Patents Represented by Attorney Patterson and Sheridan, LLP
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Patent number: 8316013Abstract: A method, system and article of manufacture for processing a database query result that includes multiple data elements in a single result field. One embodiment provides a method of processing a query result. The method includes receiving a query result that includes at least one result field having multiple data elements that are in a many-to-one relationship with a second result field. The received query result is parsed to identify the multiple data elements from the first result field. Then, a result set is generated on the basis of the identified multiple data elements. The generated result set only includes one-to-one relationships between different result fields. Advantageously, the generated result set is suitable for programmatic access in order to allow an automated processing of the generated result set.Type: GrantFiled: August 9, 2006Date of Patent: November 20, 2012Assignee: International Business Machines CorporationInventors: Daniel Paul Kolz, Shannon Everett Wenzel
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Patent number: 8316256Abstract: The present invention sets forth a method and a system for powering a graphics processing unit (GPU) with a power supply subsystem. In one embodiment, the method includes generating an offset in response to an operating voltage need of the GPU; and applying the offset to information associated with a first operating voltage of the GPU; wherein the offset causes the first operating voltage to change to a second operating voltage of the GPU.Type: GrantFiled: December 10, 2009Date of Patent: November 20, 2012Assignee: NVIDIA CorporationInventors: Yu-Li (David) Ho, Li-Ling Chou, Yu-Kuo Chiang, Shany-I Chan, Pei-Hua Su, Li-Kai Cheng
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Patent number: 8313664Abstract: In a plasma reactor having an electrostatic chuck, wafer voltage may be determined from RF measurements at the bias input using previously determined constants based upon transmission line properties of the bias input, and this wafer voltage may be used to accurately control the DC wafer clamping voltage.Type: GrantFiled: November 20, 2009Date of Patent: November 20, 2012Assignee: Applied Materials, Inc.Inventors: Zhigang Chen, Shahid Rauf, Walter R. Merry, Leonid Dorf, Kartik Ramaswamy, Kenneth S. Collins
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Patent number: 8314646Abstract: The purpose is to detect minute electrical signals embedded in noise with a simple device configuration and easily reduce the area of the device by utilizing a semiconductor device in particular. This signal reproducing device (1) includes: N FETs (61 to 6N) each receiving a common input signal (VIN) at a gate terminal and having a bias voltage (VDD) applied to a drain terminal; and an adder circuit (4) connected to source terminals of the FETs (61 to 6N), for combining currents between the drain terminals and the source terminals of the FETs (61 to 6N) and outputting the resulting current, wherein the FETs (61 to 6N) and the bias voltage (VDD) are set so that a voltage at the gate terminal having the common input signal (VIN) applied thereto falls within a subthreshold region of voltages less than a threshold voltage of the FETs (61 to 6N).Type: GrantFiled: September 2, 2008Date of Patent: November 20, 2012Assignee: Japan Science and Technology AgencyInventor: Seiya Kasai
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Patent number: 8315008Abstract: According to one embodiment, a magnetic disk device includes a magnetic disk, a magnetic head, a position error signal output module, a vibration pattern detector, an adder, and a head positioning controller. The magnetic head moves over the magnetic disk. The position error signal output module outputs a position error signal based on a difference between a head position of the magnetic head over the magnetic disk and a target position on the magnetic disk. The vibration pattern detector detects a vibration pattern of the magnetic head caused by vibration. The adder adds the position error signal to an offset signal indicating amplitude of the vibration pattern. The head positioning controller moves the head position to the target position based on a result of addition by the adder.Type: GrantFiled: February 16, 2011Date of Patent: November 20, 2012Assignee: Kabushiki Kaisha ToshibaInventors: Atsushi Suzuki, Masafumi Iwashiro, Masahide Yatsu
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Patent number: 8312007Abstract: Embodiments of the invention provide techniques for optimizing database queries for energy efficiency. In general, a query optimizer is configured to compare energy requirements of query plans, and to select a query plan requiring minimal energy to execute. In one embodiment, the query optimizer may also compare time performance of the query plans, and may select a query plan by matching to a user preference for a relative priority between energy requirements and time performance.Type: GrantFiled: May 8, 2008Date of Patent: November 13, 2012Assignee: International Business Machines CorporationInventors: Robert J. Bestgen, Wei Hu, Shantan Kethireddy, Andrew P. Passe, Ulrich Thiemann
