Abstract: The present invention is concerned with methods of converting a single resist layer into a multilayered resist.The upper portion of the single resist layer can be converted into a dry-etch resistant form. The conversion can be a blanket conversion of the upper portion of the resist layer or can be a patterned conversion of areas within the upper portion of the layer. A patternwise-converted resist can be oxygen plasma developed.The upper portion of the single resist layer can be patternwise converted into a chemically different composition or structure having altered absorptivity toward radiation. The difference in radiation absorptivity within the patterned upper portion of the resist enables subsequent use of blanket irradiation of the resist surface to create differences in chemical solubility between areas having the altered absorptivity toward radiation and non-altered areas. The difference in chemical solubility enables wet development of the patterned resist.

Abstract: Patterned conductive lines are formed simultaneously with stud via connections through an insulation layer to previously formed underlying patterned conductive lines in multilevel VLSI chip technology. A first planarized layer of insulation is deposited over a first level of patterned conductive material to which contacts are to be selectively established. The first layer then is covered by an etch stop material. Contact holes are defined in the etch stop material at locations where stud connectors are required. The first layer of insulation is not etched at this time.Next, a second planarized layer of insulation, is deposited over the etch stop material. The second layer insulation, in turn, is etched by photolithography down to the etch stop material to define desired wiring channels, some of which will be in alignment with the previously formed contact holes in the etch stop material.

Abstract: Electronic components are disclosed comprising an insulator which is the in situ cured reaction product of a polymerizable oligomer which is end capped with a vinyl and/or acetylenic end groups.

Abstract: The present invention discloses multi-layered resist structures and methods of producing them which can be used in electronic device lithography to produce micrometer and submicrometer geometries.The resist structure comprises two or more layers at least one of which is a metallic material and at least one of which is a radiation-sensitive material. The metallic layer exhibits both a high atomic number and a high density. The metallic material is positioned relative to the radiation-sensitive polymeric material so that it can be used to control reflection and backscatter of radiation used to create a latent image within the radiation-sensitive polymeric material. The thickness of the metallic layer is determined by the amount of reflection desired and the amount of backscatter permitted into the layer of radiation-sensitive polymeric material.

Abstract: Detergent laundry bars of acceptable mildness, foaming properties and processing characteristics are described which are based on built higher fatty alcohol ethoxylate sulfate detergent and which contain bentonite, which acts as a bodying agent for the laundry bars, facilitating production thereof, and contributes fabric softening properties to laundry washed with such laundry bar. When the bentonite is omitted or is replaced by water insoluble filler, such as calcium carbonate powder, bars made are not of acceptable hardness and such compositions are not satisfactorily processable in conventional soapmaking apparatuses.Also described are processes for converting aqueous solutions of higher fatty alcohol ethoxylate sulfate detergent to solid form by treatment with bentonite, and for making detergent laundry bars from such solidified detergent.

Abstract: Detergent laundry bars of acceptable mildness, detergency, foaming properties, processing characteristics and resistance to breakage are described which are based on built water soluble salts of alpha-sulfo-higher fatty acid-lower alcohol ester detergent and/or alpha-sulfo-higher fatty acid-amide, and which contain bentonite, which acts as a bodying agent for the laundry bars, facilitating production thereof, and contributing fabric softening properties to laundry washed with such laundry bars. When the bentonite is omitted or is replaced by water insoluble filler, such as calcium carbonate powder, and the alpha-sulfo-fatty acid derivative detergent is employed as an aqueous solution, bars made are not of acceptable hardness and such compositions are not satisfactorily processable in conventional soapmaking apparatuses.

Abstract: Detergent laundry bars which are mild to the hands of a user, of good foaming properties during hand washing of laundry and of good processing characteristics, include 10 to 30% of water soluble salt of alpha-sulfo-higher fatty acid-lower alcohol ester, 10 to 50% of builder for such detergent, a bodying proportion, in the range of 20 to 70%, of water insoluble powder and/or sodium sulfate filler, and 5 to 20% of water. Preferably, this improved detergent laundry bar includes 18 to 22% of sodium alpha-sulfo-higher fatty acid methyl ester, 8 to 20% of sodium tripolyphosphate, 5 to 15% of sodium carbonate, 2 to 5% of sodium silicate, 20 to 35% of calcium carbonate, 5 to 15% of talc and 10 to 15% of water.

Abstract: A device for delivering an irrigant and/or a medicament fluid to the gingival sulcus comprises an elongated handle member terminating in a flexible tip portion provided with aperture(s), the tip being connected to a fluid reservoir via a conduit and operable to discharge the fluid through the apertures only on the application of pressure to the reservoir and/or opening of a normally closed valve or apertures in the tip by flexing the tip, e.g., by pressing same against a tooth. In preferred embodiments, the handle is tubular, the distal end portion thereof comprising the fluid reservoir.

Abstract: A foldable, flexible tag having a central opening and an auxiliary opening adapted to fold over a connecting fold line so that the center of the auxiliary opening is further from the fold line than is the center of the auxiliary opening.