Reactant Contains A Silicon Atom As A Ring Member Of A Cyclic Compound Patents (Class 528/37)
  • Patent number: 6770724
    Abstract: Method is provided for selectively opening rings of polyhedral oligomeric silsesquioxane (POSS) compounds to from functionalized derivatives thereof or new POSS species. Per the inventive method, the POSS compound is reacted with an acid to selectively cleave bonds in the POSS rings to add functionalities thereto for grafting, polymerization or catalysis, to thus form new familes of POSS derived compounds. Also provided are the new compounds so formed. Method is also provided for expanding rings of POSS compounds. Per the inventive method, a POSS compound is reacted with silane reagents to obtain an expanded POSS framework with added Si ring substituends to form new families of POSS compounds. Also provided are the new compounds so formed.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: August 3, 2004
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Joseph D. Lichtenhan, Timothy S. Haddad, Frank J. Feher, Daravong Soulivong
  • Publication number: 20040143081
    Abstract: (1) An organic silicon compound represented by the following Formula (1): 1
    Type: Application
    Filed: November 21, 2003
    Publication date: July 22, 2004
    Inventors: Hisao Oikawa, Kenichi Watanabe, Nobumasa Ootake, Yoshida Kazuhiro, Keizou Iwatani
  • Patent number: 6750269
    Abstract: Disclosed is an ink composition comprising a liquid ink vehicle, a colorant, and a cyclic siloxane monomer composition capable of undergoing a ring-opening polymerization process upon contact with an anionic base.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: June 15, 2004
    Assignee: Xerox Corporation
    Inventor: Thomas W. Smith
  • Patent number: 6750308
    Abstract: This invention relates to a silicone resin composition comprising a silicone resin and an unsaturated compound. This resin composition is formulated from a silicone resin which has in its structural unit cage type polyorganosilsesquioxane whose siloxy groups are linked to a triorganosilyl group represented by —Si(CH3)2—X (wherein X is —R1—OCO—CR2═CH2, —R1—CR2═CH2 or —CH═CH2, R1 is an alkyl group, an alkylidene group or phenylene group and R2 is a hydrogen atom or an alkyl group) and an unsaturated compound which contains an unsaturated group represented by —R3—CR4═CH2 or —CR4═CH2 (wherein R3 is an alkylene group, an alkylidene group or —OCO— group and R4 is a hydrogen atom or an alkyl group) at the weight ratio of the silicone resin to the unsaturated compound in the range of 1:99 to 99:1.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: June 15, 2004
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Hideki Andoh, Masayoshi Isozaki, Takero Teramoto
  • Patent number: 6703378
    Abstract: Fluorosilicone fluids useful as high-density fluid ocular tamponades and methods of producing, purifying and using the fluorosilicone fluids in an ocular surgical procedure for retinal treatment.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: March 9, 2004
    Assignee: Bausch & Lomb Incorporated
    Inventors: Jay F. Kunzler, Richard M. Ozark, Joseph C. Salamone
  • Patent number: 6696538
    Abstract: The present invention relates to low a dielectric material essential for a next generation semiconductor with high density and high performance, and more particularly to a low dielectric material that is thermally stable and has good film-forming properties and excellent mechanical properties, a dielectric film comprising the low dielectric material, and a semiconductor device manufactured using the dielectric film. The present invention provides an organic silicate polymer having a flexible organic bridge unit in the network prepared by the resin composition of the component (a) and the component (b).
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: February 24, 2004
    Assignee: LG Chemical Ltd.
    Inventors: Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Myung-Sun Moon, Dong-Seok Shin
  • Patent number: 6677252
    Abstract: A method of planarizing a surface of a wafer includes providing a planarization material on the wafer surface and bringing a substantially flat surface into contact with the planarization material on the wafer. The planarization material is exposed to radiation at a first wavelength to cure the planarization material and is exposed to radiation at a second wavelength to cause changes to the planarization material that facilitate separation of the substantially flat surface from the planarization material.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: January 13, 2004
    Assignee: Micron Technology, Inc.
