Abstract: The application provides an apparatus, a system, a detector and a detection method for power supply voltage detection.

Abstract: An advanced process control system including a first process tool, a second process tool, and a measurement tool is provided. The first processing tool is configured to process each of a plurality of wafers by one of a plurality of first masks, and provide a first process timing data. The second processing tool is configured to process the wafer processing by the first process tool by one of a plurality of second masks to provide a plurality of works. The second process tool provides a measurement trigger signal according to the first process timing data. The measuring tool is configured to determine whether to perform a measuring operation on each works in response to the measurement trigger signal, and correspondingly provide a measurement result.

Abstract: A dynamic experimentation evaluation system provides a framework in which a continuous stream of metric data is monitored to establish a causal relationship between changes in a software program and the effect of user-observable behavior. In one aspect, an A/B test is performed continuously on a stream of metric data representing the usage of a control version of software product and the usage of a treatment version of the software product. A sequential probability ratio test (SPRT) is used as the test statistic to determine when to terminate the test and produce results within a specific confidence interval and controlled error rate.

Abstract: A power receiving apparatus includes a measurement unit that measures a first received voltage value from a power transmitting apparatus, which has a detection function for detecting an object as being different from a power receiving apparatus, based on a difference between power transmitted by the power transmitting apparatus and power received by the power receiving apparatus, as well as a first request unit that requests the power transmitting apparatus to adjust the transmitted power, a measurement unit that measures a second received voltage value from the power transmitting apparatus after the requesting, a determination unit that determines whether calibration process regarding the detection function is necessary, based on details of an adjustment of the transmitted power and the difference between the first and second received voltage values, and a request unit that requests the power transmitting apparatus to terminate power transmission and requests the power transmitting apparatus to perform the c

Abstract: First and second metrology data are used to train a machine-learning model to predict metrology data for a metrology target based on metrology data for a device area. The first metrology data are for a plurality of instances of a device area on semiconductor die fabricated using a fabrication process. The second metrology data are for a plurality of instances of a metrology target that contains structures distinct from structures in the device area. Using the trained machine-learning model, fourth metrology data are predicted for the metrology target based on third metrology data for an instance of the device area. Using a recipe for the metrology target, one or more parameters of the metrology target are determined based on the fourth metrology data. The fabrication process is monitored and controlled based at least in part on the one or more parameters.

Abstract: A produce freshness sensor inexpensive enough to be discarded after each produce use, and multi-functional that is affixed to the produce by the grower that monitors parameters that affects produce freshness (to measure color and chemical composition), the sensor being used throughout the produce distribution system. A sensor monitors produce freshness and comprises one or more emitters, a temperature sensor, a microprocessor, and a transceiver mounted on a printed circuit board. The sensor is affixed relative to the produce. Power usage is critical to prolong operational time of the temperature sensor. Data collection and transmission are controlled to minimize run time and power usage. An initial baseline is established when the sensor is affixed relative to the produce, the start time and baseline measurements being recorded relative to the baseline. The real-time information is subsequently processed to provide analysis and relevant data to users throughout the produce distribution system.

Abstract: The present disclosure provides an image capturing apparatus, an electronic equipment, and a terminal. The image capturing includes: a light-transmitting cover plate; a light source module disposed below a first surface of the light-transmitting cover plate; at least one sensing module including a mask layer and a sensor component, wherein the sensor component has a first surface and a second surface opposite to each other, the first surface of the sensor component is disposed opposite to the mask layer and the second surface of the sensor component is a photosensitive surface, and the mask layer is made of an opaque material; a catadioptric component having a first surface and a second surface opposite to each other, wherein the sensor component is disposed on the first surface of the catadioptric component. With technical solution of the present disclosure, the imaging effect of the image capturing apparatus can be improved.

Abstract: According to an embodiment of the disclosure, there is provided an electronic device including: an optical element that is fixed and is configured to split incident light reflected from an object into two or more incident light beams traveling along two or more light paths; an optical sensor that is spaced a separation distance from the optical element such that the split incident light beams form an interference area on a light receiving surface and is configured to detect the incident light; and at least one processor configured to determine state information about the object based on similarity between a first spectrum acquired from the detected incident light and at least one reference spectrum.

Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.

