Patents Represented by Attorney Janah & Associates
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Patent number: 8349294Abstract: Microparticle compositions comprising metal ion-lipid complexes for drug delivery are described including methods of making the microparticle compositions and methods of treating certain conditions and disease states by administering the microparticle compositions. The metal ion-lipid complexes can be combined with various drugs or active agents for therapeutic administration. The microparticle compositions of the present invention have superior stability to other microparticle compositions resulting in a microparticle composition with longer shelf life and improved dispersability. The microparticle compositions of the present invention have a transition temperature (Tg) of at least 20° C. above the recommended storage temperature (Tst) for drug delivery.Type: GrantFiled: December 14, 2010Date of Patent: January 8, 2013Assignee: Novartis AGInventors: Luis A Dellamary, Jean Riess, Ernest G Schutt, Jeffry G Weers, Thomas E Tarara
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Patent number: 8343881Abstract: A silicon dioxide layer is deposited onto a substrate using a process gas comprising BDEAS and an oxygen-containing gas such as ozone. The silicon dioxide layer can be part of an etch-resistant stack that includes a resist layer. In another version, the silicon dioxide layer is deposited into through holes to form an oxide liner for through-silicon vias.Type: GrantFiled: June 4, 2010Date of Patent: January 1, 2013Assignee: Applied Materials, Inc.Inventors: Yong-Won Lee, Vladimir Zubkov, Mei-Yee Shek, Li-Qun Xia, Prahallad Iyengar, Sanjeev Baluja, Scott A Hendrickson, Juan Carlos Rocha-Alvarez, Thomas Nowak, Derek R Witty
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Patent number: 8337895Abstract: The present invention provides exemplary systems and methods for producing dry powder formulations. In one embodiment, a system (10) includes at least one conditioning zone (12) having an inlet (20) to introduce an atomized formulation (18) into the conditioning zone. A controller (14, 16) controls temperature and relative humidity of the airflow into the conditioning zone to allow amorphous-to-crystalline transformation of the atomized formulation. In another embodiment, the formulation is suspended in the conditioning zone for a residence time of sufficient duration to allow surface orientation of surface active components. A dryer (24) is coupled to the conditioning zone to dry the atomized formulation, and a collector (28) collects the formulation in powder form.Type: GrantFiled: July 29, 2009Date of Patent: December 25, 2012Assignee: Novartis AGInventors: David B Bennett, Thomas K Brewer, Robert M Platz, Herman Snyder
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Patent number: 8338809Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.Type: GrantFiled: June 20, 2011Date of Patent: December 25, 2012Assignee: Applied Materials, Inc.Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
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Patent number: 8293085Abstract: A cartridge for an ion exchanging electrochemical cell, the cartridge comprising at least one spiral wound, textured, bipolar ion exchange membrane having (i) an anion exchange layer abutting a cation exchange layer with continuous contact between the anion exchange layer and the cation exchange layer; and (ii) an exposed textured surface having a pattern of texture features. A method of manufacturing a cartridge for an ion exchange electrochemical cell comprises winding the textured, bipolar ion exchange membrane into a spiral wound membrane.Type: GrantFiled: August 23, 2010Date of Patent: October 23, 2012Assignee: Pionetics CorporationInventors: John Hawkins, Eric Nyberg, George Kayser, James Holmes, Paul Schoenstein, Ashok Janah
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Patent number: 8283237Abstract: A through-silicon via fabrication method comprises forming a substrate by bonding the front surface of a silicon plate to a carrier using an adhesive layer therebetween to expose the back surface of the silicon plate. A silicon nitride passivation layer is deposited on the exposed back surface of the silicon plate of the substrate. A plurality of through holes are etched in the silicon plate, the through holes comprising sidewalls and bottom walls. A metallic conductor is deposited in the through holes to form a plurality of through-silicon vias.Type: GrantFiled: December 23, 2010Date of Patent: October 9, 2012Assignee: Applied Materials, Inc.Inventors: Nagarajan Rajagopalan, Ji Ae Park, Ryan Yamase, Shamik Patel, Thomas Nowak, Li-Qun Xia, Bok Hoen Kim, Ran Ding, Jim Baldino, Mehul Naik, Sesh Ramaswami