    Inventor: Eugene P. Marsh
  • Patent number: 6673458
    Abstract: The present invention relates to a process for producing sol-gel condensates by A1) reacting an aqueous silica sol with a silicon alkoxide and subsequently A2) converting the condensate obtained from A1) with a polyfunctional organosilane.
    Type: Grant
    Filed: January 17, 2002
    Date of Patent: January 6, 2004
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Mager, Markus Mechtel, Harald Kraus, Nusret Yuva
  • Patent number: 6669949
    Abstract: This invention relates to asymmetrical, substituted polysiloxanes which show good compatibility in a variety of oils and improve the spreading behavior of oil-based formulations, to a process for preparing these asymmetrical polysiloxanes and to oil formulations containing said asymmetrical polysiloxanes. The asymmetrical polysiloxanes of this invention are used in herbicidal and pesticidal compositions, in cosmetic and pharmaceutical preparations as well as in industrial applications. The assymmetrical substituted polysiloxanes have the following formula wherein R1, R2, Z a and b are described herein.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: December 30, 2003
    Assignee: Goldschmidt AG
    Inventors: Wayne Kennedy, Arno Knebelkamp, Peter Lersch, Jörg Simpelkamp, Stephen Wilkowski
  • Patent number: 6664359
    Abstract: A tackified composition comprising (a) a polydiorgannosiloxane polyurea segmented copolymer comprising the reaction product of (i) at least one polyaminie, wherein the polyamine comprises at least one polydiorganosiloxane diamine, or a mixture of at least one polydiorganosiloxane diamine and at least one organic polyamine, and (ii) at least one polyisocyanate, wherein the mol ratio of isocyanate to amined is between 0.9:1 and 0.95:1 or between 1.05:1 and about 1.3:1, and (b) silicate resins. The tackified compositions are useful as pressure sensitive adhesives, particularly for foamed backing tapes, medical tapes and the like, hot melt adhesives, vibration dampers, anti-corrosive materials.
    Type: Grant
    Filed: October 2, 1997
    Date of Patent: December 16, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Lani S. Kangas, Mieczyslaw H. Mazurek, Kurt C. Melancon, Walter R. Romanko, Audrey A. Sherman
  • Patent number: 6660822
    Abstract: The present invention provides a method for forming insulating film between interconnect layers in microelectronic devices, said method comprising the steps of: preparing siloxane-based resins by hydrolyzing and polycondensing the compound represented by the following formula (1), with or without the compound represented by the following formula (2), in an organic solvent in the presence of a catalyst and water; coating a silicon substrate with the siloxane-based resins dissolved in an organic solvent; and heat-curing the resulting coating film:  RSiX1X2X3  [2] in which, R is hydrogen atom, C1˜C3 alkyl group, C3˜C10 cycloalkyl group, or C6˜C15 aryl group; X1, X2 and X3 are independently C1˜C3 alkyl group, C1˜C10 alkoxy group, or halogen atom; n is an integer ranging from 3 to 8; and m is an integer ranging from 1 to 10.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: December 9, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Sang Kook Mah, Eun Ju Nah, Il Sun Hwang, Hyun Dam Jeong, Jin Gyu Lee
  • Patent number: 6660823
    Abstract: Method is provided for controlling the stereo chemistry of functionalities or X groups to exo or endo positions on a polyhedral oligomeric silsesquioxane (POSS) compound by adding certain reagents to said X groups to change one or more positions thereof to endo or exo. Also provided are the POSS species formed by the above inventive method. Method is also provided for inserting a ring substituent into a POSS compound. Also provided are the POSS species formed by such inventive method.