Abstract: A method of manufacturing a light source carrier with at least one light source, including: providing a substrate with a plurality of light source groups disposed thereon, wherein each light source group includes the at least one light source; irradiating a first light upon one of the light source groups through a first mask; capturing a photoluminescent light emitted by the one of the light source groups to acquire data; comparing the data with a reference to determine whether the one of the light source groups is qualified; providing a carrier; and transferring the one of the light source groups from the substrate to the carrier if the one of the light source groups is qualified.

Abstract: A tangible, non-transitory, machine-readable medium includes instructions that, when executed by a processor, cause the processor to determine an active operating condition of the heating, ventilation, and/or air conditioning (HVAC) system based on the active operating data related to the HVAC system, retrieve an existing service log having a maintenance procedure corresponding to the active operating condition of the HVAC system, and record an entry service log. The entry service log includes the active operating data, the active operating condition, and an updated version of the maintenance procedure corresponding to the active operating condition.

Abstract: A method for forming a Data Matrix Code or like two dimensional code on a beverage can tab uses a laser having a focal ratio of between 40 and 70 to produce spots having an average diameter of between 200 and 400 microns. The code is smaller than 6 mm by 6 mm, at least 12 modules by 12 modules, and smaller than 21 modules by 21 modules, thereby providing sufficient quantity of unique codes for use with commercial beverage can quantities. Preferably each module is formed by one laser spot. Alternatively, nine spots may be used to form a module.

Abstract: A computer system for seeding a formulation engine receives spectrometric data from a target coating. The computer system processes the spectrometric data through a probabilistic colorant analysis. The probabilistic colorant analysis generates a set of colorants. Each colorant within the set of colorants is associated with a calculated probability that the associated colorant is present within the target coating. Additionally, the computer system adds at least a portion of the colorants within the set of colorants to a formulation engine. The portion of the colorants is added to the formulation engine in order of decreasing probability. Further, the computer system generates, from an output of the formulation engine, a coating formulation that is calculated to match the target coating within a predetermined qualitative threshold.

Abstract: A health condition of a person may be assessed from a thermal sensor signal. By increasing performance indices of a thermal camera (for example, resolution, frame rate, sensitivity), operation may be extended to identification verification, biometric data extraction and health condition analysis, and so forth. Prediction may be carried out by monitoring a time sequence of thermal images, and consequently early warning of the health condition may be provided. The apparatus may be used for, but not limited to, personalization of smart home devices through supervised and reinforcement learnings. The application of the apparatus may be, but not limited to, smart homes, smart buildings and smart vehicles, and so forth.

Abstract: A production system includes a cell control apparatus that is connected to a machine control apparatus and an inspection control apparatus. The cell control apparatus includes a storage part that stores data on a state of the manufacturing machine, data on an environment state, and data on an inspection result of a product. The cell control apparatus includes a correlation analysis part that selects a variable relating to an abnormality based on a correlation between the inspection result of the product, and the data on the state of the manufacturing machine and the data on the environment state when the abnormality occurs in the inspection result, and a determination value setting part that sets a determination value of the variable relating to the abnormality.

Abstract: A method of forming an integrated device includes: pre-storing a plurality of via pillars in a storage tool; arranging a first via pillar selected from the plurality of via pillars to electrically connect to a circuit cell in a first circuit; analyzing electromigration (EM) information of the first circuit to determine if the first via pillar induces an EM phenomenon; arranging a second via pillar selected from the plurality of via pillars to replace the first via pillar of the circuit cell to generate a second circuit when the first via pillar induces the EM phenomenon; and generating the integrated device according to the second circuit.

Abstract: A method and system of displaying an operational status of a set of mobile devices deployed on multiple floors of an indoor facility in extreme ambient conditions. The method, executed in a processor of a server computing device, comprises localizing a first mobile device and at least a second mobile device to a location on a first of the multiple floors and a second of the multiple floors respectively, based at least partly on respective filtered sets of barometric ambient pressure measurements obtained at the first and at least a second mobile devices, and displaying, based on the localizing, a layout map of the multi-floor building that includes the first mobile device and the second mobile device positioned within the first and the second of the multiple floors respectively.

