Abstract: A recipe-and component control module (RACCM) is provided. The RACCM is a server for performing data management in a plasma processing system with a plurality of components. The RACCM includes a plurality of intelligent agents. Each intelligent agent of the intelligent agents is configured to interact with each component of the plurality of components. The RACCM also includes a coordinating agent, which is configured to receive processed data from the plurality of intelligent agents.

Abstract: A plasma processing system for processing a substrate is disclosed. The plasma processing system includes a gas distribution system. The plasma processing system also includes a gas flow control assembly coupled to the gas distribution system and configured to control a set of input gases provided by the gas distribution system. The plasma processing system further includes a first set of nozzles coupled to the gas flow control assembly and configured to supply a first set of gases for processing a first portion of the substrate. The plasma processing system further includes a second set of nozzles coupled to the gas flow control assembly and configured to supply a second set of gases for processing a second portion of the substrate.

Abstract: An apparatus generating a plasma for removing metal oxide from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the metal oxide.

Abstract: An electronic device having an enclosure is disclosed. The electronic device includes a hole disposed at least partially through the enclosure. The electronic device also includes a detector configured to provide at least one visual indication after being immersed in water. The detector may include a moisture-indicating portion and a light-permitting moisture-proof membrane. The detector may be disposed inside at least one of the enclosure and the hole such that at least a portion of the detector is visible through the hole from outside of the enclosure without dismantling or opening the electronic device. The distance between the light-permitting moisture-proof membrane and an opening of the hole in the enclosure may be less than the distance between the moisture-indicating portion and the opening of the hole.

Abstract: A user interface component for use in an electronic device is disclosed. The electronic device includes a first part and a second part. The user interface component may include a structural part configured to provide structural stiffness for the user interface component. The structural part may include an aperture. The aperture may allow a fastener to pass through the structural part to couple the first part with the second part without removing the structural part from the electronic device. The aperture may also allow the fastener to be removed from the electronic device through the structural part without removing the structural part from the electronic device. The user interface component may also include a cover detachably coupled with the structural part. The cover may cover the aperture and may receive user input.

Abstract: An apparatus generating a plasma for removing an edge polymer from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the edge polymer.

Abstract: A diagnostic tool for performing electrical measurements to calibrate a plasma processing chamber probe is provided. The diagnostic tool includes an RF generator. The diagnostic tool also includes a first impedance circuit. The first impedance circuit is a voltage-load network, configured to deliver RF voltage outputs from the RF generator for voltage measurements when RF power from the RF generator is delivered to the first impedance circuit. The diagnostic tool further includes a second impedance circuit. The second impedance circuit is a current-load network, configured to deliver RF current outputs from the RF generator for current measurements when the RF power from the RF generator is delivered to the second impedance circuit. The diagnostic tool further includes a coaxial switch network arrangement configured to provide switchable RF delivery paths to deliver the RF power from the RF generator to one of the first impedance circuit and the second impedance circuit.

Abstract: A latch mechanism for removably securing a module in a bay of an electronic device. The latch mechanism includes a first wireform configured to move along a first wall of the bay to latch a first side of the module and a tang configured to move substantially perpendicularly to a second side of the module to latch the second side of the module. The latch mechanism includes a control member operatively connected with the first wireform and the tang to actuate the first wireform and the tang simultaneously in response to user input such that when the module is inserted into the bay, the first wireform and the tang simultaneously latch the first side of the module and the second side of the module.

Abstract: A Universal Serial Bus socket-equipped arrangement (USB-SEA) configured for mating with a Universal Serial Bus (USB) plug having a plug metal housing and an aperture disposed in the plug metal housing. The arrangement includes a plug-receiving cavity configured to receive the USB plug. The arrangement further includes a spring-loaded mechanism disposed within the plug-receiving cavity. The spring-loaded mechanism is biased toward an interior region of the plug-receiving cavity. The spring-loaded mechanism is also configured to slide along the connector metal housing of the USB plug when the USB plug is inserted into the plug-receiving cavity and to movably mate with the aperture disposed in the plug metal housing when the USB plug is in a terminal mating position with the USB socket assembly. The spring-loaded mechanism represents one of a spring-loaded ball and a spring-loaded pin.

Abstract: A method and apparatus for improving the system response time when URL filtering is employed to provide security for web access. The method involves gathering the attributes of the user, and pre-populating a local URL-rating cache with URLs and corresponding ratings associated with analogous attributes from a URL cache database. Thus, the cache hit rate is higher with a pre-populated local URL rating cache, and the system response time is also improved.

Abstract: An optimized activation prevention assembly for a gas delivery system is disclosed. The apparatus includes a pneumatically operated valve assembly. The apparatus also includes a toggle switch mechanically attached to the pneumatically operated valve assembly, the toggle switch includes a toggle arm, the toggle arm being positioned in one of an activation zone and a deactivation zone, wherein when the toggle arm is positioned in the activation zone, the pneumatically operated valve is activated, and wherein when the toggle arm is positioned in the deactivation zone, the pneumatically operated valve is deactivated. The apparatus further includes an activation prevention mechanism attached to the toggle switch, wherein when the activation prevention mechanism being configured for preventing the toggle arm from being repositioned from the deactivation zone to the activation zone without at least bypassing a lockout function of the optimized activation prevention mechanism.

