Patents Represented by Attorney Fletcher Yoder
  • Patent number: 6618854
    Abstract: The remotely accessible Integrated Debug Environment of this invention permits a user having only a computer and an Internet connection to remotely access an IDE configured for operating and debugging a selected target microprocessor or microcontroller. An IDE is set up, including a host computer which operates as a web server and as a target/debug controller. One or more target processors may be connected to the host computer, along with debug equipment, such as logic analyzers, ICE equipment, overlay memory, etc. The host computer includes toolsets that correspond to the available target processor(s). In order to execute or debug code on a selected target processor, a user connects to the host computer using a web browser, with which the user can determine the availability of target processors and other pertinent information.
    Type: Grant
    Filed: February 18, 1997
    Date of Patent: September 9, 2003
    Assignee: Advanced Micro Devices, Inc.
    Inventor: Daniel Peter Mann
  • Patent number: 6614874
    Abstract: The present technique provides a variety of processing schemes for decomposing soft tissue and bone images more accurately from low and high-energy images acquired from an imaging system, such as a dual-energy digital radiography system using flat-panel technology. In particular, a modified decomposition process is provided to mitigate noise and to reduce contrast artifacts, such as blooming, while decomposing soft tissue and bone images from low and high-energy images.
    Type: Grant
    Filed: January 28, 2002
    Date of Patent: September 2, 2003
    Assignee: GE Medical Systems Global Technology Company, LLC
    Inventor: Gopal B. Avinash
  • Patent number: 6607974
    Abstract: Annular and linear contact structures are described which exhibit a greatly reduced susceptibility to process deviations caused by lithographic and deposition variations than does a conventional circular contact plug. In one embodiment, a standard conductive material such as carbon or titanium nitride is used to form the contact. In an alternative embodiment, a memory material itself is used to form the contact. These contact structures may be made by various processes, including chemical mechanical planarization and facet etching.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: August 19, 2003
    Assignee: Micron Technology, Inc.
    Inventor: Steven T. Harshfield