    Type: Grant
    Filed: November 14, 2000
    Date of Patent: December 9, 2003
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Joseph D. Lichtenhan, Frank J. Feder, Daravong Soulivong
  • Patent number: 6649689
    Abstract: This invention relates to hydrophilic curable alkoxylated silicone polymers for surface modification and are useful in, e.g., fiber and fabric care, hair care, skin care, surface care, and car care compositions. The compounds are curable silicone polymers which contain one or more polyalkyleneoxy groups, preferably polyalkyleneoxy pendant groups, comprising at least some ethyleneoxy units, said polyalkyleneoxy pendant groups are preferably capped with low molecular weight alkyl groups, such as C1-C6 alkyl groups. These compounds are substantive to the surface but keep the surface hydrophilic.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: November 18, 2003
    Assignee: The Procter & Gamble Company
    Inventors: Eugene Paul Gosselink, Toan Trinh, Robb Richard Gardner
  • Patent number: 6646090
    Abstract: Condensation curable poly(fluoroorgano)siloxane-poly(silarylene)siloxane block copolymer compositions having a glass transition temperature not exceeding about −54° C. and excellent solvent resistance have been found useful as sealants. Polyalkoxysilylorgano compounds, such as 1,4-bis[trimethoxysilyl(ethyl)]benzene have been found to be effective as cross-linkers.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: November 11, 2003
    Assignee: General Electric Company
    Inventors: Navjot Singh, John Thomas Leman, John M. Whitney, Herman Otto Krabbenhoft
  • Patent number: 6624236
    Abstract: The invention relates to polysiloxanes from cross-linkable monomers based on cyclosiloxanes and their use in polymerizable compositions. The invention relates in particular to polysiloxanes from sol-gel-condensable cyclosiloxane(meth)acrylates as well as resinous compositions, obtainable by hydrolytic condensation of one or more hydrolyzable and condensable cyclosiloxane(meth)acrylates.
    Type: Grant
    Filed: September 19, 2001
    Date of Patent: September 23, 2003
    Assignee: 3M Espe AG
    Inventors: Peter Bissinger, Oswald Gasser, Rainer Guggenberger, Wolfgang Soglowek, Gunther Eckhardt
  • Patent number: 6617391
    Abstract: The present invention relates to linear polyalkylorgano-siloxanes having polyoxyalkylene and amino-functional groups which additionally have terminal alkoxy groups, and to the preparation and use thereof.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: September 9, 2003
    Assignee: Goldschmidt AG
    Inventors: Manfred Krakenberg, Holger Leidreiter, Sascha Oestreich, Stefan Stadtmuller, Akfred Walter
  • Patent number: 6613441
    Abstract: The present invention relates to mixtures prepared from (A) at least one linear, branched, or cyclic monomeric organosilane having at least two silicon atoms with hydrolyzable and/or condensation-crosslinking groups in which the silicon atoms are bonded to one another through at least one carbon atom in a linking unit, and (B) at least one boron- and/or aluminum-containing compound having the formula (I) RxM(OR′)3-x  (I)  wherein M is Al or B, x is 0, 1, or 2, R is C1-C6-alkyl, C6-C12-aryl, or (O)1/2, with the proviso that if R is (O)1/2, then the compound of the formula (I) is a chain when x is 1 and a cyclic or cage-form compound when x is 2, and each R′ is independently H, C1-C10-alkyl, or C6-C12-aryl. The invention further relates to hybrid materials prepared from such mixtures and to coatings produced therefrom.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: September 2, 2003
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Mager, Steffen Hofacker
  • Patent number: 6599635
    Abstract: The present invention relates to inorganic coating compositions based on cyclic carbosiloxanes, inorganic polycondensates and &agr;,&ohgr;-functional linear oligosiloxanes, and also to a process for production thereof and to the use thereof and to a non-stick layer so obtained.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: July 29, 2003
    Assignee: Bayer Aktiengesellschaft
    Inventors: Markus Mechtel, Wolfgang Pütz, Lutz Schmalstieg, Holger Mundstock, Michael Sonntag
  • Patent number: 6573355
    Abstract: The invention discloses a method for the preparation of an organopolysiloxane having a branched molecular structure which comprises the steps of: (A) Mixing (A1) an organopolysiloxane represented by the average unit formula [R13SiO½]m[R1SiO{fraction (3/2)}]n[R1(R2O)SiO]q, in which R1 is a monovalent hydrocarbon group, R2 is a hydrogen atom, methyl group or ethyl group and the subscripts m, n and q are each 0 or a positive number with the proviso that (n+q)/m is from 0.6 to 1.5 and q/(m+n) is 0 or a positive number not exceeding 0.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: June 3, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shinji Irifune, Masahiko Ogawa
  • Patent number: 6572923
    Abstract: Methods for synthesizing extra low-k CVD precursors and forming extra low-k dielectric films on the surfaces of semiconductors wafers and integrated circuits are disclosed. An asymmetric organocyclosiloxane compound is applied to the surface where it will react with and form a film that will have a dielectric constant, k, from 2.0 to 2.5.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: June 3, 2003
    Assignee: The BOC Group, Inc.
