Abstract: A composition of matter comprising a diamine salt and sulfoisophthalic acid in a ratio other than one salt to one acid and a process for producing a diamine salt of sulfoisophthalic acid comprising generating a sulfoisophthalic acid and charging the sulfoisophthalic acid with diamine.

Abstract: Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. ROC(?O)R1—COOCH2CF2SO3?H+??(1a) RO is OH or C1-C20 organoxy, R1 is a divalent C1-C20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

Abstract: A substance includes diamond particles having a maximum linear dimension of less than about 1 ?m and an organic compound attached to surfaces of the diamond particles. The organic compound may include a surfactant or a polymer. A method of forming a substance includes exposing diamond particles to an organic compound, and exposing the diamond particles in the presence of the organic compound to ultrasonic energy. The diamond particles may have a maximum linear dimension of less than about 1 ?m. A composition includes a liquid, a plurality of diamond nanoparticles dispersed within the liquid, and an organic compound attached to surfaces of the diamond nanoparticles. A method includes mixing a plurality of diamond particles with a solution comprising a liquid solvent and an organic compound, and exposing the mixture including the plurality of diamond nanoparticles and the solution to ultrasonic energy.

Abstract: This invention relates to novel compounds suitable for labeling by positron emitting isotopes, such as 18F, 11C, 13N and 15O, through appropriate labeling reagents, such as 18F reagents and methods of preparing such a compound, compositions comprising such compounds, kits comprising such compounds or compositions and uses of such compounds, compositions or kits for diagnostic imaging by positron emission tomography (PET).

Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.

Abstract: A process for preparing a detergent alcohol mixture comprising the steps of providing one or more poly-branched poly-olefins, wherein the poly-branched poly-olefins must contain one non-branched terminal olefin and one or more additional branched olefins in the molecule; hydroformylating said poly-branched poly-olefins to produce a poly-branched olefin containing aldehyde product with one or more olefins or mixture thereof; reducing the aldehyde product of step (b) in the presence of hydrogen and a hydrogenation catalyst to form a poly-branched detergent alcohol mixture; and removing said poly-branched alcohol mixture from said catalyst and branched aldehydes, alcohols and surfactants produced from the products of this process.

Abstract: This invention relates to pharmaceutically acceptable amphiphilic antioxidant compounds, compositions and dosage forms comprising said compounds, and methods and uses reliant on said compounds. The exemplified compounds are all mitoquinone derivatives, being methoxyphenyl alkyl triphenylphosphonium or methoxy dioxocyclohexadiene alkyl triphenylphosphonium derivatives. The compounds, compositions, dosage forms, uses and methods are useful in, for example, the treatment of diseases or conditions associated with oxidative stress.

Abstract: Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free heteroaromatic sulfonate anionic component. The photoacid generators preferably contain an onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.

Abstract: Ferroelectric liquid crystal compositions including organic ion pair compounds wherein image sticking is reduced or eliminated. Use of the ferroelectric liquid crystal compositions in a ferroelectric liquid crystal display device allows for rapid image refresh rates without required a DC-balancing algorithm. The organic ion pair compounds provide electrical resistivity values for the compositions that result in reduced image sticking when the compositions are used in FLC display devices.

Abstract: Provided is an adhesive composition for a semiconductor device. For example, the adhesive composition comprises a binder resin and a silicon carbide filler. The silicon carbide filler has relatively high thermal conductivity and a relatively low coefficient of thermal expansion (CTE). Accordingly, the adhesive composition containing the silicon carbide filler exhibits improved heat dissipation performance and electrical performance due to high thermal conductivity and shows inhibition of delamination or cracking of semiconductor devices due to low CTE. The silicon carbide has high thermal conductivity, but is electrically non-conductive. Therefore, an electrically conductive adhesive can be obtained by additional incorporation of a silver (Ag) filler into the binder resin.

Abstract: One subject of the invention is a dimethyl disulphide in which the content of biocarbon is at least 1%. Another subject of the invention is processes for preparing this dimethyl disulphide. Yet another subject of the invention is the use of such a dimethyl disulphide for the manufacture of methanesulphonic acid.

Abstract: Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.

Abstract: The present invention is directed to an isomerized alpha olefin sulfonate and a method of making the same wherein the isomerized alpha olefin sulfonate is derived from sulfonating an isomerized alpha olefin with sulfur trioxide in the presence of air thereby producing an isomerized alpha olefin sulfonic acid, wherein the isomerized alpha olefin is derived from the isomerization of C12-C20 normal alpha olefins; and neutralizing the isomerized alpha olefin sulfonic acid with a source of an alkali metal or ammonium or substituted ammonium ion.