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Patent number: 8310484Abstract: An operator graph representing three-dimensional animation can be analyzed to identify subgraphs of the operator graph in which operators are not required to operate in a serialized manner. Such a condition may arise, for example, when two operators are not dependent on each other for data. This condition may arise when the operators are operating on different elements in a scene. Such operators may be evaluated in parallel. To identify these operators, a dependency graph is created. The dependency graph indicates which operators have inputs that are dependent on outputs provided by other operators. Using this graph, operators that are independent of each other can be readily identified. These operators can be evaluated in parallel. In an interactive editing system for three-dimensional animation or other rich media, such an analysis of an operator graph would occur when changes are made to the animation.Type: GrantFiled: July 26, 2007Date of Patent: November 13, 2012Assignee: AUTODESK, Inc.Inventors: Jérôme Couture-Gagnon, Peter Zion, Ian Stewart, Ronald Beirouti, Dominic Laflamme, Maxime Beaudry
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Patent number: 8309874Abstract: A method and apparatus for heating or cooling a fluid. An inlet conduit coupled to a plurality of distribution nozzles in fluid communication with a channel at the periphery of the apparatus. An insert and a sleeve cooperatively define a thin gap, in fluid communication with the channel, through which the fluid flows. Thermal inserts near the thin gap generate heat flux into or out of the fluid, which exits through an outlet conduit.Type: GrantFiled: May 16, 2008Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Tao Hou, Son T. Nguyen, Kenric Choi, Anh N. Nguyen
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Patent number: 8312511Abstract: Embodiments of the invention provide techniques for integrating criminal databases with virtual worlds. The real-world identity of a user of a virtual world may be determined, e.g., by the user's network address. The user's identity may be used to search for data records of the user's criminal activities, e.g., from a police database. The retrieved data may be used to determine potential harm to other users of the virtual world from further criminal acts. Actions to prevent potential harm to other users may then be determined, including blocking access or activities available to the user, providing other users with warnings, and monitoring the avatar of the user.Type: GrantFiled: March 12, 2008Date of Patent: November 13, 2012Assignee: International Business Machines CorporationInventors: Zachary Adam Garbow, Candace Trielle Pederson
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Patent number: 8309440Abstract: Embodiments described herein provide methods for processing a substrate. One embodiment comprises positioning a substrate in a processing region of a processing chamber, exposing a surface of the substrate disposed in the processing chamber to an oxygen containing gas to form a first oxygen containing layer on the surface, removing at least a portion of the first oxygen containing layer to expose at least a portion of the surface of the substrate, and exposing the surface of the substrate to an oxygen containing gas to form a second oxygen containing layer on the surface.Type: GrantFiled: July 1, 2011Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Errol Antonio C. Sanchez, Johanes Swenberg, David K. Carlson, Roisin L. Doherty
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Patent number: 8310482Abstract: A system for distributed of plane equation calculations. A work distribution unit is configured to receive a set of vertex data that includes meta data associated with each vertex in a modeled three-dimensional scene, to divide the set of vertex data into a plurality of batches of vertices, and to distribute the plurality of batches of vertices to one or more general processing clusters (GPCs). A processing cluster array includes the one or more (GPCs), where each GPC includes one or more shader-primitive-controller units (SPMs), and each SPM is configured to calculate plane equation coefficients for a subset of the vertices included in a batch of vertices. Advantageously, a distributed configuration of multiple plane equation calculation units decreases the size of the data bus that carries plane equation coefficients and increases overall processing throughput.Type: GrantFiled: December 1, 2008Date of Patent: November 13, 2012Assignee: NVIDIA CorporationInventors: Ziyad S. Hakura, Emmett M. Kilgariff
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Patent number: 8309475Abstract: Embodiments of the invention contemplate a method, apparatus and system that are used to support and position a substrate on a surface that is at a different temperature than the initial, or incoming, substrate temperature. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein generally may also provide an inexpensive and simple way of accurately positioning a substrate on a substrate support that is positioned in a semiconductor processing chamber. Substrate processing chambers that can benefit from the various embodiments described herein include, but are not limited to RTP, CVD, PVD, ALD, plasma etching, and/or laser annealing chambers.Type: GrantFiled: January 4, 2012Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Blake Koelmel, Abhilash J. Mayur, Kai Ma, Alexander N. Lerner
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Patent number: 8308529Abstract: Embodiments of a system and method for polishing substrates are provided. In one embodiment, a polishing system is provided that includes a polishing module, a cleaner and a robot. The robot has a range of motion sufficient to transfer substrates between the polishing module and cleaner. The polishing module includes at least two polishing stations, at least one load cup and at least four polishing heads. The polishing heads are configured to move independently between the at least two polishing stations and the at least one load cup.Type: GrantFiled: April 21, 2009Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Allen L. D'Ambra, Alpay Yilmaz
