Abstract: A method for processing a substrate in a plasma processing chamber. The substrate is disposed above a chuck and surrounded by an edge ring while the edge ring being electrically isolated from the chuck. The method includes providing RF power to the chuck and providing a edge ring DC voltage control arrangement. The edge ring DC voltage control arrangement is coupled to the edge ring to provide first voltage to the edge ring, with the edge ring potential being one of a positive potential, a negative potential and a ground. The method further includes generating a plasma within the plasma processing chamber to process the substrate. The substrate is processed while the edge ring DC voltage control arrangement is configured to cause the edge ring potential to be less than a DC potential of the substrate in an embodiment and to be substantially equal to the DC potential of the substrate in another embodiment.

Abstract: In embodiments of the present invention, hinge mechanisms for use in a portable computing device having a base and a lid are presented, the hinge mechanism including: a base link pivotally connected with a base such that the base link rotates about a first axis of rotation, the base link being in sliding communication with a lid; a lid link pivotally connected with the lid such that the lid link rotates about a second axis of rotation, the lid link being in sliding communication with the base; and a center pin pivotally connecting the base link with the lid link such that the base link and the lid link rotate about a third axis of rotation wherein the base link, the lid link, and the center pin cooperatively function to translate the lid over at least two planes of motion with respect to the base.

Abstract: A targeted data collection system configured to collect processing data in a plasma processing system is provided. The system includes a data collection host and a plurality of plasma processing components having a plurality of sensors such that each of the plurality of plasma processing components having at least one sensor. Each of the sensors implements at least one intelligent targeted data agent that governs sensor data collection behavior. The system further includes a communication network coupling data collection host and plurality of sensors for bi-directional communication such that a given sensor of plurality of sensors receive information from data collection host pertaining to plasma processing system conditions occurring elsewhere from given sensor.

Abstract: An active call handover arrangement for managing a handover between a plurality of telecommunication devices associated with a public extension number is provided. The arrangement includes a mobility server configured to manage a telecommunication session between a telecommunication device of a third-party caller and a first telecommunication device of the plurality of telecommunication devices. The arrangement also includes a switch component configured to be associated with at least one telecommunication device of the plurality of telecommunication devices. At least one telecommunication device is configured to include mobility client software. The switch component is also configured to enable a user to perform the handover between the first telecommunication device and a second telecommunication device of the plurality of telecommunication devices.

Abstract: An arrangement configured to contain plasma within plasma tube assembly of downstream microwave plasma system. Downstream microwave plasma system is configured to generate plasma within plasma-sustaining region of plasma tube assembly and channeling at least portion of plasma downstream to plasma processing chamber of downstream microwave plasma system. Arrangement includes a first hollow center electrically conductive disk surrounding a cylindrical structure that defines plasma passage of plasma tube assembly. Arrangement also includes a second hollow center electrically conductive disk also surrounding the cylindrical structure. Second hollow center electrically conductive disk is configured to be disposed in a spaced-apart relationship relative to first hollow center electrically conductive disk so as to form a first hollow center disk-shape interstitial region between first hollow center electrically conductive disc and second hollow center electrically conductive disc.

Abstract: A computer-implemented method for performing recipe evaluation is provided. The computer-implemented method includes integrating a plurality of data sources into a single recipe report card framework. The recipe report card framework includes an editor for interacting with the plurality of data sources. The computer-implemented method also includes displaying a plurality of graphical displays. Each graphical display of the plurality of graphical displays is configured to present a signal parameter of a set of signal parameters for at least a substrate. The computer-implemented method further includes providing a plurality of criteria for each of the set of signal parameters. The computer-implemented method yet also includes providing a plurality of ranges for the each of the set of signal parameters. The computer-implemented method yet further includes providing an expert guide, which is configured to provide guidance in analyzing a recipe.

