Abstract: A polysiloxane-based material presents a predetermined structure or conformation such that the polysiloxane-based material comprises a ratio between a number of linear —Si—O— bonds and a number of cyclic —Si—O— bonds less than or equal to 0.4, and preferably less than or equal to 0.3. Such a polysiloxane-based material enables a wetting hysteresis less than 10°, and preferably less than 5° to be obtained. Such a low wetting hysteresis material can be achieved by chemical vapor deposition enhanced by a plasma wherein a precursor is injected. The precursor is selected from the group consisting of cyclic organosiloxanes such as octamethylcyclotetrasiloxane and derivatives thereof and cyclic organosilazanes such as octamethylcyclosilazane and derivatives thereof. A ratio between a power density dissipated in the plasma and a precursor flow rate injected in the plasma is less than or equal to 100 W.cm?2/mol.min?1.

Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.

Abstract: A multi-functional cyclic silicate compound, a siloxane-based polymer prepared from the silicate compound and a process of producing an insulating film using the siloxane-based polymer. The silicate compound of the present invention is highly compatible with conventional pore-generating substances and hardly hygroscopic, so it is useful for the preparation of a siloxane-based polymer suitable to a SOG process. Furthermore, a film produced by the use of such siloxane-based polymer is excellent in mechanical properties, thermal stability and crack resistance and enhanced in insulating properties by virtue of its low hygroscopicity. Therefore, in the field of semiconductor production, this film is of great use as an insulating film.

Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H—[(AHR)n(c-AmHpm?2)q]—H, where each instance of A is independently Si or Ge; R is H, —AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14?a, the formula AkHgR1?h and/or the formula c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane.

Abstract: The present invention relates to low a dielectric material essential for a next generation semiconductor with high density and high performance, and more particularly to a low dielectric material that is thermally stable and has good film-forming properties and excellent mechanical properties, a dielectric film comprising the low dielectric material, and a semiconductor device manufactured using the dielectric film.

Abstract: A process for producing a film forming composition, the process including hydrolyzing and condensing: (A) at least one silane compound selected from a compound (A-1) shown by the following general formula (1), a compound (A-2) shown by the following general formula (2), and a compound (A-3) shown by the following general formula (3), RaSi(OR1)4-a??(1) Si(OR2)4??(2) R3b(R4O)3-bSi—(R7)d—Si(OR5)3-cR6c??(3); and (B) a cyclic silane compound shown by the following general formula (4):

Abstract: Provided is a method for preparing a siloxane polymer by hydrolysis and condensation reactions of a hydrolyzable silane compound, which has a step of preparing a salt of a silsesquioxane cage compound represented by the following formula (1): (SiO1.5—O)nn?X+n ??(1) wherein, X represents NR4, Rs may be the same or different and each represents a linear or branched C1-4 alkyl group and n is an integer from 6 to 24 and a step of hydrolyzing and condensing the hydrolyzable silane compound with the salt of a silsesquioxane cage compound.

Abstract: Methods of sealing a semiconductor element are provided. The methods includes the steps of coating a semiconductor element mounted on a gold-plated printed circuit board with a curable silicone resin, and then curing the curable silicone resin. In a method, the gold-plated printed circuit board is subjected to preliminary treatment with a treatment agent including an acid anhydride group-containing alkoxysilane and/or a partial hydrolysis-condensation product thereof In another method, the curable silicone resin includes the treatment agent. The methods yield favorable adhesion upon sealing.

Abstract: A method comprising heating in the presence of a catalyst, a mixture comprising (i) a reaction product obtained by mixing in the presence of a platinum group metal-containing catalyst at least one organohydrogensilicon compound containing at least one silicon-bonded hydrogen atom per molecule and at least one compound having at least one aliphatic unsaturation; (ii) at least one endblocker, and optionally (iii) at least one organosiloxane chosen from a hydrolyzate or a cyclosiloxane, so to cause polymerization of components (i), (ii), and optionally (iii) to form branched polymers.