    Inventors: Ce Ma, Qing Min Wang
  • Publication number: 20030065123
    Abstract: Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are methods for forming insulating film between interconnect layers in semiconductor devices by using the siloxane-based resins thus prepared as low dielectric insulating materials.
    Type: Application
    Filed: March 27, 2002
    Publication date: April 3, 2003
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Sang Kook Mah, Eun Ju Nah, Il Sun Hwang, Hyun Dam Jeong, Jung Hyung Kim
  • Patent number: 6534587
    Abstract: Symmetric and asymmetric cyclic silalkylenesiloxane monomers and copolymers thereof, as well as crosslinked and/or reinforced silalkylenesiloxane copolymers, medical devices containing such materials, and methods of preparation.
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: March 18, 2003
    Assignee: Medtronic, Inc
    Inventors: Mark A. Tapsak, Edward Di Domenico
  • Patent number: 6534614
    Abstract: A process for preparing linear organohydrogensiloxanes. The process comprises contacting an organohydrogendichlorosilane in the presence of trimethylchlorosilane with water to form an M-stopped hydrolyzate. The hydrolyzate is optionally preheated prior to being contacted with an acidic rearrangement catalyst to effect formation of linear organohydrogensiloxanes. The linear organohydrogensiloxanes are separated from cyclic organohydrogensiloxanes and recovered. The cyclic organohydrogensiloxanes may then be recycled to the process for further contact with the acidic rearrangement catalyst for maximum overall conversion rate.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: March 18, 2003
    Assignee: General Electric Company
    Inventors: Luisito A. Tolentino, Akber Ali Khanshab
  • Patent number: 6534615
    Abstract: The invention relates to a process for preparing an amino-functional organosiloxane of the formula III, (SiO{fraction (4/2)})k(R1SiO{fraction (3/2)})m(R12SiO{fraction (2/2)})p(R13SiO½)q[O½SiR12—R—NH2]s[O½H]t  (III) which comprises reacting an organosiloxane of the formula IV (SiO{fraction (4/2)})k(R1SiO{fraction (3/2)})m(R12SiO{fraction (2/2)})p(R13SiO½)q[O½H]r  (IV) with a cyclic silazane of the formula V where R, Rx, R1, s, t, r, k, m, p and q are as defined in claim 1.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: March 18, 2003
    Assignee: Consortium fur Elektrochemische Industrie GmbH
    Inventors: Oliver Schäfer, Volker Frey, Bernd Pachaly, Andreas Bauer
  • Patent number: 6531260
    Abstract: A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: March 11, 2003
    Assignee: JSR Corporation
    Inventors: Haruo Iwasawa, Tsutomu Shimokawa, Akihiro Hayashi, Satoru Nishiyama
  • Patent number: 6524716
    Abstract: There is disclosed a method for the preparation of a diene polymer interpenetrated with a polysiloxane comprising the polymerization of (A) at least one silane monomer of the formula: (B) at least one silane monomer of the formula: (C) at least one diene monomer, said polymerization being conducted in the presence of an anionic base, an inert solvent and a polymerization initiator, wherein each R1 is independently selected from the group consisting of alkyl radicals having from 1 to 4 carbon atoms and aryl radicals having 6 carbon atoms and R2 is selected from the group consisting of where x is an integer of from 1 to 8.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: February 25, 2003
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Friedrich Visel, Wolfgang Lauer, Marc Weydert
  • Patent number: 6501212
    Abstract: A method of insulating a cathode ray tube and an electrical insulator composition for a cathode ray tube enabling an electrical insulator to be produced without material loss and enabling improvement of the bonding strength between a stem and a stem base and the insulation property between stem pins, when attaching to a stem, which is provided at the cathode ray tube and has a tip and stem pins projecting therefrom, an insulating stem base, which comprises a base through which pin through holes are formed and has provided projecting from the front surface thereof a tip holder, in a state with the stem pins inserted through the pin through holes and the tip held in the tip holder, said method comprising the steps of molding an electrical insulator composition comprising an uncured self-adhesive silicone rubber into a predetermined sheet shape by using a transfer mold to obtain an electrical insulator, arranging the electrical insulator in a state extending from the positions of the pin through holes on the bac
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: December 31, 2002
    Assignee: Sony Corporation
    Inventors: Takashi Setsuda, Hirokazu Kanno, Kazuhiko Tomaru, Tsutomu Yoneyama, Hisaharu Yamaguchi
  • Patent number: 6492480
    Abstract: Disclosed is a method for the preparation of a linear polysilalkylenesiloxane from four- to seven-membered cyclic silalkylenesiloxane by subjecting the cyclic silalkylenesiloxane to ring opening polymerization by using as a catalyst a polynuclear ruthenium-carbonyl complex in which carbonyl groups are coordinated with three or four ruthenium atoms, in the presence of a silane compound having at least one Si—H bond.