Abstract: Provided herein are methods of decreasing a level of kynurenic acid in a cell and of treating a pathophysiological condition in a subject associated with an increase in kynurenic acid in a subject. In these methods the inhibitory action of dicarboxylic acids or derivatives or analogs thereof are effective to inhibit activity of kynurenine aminotransferase II. Also provided is a method of screening for potential inhibitory compounds for kynurenine aminotransferase II. The dicarboxylic acids or derivatives or analogs thereof may have the structural formula, where R1 is H, NH2 or NHCH3, R2 is H or CH3, n is 0 to 14, and X is —COOH, CH2OH, —PO3H2, —SO3H, or —SO3H; or a pharmacologically acceptable salt.

Abstract: A compound of the general formula X-[Q-W—(CH?CH)n—(CH2)2-L]m (I) in which X represents a polymer; Q represents a linking group; W represents an electron-withdrawing group; n represents 0 or an integer of from 1 to 4; L represents a leaving group; and m represent an integer of from 1 to 8. The compounds find use in the conjugation of biological molecules.

Abstract: Provided are processes for the synthesis of aniline derivatives, specifically certain aniline derivatives which have activity as thyroid receptor ligands.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.

Abstract: A process for preparing solid alkaline earth metal salts of secondary paraffinsulphonic acids is claimed. This process comprises converting an aqueous solution of a secondary paraffinsulphonic acid and an alkaline earth metal hydroxide into solid form by spray drying.

Abstract: (1) A vinyl sulfonic acid, having a double bond content of 95 wt. % or more, and (i) a sodium (Na) content of 1 ppm or less, and (ii) a content of at least one metal selected from the group consisting of alkali earth metal and first row transition metal of 1 ppm or less. Alternatively, (2) a vinyl sulfonic acid, having a double bond content of 95 wt. % or more, and (i) a sodium (Na) content of 100 ppb or less, and (ii) a content of at least one metal selected from the group consisting of alkali earth metal and first row transition metal of 100 ppb or less. Further, a homopolymer or copolymer thereof, a production method thereof, or a thin-film distillation apparatus suited for the production thereof.

Abstract: The present invention relates to the use of alkane sulfonic acid for descaling, and more generally for cleaning vats, casks, and other containers used for the storage, shipping, and handling of meat and early produce, particularly poultry, fruit, and vegetables. The present invention also relates to a composition in gel form including at least one alkane sulfonic acid.

Abstract: The present invention relates to the use of at least one alkanesulfonic acid of formula R—SO3H, in which R represents a saturated, linear or branched, hydrocarbon chain containing 1 to 4 carbon atoms, as agent for cleaning cement, mortar, concrete, lime, laitance and other derived products. The invention also relates to a method of cleaning cement, mortar, concrete, lime, laitance and other derived products using at least one alkanesulfonic acid.

Abstract: A process for recovering oil from an oil-bearing formation comprises introducing into said formation an aqueous composition comprising at least one sulfonated derivative of one or more internal olefins, said internal olefins being characterized by having low amounts of tri-substitution on the olefin bond, said sulfonated derivative being obtained by sulfonating a composition comprising internal olefins of the formula: R1R2C?CR3R4 wherein R1, R2, R3 and R4 are the same or different and are hydrogen or straight- or branched-chain, saturated hydrocarbyl groups and the total number of carbon atoms of R1, R2, R3 and R4 is 6 to 44 with the proviso that at least about 96 mole percent of R1 and R3 are straight- or branched-chain, saturated hydrocarbyl groups and at least about 96 mole percent of R2 and R4 are hydrogen.

Abstract: The invention relates to surfactant compositions made from esters or amides of the betaine glycine, produced by reaction of the glycine betaine with a sulphonic acid and an alcohol or a fatty-chain amine derived from vegetable oils. The invention further relates to a cosmetic comprising said surfactant composition, in particular, liquid soap, bath foam, shower gel or shampoo.

Abstract: Novel fluorescent dyes are disclosed for use in analyte detection. In particular, mono- and bis-substituted HPTS dyes and methods of making them are provided.

Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

Abstract: The invention provides compositions comprising at least one alkylphenol-aldehyde resin (constituent I) and, based on the alkylphenol resin, from 0.005 to 10% by weight of at least one oil-soluble organic ammonium sulfonate (constituent II).

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q5 represents a single bond or a divalent linking group).

Abstract: The invention provides a compound which is useful in production of a fluoropolymer and easy to be removed from the produced fluoropolymer, a method of producing the compound, and a method of producing a fluoropolymer using the compound. The invention provides a compound which is represented by Rf1—CH2O—CF2—CHF—Rf2—X, wherein Rf1 represents a fluoroalkyl group containing 1 to 5 carbon atoms, Rf2 represents a fluoroalkylene group containing 1 to 3 carbon atoms, X represents —COOM or —SO3M, and M represents one of H, K, Na, and NH4.