Abstract: Parallel stacking mid-frame structural supports for use with a portable electronic device are presented including: a first side member; a second side member disposed substantially parallel to the first side member, the first member and the second member each configured with; a support feature for providing structural support when an applied load exceeding a predetermined threshold is exerted on the portable electronic device, and an attachment feature; a third side member mechanically contiguous with and disposed substantially perpendicular to the first side member; and a fourth side member mechanically contiguous with and disposed substantially perpendicular to the first side member. In some embodiments, the mid-frame structural support also includes: a first number of rib supports for supporting a printed circuit board (PCB), and a second number of rib supports for supporting the PCB. In some embodiments, the predetermined threshold is approximately 800 grams.

Abstract: A plasma system is disclosed. The plasma system includes a microwave waveguide assembly having a longitudinal axis parallel with a first axis. The plasma system also includes a plasma tube assembly intersecting the microwave waveguide assembly. The plasma tube assembly has a longitudinal axis parallel with a second axis that is substantially orthogonal with the first axis. The plasma tube assembly also has a plasma-sustaining region defined by an upstream plurality of plasma traps and a downstream plurality of plasma traps.

Abstract: A computer-implemented method of coupling a user interface device (UID) with a system device. The UID and system device are coupled with heterogeneous UID switches. The method includes providing a switch command server (SCS), which is in electronic communication with UID switches. The method also includes receiving at the SCS a switch/location agnostic connectivity indication (SLACI), which indicates a desire to provide a complete data path between the UID and system device. The method further includes performing protocol negotiation, using the SCS and SLACI to ascertain at least one available data path between the UID and system device. The method additionally includes formulating switch commands, which instruct the UID switches to connect the UID and system device to form the complete data path. The method yet further includes transmitting switch commands from the SCS to the UID switches, thereby causing UID switches to connect the UID with the system device.

Abstract: A method for performing a handoff for a mobile device from a first radio station to a second radio station. The method includes buffering a first media data set that is received through the first radio station. The method also includes cross-correlating a tail portion of the first media data set and a head portion of a second media data set to generate a cross-correlated media data set, if the second media data set is received through the second radio station. The method further includes synthesizing, using a modeled portion of the first media data set, a synthesized media data set, if no media data is received through the second radio station within a threshold. The method further includes extending the first media data set to generate an extended media data set, if no media data is received through the second radio station at the threshold.

Abstract: A Universal Serial Bus socket-equipped arrangement (USB-SEA) configured for mating with a Universal Serial Bus (USB) plug having a plug metal housing and an aperture disposed in the plug metal housing. The arrangement includes a plug-receiving cavil configured to receive the USB plug. The arrangement further includes a spring-loaded mechanism disposed within the plug-receiving cavity. The spring-loaded mechanism is biased toward an interior region of the plug-receiving cavity. The spring-loaded mechanism is also configured to slide along the connector metal housing of the USB plug when the USB plug is inserted into the plug-receiving cavity and to movably mate with the aperture disposed in the plug metal housing when the USB plug is in a terminal mating position with the USB socket assembly. The spring-loaded mechanism represents one of a spring-loaded ball and a spring-loaded pin.

Abstract: A method for affecting a creation of a recipe for processing a substrate in a processing system. The method includes providing a best-known method driven recipe editor. The best-known method driven recipe editor incorporates best-known methods (BKMs), which are best practice specifications for the recipe. The method also includes creating a plurality of BKM modules based on the BKMs for the recipe. The method further includes defining rules for parameters in the plurality of BKM modules. The rules are propagated by the BKMs. The methods moreover includes creating a BKM driven recipe by employing the best-known method driven recipe editor to enter values for the parameters within the guidelines of BKM rules.

Abstract: A housing for accommodating one or more riser cards is disclosed. The one or more riser cards include a first riser card. The first riser card may be configured to carry at least a first component. The housing may include a first inlet side configured to allow first air to flow into the housing for cooling the first component. The housing may also include an outlet side configured to allow at least a first portion of the first air to flow away from the housing. The housing may be configured to be disposed inside an enclosure of an electronic device. At least one of the first inlet side and the outlet side may include a first guiding structure configured to guide movement of the first riser card relative to the housing.

