Abstract: Charitable donations are increased by automatically providing immediate on-line recognition of on-line donors. A list of donors is maintained on a Web page acknowledging the on-line contributions. Donor names on the list can be links to additional information about the donation or the donor. Information about donor and donation is entered by the donor, who can specify what information is to be published on the Web and what information is to remain unpublished. The donor list can be arranged in order of donation size, and donors can compete for position on the list. The donor information can indicate membership in a group, and donations can also be totaled by group to encourage donation competition between groups.

Abstract: The invention relates to a composite structure of a sample carrier 20 and a sample holder 30 for use in a TEM, for example. The sample carrier is hereby separately embodied from the sample holder. Although such compositions are already known, the known compositions are very fragile constructions. The sample carrier according to the invention can be formed from a strip of metal, and is a simple and cheap element. Using resilient force, it clamps onto or into the sample holder. The portion of the sample holder to which the sample carrier couples also has a simple form. The sample carrier can couple to the sample holder in vacuum using a coupling tool.

Abstract: The present invention provides methods, devices, and systems for analyzing defects in an object such as a semiconductor wafer. In one embodiment, it provides a method of characterizing defects in semiconductor wafers during fabrication in a semiconductor fabrication facility. This method comprises the following actions. The semiconductor wafers are inspected to locate defects. Locations corresponding to the located defects are then stored in a defect file. A dual charged-particle beam system is automatically navigated to the vicinity defect location using information from the defect file. The defect is automatically identified and a charged particle beam image of the defect is then obtained. The charged particle beam image is then analyzed to characterize the defect. A recipe is then determined for further analysis of the defect. The recipe is then automatically executed to cut a portion of the defect using a charged particle beam.

Abstract: Particle-optical apparatus are normally embodied with a magnetic or electrostatic lens so as to focus a beam 1 of charged particles onto a sample 8. It is desirable to be able to use these apparatus at different beam energies. It is, however, undesirable that the focus position 9 of the beam, as a result hereof, should shift with respect to the sample 8. Use of a permanent-magnetic material 6 in a magnetic lens has advantages as regards compact construction, but is normally avoided because it is not easily possible to adjust the lens power to match varying beam energies. The invention shows how it is possible to keep constant the focus position 9, independent of the energy of the particles in the beam 1, by combining a magnetic lens—that has been furnished with permanent-magnetic material—with an electrostatic lens. The electrostatic lens is embodied in that case as an accelerating lens.

Abstract: A game combines two forms of communication, which, in preferred embodiments, are acting and drawing. In those embodiments, certain players try to act ideas presented on cards to drawers, who use dry-erase boards to draw, for different ends based on the specific embodiment.

Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.

Abstract: Sample carriers for use in Transmission Electron Microscopes (TEMs) and freely commercially available have the form of a gauze with a strengthening edge. The thickness of these known sample carriers is of the order of magnitude of 20 ?m, and is uniform across the entire sample holder. The tiny thickness of these fragile sample carriers makes manipulation difficult. There is a desire to realize automatic introduction and removal of sample carriers in a TEM, seeing as this would make it possible to use the TEM continuously, without human intervention. The invention describes a robust sample carrier whereby—both in the case of manual and automatic manipulation—deformation of and/or damage to the sample carrier is avoided. This is achieved by employing a strengthening edge portion 2 with a thickness 6 larger than the thickness 5 of the middle portion 1 of the sample carrier. The ability to use the sample carrier in analyses in which tilting is important is hereby not impeded.

Abstract: A method of fabricating a nanotube probe tip and the resultant probe tip, particularly for use in an atomic force microscope. A moderately sharply peaked support structure has its tip cut or flattened to have a substantially flat end of size of about 20 to 200 nm across. The support structure may be formed by etching a conical end into a silica optical fiber. Nickel or other catalyzing metal such as iron is directionally sputtered onto the flat end and the sloped sidewalls of the support structure. The nickel is anisotropically etched to remove all the nickel from the sidewalls but leaving at least 15 nm on the flat end to form a small nickel dot. A nanotube is then grown with the nickel catalyzing its growth such that only a single nanotube forms on the nickel dot and its diameter conforms to the size of the nickel dot. In another preferred embodiment of the invention, a catalyst material can be directly deposited on to the probe end using charged particle beam deposition, such as electron beam deposition.

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.

Abstract: A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications.

Abstract: In the semiconductor industry, microscopic samples are cut out of substrates for purposes of analysis. In the case of a known method, a sample to be cut loose out of a substrate is attached to a sample carrier connected to a manipulator and the sample is cut loose from the substrate. Subsequently, the sample is fixed to a TEM grid and completely separated from the sample carrier. According to the invention, the sample carrier 3 is left in connection with the sample 1 and the sample carrier 3 is separated from the manipulator 4. By making the sample carrier 3 connected to the sample 1 much bigger than the (microscopic) sample 1, and by manipulating the sample carrier 3, manipulation—with the aid of a (macroscopic) manipulator—of the microscopic sample 1 attached thereto becomes easier than manipulating the sample 1 without the sample carrier 3 attached thereto. In addition, a mechanical coupling between manipulator 4 and sample carrier 3 is shown, which enables a great degree of automation.