Abstract: Methods and systems for solving measurement models of complex device structures with reduced computational effort are presented. In some embodiments, a measurement signal transformation model is employed to compute transformed measurement signals from coarse measurement signals. The transformed measurement signals more closely approximate a set of measured signals than the coarse measurement signals. However, the coarse set of measured signals are computed with less computational effort than would be required to directly compute measurement signals that closely approximate the set of measured signals. In other embodiments, a measurement signal transformation model is employed to compute transformed measurement signals from actual measured signals. The transformed measurement signals more closely approximate the coarse measurement signals than the actual measured signals.

Abstract: Techniques for providing improved typeahead features are described. According to various embodiments, it is determined that a user has specified, via a user interface, a first metric term. A list of one or more suggested operators associated with the first metric term is then generated and displayed, and it is determined that the user has selected one of the suggested operators. Thereafter, a list of one or more suggested metric terms associated with the selected operator is generated and displayed, and it is determined that the user has selected a second metric term from the suggested metric terms. Thereafter, a custom metric definition data entity that references information defining a custom metric is generated, the information specifying that metric values associated with the custom metric are generated by processing metric values associated with the first metric term and the second metric term based on the selected operator.

Abstract: A method and a computing system for performing the method. At least two microstates of at least two components of a computing system are organized into at least two macrostates of the computing system. Each microstate represents a state that a component of the computing system is able to individually enter. Each macrostate represents a state that the computing system is able to enter as a whole. The macrostates are organized into attractors. Each attractor is a stable state in which the computing system is stable. An attractor separation map is constructed. The attractor separation map indicates how the attractors are separated from one another by at least two hamming distances. Each hamming distance is a number of bits that differ between two attractors.

Abstract: A cancer cell detection system includes a sample holder, a laser light source, a light detector, and a determine module. The sample holder holds a cell measurement component having metal nanoparticles, and a cell sample is on the cell measurement component. The laser light source illuminates the cell sample. The light detector detects a surface enhanced Raman scattering signal of the cell sample. The determine module selectively determines if the cell sample includes a cancer cell according to a signal intensity of a valid signal in a first Raman peak and a signal intensity of a valid signal in a second Raman peak. The first Raman peak is the signal position of the ring breathing mode of adenine, and the second Raman peak is the signal position of the stretching mode of adenine.

Abstract: Various embodiments provide systems, computer program products and computer implemented methods. In some embodiments, a system includes a computer-implemented method of determining a laterally diffuse dopant profile in semiconductor structures by providing first and second semiconductor structures having plurality of gate array structures in a silicided region separated from each other by a first distance and second distance. A potential difference is applied across the plurality of gate array structures and resistances are determined. A linear-regression fit is performed on measured resistance versus the first distance and the second distance with an extrapolated x equals 0 and a y-intercept to determine a laterally diffused dopant-profile under the plurality of gate array structures based on a semiconductor device model.

Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.

Abstract: An apparatus for production of a gypsum product is provided which comprises a conveyer comprising a conveyer belt and means for rotating the conveyer belt; means for forming a gypsum product; and at least one laser scanner positioned over the conveyer belt at the location where the scanner scans at least one edge of the gypsum product which is at least partially set; and the laser scanner is in communication with a processor. Methods for forming a gypsum product with the apparatus are provided as well.

Abstract: The present invention relates to a method for transforming an initial progressive ophthalmic surface which has to be manufactured by a manufacturing method, the transformation method comprising: a step of selecting a manufacturing method intended to be implemented, in which said manufacturing method introduces a reproducible surface defect, a step of selecting a predictive model of said reproducible surface defect, a step of selecting an initial progressive ophthalmic surface S intended to be manufactured, a step of determining (S1), during which there is determined, by means of said predictive model, a surface defect value D which would be introduced if the initial progressive ophthalmic surface S were produced by said manufacturing method, a transformation step (S2), during which said initial progressive ophthalmic surface S is transformed into a transformed progressive ophthalmic surface S* by compensating the defect value D determined during the step (S1), such that the subsequent manufacture of the tr

Abstract: Method for determining the values of a set of n optical parameters (P1, P2, . . . , Pn) of an ophthalmic lens, n being an integer greater than or equal to 1, the method comprising: an nominal ophthalmic lens data providing step, an ophthalmic lens providing step, an optical surface measuring step, a surface errors determining step during which a set of m surface error parameters (?1, ?2, . . .