Abstract: The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is —O—, —CH2— or a single bond. The preferred organic group is a functional group or a group having a functional group.

Abstract: A composition comprising (A) polycycloolefin-functional polysiloxane represented by the following average compositional formula (1) wherein R1 is a monovalent organic group which does not have an unsaturated bond and may be different from each other, k is the number of 0 or larger, n is the number of from 0.01 to less than 4, m is the number of from 0 to less than 4, provided that the sum of m and n is larger than 0 and less than 4, (B) a siloxane having an SiH bond represented by the following average compositional formula (2) in such an amount that a molar ratio of the SiH bond to the unsaturated bond in the component (A) ranges from 0.1 to 10, HSiR2aO(4-a)/2 ??(2) wherein R2 is a monovalent organic group and a is the number larger than 0 and less than 4, and (C) an addition reaction catalyst in a catalytic amount.

Abstract: The use of a material possessing a six-member borazine ring consisting of at least boron and nitrogen elements in the form of a low dielectric constant insulating film in a hard mask, a Cu diffusion barrier layer and an etching stopper which are necessary when low dielectric constant interlayer insulating films and Cu wiring in the multilayer interconnection of an LSI allows the parasitic capacity between the multilayer wirings to be suppressed and enables the ULSI to produce a high-speed operation.

Abstract: The object of the present invention is to provide a production method wherein synthesis of a cyclic organic silicon compound similar to oxa-silacyclopentanes is completed in a single-step reaction. It is also to provide an organic silicon resin having an alcoholic hydroxyl group, which is capable of easily controlling its construction and is longitudinally stable. The means for solving is to produce the cyclic organic silicon compound represented by the formula (3) below by reacting an olefin represented by the formula (1) below and an alkoxysilane represented by the formula (2) below in the presence of a catalyst comprising a transition metal. (In the formula, Z is alkenyl group having carbon atoms from 2 to 5 where the terminal carbon atom forms a C?C bond, R is methyl group or hydrogen atom, and Me is methyl group.) (In the formula, R1 is alkyl group or alkoxyl group, having carbon atoms from 1 to 3, and R2 is alkyl group having carbon atoms from 1 to 3.

Abstract: A polysiloxane represented by the formula (1) or (2): where R, R1, R2, m and n are defined in the specification.

Abstract: In one embodiment, the present invention relates to a process for preparing siloxane polymers comprising the steps of: (a) polymerizing at least one siloxane-based monomer in the presence of a crosslinking agent consistent with the following structure: where n is an integer in the range of 1 to about 100; and (b) recovering at least one polymerization product generated by the reaction of Step (a).

Abstract: Since the majority of conventional organic/inorganic composite materials are obtained by mechanical blending of a silsesquioxane and an organic polymer or other means, it was extremely difficult to control the structure of the composite as a molecular agglomerate. In order to solve such a problem, the invention is to provide a silicon compound represented by Formula (1). This novel silicon compound has a living radical polymerization initiating ability for addition polymerizable monomers of a wide range.

Abstract: A film-forming silicone resin composition, comprising a reaction product obtained by a method comprising the step of heating (A) an alkoxysilyl-functional organopolysiloxane obtained by running an equilibration reaction with components comprising (A1) a polydiorganosiloxane and (A2) an alkylpolysilicate in the presence of (A3) an equilibration polymerization catalyst; (B) colloidal silica, aluminum oxide, antimony oxide, titanium oxide, or zirconium oxide; and (C) water, and a curable film-forming silicone resin composition, comprising above film-forming silicone resin composition and (E) a condensation reaction catalyst.

Abstract: Disclosed herein is a composition for forming a low dielectric thin film, which includes silane monomers having only any one of stereoisomer, or a siloxane polymer produced by polymerizing the monomers, and a method of producing the low dielectric thin film using the same. When using the composition, mechanical properties are excellent because tacticity of a matrix is improved, and formation of pores is increased due to a molecular free volume, thus it is possible to produce a low dielectric thin film having low dielectricity.