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Patent number: 8279577Abstract: A support for a substrate processing chamber comprises a chuck having a substrate receiving surface, and a base comprising an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth. A lower wall is seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel. A fluid inlet is provided to supply a heat transfer fluid to the fluid channel and a fluid outlet provided to discharge the heat transfer fluid from the fluid channel.Type: GrantFiled: August 2, 2010Date of Patent: October 2, 2012Assignee: Applied Materials, Inc.Inventors: Andrew Nguyen, Wing Lau Cheng, Hiroji Hanawa, Semyon Kats, Kartik Ramaswamy, Yan Ye, Kwok Manus Wong, Daniel J. Hoffman, Tetsuya Ishikawa, Brian C. Lue
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Patent number: 8252653Abstract: A flash memory device and methods of forming a flash memory device are provided. The flash memory device includes a doped silicon nitride layer having a dopant comprising carbon, boron or oxygen. The doped silicon nitride layer generates a higher number and higher concentration of nitrogen and silicon dangling bonds in the layer and provides an increase in charge holding capacity and charge retention time of the unit cell of a non-volatile memory device.Type: GrantFiled: October 21, 2008Date of Patent: August 28, 2012Assignee: Applied Materials, Inc.Inventors: Mihaela Balseanu, Vladimir Zubkov, Li-Qun Xia, Atif Noori, Reza Arghavani, Derek R. Witty, Amir Al-Bayati
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Patent number: 8246934Abstract: A respiratory dispersion for pulmonary delivery comprises one or more bioactive agents, a suspension medium, and a plurality of perforated microstructures having a mean aerodynamic diameter of less than 5 ?m. The suspension medium comprises at least one propellant and permeates the perforated microstructures.Type: GrantFiled: September 3, 2010Date of Patent: August 21, 2012Assignee: Novartis AGInventors: Jeffry G. Weers, Ernest G. Schutt, Luis A. Dellamary, Thomas E. Tarara, Alexey Kabalnov
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Patent number: 8226769Abstract: An electrostatic chuck for receiving a substrate in a substrate processing chamber comprises a ceramic puck having a substrate receiving surface and an opposing backside surface with a plurality of spaced apart mesas. An electrode is embedded in the ceramic puck to generate an electrostatic force to hold a substrate. Heater coils located at peripheral and central portions of the ceramic puck allow independent control of temperatures of the central and peripheral portions of the ceramic puck. The chuck is supported by a base having a groove with retained air. The chuck and base can also have an overlying edge ring and clamp ring.Type: GrantFiled: April 26, 2007Date of Patent: July 24, 2012Assignee: Applied Materials, Inc.Inventors: Alexander Matyushkin, Dennis Koosau, Theodoros Panagopoulos, John Holland
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Patent number: 8216374Abstract: A gas coupler is capable of conducting gas between a gas component, gas source and substrate processing chamber. The gas coupler comprises a metal block comprising a gas component seating surface having a plurality of gas component coupling ports. The block also has a plurality of sidewalls at right angles to the gas component seating surface, each sidewall comprising a counterbored gas orifice. A plurality of right-angled internal passageways are each connected to a gas component coupling port. Each internal passageway terminates at counterbored gas orifice on a different sidewall surface so that each gas component coupling port is fluidly connected to a different sidewall.Type: GrantFiled: December 20, 2006Date of Patent: July 10, 2012Assignee: Applied Materials, Inc.Inventors: Joel Huston, Jeffery Tobin, Christophe Marcadal
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Patent number: 8203791Abstract: A lens module array comprising a spacer plate comprising (i) first and second surfaces, and (ii) an array of lens barrels, each lens barrel comprising (1) a lens opening extending inward from the first surface of the spacer plate, and (2) a sensor cavity extending inward from the second surface of the spacer plate to meet the lens opening; and (b) at least one lens positioned over each lens opening of a lens barrel, the outer circumference of the lens being attached to the spacer plate.Type: GrantFiled: October 6, 2010Date of Patent: June 19, 2012Assignee: Ether Precision, Inc.Inventors: Jean-Pierre Lusinchi, Xiao-Yun Kui
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Patent number: 8198180Abstract: In an ion implantation method, a substrate is placed in a process zone and ions are implanted into a region of the substrate to form an ion implanted region. A porous capping layer comprising dispersed gas pockets is deposited on the ion implanted region.Type: GrantFiled: December 21, 2010Date of Patent: June 12, 2012Assignee: Applied Materials, Inc.Inventors: Jose Ignacio Del Agua Borniquel, Tze Poon, Robert Schreutelkamp, Majeed Foad