    Type: Grant
    Filed: June 20, 2001
    Date of Patent: December 10, 2002
    Assignee: Japan Science and Technology Corporation
    Inventors: Hideo Nagashima, Kouki Matsubara, Junichi Terasawa
  • Patent number: 6492089
    Abstract: A polymer bearing specific cyclic silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: December 10, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takeshi Kinsho, Mutsuo Nakashima, Koji Hasegawa
  • Patent number: 6471985
    Abstract: In one embodiment, the present invention relates to a method of treating a wound, involving applying to the wound a room temperature vulcanizing silicone composition comprising a crosslinkable polymer, a crosslinking agent, and a catalyst; permitting the room temperature vulcanizing silicon composition to cure thereby forming a membrane having a thickness from about 0.1 mm to about 5 mm; and removing the membrane from the wound after at least about 1 day.
    Type: Grant
    Filed: June 4, 1999
    Date of Patent: October 29, 2002
    Inventors: Bahman Guyuron, Michael Doliveck
  • Patent number: 6433077
    Abstract: A method is provided for making emulsion polymerized silicone rubber having an average particle size of from about 400 nm to 2 microns and grafts thereof. Thermoplastic blends having improved weatherability and impact strength are also provided based on the use of a thermoplastic organic polymer and a graft of such emulsion polymerized silicone rubber as an impact modifier.
    Type: Grant
    Filed: September 13, 2000
    Date of Patent: August 13, 2002
    Assignee: General Electric Company
    Inventors: Daniel Horace Craig, Rong Hu
  • Patent number: 6423378
    Abstract: The invention concerns the use of cross-linkable silicone compositions for fast, economical and simple impregnation and/or varnishing of flat joints (e.g. cylinder head gaskets). More precisely it concerns the use of silicone compositions cross-linkable under UV radiation, by cationic process and in the presence of specific phoinitiators selected among onium borates or organometallic complexes, of which the borate counter-anions contain at least a boron bound to at least a substituted phenyl (Me, F). The silicone liquid precursor is a polydimethylsiloxane (PDMS) substituted by cross-linking functional groups, by cationic process (Gfp) under UV of the epoxy of vinyloxy type. These Gfp are present at the rate of 0.15 to 2.0 pr kg of PDMS. The invention also relates to the method for impregnating/varnishing flat joints (e.g. cylinder head gaskets) using the specific PDMS composition+photoinitiator of borate type as well as the treated joints and the composition themselves.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: July 23, 2002
    Assignee: Rhodia Chimie
    Inventors: Marie-Christine Cotting, Gérard Joubert, Olivier Loubet
  • Patent number: 6403499
    Abstract: A method of planarizing a surface of a wafer includes providing a planarization material on the wafer surface and bringing a substantially flat surface into contact with the planarization material on the wafer. The planarization material is exposed to radiation at a first wavelength to cure the planarization material and is exposed to radiation at a second wavelength to cause changes to the planarization material that facilitate separation of the substantially flat surface from the planarization material.
    Type: Grant
    Filed: February 21, 2001
    Date of Patent: June 11, 2002
    Assignee: Micron Technology, Inc.
