Abstract: Stabilized dispersions are provided for the delivery of a bioactive agent to the respiratory tract of a patient. The dispersions preferably comprise a plurality of perforated microstructures dispersed in a suspension medium that typically comprises a hydrofluoroalkane propellant. As density variations between the suspended particles and suspension medium are minimized and attractive forces between microstructures are attenuated, the disclosed dispersions are particularly resistant to degradation, such as, by settling or flocculation. In particularly preferred embodiments, the stabilized dispersions may be administered to the lung of a patient using a metered dose inhaler.

Abstract: A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is formed in the resist layer that exposes the underlying surface of the component. The underlying surface is etched through the apertures in the resist layer to form a textured surface having raised features with top corners. The resist layer is removed, and a treatment step is performed to form top corners that are rounded. In another method, the textured surface is formed by providing a patterned mask having apertures above the surface of the component. A material is sprayed through the apertures in the patterned mask and onto the surface to form a textured surface with raised features having the material.

Abstract: A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.

Abstract: A detachable electrostatic chuck is capable of being attached to a pedestal in a process chamber. The chuck comprises an electrostatic puck having a ceramic body with an embedded electrode. The chuck also has a baseplate below the electrostatic puck with a lower surface which is bonded to a sealing assembly comprising a sealing plate and sealing ring. The sealing plate and ring are polished to form a gas-tight seal between the chuck and pedestal to prevent gas leakage from or into this region.

Abstract: A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying structure and first and second coating layers. The first coating layer is formed over the underlying structure, and has a first surface with an average surface roughness of less than about 25 micrometers. The second coating layer is formed over the first coating layer, and has a second surface with an average surface roughness of at least about 50 micrometers. Process residues can adhere to the surface of the second coating layer to reduce the contamination of processed substrates.

Abstract: A halogen lamp assembly 20 for a substrate processing chamber 100 has a halogen lamp 22 and a ceramic heat sink monolith 24. The halogen lamp 22 includes a filament 28 and a pair of electrical connectors 30 encapsulated in an envelope 26 having a pinch seal end 34. The ceramic heat sink monolith 24 includes a block 38 and an array of spaced apart posts 40 projecting outwardly from the block 38. The block 38 includes a cavity 42 that has a recessed inner surface 44 shaped to mate with the pinch seal end 34 of the lamp 22 and an opening that allows the electrical connectors 30 of the halogen lamp 22 to pass through.

Abstract: A thin film battery manufacturing method comprises annealing a battery substrate to a temperature at which organic materials are burned off the battery substrate to clean the battery substrate. The battery substrate comprises a thickness of less than about 100 microns. After annealing, a plurality of thin films are formed on the annealed battery substrate, the thin films comprising at least one electrolyte between a pair of electrodes, and the thin films adapted to generate or store an electrical charge. The thin films can also be annealed to remove defects in the thin films.

Abstract: In a method of refurbishing a deposition target, a surface of the target is provided in a process zone. An electrical arc is generated in the process zone, and a consumable metal wire is inserted into the process zone to form liquefied metal. A pressurized gas is injected into the process zone to direct the liquefied metal toward the surface of the target to splatter the liquefied metal on the surface, thereby forming a coating having the metal on at least a portion of the surface of the target that exhibits reduced contamination from the environment.

Abstract: A metal silicide layer is formed on silicon-containing features of a substrate in a chamber. A metal film is sputter deposited on the substrate and a portion of the sputter deposited metal film is silicided. In the process, sputtering gas is energized by applying an electrical bias potential across the metal sputtering target and the substrate support to sputter deposit metal from a target onto the substrate. At least a portion of the deposited sputtered metal is silicided by heating the substrate to a silicidation temperature exceeding about 200° C. to form a combined sputtered metal and metal silicide layer on the substrate. The remaining sputtered metal can be silicided by maintaining the substrate at the silicidation temperature to form the metal silicide layer.

Abstract: A detachable electrostatic chuck can be attached to a pedestal in a process chamber. The electrostatic chuck has an electrostatic puck comprising a dielectric covering at least one electrode and a frontside surface to receive a substrate. A backside surface of the chuck has a central protrusion that can be a D-shaped mesa to facilitate alignment with a mating cavity in the pedestal. The protrusion can also have asymmetrically offset apertures, which further assist alignment, and also serve to receive electrode terminal posts and a gas tube. A heat transfer plate having an embedded heat transfer fluid channel is spring loaded on the pedestal to press against the chuck for good heat transfer.