Abstract: A method for configuring a plasma cluster tool is disclosed. The method includes generating a key file from option specifications, the key file encapsulating configuration restrictions specifically imposed on the plasma cluster tool. The method also includes generating at least one system-wide configuration file and at least one component-level configuration file using the key file. The method additionally includes generating run-time executable objects from a database of option definition files, the at least one system-wide configuration file and the at least one component-level configuration file. Furthermore, the method includes employing the run-time executable objects to configure the plasma cluster tool.

Abstract: A method of determining a parameter of interest during processing of a patterned substrate includes obtaining a measured net reflectance spectrum resulting from illuminating at least a portion of the patterned substrate with a light beam having a broadband spectrum, calculating a modeled net reflectance spectrum as a weighted incoherent sum of reflectances from different regions constituting the portion of the patterned substrate, and determining a set of parameters that provides a close match between the measured net reflectance spectrum and the modeled net reflectance spectrum. For wavelengths below a selected transition wavelength, a first optical model is used to calculate the reflectance from each region as a weighted coherent sum of reflected fields from thin film stacks corresponding to laterally distinct areas constituting the region. For wavelengths above the transition wavelength, a second optical model based on effective medium approximation is used to calculate the reflectance from each region.

Abstract: A high-speed communications network tap includes a first terminal and a second terminal adapted to couple the tap in-line in the network and communicate data with network devices. A duplicator is coupled to the first terminal and the second terminal and configured to duplicate the data as a copy of the data. A processor is coupled to the duplicator and to a third terminal, and is configured to receive the copy of the data from the duplicator and to provide the data to the third terminal. The third terminal is adapted to couple the tap to a network monitor and send data to the network monitor. Advantages of the invention include the ability to duplicate high-speed communication network data for monitoring in an essentially zero delay.

Abstract: A method in a plasma processing system for etching a feature through a dielectric layer of a dual damascene stack on a semiconductor substrate is disclosed. The method includes placing the substrate in a plasma processing chamber of the plasma processing system. The method further includes flowing an etchant gas mixture into the plasma processing chamber, the etchant gas mixture being configured to etch the dielectric layer. The method additionally includes striking a plasma from the etchant source gas. The method also includes etching the feature through the dielectric layer while applying a bias RF signal to the substrate, the bias RF signal having a bias RF frequency of between about 27 MHz and about 90 MHz. The bias RF signal further has a bias RF power component that is configured to cause the feature to be etched in accordance to predefined etch rate parameters and etch profile parameters at the bias RF frequency.

Abstract: A method in a plasma processing system for etching a feature through a given layer on a semiconductor substrate. The method includes placing the substrate in a plasma processing chamber of the plasma processing system. The method also includes flowing an etchant gas mixture into the plasma processing chamber, the etchant gas mixture being configured to etch the given layer. The method additionally includes striking a plasma from the etchant source gas. Furthermore, the method includes etching the feature at least partially through the given layer while applying a bias RF signal to the substrate, the bias RF signal having a bias RF frequency of between about 45 MHz and about 75 MHz. The bias RF signal further has a bias RF power component that is configured to cause the etch feature to be etched with an etch selectivity to a second layer of the substrate that is higher than a predefined selectivity threshold.

Abstract: Circuitry and techniques for managing a power supply are disclosed. A processor-controlled switch is employed to control the delivery of power to conductors that provide power to an external electronic device wherein the processor controls the switch opening and the switch opening based not only on contemporaneous parameter measurements but also on state information known to the processor. The management circuit can control the power supply without requiring the use of an additional sense wire between the management circuit and the external electronic device.

Abstract: An apparatus for measuring a temperature of a substrate is disclosed. The apparatus includes a phosphor material in direct contact with the substrate and in thermal contact with the substrate, the phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, the fluorescent response decaying at a decay rate that is related to a temperature of the phosphor material, and the phosphor material producing a first set of non volatile byproducts when expose to a plasma.