Abstract: A method of etching a substrate in a plasma processing chamber is disclosed. The method includes introducing the substrate having thereon an underlying layer, an anti-reflective layer above the underlying layer, and a photo-resist layer above the anti-reflective layer into the chamber. The method also includes flowing a gas mixture into the chamber, the gas mixture includes a flow of a hydrofluorocarbon gas, a flow of fluorocarbon gas, a flow of a halogen-containing gas other than the hydrofluorocarbon gas, and a flow of oxygen gas. The method further includes striking a plasma from the gas mixture. The method additionally includes etching at least through the anti-reflective layer with the plasma.

Abstract: Systems and methods for controlling a heater to drive a load temperature to approximate a setpoint. At the beginning of each ½ AC cycle, a sigma delta modulation algorithm is computed to determine whether the AC cycle should be turned on or off. The running estimate of the past actual duty cycle is compared to the desired output duty cycle, and the difference between the two is used to adjust the next ½ cycle's output. This results in a pseudo-random pulse sequence output which does not contain significant periodic components that could cause undesirable small periodic thermal ‘ripples’ on the element being heated.

Abstract: A plasma processing chamber for processing a substrate to form electronic components thereon is disclosed. The plasma processing chamber includes a plasma-facing component having a plasma-facing surface oriented toward a plasma in the plasma processing chamber during processing of the substrate, the plasma-facing component being electrically isolated from a ground terminal. The plasma processing chamber further includes a grounding arrangement coupled to the plasma-facing component, the grounding arrangement including a first resistance circuit disposed in a first current path between the plasma-facing component and the ground terminal. The grounding arrangement further includes a RF filter arrangement disposed in at least one other current path between the plasma-facing component and the ground terminal, wherein a resistance value of the first resistance circuit is selected to substantially eliminate arcing between the plasma and the plasma-facing component during the processing of the substrate.

Abstract: A token-assignment network implemented out of existing computers that are interconnected in an Ethernet network. The token-assignment mode ensures that each computer in the token-assignment network has a turn at transmitting, thus preventing starvation of any particular computer in the token-assignment network. In this manner, computers of the token-assignment network are able to continue functioning even during a virus outbreak, thereby enabling business to continue and/or virus remedial actions to be taken via the network.

Abstract: A communications network tap, comprises a first terminal and a second terminal adapted to couple the tap in-line in the network and communicate data packets with network devices. A heartbeat generator is configured to generate a heartbeat signal, and a heartbeat insert circuit coupled to the first terminal and the heartbeat generator and configured to insert the heartbeat signal into data packets. A third terminal is coupled to the heartbeat insert circuit and adapted to couple the tap to a network monitor and communicate data packets with network monitor. A heartbeat remove circuit is coupled to the third terminal and configured to receive data packets from a network monitor and remove the heartbeat signal from the data packets. A heartbeat detector coupled to the heartbeat remove circuit and configured to detect whether the data packets include the heartbeat signal, and if not, to generate an alarm signal. A switch is coupled to the second terminal and configured to transmit data packets onto the network.

Abstract: An apparatus for measuring a temperature of a substrate is disclosed. The apparatus includes a phosphor material in thermal contact to the substrate, the phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, the fluorescent response decaying at a decay rate that is related to a temperature of the phosphor material, and the phosphor material producing a first set of non volatile byproducts when exposed to a plasma.

Abstract: An apparatus for selectively pre-coating a plasma processing chamber, including a chamber wall is disclosed. The apparatus includes a first set of RF electrodes, the first set of RF electrodes configured to strike a first pre-coat plasma, the first set of RF electrodes defining a first plasma chamber zone. The apparatus also includes a first set of confinement rings disposed around the first set of RF electrodes; and a second set of confinement rings disposed between the first set of confinement rings and the chamber wall. The apparatus further includes a gas delivery system configured to apply a first pre-coat layer to the first plasma zone when a first pre-coat gas is delivered and the first set of RF electrodes is energized. The apparatus also includes the gas delivery system configured to apply a second pre-coat layer to the second plasma zone when a second pre-coat gas is delivered and the second set of RF electrodes is energized.

Abstract: A method of determining an endpoint of a process by measuring a thickness of a layer, the layer being deposited on the surface by a prior process is disclosed. The method includes providing a sensor that is coplanar with the surface, wherein the sensor is configured to measure the thickness. The method also includes exposing the plasma chamber to a plasma, wherein the thickness is changed by the exposing, and determining the thickness as a function of time. The method further includes ascertaining a steady state condition in the thickness, the steady state condition being characterized by a substantially stable measurement of the thickness, a start of the steady state condition representing the endpoint.

Abstract: In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.