Abstract: A full-automatic detecting system and method for a transformer. The system comprises a material delivery line; a feed device; a detection delivery line; insulating test devices; error detecting devices; a laser marking device; a discharge device; and a detection management system. The insulating test devices, the error detecting devices, and the laser marking device are sequentially arranged beside the detection delivery line. The material delivery line, the detection delivery line, and the devices work in coordination, to realize full-automatic detection of the transformer, avoid manual detection errors and improve the sorting accuracy.

Abstract: Electromagnetic modeling of finite structures and finite illumination for metrology and inspection are described herein. In one embodiment, a method for evaluating a diffracting structure involves providing a model of the diffracting structure. The method involves computing background electric or magnetic fields of an environment of the diffracting structure. The method involves computing scattered electric or magnetic fields from the diffracting structure using a scattered field formulation based on the computed background fields. The method further involves computing spectral information for the model of the diffracting structure based on the computed scattered fields, and comparing the computed spectral information for the model with measured spectral information for the diffracting structure. In response to a good model fit, the method involves determining a physical characteristic of the diffracting structure based on the model of the diffracting structure.

Abstract: A system (1010, 1110) for identifying a landmark is disclosed. The system includes a field generator (1016, 1116) for generating a magnetic field, an orthopaedic implant (1030, 1130) located within the magnetic field, the implant having at least one landmark (1028, 1128), a removable probe (1029, 1129) with a first magnetic sensor (1026, 1126), a landmark identifier (1016, 1116) with a second magnetic sensor (1020, 1120) and a processor (1012, 1112) for comparing sensor data from the first and second sensor and using the set distance to calculate the position of the landmark identifier relative to the at least one landmark. The system allows for blind targeting of one or more landmarks.

Abstract: A method for comparing systems includes running, simultaneously, a first system and a second system, wherein the first system and the second system process events, collecting first data from the first system based on the processing of the events, collecting second data from the second system based on the processing of the events, wherein the second system includes at least one feature different than the first system, and performing a sequential probability ratio test based on the first data and the second data.

Abstract: A process of measuring overlay metrologies of wafers, the wafer having a plurality of patterned layers. The process begins with retrieving historical overlay metrologies from a database, and real overlay metrologies of a first group of the wafers are measured. On the other hand, virtual overlay metrologies of a second group of the wafers are calculated with the retrieved historical overly metrologies. The real overlay metrologies of the first group of the wafers and the virtual overlay metrologies of the second group of the wafers are stored to the database as the historical overlay metrologies.

Abstract: Provided is a method for controlling a fabrication cluster using an optical metrology system that includes an optical metrology tool, an optical metrology model, and a profile extraction algorithm. The method comprises: selecting a number of rays for the illumination beam, selecting beam propagation parameters, using a processor, determining beam propagation parameters from the light source of the to the sample structure, determining the beam propagation parameters from the sample structure to the detector, calculating intensity and polarization of each ray on the detector, generating a total intensity and polarization of the diffraction beam, calculating a metrology output signal from the total intensity and polarization, extracting the one or more profile parameters using the metrology output signal, transmitting at least one profile parameter to a fabrication cluster, and adjusting at least one process parameter or equipment setting of the fabrication cluster.

Abstract: Techniques for hard press rejection are described herein. In an example embodiment, a touch area on a sensor array is determined, where the touch area corresponds to a detected object and is associated with multiple signal values. A slope value for the detected object is computed based on a ratio of a signal distribution value in the touch area to a metric indicating a size of the touch area with respect to the sensor array. The slope value is compared to a threshold in order to determine whether to accept or to reject the detected object, and the detected object is rejected based on the comparison.

Abstract: Embodiments of the present invention provide an improved method and system for assessing non-uniformity of features in the measurement area (within the beam spot) on a semiconductor structure, (e.g. wafer), such as a non-uniform film thickness. The scattering from non-uniform features is modeled. Post-processing the residual of theoretical and collected spectra is performed to assess a measure of non-uniformity from within an incident spot beam of a spectrum acquisition tool.