Abstract: A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.

Abstract: The invention concerns a process for preparing a hybrid organic-inorganic material (HOIM) with phosphorus-containing bridges between the surface of an inorganic substrate containing an element M and one or more organic groups of the covalent M-O-P-R type, said process using, as a precursor for said organic group or groups, at least one organophosphorus acid halide with formula RxP(O)Xy in which x=1 or 2, y=3?x, X being a halogen and R designating at least one organic alkyl, aryl or aryl-alkyl group. Non-exhaustive applications for the hybrid organic-inorganic material obtained by the process of the invention are in the fields of anti-corrosion, lubrication, microelectronics, nanotechnologies, composite materials, heterogeneous catalysis, supported catalysis, depollution and biomedical applications.

Abstract: The aim of the present invention is to provide a lubricating oil composition for a hydrodynamic bearing device wherein oil film disruption is suppressed. It is solved by a lubricating oil composition for a hydrodynamic bearing device which comprises a base oil and an oil film disruption inhibitor such as metal sulfonate.

Abstract: The present invention provides a pharmaceutical composition containing, as an active ingredient, a compound that specifically binds to KSRP or a functional fragment thereof, and a screening method for the compound. KSRP is a novel target protein for anticancer agents; a compound capable of regulating the expression and activity of such a protein and a pharmaceutical composition containing it are highly useful for proliferative diseases, particularly as anticancer agents. By providing the novel target protein, the mechanism behind the anticancer effect that has conventionally been unexplainable can be elucidated.

Abstract: Sulfonate salts have the formula: R1COOCH2CH2CF2CF2SO3?M+ wherein R1 is alkyl, aryl or hetero-aryl, M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.

Abstract: Provided is a new organic-acid-based catalyst enabling production of a polyhydroxycarboxylic acid by direct dehydration polycondensation of a hydroxycarboxylic acid such as L-lactic acid, specifically, an organic-acid-based catalyst comprising an amine salt of a sulfonic acid or a phosphine salt of a sulfonic acid for production of polyhydroxycarboxylic acids such as poly-L-lactic acid.

Abstract: Sulfonate salts have the formula: CF3—CH(OH)—CF2SO3?M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Because of inclusion within the molecule of a hydroxyl group which is a polar group, the sulfonic acids are effective for restraining the length of acid diffusion through hydrogen bond or the like. The photoacid generators that generate these sulfonic acids perform well during the device fabrication process including coating, pre-baking, exposure, post-exposure baking, and developing steps. The photoacid generators are little affected by water left on the wafer during the ArF immersion lithography.

Abstract: The present invention provides aqueous sizing compositions for application to glass fibers as well as polymeric resins reinforced with glass fibers at least partially coated with the aqueous sizing compositions. In some embodiments, sizing compositions of the present invention demonstrate advantageous properties resulting from the presence of an acid-amine component therein.

Abstract: A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation: Z—A—X—B—R—(Y)n??(I) wherein Z represents an organic acid group; A represents a divalent linking group; X represents a divalent linking group having a hetero atom; B represents an oxygen atom or —N(Rx)—; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted with Y, and when B represents —N(Rx)—, R and Rx may be bonded to each other to form a cyclic structure; Y represents —COOH or —CHO, and when a plurality of Y's are present, the plurality of Y's may be the same or different; and n represents an integer of from 1 to 3.

Abstract: By using protonic acids, diesters of dicarbonic acid may be stabilized against thermal and chemical decomposition over a relatively long period. Mixtures of diesters of dicarbonic acid and protonic acids are outstandingly suitable for preserving foods.

Abstract: A thermal acid generator of generating an acid on heating above 100° C. has formula: CF3CH(OCOR)CF2SO3?(R1)4N+ wherein R is alkyl or aryl, R1 is hydrogen, alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or R1 may bond together to form a ring with N. The sulfonic acid generated possesses an ester site within molecule so that less bulky acyl groups to bulky groups may be incorporated therein. The thermal acid generator provides a sufficient acid strength, is less volatile due to a high molecular weight, and ensures film formation. Upon disposal of used resist liquid, it may be converted into low accumulative compounds.

Abstract: Sulfonate salts have the formula: CF3—CH(OCOR)—CF2SO3?M+ wherein R is C1-C20 alkyl or C6-C14 aryl, and M+ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.

Abstract: The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.