    Inventor: Eugene P. Marsh
  • Patent number: 6395826
    Abstract: The present invention relates to mixtures prepared from (A) at least one linear, branched, or cyclic monomeric organosilane having at least two silicon atoms with hydrolyzable and/or condensation-crosslinking groups in which the silicon atoms are bonded to one another through at least one carbon atom in a linking unit, and (B) at least one boron- and/or aluminum-containing compound having the formula (I) RxM(OR′)3−x  (I)  wherein M is Al or B, x is 0, 1, or 2, R is C1-C6-alkyl, C6-C12-aryl, or (O)½, with the proviso that if R is (O)½, then the compound of the formula (I) is a chain when x is 1 and a cyclic or cage-form compound when x is 2, and each R′ is independently H, C1-C10-alkyl, or C6-C12-aryl. The invention further relates to hybrid materials prepared from such mixtures and to coatings produced therefrom.
    Type: Grant
    Filed: March 24, 1999
    Date of Patent: May 28, 2002
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Mager, Steffen Hofacker
  • Patent number: 6395858
    Abstract: The present invention relates to mixtures of catenate and cyclic siloxane oligomers of the formulae I and II where the substituents R consist of (i) aminopropyl-functional groups of the formula —(CH2)3—NH2 or —(CH2)3—NHR′ or —(CH2)3—NH(CH2)2—NH2 or —(CH2)3—NH(CH2)2—NH(CH2)2—NH2,in which R′ is a linear, branched or cyclic alkyl group of 1 to 18 carbon atoms or an aryl group of 6 to 12 carbon atoms, and (ii) methoxy, ethoxy, 2-methoxyethoxy and/or propoxy groups, and (iii) if desired, alkyl, alkenyl, isoalkyl or cycloalkyl groups of 1 to 18 carbon atoms and/or aryl groups of 6 to 12 carbon atoms, and where not more than one aminopropyl-functional group is attached to one silicon atom and the degree of oligomerization of compounds of the formula I is within the range 2<m<30 and that of compounds of the formula II is 3≦n≦30 and the quotient of the molar proportion of Si/alkoxy group is ≧0.5.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: May 28, 2002
    Assignee: Degussa AG
    Inventors: Helmut Mack, Dieter Barfurth, Roland Edelmann, Albert-Johannes Frings, Michael Horn, Peter Jenkner, Ralf Laven, Jaroslaw Monkiewicz, Burkhard Standke
  • Patent number: 6365698
    Abstract: Grafted-polysilanes with a greater efficiency for the photoinitiation of vinyl type resins are provided. These grafted polysilanes which include both grafted cyclic polysilanes and grafted networked polysilanes have variable composition and length molecular chains grafted onto the silane backbone which aid in the solubility in vinyl type resins.
    Type: Grant
    Filed: October 16, 1998
    Date of Patent: April 2, 2002
    Assignees: Three Bond Co., Ltd., University of Cincinnati
    Inventors: Barry Goldslager, Stephen J. Clarson
  • Patent number: 6353073
    Abstract: The present invention provides near quantitative yields of greater than about 95% isomeric purity of poly(3-aminopropylmethylsiloxane)-poly(dimethylsiloxane) copolymers of the general formulae: Me3Si(H2NCH2CH2CH2MeSiO)w(Me2SiO)xOSiMe3 (H2NCH2CH2CH2MeSiO)y(Me2SiO)z wherein Me is methyl, w may range from 1 to about 100, x may range from 1 to about 100, y may range from 1 to about 6, z may range from 1 to about 6 and y+z may range from 3 to about 7.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: March 5, 2002
    Assignee: Archimica (Florida), Inc.