Abstract: A photocathode is capable of generating an electron beam from incident light. The photocathode comprises a light permeable support having a light receiving surface and an opposing surface. A Group III nitride layer is provided on the opposing surface of the support. The Group III nitride layer comprises at least one Group III element and nitrogen. An alkali halide layer is provided on the Group III nitride layer. The alkali halide can be a cesium halide, such as cesium bromide or iodide.

Abstract: A gas distributor distributes a gas across a surface of a substrate processing chamber. The gas distributor has a hub, a baffle extending radially outward from the hub, a first set of vanes and a second set of vanes. In one version, the hub has a gas inlet and a gas outlet. The baffle has an opposing first and second surfaces. First vanes are on the first surface of the baffle and direct gas across chamber surfaces. In one version, the first vanes comprise arcuate plates that curve and taper outward from the hub. Second vanes are on the second surface of the baffle and direct gas across the second surface of the baffle. In one version, a gas feed-through tube in the hub can allow a gas to bypass the first and second set of vanes.

Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle ? of from about ¼ to about 3 mrads, where the acceptance semi-angle ? is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

Abstract: A component capable of being exposed to a plasma in a process chamber has a structure having an electroplated coating comprising yttrium-containing species. The electroplated coating is resistant to corrosion in the plasma, and can have a compositional gradient of yttrium-containing species through a thickness of the coating. In one embodiment, the coating is formed by electroplating a layer comprising yttrium onto the surface, and then electroplating a second layer onto the first layer, and annealing the first and second layers. The second layer can comprise aluminum or zirconium. In another embodiment, the coating is formed by electroplating a layer comprising a mixture of aluminum and yttrium onto the surface and annealing the layer.

Abstract: A substrate support comprises a ceramic disc with an electrode that is chargeable through an electrode terminal. An electrical connector connects an external power source to the electrode terminal. The electrical connector has a pair of opposing pincer arms, a groove sized to fit around the electrode terminal, and a pair of through holes to receive a tightening assembly capable of tightening the opposing pincer arms about the electrode terminal.

Abstract: An apparatus to treat an influent solution comprising ions to obtain a selectable ion concentration in an effluent solution. The apparatus comprises an electrochemical cell comprising a housing comprising first and second electrodes. A water-splitting ion exchange membrane is between the first and second electrodes, the membrane comprising ananion exchange surface facing the first electrode, and an cation exchange surface facing the second electrode, or vice versa. The housing also has an influent solution inlet and an effluent solution outlet with a solution channel that allows influent solution to flow past both the anion and cation exchange surfaces of the water-splitting ion exchange membrane to form the effluent solution. A variable voltage supply is capable of maintaining the first and second electrodes at a plurality of different voltages during an ion exchange stage.

Abstract: A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface features; and a second aluminum oxide layer on the first aluminum oxide layer, the second aluminum oxide layer substantially completely filling the penetrating surface features of the first aluminum oxide layer. A method of forming the coated aluminum component is also described.

Abstract: A stroller includes a wheel frame and a handle frame. The handle frame includes a grip member and two swing rods. The swing rods are spaced apart from each other in a left-to-right direction, and are connected pivotally to the wheel frame. The grip member has two extension rod portions that are connected respectively and pivotally to the swing rods so as to allow the grip member to be folded on the swing rods. Two slide sleeves are sleeved respectively and movably on the extension rod portions. Two rod-retaining seats are disposed respectively on the slide sleeves, and engage respectively and automatically retaining grooves in the swing rods so as to prevent the grip member from pivoting upwardly away from the swing rods when the grip member is folded on the swing rods.

Abstract: In determining an endpoint of etching a substrate, light that is directed toward the substrate is reflected from the substrate. A wavelength of the light is selected to locally maximize the intensity of the reflected light at an initial time point of the etching process. The reflected light is detected to determine an endpoint of the substrate etching process.

Abstract: A multiple electron beam source comprises a photon source to generate a photon beam, a lens to focus the photon beam, a photocathode having a photon receiving surface and an electron emitting surface, and an array of electron transmission gates spaced apart from the electron emitting surface of the photocathode by a distance dg. In one version, the multiple electron beam source comprises a photocathode stage assembly to move the photocathode relative to the array of electron transmission gates. In one version, the multiple electron beam source also comprises a plasmon-generating photon transmission plate comprising an array of photon transmission apertures and exterior surfaces capable of supporting plasmons.