mechanical strength and a chemical resistance of a polymer material.

Abstract: Provided are a photoelectric conversion device capable of controlling an absorbance of the red region at a wavelength of 600 nm or more, and an imaging device having an improved color reproduction by using the photoelectric device. Provided are a photoelectric conversion device that includes a pair of electrodes, and a photoelectric conversion layer disposed between the pair of electrodes, in which the photoelectric conversion layer contains a p-type semiconductor compound and two or more different kinds of unsubstituted fullerenes, and an imaging device that includes the photoelectric conversion device.

Abstract: A method of forming a silsesquioxane/Q/siloxane polymer or oligomer system used to form coatings or monoliths, includes the step of mixing silsesquioxane, siloxane and alkoxysilane components having structures as presented below in ratios as presented below with a soluble F? catalyst and water in a suitable solvent so that on stirring at temperatures of ?20° to approximately 100° C. all of the components dissolve producing a solution. A soluble oligomer is formed in equilibribum with single molecules with specific structures including [RSiO1.5]x[R?MeSiO]y[R?Me2SiOSiO1.5]z (where R?R? or R? or R1 or R2 as denoted below) and where x, y and z are mole fractions whose sum is equal to one.

Abstract: The present invention relates to a curable organopolysiloxane composition, which comprises: (A) an organocyclosiloxane having alkenyl groups, represented by the following formula (I) wherein n=3 or 4; (B) a hydrosilicone resin of formula (II) (R1R2R3SiO1/2)M.(R4R5SiO2/2)D.(R6SiO3/2)T.

Abstract: Provided is a silicon-containing curable composition which includes a prepolymer (A) containing two or more Si—H groups in one molecule, which is obtained by subjecting one or more kinds of a cyclic siloxane compound (?) represented the following formula (1) and one or more kinds of a compound (?) represented by the following formula (2), to a hydrosilylation reaction; a cyclic siloxane compound (B) containing, in one molecule, two or more carbon-carbon double bonds that are reactive with Si—H groups; a polysiloxane compound (C) which is different from the prepolymer (A) and the cyclic siloxane compound (B); and a hydrosilylation catalyst (D). In formula (1), R1 to R3 each represent an alkyl group having 1 to 6 carbon atoms, or a phenyl group; a represents a number from 2 to 10; and b represents a number from 0 to 8. In formula (2), n represents the number 1 or 2.

Abstract: A coatable resin solution capable of forming a coating when applied to the surface of a substrate that is photo-patternable and developable as a dielectric material upon exposure to ultraviolet radiation is provided. The resin solution comprises a silsequioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ-based resin includes both a hydride component and at least one photo-curable component. The resulting coating exhibits a dielectric constant that is less than or equal to about 3.5.

Abstract: A silicon-based coating composition for a wide range of mold surfaces, which composition is formed from a mixture of constituents comprising appropriate portions of silazane, siloxane, and silane, and optionally organic solvent. The composition, after curing, results in an extreme release product that is non-transferable to the finished part, allowing for proper adhesion of coatings or adhesives to the finished surface without additional surface preparation. The cured coatings are ultrathin, having a thickness between 0.1 ?m and 3 ?m, and having a hardness between about 4H and about 9H.

Abstract: Heteroatom doped silane compounds, e.g., phosphorus-containing silane compounds, are provided. The application also provides methods of producing the heteroatom doped silane compounds from halogen substituted silanes via reaction with a heteroatom-containing nucleophile.

Abstract: Carbanionic polymer chains that contain polyene mer can be provided with a block derived from one or more ethylenically unsaturated functional monomers after being reacted to include, at their respective termini, one or more, although preferably one, unit that is the radical of a cyclic compound, the ring structure of the cyclic compound comprising silicon atoms alternating with O, S or N atoms.

Abstract: The present invention relates to a process for the production of an intermediate siloxane monomer and use of said monomer to produce high molecular weight linear polysilalkylenesiloxanes. The siloxane monomer is prepared by ring opening polymerization of a cyclic monomer of the structure in the presence of an acidic or basic ring opening polymerization catalyst; to form a mixture of siloxane monomers and linear oligomers. The linear oligomers are then extracted and discarded before a further step of ring opening polymerization using the aforementioned intermediate siloxane monomer mixture as the starting material. The second polymerization step is undertaken at a temperature within the melting point range of said siloxane monomer mixture. The intermediate, final product and methods of their manufacture are described.