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Patent number: 8309374Abstract: The present invention generally provides a batch substrate processing system, or cluster tool, for in-situ processing of a film stack used to form regions of a solar cell device. In one configuration, the film stack formed on each of the substrates in the batch contains one or more silicon-containing layers and one or more metal layers that are deposited and further processed within the various chambers contained in the substrate processing system. In one embodiment, a batch of solar cell substrates is simultaneously transferred in a vacuum or inert environment to prevent contamination from affecting the solar cell formation process.Type: GrantFiled: October 7, 2009Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Keith Brian Porthouse, Peter G. Borden, Tristan R. Holtam, Lisong Zhou, Ian Scott Latchford, Derek Aqui, Vinay K. Shah
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Patent number: 8309421Abstract: The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.Type: GrantFiled: January 21, 2011Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Yao-Hung Yang, Abhijit Kangude, Sanjeev Baluja, Michael Martinelli, Liliya Krivulina, Thomas Nowak, Juan Carlos Rocha-Alvarez, Scott Hendrickson
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Patent number: 8307836Abstract: The present invention generally is an adjustable applicator employed for application of a cosmetic or a care product such as for application of mascara, coloring strands of hair, for dental flossing or for applying pharmaceuticals or cleaning agents. The invention discloses an adjustable applicator comprising an applicator element having a bore, a filament wherein the filament is housed inside the bore of the applicator element and a clasping means wherein the applicator element angularly deforms when a force is applied on the clasping means. Also disclosed is a device for packaging and dispensing a substance comprising said adjustable applicator.Type: GrantFiled: January 30, 2009Date of Patent: November 13, 2012Assignee: Zen Design Solutions LimitedInventors: Leo Clifford Pires, Roger Hwang, Rahul Bose
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Patent number: 8310075Abstract: A rotor of a wind turbine may cast an intermittent shadow onto an object in the vicinity of the turbine. A shadow-control system stops the wind turbine, based on a shadow-related shut-down condition. The condition is based on a result of a comparison between a direct-light intensity and an indirect-light intensity being beyond a direct-to-indirect light threshold. A set of light sensors measures the direct- and indirect-light intensities. A sensor measures the direct light intensity when irradiated by the sun, and the indirect-light intensity when not irradiated by the sun. The set of light sensors to provide the measured direct- and indirect-light intensities for the comparison consists of two sensors, an eastward-oriented sensor and a westward-oriented sensor.Type: GrantFiled: September 3, 2007Date of Patent: November 13, 2012Assignee: Vestas Wind Systems A/SInventors: Lindy B. Sorensen, Bo Heftholm Christensen, Bruno Lund Mathiasen
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Patent number: 8309446Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel processing sequence to form a solar cell device. In one embodiment, the methods include forming a doping layer on a back surface of a substrate, heating the doping layer and substrate to cause the doping layer diffuse into the back surface of the substrate, texturing a front surface of the substrate after heating the doping layer and the substrate, forming a dielectric layer on the back surface of the substrate, removing portions of the dielectric layer from the back surface to from a plurality of exposed regions of the substrate, and depositing a metal layer over the back surface of the substrate, wherein the metal layer is in electrical communication with at least one of the plurality of exposed regions on the substrate, and at least one of the exposed regions has dopant atoms provided from the doping layer.Type: GrantFiled: July 16, 2009Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Yonghwa Chris Cha, Kapila P. Wijekoon, Hongbin Fang
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Patent number: 8308858Abstract: Embodiments as described herein provide methods for depositing a material on a substrate during electroless deposition processes, as well as compositions of the electroless deposition solutions. In one embodiment, the substrate contains a contact aperture having an exposed silicon contact surface. In another embodiment, the substrate contains a contact aperture having an exposed silicide contact surface. The apertures are filled with a metal contact material by exposing the substrate to an electroless deposition process. The metal contact material may contain a cobalt material, a nickel material, or alloys thereof. Prior to filling the apertures, the substrate may be exposed to a variety of pretreatment processes, such as preclean processes and activations processes. A preclean process may remove organic residues, native oxides, and other contaminants during a wet clean process or a plasma etch process. Embodiments of the process also provide the deposition of additional layers, such as a capping layer.Type: GrantFiled: January 18, 2010Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Michael P. Stewart, Timothy W. Weidman, Arulkumar Shanmugasundram, David J. Eaglesham
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Patent number: D671190Type: GrantFiled: February 8, 2012Date of Patent: November 20, 2012Inventor: Richard Sheridan