Abstract: The invention relates to a test method for examining an inspection device, which is associated with a functional unit of a master unit, comprising at least the following steps: producing a specified number of faulty and/or correct containers or test containers by means of the functional unit itself in that a control signal for producing a distinctive element is fed to the functional unit; leading the faulty containers or test containers past the inspection device, which detects the faulty containers or test containers and produces a signal to discharge the faulty containers or test containers, or indicates a value regarding the expected and the measured faulty and/or correct containers. The test method is automatically started or performed and is suitable, for example, for examining a label position checking device, the filling amount checking unit, and the closure seating checking unit in order to be able to determine the fault-free functioning thereof or optionally the faulty functioning thereof.

Abstract: Identifying a damaged tool, including capturing, by an optical scanner, images of a manufactured part machined by the damaged tool; determining, from the captured images by a data processor operatively coupled to the scanner, measurements of the part; and determining, by the data processor based upon the measurements, that the tool is damaged.

Abstract: A system includes a measured value storing device in which a product measured value acquired periodically and a manufacturing condition measured value are stored, a product threshold value setting device that sets a product threshold value for determining whether a product is normal or not, an abnormality accumulating device that acquires a product abnormality cumulative frequency where the product abnormality measured value exceeds the product threshold value, a product threshold value changing device that changes the product threshold value, a condition threshold value setting device that sets a condition threshold value to be compared with a manufacturing condition measured value, a condition abnormality accumulating device that acquires a condition cumulative frequency, a condition threshold value changing device that changes a condition threshold value, and a cause identifying device that identifies a cause of abnormality based on the distribution of the product abnormality cumulative frequency and a man

Abstract: A method of inspecting a structure of a device and a system for doing the same is described. The method includes generating a sample image of a device having a structure to be inspected; identifying a plurality of features of the sample image; comparing the plurality of features to a corresponding plurality of features of a reference image; and locating features in the sample image that deviate from corresponding features of the reference image. The generating step includes moving the device, a detector array or both, relative to one another, wherein the detector array is configured to generate a line of data representing light reflected from the device, and assembling lines of data from the detector array to generate a sample image.

Abstract: A system and method of use is provided, relating to an analytical system in which a disposable unit configured to contain a plurality of test strips is inserted into a hand-held device, the test strips being successively presented at a measuring position by a drive provided with the device, wherein after a disposable unit is removed and replaced, the drive is activated to position the test strip that is first in order at the measuring position and it is determined whether the test strip is present, and if the first test strip is not present, the test strip that was presented last when the device was actuated is again positioned at the measuring position.

Abstract: The present invention provides a remote monitoring system for monitoring the operation of a fluid treatment system and/or the qualities, characteristics, properties, etc., of the fluid being processed or treated by the fluid treatment system. The system includes a remote computer that may be associated with a database that accesses data transmitted from the fluid treatment system with the data collected, acquired, etc., from one or more sensors placed in the fluid treatment system for measuring fluid quality and/or equipment operation in a fluid treatment system. The remote computer may then analyze or manipulate the data to generate an analysis result or analysis report that may be sent or communicated along with the data and/or any historical or expected information or data to a remote viewing device for viewing by a user. A method is further provided for the operation of the remote monitoring system of the present invention.

Abstract: A system and method for analyzing a product fabrication process are disclosed. A product yield analysis system according to an exemplary embodiment of the present disclosure includes a data extraction unit that extracts sensor data from a plurality of sensors arranged in equipment for fabricating a product, a reference signal generation unit that generates a reference signal for each of the plurality of sensors from the sensor data, and a sensor detection unit that detects one or more sensors having a correlation with a yield of the product using the sensor data and the reference signal.

Abstract: Disclosure herein is related to a method and a system for intelligent weak pattern diagnosis for semiconductor product, and a related non-transitory computer-readable storage medium. In the method, a weak pattern layout is firstly retrieved from a defect pattern library and a frequent failure defect pattern library; defect data is retrieved from fab defect inspection tool; a design layout is then received and weak defect pattern screen is performed to extract known and unknown weak defect patterns. In addition to updating the weak pattern library, the weak pattern contour can be made upon SEM image data, and then the true systematic weak pattern can be justified.