Abstract: A polymer including a structural unit represented by the following Chemical Formula 1, and a composition and a film including the same are provided. In the above formula at least one of Ra and Rb is either Chemical Formula 3 or Chemical Formula 4, as shown below. The polymer also includes units selected from polyamic acid, polyimide, polyaramid, polyamide, polyurethane, polycarbonate and polyacetal units and mixtures of such units.

Abstract: PROBLEM TO BE SOLVED To provide an ophthalmic lens, which can be more safely worn, that is, to provide a material, which is transparent and has high oxygen permeability and a high hydrophilic property, and to provide a novel monomer to be a raw material thereof. SOLUTION A hydrophilic polysiloxane macromonomer contains polyoxyethylene as a hydrophilic side chains in a polysiloxane main chain, wherein transparency, oxygen permeability, and hydrophilic properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.

Abstract: A synthetic method for preparing dual curable (e.g., thermal and light curable) silicone compositions is provided. The first step being a chemical modification of silanichydride bonds in cyclic siloxane monomer by the hydrosilylation reaction with acrylate-/methacrylate-containing allylic monomer. The second step being a ring-opening polymerization of the acrylate-/methacrylate-functionalized cyclic siloxane monomer with siloxane monomers using an oligosiloxane as a chain terminator.

Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane may have the formula H-[(AHR)n(c-AmHpm-2)q]—H, where A is independently Si or Ge; R is H, -AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. The method may include combining a silane compound of the formula AHaR14-a, AkHgR1?h and/or c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. Alternatively, the method may include halogenating a polyarylsilane and reducing the halopolysilane with a metal hydride to form the polysilane.

Abstract: Novel photoactive polymers, as well as related components, articles, systems, and methods are disclosed.

Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.

Abstract: A release sheet, on which a stamper receiving layer for producing an optical recording medium is laminated, comprising a release agent layer on a side to which the stamper receiving layer is laminated, wherein the release agent layer is formed using a release agent that contains an organopolysiloxane (other than an MQ resin below) containing an alkenyl group in the molecule, an MQ resin containing an alkenyl group and having, as constituent components, M units represented by formula (1) R12R2—Si—O—??(1) (where, R1 denotes an organic group and R2 denotes an alkenyl group), and Q units represented by formula (2) and a cross-linking agent, and that does not substantially contain particles consisting of inorganic matter, and the alkenyl group content in said MQ resin ranges from 0.5 to 5 wt %. The release sheet can reduce concave defects on a convex-concave pattern transfer surface of the stamper receiving layer.

Abstract: There are provided a silicone resin sheet having high heat resistance and strength and being excellent in flexibility, and a pressure-sensitive adhesive sheet having excellent anchoring, force and excellent moisture resistance. The inorganic oxide particle-containing silicone resin sheet according to the present invention includes a silicone resin composition containing a crosslinked structure in which an inorganic oxide particle dispersed in a polysiloxane resin and the polysiloxane resin are crosslinked through a chemical bond, and has a tensile elongation of 5 to 15%.

Abstract: A dendritic polymer and a magnetic resonance imaging contrast agent employing the same. The magnetic resonance contrast agent includes the dendritic polymer according to the structure of S?P-D?Z-L)i)j or S?P-D?X—Z-L)i)j, wherein, S is cyclosilane moiety with j silicon oxygen residual groups, and j is not less than 2; P is ?CH2CH2O?l, and l is not less than 1; D is a C3-30 dendritic moiety having n oxygen residue, and n is not less than 3; X is C3-30 moiety having bi-functional groups; Z is a C3-20 moiety having a plurality of functional group; and L is a metal cation.

Abstract: A method of regioselectively preparing a pyridine-containing compound is provided. In particular embodiments, the method includes reacting halogen-functionalized pyridal[2,1,3]thiadiazole with organotin-functionalized cyclopenta[2,1-b:3,4-b?]dithiophene or organotin-functionalized indaceno[1,2-b:5,6-b?]dithiophene. Also provided is a method of preparing a polymer. The method includes regioselectively preparing a monomer that includes a pyridal[2,1,3]thiadiazole unit; and reacting the monomer to produce a polymer that includes a regioregular conjugated backbone section, wherein the section includes a repeat unit containing the pyridal[2,1,3]thiadiazole unit. A polymer that includes a regioregular conjugated backbone section, and electronic devices that include the polymer, are also provided.

Abstract: The HBP Free-POSS compounds of Formula I are superior to prior HB polymers and linear polymers in space and electronic applications because they have better resistance to electrons, protons and atomic oxygen, have superior out-gassing performance, and are transparent. They are used as coatings, films, adhesives, sealants and elastomers.