    Inventors: Timothy N. Biggs, Benigno A. Janeiro
  • Patent number: 6353075
    Abstract: A polymerization process comprising mixing a siloxane having silicon-bonded groups R′ and a cyclic or linear siloxane having no silicon-bonded groups R′ with a phosphazene base catalyst in the presence of water and allowing the siloxane having silicon-bonded groups R′ to condense and the cyclic or linear siloxane having no silicon-bonded R′ groups to polymerize by equilibration.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: March 5, 2002
    Assignee: Dow Corning Limited
    Inventors: Peter Hupfield, Avril Surgenor, Richard Taylor
  • Patent number: 6346593
    Abstract: A polymerization process comprising mixing siloxane polymers with organosilicon compounds having at least one silicon-bonded group RN, which is a substituent comprising at least one amine group, and with a phosphazene base catalyst and allowing the siloxanes and organosilicon compounds to polymerize to form amino-functional polyorganosiloxane polymers is claimed.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: February 12, 2002
    Assignee: Dow Corning Limited
    Inventors: Peter Hupfield, Grainne Moloney, Avril Surgenor, Richard Taylor
  • Patent number: 6340735
    Abstract: A coating solution of a poly(phenylsilsesquioxane) ladder polymer having a weight average molecular weight of 4,000-100,000 in a suitable solvent is spin coated and heated to form a dense dielectric film having a low dielectric constant.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: January 22, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Fujio Yagihashi
  • Patent number: 6339137
    Abstract: The present invention provides near quantitative yields of greater than about 95% isomeric purity of poly(3-aminopropylmethylsiloxanes) of the general formulae: Me3Si(H2NCH2CH2CH2MeSiO)xOSiMe3 (H2NCH2CH2CH2MeSiO)y wherein Me is methyl, x may range from 2 to about 100 and y may range from 3 to about 7. The present invention also provides a simple method for rapidly producing poly(3-aminopropylmethylsiloxanes) of the general formulae: Me3Si(H2NCH2CH2CH2MeSiO)xOSiMe3 (H2NCH2CH2CH2MeSiO)y wherein Me is methyl, x may range from 2 to over 100 and y may range from 3 to about 7, the method comprising heating of 3-(3-aminopropyl)-1,1,1,3,5,5,5-heptamethyltrisiloxane, of at least 95% isomeric purity, with a basic catalyst, removing hexamethyldisiloxane, and decomposing the catalyst.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: January 15, 2002
    Assignee: Archimica (Florida) Inc.
    Inventors: Timothy N. Biggs, Benigno A. Janeiro
  • Patent number: 6313255
    Abstract: Telechelic polymers are presented, comprising polysiloxane polymers having multiple epoxy end-groups of the formula G—R3—SiR1R2O(SiR1R2O)mSiR1R2—R3—G wherein each R1 and R2 are independently monovalent alkyl, alkoxy, aryl, aryloxy, and halohydrocarbon radicals having from 1 to 20 carbon atoms, halohydrocarbon radicals having the formula CnF2n+1CH2CH2— wherein n is an integer from 1 to 18; m is an integer in the range from 10 to about 1000; R3 is a divalent hydrocarbon radical having from 2 to 18 carbon atoms; and G is a silicon-based functionalized end group, wherein the functionalities are selected from the group consisting of epoxides, vinyl ethers, propenyl ether, or a combination thereof.
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: November 6, 2001
    Assignee: General Electric Company
    Inventor: Slawomir Rubinsztajn
  • Patent number: 6308001
    Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical having the formula: R1—CFH—CF2— or R1—CF═CF—, wherein R1 is an unsubstituted or substituted aliphatic radical, unsubstituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical, and X is an unsubstituted or substituted aliphatic radical, an unsubstituted or substituted cyclic aliphatic radical, unsubstituted or substituted aromatic radical, unsubstituted or substituted araliphatic radical or an unsubstituted or substituted heterocyclic radical. Curable compositions containing the vinyl ether compounds and methods in which the substrate coating layers of the vinyl ether compositions are cured, particularly on optical devices, are also disclosed, as well as polymers polymerized from the vinyl ether compounds.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: October 23, 2001
    Assignee: AlliedSignal Inc.
    Inventors: Haridasan K. Nair, David Nalewajek, David E. Bradley
  • Patent number: 6303729
    Abstract: A partially added cyclic organohydrogensiloxane is prepared in high yields by mixing (A) a cyclic organo-hydrogensiloxane having at least two Si—H bonds with (B) a cyclic or acyclic organic unsaturated compound having an aliphatic unsaturated double bond, effecting addition reaction in the presence of a platinum catalyst, adding a silylating agent to the reaction mixture, and isolating the product from the reaction mixture by distillation.