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Patent number: 8198671Abstract: A flash memory device comprises a substrate comprising silicon with a silicon dioxide layer thereon. A silicon-oxygen-nitrogen layer is on the silicon dioxide layer, and the silicon-oxygen-nitrogen layer comprises a shaped concentration level profile of oxygen through the thickness of the layer. A blocking dielectric layer is on the silicon-oxygen-nitrogen layer, and a gate electrode is on the blocking dielectric layer. Oxygen ions can be implanted into a silicon nitride layer to form the silicon-oxygen-nitrogen layer.Type: GrantFiled: April 22, 2010Date of Patent: June 12, 2012Assignee: Applied Materials, Inc.Inventors: Christopher Sean Olsen, Tze Wing Poon, Udayan Ganguly, Johanes Swenberg
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Patent number: 8187416Abstract: An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.Type: GrantFiled: May 20, 2005Date of Patent: May 29, 2012Assignee: Applied Materials, Inc.Inventors: Keith A. Miller, Genhua Xu, Shengde Zhong, Mahendra Bhagwat Lokhande
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Patent number: 8168322Abstract: A battery comprises a substrate comprising a first surface comprising a first battery cell having a first non-contact surface, a pliable dielectric abutting the first non-contact surface, the pliable dielectric comprising a peripheral edge, and a first cap about the pliable dielectric.Type: GrantFiled: May 19, 2010Date of Patent: May 1, 2012Assignee: Front Edge Technology, Inc.Inventors: Victor Krasnov, Kai-Wei Nieh
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Patent number: 8168223Abstract: Engineered particles are provided may be used for the delivery of a bioactive agent to the respiratory tract of a patient. The particles may be used in the form of dry powders or in the form of stabilized dispersions comprising a nonaqueous continuous phase. In particularly preferred embodiments the particles may be used in conjunction with an inhalation device such as a dry powder inhaler, metered dose inhaler or a nebulizer.Type: GrantFiled: June 21, 2001Date of Patent: May 1, 2012Assignee: Novartis Pharma AGInventors: Thomas E. Tarara, Jeffry G. Weers, Alexey Kabalnov, Ernest G. Schutt, Luis A. Dellamary
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Patent number: 8134118Abstract: Methods of forming a lens array block comprising a plurality of lens barrels are provided, including depositing lens barrel material by electrolysis and etching lens barrels from a block of material. Also provided are means of assembling image capturing units or arrays of image capturing units.Type: GrantFiled: August 26, 2011Date of Patent: March 13, 2012Assignee: Ether Precision, Inc.Inventors: Chao-Chi Chang, Yung-I Chen, Jean-Pierre Lusinchi, Raymond Chih-Chung Hsiao
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Patent number: 8130382Abstract: An endpoint detection method for detecting an endpoint of a process comprises determining a reflectance spectrum of light reflected from a substrate, the light having a wavelength, processing the substrate while light having the wavelength is reflected from the substrate, detecting light having the wavelength after the light is reflected from the substrate, generating a signal trace of the intensity of the reflected light and normalizing the signal trace with the reflectance spectrum of the light. The normalized signal trace can then be evaluated to determine an endpoint of the process.Type: GrantFiled: June 28, 2011Date of Patent: March 6, 2012Assignee: Applied Materials, Inc.Inventors: Lei Lian, Matthew Fenton Davis
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Patent number: 8114525Abstract: A component capable of being exposed to a plasma in a process chamber has a structure having an electroplated coating comprising yttrium-containing species. The electroplated coating can include zirconium oxide, or can have an oxide layer thereon. In another embodiment the electroplated coating comprises a first species and is coated with a second electroplated coating comprising a second species that is different from the first species. The electroplated coating is resistant to corrosion in the plasma. In another embodiment, the electroplated coating has an interface having a thickness with a first concentration gradient of an yttrium-containing species and a second concentration gradient of a second species. An electroplated coating having a layer comprising first and second concentration gradients of first and second metals can be formed by varying the concentration of the first and second metal electrolyte species in the electroplating bath to electroplate the coating.Type: GrantFiled: May 8, 2008Date of Patent: February 14, 2012Assignee: Applied Materials, Inc.Inventors: Nianci Han, Li Xu, Hong Shih, Yang Zhang, Danny Lu, Jennifer Y. Sun