Abstract: A recycling process is presented to treat spent waste acid solutions whereby useful products are produced. Spent waste acid containing inorganic and organic contaminants is mixed with a magnesium compound containing aluminum and iron compounds that form oxyhydroxide flocs that complex, react, sequester and/or co-precipate the contaminates from the admixture. The magnesium reacts with sulfate ions to form a high quality magnesium sulfate solution.

Abstract: A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7? to R9? each independently represents an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X? represents an anion.

Abstract: A method for preparing a thermoplastic composition containing an antistatic agent is described. The antistatic agent is a phosphonium sulfonate salt that is prepared by a method that includes combining in an aqueous medium sodium hydroxide and/or lithium hydroxide, a sulfonyl fluoride compound, and a phosphonium halide compound; and separating the phosphonium sulfonate from the aqueous medium. The phosphonium sulfonate salt is then combined with a thermoplastic resin.

Abstract: A method of treating a hydrocarbon containing formation is described. The method includes providing a hydrocarbon recovery composition to the hydrocarbon containing formation. The hydrocarbon recovery composition includes a branched internal olefin sulfonate having an average carbon number of at least 15 and an average number of branches per molecule of at least about 0.8.

Abstract: A process for working up ?-sulfatoethylsulfonylaniline-2-sulfonic acid from a solution in aqueous sulfuric acid, comprises a first step of the ?-sulfatoethylsulfonylaniline-2-sulfonic acid being precipitated by addition of alkali or alkaline earth metal and/or ammonium salts, separated off and dissolved or the sulfuric acid being precipitated by addition of calcium salts and the resulting calcium sulfate being separated off if appropriate, and a second step of the resultant solution being adjusted to a pH between 1 and 5 by addition of alkali or alkaline earth metal or ammonium hydroxide, carbonate, bicarbonate and/or acetate, any calcium sulfate still present being separated off and the ?-sulfatoethylsulfonylaniline-2-sulfonic acid being isolated from the solution.

Abstract: Alkyl ether sulfates having 1 to 9 carbon atoms in the alkyl chain and 1 to 20 alkyleneoxy units in the ether moiety are suitable for use as low-foam additives for enhancing the activity of water-soluble or partially water-soluble agrochemicals. They can be used to produce low-foam preparations for crop protection.

Abstract: This invention relates new and improved processes for the preparation of arylalkylsulfonic acids derived from aromatic or substituted aromatic molecules and AOS acid (generally a mixture of alkenesulfonic acid and sultones, produced from the sulfonation of alpha olefins) and to cleaning compositions comprising said arylalkylsulfonic acids. The invention involves the use of a superacid catalyst to effectuate the conversion of AOS acid and aromatic reactants to arylalkylsulfonic acid under substantially anhydrous conditions, whereby a substantial improvement in the rate of conversion of the reactants to arylalkylsulfonic acid and/or improvement in mono-alkylation selectivity is realized, as compared to methods of preparation previously disclosed. Also useful as an alkylation promoter is the arylalkylsulfonic acid reaction product itself, produced in situ or from a previous reaction (i.e., a self-catalyst heel).

Abstract: A method for making the phosphonium sulfonate salt of generic formula (1): wherein each X is independently a halogen or hydrogen, provided that the molar ratio of halogen to hydrogen is greater than about 0.90; p is 0 or 1 and q and r are integers of 0 to about 7 provided that q+r is less than 8 and that if p is not zero then r is greater than zero; and each R is the same or different hydrocarbon radical containing 1 to about 18 carbon atoms, the method comprising combining in an aqueous medium a compound of generic formula (2): wherein M is Li or Na, and X, q, p, and r are as defined above, with a stoichiometric excess of a compound of the generic formula (3): (R)4P-Z??(3) wherein Z is a halogen and R is as defined above; and separating the product of formula (1) from the medium.

Abstract: Compounds of the formulae I, II and III wherein R1 is for example hydrogen, C3–C8cycloalkyl, C1–C12alkyl, phenyl unsubstituted or substituted; R2 and R2? for example are hydrogen, C1–C20alkyl, C3–C8cycloalkyl or phenyl, unsubstituted or substituted, or are Ar1 is for example phenyl, optionally substituted by e.g. Ar2 is for example phenylene, optionally substituted e.g. by —(CO)R7, (D), (E) or (F); Ar3 is for example phenyl; M1, M2 and M3 are, for example, C1–C20alkylene; M4 is for example direct bond, —O—, —S—, —Y—(C1–C10alkylene)-Y?—, optionally substituted; Y and Y? are for example a direct bond or —O—; R7 is for example hydrogen, C1–C20alkyl or phenyl, optionally substituted; R8, R9, R8? and R9? are for example hydrogen or C1–C12alkyl, exhibit an unexpectedly good performance in photopolymerization reactions.