Abstract: An underfill composition including a polymer precursor is provided. The polymer precursor includes an inorganic backbone and one or more pendant oxetane functional groups. Associated article and method are also provided.

Abstract: Novel fluorescent polyhedral oligomeric silsesquioxane (POSS) colorants are provided. The colorants are strongly fluorescing and long lasting with excellent light stability. The novel colorants can be prepared from chromophores found in common pigments and provide a simple way to convert an insoluble pigment into a soluble fluorescent colorant.

Abstract: Provided is a curable silicone resin composition including (A) a siloxane/polycyclic hydrocarbon-based compound containing at least 2 silicon-bonded hydrogen atoms, which is an addition reaction product of (a) a siloxane-based compound with at least 3 silicon-bonded hydrogen atoms, and (b) a polycyclic hydrocarbon with at least 2 addition reactive carbon-carbon double bonds, (B) a siloxane-based compound containing at least 2 silicon-bonded alkenyl groups, and (C) a hydrosilylation reaction catalyst. This composition is useful as a material for optical devices or parts, insulation material for electronic devices or parts, or coating material.

Abstract: An insulated organic copolymer is provided, having the excellent mechanical strength and deposition property at an interface contacting the lower base or the upper layer of the inorganic insulation film, and the effective dielectric constant is low as the whole film, which is suitable as the interlayer insulation film that separates the multi-layer copper wirings of the semiconductor device. The organosiloxane copolymer film is obtained by the polymerization of the cyclosiloxane and the straight-chain siloxane as the raw materials by the plasma excitation of both. At the interfaces contacting the inorganic insulation films, the interface layers having a film quality that is intricate and excellent in deposition property are prepared whereby the main component of the film composition is the straight-chain siloxane.

Abstract: A polymer having a repeating unit represented by formula (I) is used for an insulating-film forming material and an insulating film. wherein R1 to R7 each are a monovalent hydrocarbon group, etc.; one of X, Y and Z is a specific siloxane group and the remaining two each are —O— or divalent silyl-containing group that bonds to (I) on the side of the oxygen atom of the group.

Abstract: A method for making high softening point linear and cyclic alkylsilicone waxes includes reacting a C30+ alpha olefin wax with a silicone hydride polymer in the presence of a catalyst. The high softening point linear and cyclic alkylsilicone waxes have softening points approximating those of natural waxes and, in consequence, can be used in applications which traditionally employ natural waxes.

Abstract: Provided is a curable composition including (A) an addition reaction product of (a) a compound with 2 silicon atom-bonded hydrogen atoms within each molecule, having a general formula (1): wherein, A is a bivalent group represented by a formula (2): (wherein, R? represents an unsubstituted or substituted monovalent hydrocarbon group of 1 to 12 carbon atoms, or an alkoxy group of 1 to 6 carbon atoms, and n represents an integer from 0 to 100), or a group having a structural formula (3): and each R represents an unsubstituted or substituted monovalent hydrocarbon group of 1 to 12 carbon atoms, or an alkoxy group of 1 to 6 carbon atoms, and (b) a polycyclic hydrocarbon with 2 addition reactive carbon-carbon double bonds within each molecule, said addition reaction product containing at least two addition reactive carbon-carbon double bonds in each molecule, (B) a compound with at least 3 silicon atom-bonded hydrogen atoms within each molecule, and (C) a hydrosilylation reaction catalyst.

Abstract: The present invention provides a composition for preparing porous dielectric thin films containing pore-generating material, said composition comprising gemini detergent, and/or a quaternary alkyl ammonium salt, a thermo-stable organic or inorganic matrix precursor, and solvent for dissolving the two solid components. There is also provided an interlayer insulating film having good mechanical properties such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.

Abstract: The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is —O—, —CH2— or a single bond. The preferred organic group is a functional group or a group having a functional group.

Abstract: There is disclosed an anti-reflection film material used in lithography containing at least a polymer compound having repeating units for copolymerization represented by the following general formula (1), or those containing a polymer compound having repeating units for copolymerization represented by the following general formula (2) and a polymer compound having repeating units for copolymerization represented by the following general formula (3).