    Type: Grant
    Filed: May 18, 2000
    Date of Patent: October 16, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Shinichi Sato
  • Patent number: 6294634
    Abstract: A method of preparing organosilicon compositions by heating various mixtures of (i) dimethylcyclosiloxanes or methylhydrogencyclosiloxanes, (ii) homopolymeric and copolymeric cyclosiloxanes containing a C5 or more carbon atom containing group, and (iii) homopolymeric and copolymeric cyclosiloxanes containing an oxyalkylene segment, in the presence of a catalyst, at a temperature and for a time sufficient to cause polymerization of cyclosiloxanes (i) to (iii) to the desired organosilicon composition.
    Type: Grant
    Filed: March 28, 2000
    Date of Patent: September 25, 2001
    Assignee: Dow Corning Corporation
    Inventors: Michael Salvatore Ferritto, William James Schulz, Jr.
  • Patent number: 6288195
    Abstract: An organopolysiloxane gum is prepared by polymerizing a cyclic organopolysiloxane with a low molecular weight linear organopolysiloxane end-blocked with a triorganosilyl group in the presence of a thermally decomposable catalyst. After the polymerization reaction, the catalyst is deactivated by heating the reaction product under a subatmospheric pressure of typically up to 500 mmHg.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: September 11, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaharu Takahashi, Yutaka Hagiwara, Minoru Igarashi, Kenji Tawara, Yoshio Tomizawa
  • Patent number: 6288196
    Abstract: An organopolysiloxane gum is continuously prepared by (I) mixing at least one cyclopolysiloxane with an end capping agent, (II) feeding the mixture to a self-cleaning reactor along with an alkaline polymerization catalyst, and effecting polymerization at a temperature of 100 to 250° C. and under subatmospheric pressure, (III) continuously adding a neutralizing agent to the reaction mixture of step (II), thereby terminating the polymerization reaction, and (IV) continuously removing the cyclopolysiloxane and volatile components from the reaction mixture.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: September 11, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaharu Takahashi, Yutaka Hagiwara
  • Patent number: 6284859
    Abstract: A polymerization process comprising mixing siloxanes having silicon-bonded groups R′ with ionic phosphazene base catalysts and allowing condensation via reaction of Si—R′ groups with the formation of a Si—O—Si linkage, R′ denoting a hydroxyl group or a hydrocarbonoxy group having up to 8 carbon atoms is claimed. The catalysts may be of the general formulae: {((R12N)3P═N—)x(R12N)3−xP—N(H)R2}+{A−} or {((R12N)3P═N—)y(R12N)4−yP}+{A}− in which R1 is hydrogen or an optionally substituted hydrocarbon group or in which two R1 groups bonded to the same N atom may be linked to complete a heterocyclic ring, R2 is hydrogen or an optionally substituted hydrocarbon group, x is 1, 2 or 3, y is 1, 2, 3 or 4 and A is an anion.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: September 4, 2001
    Assignee: Dow Corning Limited
    Inventors: Peter Hupfield, Avril Surgenor, Richard Taylor
  • Patent number: 6271330
    Abstract: Terminally functionalized silicone polymers prepared using protected functionalized initiators and processes for preparing the same. The silicone polymers includes protected, functionalized silicone polymers, such as mono-functional, homotelechelic, heterotelechelic, macromonomer, and radial polymers. The protected functionalized polymers can be optionally deprotected to afford functionalized silicone polymers.
    Type: Grant
    Filed: August 12, 1999
    Date of Patent: August 7, 2001
    Assignee: FMC Corporation
    Inventors: Robert James Letchford, James Anthony Schwindeman, Roderic Paul Quirk
  • Patent number: 6248853
    Abstract: A liquid state non-solvent silicone resin obtained from a polycondensation reaction of material (A) dimethyl poly siloxane, material (B) vinyl methyl cyclo siloxane and material (C) diphenyl dihydroxy silane, the reaction being performed at a temperature within about 140˜180° C. under the presence of an anionic polymerization catalyzer.
    Type: Grant
    Filed: January 5, 1999
    Date of Patent: June 19, 2001
    Assignee: Silitek Corporation
    Inventors: Yong Zhou Sun, Peng Zhao, Jian Liu, Chi-Lung Tsai