Abstract: A test apparatus that tests a plurality of devices under test formed on a wafer under test includes a test substrate that faces the wafer under test and is electrically connected to the devices under test, a programmable device that is provided on the test substrate and changes a logic relationship of output logic data with respect to input logic data, according to program data supplied thereto, a plurality of input/output circuits that are provided on the test substrate to correspond to the devices under test and that each supply the corresponding device under test with a test signal corresponding to the output logic data of the programmable device, and a judging section that judges pass/fail of each device under test, based on operation results of each device under test according to the test signal.

Abstract: Some embodiments of the present invention provide a system that determines whether a cooling device in a computer system is responsive to control signals. During operation of the computer system, a control signal is sent to the cooling device. Next, a response of the computer system to the control signal is measured, wherein the response includes a temperature profile. The frequency content of the control signal is then compared to the frequency content of the temperature profile to determine whether the cooling device is responsive to the control signal.

Abstract: A charged particle beam writing apparatus includes a storage unit configured to store writing data in which there are defined a plurality of figures and resizing information indicating, with respect to each of the plurality of figures, a resizing status whether or not to perform resizing and a resizing direction used when performing resizing, a judgment determination unit configured to input the writing data and judge, with respect to each of the plurality of figures, the resizing status whether or not to perform resizing and the resizing direction used when performing resizing, a resize processing unit configured to resize, with respect to each of the plurality of figures, a dimension of a figure concerned in a judged resizing direction when it is judged to perform resizing, and a writing unit configured to write a pattern onto a target workpiece with using a resized figure and a charged particle beam.

Abstract: A binning process uses curve fitting to create and assign one or more bins based on testing data of operating voltage versus leakage current for test integrated circuits. Each bin is created by assigning an initial operating voltage to the bin and fitting a curve to the testing data population. An equation is generated describing the fitted curve. Integrated circuits are binned by measuring the leakage current at a selected operating voltage and testing the integrated circuit at one or more operating voltages determined based on the fitted curves. The integrated circuits are assigned a maximum operating voltage that corresponds to the lowest tested operating voltage at which the integrated circuit passes the test.

Abstract: Automated provisioning of radiotelephone handsets 20 at a fulfillment center and automated quality assurance uses a computer database of specifications 16 for authentication and activation from multiple handset manufacturing vendors, radiotelephone service providers, and distributors. A universal interface system 10 is provided to efficiently access diverse makes and models of handsets. The handsets are attached to the interface system in accordance with a build request, checked to see if the attached handset matches the build request, and automatically provisioned via the interface in accordance with the build request.

Abstract: A system and a method for ESD testing are contained in an ESD testing system which is running on an electronic device. A storage unit of the electronic device pre-stores a layout file which includes a layout pattern having electrical traces, an ESD entry point, and mounted positions of multiple electronic elements. The ESD testing method obtains the layout file from the storage unit; displays the layout pattern on a display unit of the electronic device, simulates ESD in the ESD entry point of the displayed layout pattern, tests electrical characteristics of the electrical traces between the ESD entry point and the mounted positions of multiple electronic elements to determine whether the electrical characteristics of the electrical traces pass or fail the ESD test, and marks the electrical traces which fail the ESD test on the displayed layout pattern.

Abstract: Methods and systems for dynamic design attributes for wafer inspection are provided. One method includes, at run time of a wafer inspection recipe, prompting a user of a wafer inspection tool on which the wafer inspection recipe is performed for information for a design based binning (DBB) process. The information includes one or more formulae for calculating design attributes from a design for a wafer. The design attributes are used to bin the defects in the DBB process. The method also includes performing inspection of a wafer according to an updated wafer inspection recipe. Performing the inspection includes binning defects detected on the wafer according to the DBB process in the updated wafer inspection recipe.

Abstract: A factory control server stores module configuration data for modules. The modules include processes for producing a final product and have corresponding module requirements. The factory control server analyzes in real-time actual product output data that is generated by a final product tester after a factory produces at least one final product to determine whether the actual product output data meets an expected product output. The factory control server analyzes actual module data in real-time to determine a new module requirement to cause new actual product output data for a subsequent final product to meet the expected product output in response to a determination that the actual product output data does not meet the expected product output. The factory control server notifies a module controller in real-time of the new module requirement. The module controller changes parameters in real-time to manufacture the subsequent final product.