Abstract: Method for performing focusing in a particle-optical device with the aid of astigmatism in the particle beam. In a particle-optical device such as an electron microscope it is advantageous to perform the process of focusing automatically. In accordance with the invention, the electron beam which is to be focused is deliberately made astigmatic to a certain degree. With this astigmatic beam, two images of a specimen are made at two different settings of the objective, after which in each of the images the direction of the astigmatic smearing is determined—for example, with the aid of a two-dimensional Fourier transform (FFT). The directions of the astigmatic smearing are perpendicular to each other if, in the transition from a first setting of the objective to a second one, the point of optimum focus is passed. Through a process of interpolation (which process may be iterative) between these two settings, the point of optimum focus can now be determined.

Abstract: A surface analyzing system including in one system both an integrating optical instrument, such as a scatterometer, and individual-feature-measuring instrument, such as a scanning probe microscope or a beam imaging system, for example, a scanning electron microscope. In a preferred embodiment, the two instruments are capable of characterizing a wafer held on a common stage. The stage may be movable a predetermined displacement to allow the same area of the wafer to be characterized by a scatterometer at one position of the stage and to be characterized by the scanning probe microscope or beam imaging system. The scatterometer can rapidly measure wafers to indicate whether a problem exists, and the scanning probe microscope can perform detailed measurements on wafers flagged by the scatterometer.

Abstract: A charged particle beam system uses an ion generator for charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber, so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.

Abstract: The present invention provides improved angular aperture schemes for generating shaped beam spots having a desired geometric shape from rectangular, elliptical, and semi-elliptical apertures having one sharp edge. A sharper beam edge can be generated by offsetting the rectangular or elliptical aperture in combination with under or over focus. In the spherical aberration limit, under-focused semi-circle apertures provide a sharp, flat edge. The sharp edge can be made resolute enough for precision milling applications, and at the same time, the spot can be made large enough with enough overall current and current density to efficiently mill away material in either a production or laboratory environment. Depending on the particular beam spot that is desired, combinations of techniques including defocusing, aperture offsetting, and stigmation adjustment, can be used in both spherical aberration dominant and chromatic aberration dominant environments to achieve a desired beam for a desired application.

Abstract: The invention adds one or more surface contour(s) to the bombarded area(s) within ion columns to greatly reduce the likelihood that back sputtered material will reach the ion generating source. A number of different surface contours are disclosed including angled surfaces, surfaces defining cups to capture back sputtered material, pre-textured and forested surfaces. The different surfaces can be used in any combination. The reduction in back sputtered material reaching the ion source reduces the time to stability, greatly increases the working stability, and increases the lifespan of the source.

Abstract: A particle-optical apparatus comprising a sample holder for receiving a sample, a particle source embodied to produce a primary beam of first electrically charged particles along an optical axis for the purpose of irradiating the sample, first detector embodied to detect second electrically charged particles that emanate from the sample as a result of the irradiation thereof, a detection space that at the least is formed by the sample holder and the first detector, and an immersion lens embodied to produce a magnetic field for the purpose of focusing the primary beam in the vicinity of the sample holder. The first detector are embodied to produce an electric field in the detection space, and the detection space is embodied to comprise a gas.

Abstract: The invention provides a method for the manufacture and transmissive irradiation of a sample, comprising the steps of: A Providing a particle-optical system having an internal low-pressure chamber and suitable for the generation of an electron beam and an intersecting ion beam in said chamber; B Providing a specimen within the chamber, carried by a manipulator; C Irradiating the specimen with the ion beam so as to cut a sample from the specimen; D Relatively displacing the sample thus cut to a sample holder than can be manipulated; E Attaching the sample to the sample holder; F Using an electron beam to perform transmissive irradiation of the sample thus attached to the sample holder, characterized in that step F is performed in the low-pressure chamber of the particle-optical system according to step A.

Abstract: The invention provides a knowledge management system particularly suited for use in the integrated circuit design environment. The system allows administrators to define standardized component types. Instantiated components versions comprise “deliverables” and “attributes.” Deliverables comprise a file or directory of files or groups of files or directories that perform a common function and are characterized by the system in a standardized manner. Attributes comprise metadata describe the component version. By the abstraction of design files into deliverables, the systems can work with design files originating from any source and having different structures and still make those design files available by other designers in a uniform manner for efficient reuse of pre-qualified components. Tasks in the design flow can be tracked in the system. The system may also include a communications application, an issue tracking application, and an audit trail application.

Abstract: The present invention provides methods for achieving substantially damage-free material deposition using charged particle (e.g., ion, electron) or light beams for generating secondary electrons to induce deposition in a gas deposition material. Among other things, some of the methods can be used to deposit, with satisfactory throughput, a protective layer over a semiconductor feature without significantly altering the feature thereby preserving it for accurate measurement. In one embodiment, the beam is directed onto an electron-source surface next to the target surface but not within it. The beam is scanned on the electron-source surface causing secondary electrons to be emitted from the electron-source surface and enter the region over the target surface to interact with deposition gas for depositing a desired amount of material onto the target surface.