Abstract: Relatively high refractive index polymeric compositions and ophthalmic devices such as for example intraocular lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the copolymerization of one or more aromatic-substituted polysiloxane prepolymers with one or more aromatic monomers, alkylated monomers or hydrophilic monomers.

Abstract: Cyclosiloxane-multiol compositions, multicomponent polyurethane networks, and related methods are disclosed.

Abstract: Disclosed is a holographic recording medium. The novel holographic recording mediums disclosed herein comprises: a) at least one polyfunctional epoxide monomer or oligomer which undergoes acid initiated cationic polymerization. Each epoxide in the monomer or oligomer is linked by group comprising a siloxane to a silicon atom and each monomer or oligomer has an epoxy equivalent weight of greater than about 300 grams/mole epoxide; b) a binder which is capable of supporting cationic polymerization; c) an acid generator capable of producing an acid upon exposure to actinic radiation; and optionally d) a sensitizer.

Abstract: A poly(cyclosiloxane) is synthesized by oxidation with water in the presence of a Pt catalyst, followed immediately by polycondensation of the Si—OH groups to form Si—O—Si linkages. Thus, pentamethylcyclopentasiloxane can be polymerized into poly(pentamethycyclopentasiloxane).

Abstract: Amphiphilic telechelics incorporating polyhedraloligosilsesquioxane (POSS) synthesized by direct urethane linkage between the diol end groups of polyethylene glycol (PEG) homopolymers and the monoisocyanate group of POSS macromers. The hydrophobicity of the amphiphilic telechelics can be varied by using PEG homopolymers of increasing MW, providing for control over molecular architecture by hydrophilic/hydrophobic balance. Methods for synthesizing the amphiphilic telechelics and their use as surfactants, thickening agents, additives to plastic such as PMMA?(Plexiglass), epoxyadhesives for improving their properties are also disclosed.

Abstract: An article of a plastic substrate and a bond layer of a plasma polymerized cyclosiloxane having select unsaturation and a method of forming same.

Abstract: Compositions suitable for use as underfill materials in an integrated circuit assembly are provided. Also provided are methods of preparing integrated circuit assemblies containing certain underfill materials as well as electronic devices containing such integrated circuit assemblies.

Abstract: A curable silicone resin composition is provided which is useful as a material for optical devices or parts, insulation material for electronic devices or parts, or coating material, and which produces a cured product having high hardness and strength and further having good optical transmission in the short wavelength region. The composition includes (A) an aromatic hydrocarbon compound having at least two hydrogen atoms bonded to silicon atoms with the silicon atoms being bonded to the hydrocarbon skeleton of the aromatic hydrocarbon compound, (B) a cyclic siloxane compound having at least two silicon atom-bonded alkenyl groups, and (C) a hydrosilylation reaction catalyst, or (D) an aromatic hydrocarbon compound having at least two alkenyl groups bonded to silicon atoms with the silicon atoms being bonded to the hydrocarbon skeleton of the aromatic hydrocarbon compound, (E) a cyclic siloxane compound having at least two silicon atom-bonded hydrogen atoms, and (C) a hydrosilylation reaction catalyst.

Abstract: Disclosed herein are a siloxane-based resin having novel structure and an interlayer insulating film for a semiconductor device formed using the same The siloxane-based resins have so low dielectric constant in addition to excellent mechanical properties, heat-stability and crack-resistance that they are useful materials for an insulating film between interconnect layers of a semiconductor device.

Abstract: Relatively high refractive index polymeric compositions and ophthalmic devices such as for example intraocular lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the copolymerization of one or more aromatic-substituted polysiloxane prepolymers with one or more aromatic monomers, alkylated monomers or hydrophilic monomers.

Abstract: Described are polyorganosiloxanes that contain at least one radical in which a quaternized nitrogen atom is present. Furthermore, the polysiloxanes contain at least one further polar radical. The polyorganosiloxanes can be transformed into stable aqueous solutions or dispersons that are excellently suited for finishing textile fiber materials.