Abstract: Cured products constituted with conventional epoxy compounds have been disadvantageous in heat-resistant and light-resistant transparency, and crack resistance. An object of the present invention is to provide: a modified polyorganosiloxane compound having an epoxy group and/or an oxetanyl group which provides a cured product that is excellent in heat-resistant and light-resistant transparency, and crack resistance; a curable composition thereof; and a cured product obtained by curing the same.

Abstract: The present invention relates to a process for the production of an intermediate siloxane monomer and use of said monomer to produce high molecular weight linear polysilalkylenesiloxanes. The siloxane monomer is prepared by ring opening polymerization of a cyclic monomer of the structure in the presence of an acidic or basic ring opening polymerisation catalyst; to form a mixture of siloxane monomers and linear oligomers. The linear oligomers are then extracted and discarded before a further step of ring opening polymerization using the aforementioned intermediate siloxane monomer mixture as the starting material. The second polymerisation step is undertaken at a temperature within the melting point range of said siloxane monomer mixture. The intermediate, final product and methods of their manufacture are described.

Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer, and reacting the reactive polymer with a halosilane compound containing an amino group.

Abstract: Embodiments of the present disclosure include functionalized polyhedral oligomeric silsesquioxane compositions or mixtures, methods of using functionalized polyhedral oligomeric silsesquioxane compositions, structures including functionalized polyhedral oligomeric silsesquioxane, and the like.

Abstract: A polysiloxane represented by the formula (1) or (2): where R, R1, R2, m and n are defined in the specification.

Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H-[(AHR)n(c-AmHpm-2)q]—H, where each instance of A is independently Si or Ge; R is H, -AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14-a, the formula AkHgR1?h and/or the formula c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane.

Abstract: The present invention relates to a compound represented by Formula (1) and a polymer obtained using the compound: wherein R1 is phenyl which may have substituents, Q1 is hydrogen, halogen, alkyl having 1 to 10 carbon atoms, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexenyl or phenyl in which optional hydrogen may be replaced by halogen or alkyl having 1 to 5 carbon atoms, <—Z0?A1-Z1?l?A2-Z2?m?A3-Z3?n?A4?p-Z4—??(2) and Q2 is a group represented by Formula (2): wherein the code < represents a bonding point with silicon, l, m, n and p are independently 0, 1, 2 or 3, A1 to A4 are independently a single bond, 1,4-cyclohexylene, 1,4-cyclohexenylene, a condensed ring group having 6 to 10 carbon atoms which is a divalent group, or 1,4-phenylene, Z0 to Z3 are independently a single bond, CH?CH—, —C?C—, —COO—, —OCO—, or alkylene having 1 to 20 carbon atoms, and Z4 is a single bond, —CH?CH—, —C?C—, —COO—, —OCO—, or alkylene having 1 to 20 carbon atoms.

Abstract: The present invention relates to a composition for a thermosetting silicone resin, the composition including: (A) an organohydrogenpolysiloxane; (B) an alkenyl group-containing epoxy compound; (C) an alkenyl group-containing cyclic siloxane; and (D) a hydrosilylation catalyst, a thermosetting silicone resin composition obtained by reacting the composition and a production method thereof, a photosemiconductor element-encapsulating material including the thermosetting silicone resin composition, and a photosemiconductor device including a photosemiconductor element encapsulated with the resin composition or the photosemiconductor element-encapsulating material.

Abstract: A polysiloxane represented by the formula (1) or (2): where R, R1, R2, m and n are defined in the specification.

Abstract: A core-shell particle is formed by a method that includes forming a crosslinked polyorganosiloxane core, reacting a graftlinking agent with the crosslinked polyorganosiloxane core, and polymerizing a poly(alkenyl aromatic) shell around the graftlinking agent-functionalized polyorganosiloxane core. The method produces a core-shell particle with improved adhesion between shell and core. The core-shell particle is useful as an impact modifier in thermoplastic compositions.

Abstract: The present invention relates to a process for producing a particulate nanocomposite material, in which the particles of the nanocomposite material comprise a) at least one inorganic or organo(semi)metallic phase which comprises at least one (semi)metal M; and b) at least one organic polymer phase. The invention also relates to the nanocomposite materials obtainable by this process. The process comprises the polymerization of at least one monomer MM which has at least one first cationically polymerizable monomer unit A which has a metal or semimetal M, and at least one second cationically polymerizable organic monomer unit B which is joined to the polymerizable unit A via at least one, e.g.