Abstract: A method for reducing the modulus of polymer silicone hydrogel compositions by employing monomeric polysiloxanes endcapped with trimethylsilyl to reduce the crosslinking density of the hydrogel. The synthesis consists of a single vessel acid catalyzed ring opening polymerization and may be employed to produce copolymers useful as hydrogel contact lens materials.

Abstract: Optically transparent, relatively high refractive index polymeric compositions and ophthalmic devices such as intraocular lenses, corneal inlays and contact lenses made therefrom are described herein. The preferred polymeric compositions are produced through the polymerization of one or more aromatic-based siloxane macromonomers or the copolymerization of one or more aromatic-based siloxane macromonomers with one or more non-siloxy aromatic-based monomers, non-aromatic-based hydrophobic monomers or non-aromatic-based hydrophilic monomers.

Abstract: The present invention provides a silane oligomer for immobilizing a physiological material that is prepared by copolymerizing an aminosilane compound with a cyclic siloxane oligomeric compound. The present invention can preserve the immobilization layer by applying a silane oligomer. Further, the immobilization layer has a three-dimensional structure and thus has superior thermal stability and reagent resistance.

Abstract: The invention relates to silicone compositions that are used in the production of varnishes that can be applied to supports in order to reduce the friction coefficient. The inventive composition comprises at least one polyorganosiloxane A (POS) which can be cationically and radically cross-linked by functional cross-linking groups (GFR) and a primer C chosen from onium borates, characterized in that the inventive composition also comprises molecules (POS D) which are substituted by secondary functional groups (GFS) carried by silicon atoms and selected from those that include at least one alkoxy and/or epoxy and/or carboxy motif and optionally a charge (e.g. silica). The invention can be used with anti-friction varnishes for RTV silicone coatings for material used in air bags, thermal transfer ribbons or packing films.

Abstract: This invention relates generally to heat curable compositions, particularly well utilized for use as impregnation sealants curable using hydrosilation chemistry. The heat curable compositions of the present invention can be stored and shipped as a one-part composition. The composition includes at least one curable unsaturated organic component, at least one co-reactant, which has at least two functional groups reactive with the organic component, and at least one catalyst of initiating the cure of the composition.

Abstract: Provided herein is an inorganic-organic hybrid conjugated polymer having opto-electronic function and a process to make the same. The disclosed polymer contains inorganic or organic bulky groups in the polymer backbone or as pedant groups and has a general formula: wherein: A is a bulk group, comprising at least one silsesquioxane, serving as a positional anchor for the polymer. S serving as a spacer includes alkyl, cycyloalkyl group of from 1 to 30 carbon atoms, or aryl or substituted aryl of from 6 to 50 carbon atoms, or herteroaryl or substituted heteroaryl of from 4 to 50 carbons. CP represents any conjugated polymer segment at least one portion thereof comprising an opto-electronic function, for example, polyacetylenes, polyphenylenes, polyphenylenevinylenes, polythiophenes, polypyrroles, polyanilines, polyfluorences, and any conjugated co-polymer segment. x, y and z are positive integers, where x and z is equal or greater than 1.

Abstract: Relatively high refractive index polymeric compositions and ophthalmic devices such as for example intraocular lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the copolymerization of one or more aromatic-substituted polysiloxane prepolymers with one or more aromatic monomers, alkylated monomers or hydrophilic monomers.

Abstract: A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

Abstract: The invention relates to soluble organic-inorganic compositions comprising linear and cyclic hydrosiloxanes, to a novel process for preparing them and to their use as coating materials.

Abstract: Relatively high refractive index polymeric compositions and ophthalmic devices such as for example intraocular lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the copolymerization of one or more aromatic-substituted polysiloxane prepolymers with one or more aromatic monomers, alkylated monomers or hydrophilic monomers.

Abstract: The present invention relates to a polysiloxane of the general formula (I) 1