Patents Represented by Attorney Sandra P. Thompson
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Patent number: 6645447Abstract: A gas contaminant is filtered using fibers having internal cavities containing a chemically reactive oxidizing agent, an acid or base, a coordinating agent, a complexing agent, or a deliquescing agent. Where the contaminant is basic, the reagent is preferably an oxidizing agent. Where the contaminant is acidic, the reagent is preferably basic, and more preferably comprises a group 1 or group 2 metal cation. The reagent may also advantageously comprise a phosphate, chitosan, hypochlorite, borate, carbonate, hydroxide, or oxide. Where the contaminant is neutral, the reagent is preferably an oxidizing agent, complexing agent, coordinating agent, or deliquescing agent. The reagent is preferably impregnated into an adsorptive solid, including, for example, carbon powder, zeolite, aluminum oxide, or silica. The fibers are preferably multilobal, and most preferably either trilobal or quadrilobal. It is also preferred that the fibers contain a plurality of T shaped lobes.Type: GrantFiled: April 11, 2001Date of Patent: November 11, 2003Assignee: Honeywell International Inc.Inventors: Ron Rohrbach, Dan Bause, Peter Unger
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Patent number: 6630433Abstract: Chemical mechanical planarization or spin etch planarization of surfaces of copper, tantalum and tantalum nitride is accomplished by means of the chemical formulations of the present invention. The chemical formulations may optionally include abrasive particles and which may be chemically reactive or inert. Contact or non-contact CMP may be performed with the present chemical formulations. Substantially 1:1 removal rate selectivity for Cu and Ta/TaN is achieved.Type: GrantFiled: December 20, 2000Date of Patent: October 7, 2003Assignee: Honeywell International Inc.Inventors: Fan Zhang, Daniel L. Towery, Joseph A. Levert, Shyama P. Mukherjee
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Patent number: 6627669Abstract: In accordance with the present invention, compositions and methods are provided in which the mechanical strength and durability of a precursor material having a plurality of pores is increased by a) providing a precursor material; b) treating the precursor material to form a nanoporous aerogel, preferably by using a supercritical drying process; c) providing a blending material having a reinforcing component and a volatile component; d) combining the nanoporous aerogel and the blending material to form an amalgamation layer; and e) treating the amalgamation layer to increase the mechanical strength of the layer by a substantial amount, and to ultimately form a low dielectric material that can be utilized in various applications.Type: GrantFiled: July 3, 2002Date of Patent: September 30, 2003Assignee: Honeywell International Inc.Inventors: Shyama Mukherjee, Roger Leung, Kreisler Lau
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Patent number: 6623715Abstract: An ultra-efficient multilobal cross-sectioned fiber filter for chemical contaminant filtering applications is described. An absorptive chemically reactive reagent, preferably an acid or base and in liquid or an adsorptive chemically reactive reagent (an acid or base) in solid form, is disposed within longitudinal slots in each length of fiber. The reagent may be used alone or in conjunction with solid adsorptive particles which may also be utilized with the reagents in the longitudinal slots within the fibers. Reagents within the fibers remain exposed to a base-contaminated airstream passing through the filter. Base contaminants in the airstream, chemicals such as ammonium and amines (as well as particles), react with the acid reagent within the longitudinal slots of the fibers. As the contaminant and reagent react, the ammonium or amine becomes irreversibly absorbed (or adsorbed if reagent is a solid acid) to the liquid acid reagent and multilobal fiber.Type: GrantFiled: April 12, 2001Date of Patent: September 23, 2003Assignee: Honeywell International, IncInventors: Neil H. Hendricks, Jeff Miller, Ron P. Rohrbach, Dan E. Bause, Peter D. Unger, Adel G. Tannous, Randy R. LeClaire, William E. McGeever
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Patent number: 6610114Abstract: An oxidizing slurry for removal of low dielectric constant materials. The slurry is formed utilizing non-oxidizing particles with a separate oxidizing agent, oxidizing particles alone or reducible abrasive particles with a compatible oxidizing agent. The particles can be formed of a metal oxide, nitride, or carbide material, by itself or mixtures thereof, or can be coated on a core material such as silicon dioxide or can be coformed therewith. A preferred oxidizing slurry is multi-modal in particle size distribution. Although developed for utilization in CMP semiconductor processing the oxidizing slurry of the present invention also can be utilized for other high precision polishing processes.Type: GrantFiled: June 14, 2001Date of Patent: August 26, 2003Assignee: Honeywell International Inc.Inventors: Dan Towery, Neil Hendricks, Paul Schilling, Tian-An Chen
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Patent number: 6607939Abstract: Methods and apparatus for increasing the yield achieved during high density interconnect (HDI) production. In particular, processes in which panels are tested to identify good cells/parts, good cells are removed from the panels, and new panels created entirely of identified/known good cells allow increases in the number of layers used in a HDI without incurring the decrease in yield normally associated with such a layering process.Type: GrantFiled: December 18, 2001Date of Patent: August 19, 2003Assignee: Honeywell International Inc.Inventors: Richard Pommer, Simon McElrea, Brad Banister
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Patent number: 6605238Abstract: Described is a compliant and crosslinkable thermal interface material of at least one silicone resin mixture, at least one wetting enhancer and at least one thermally conductive filler, and a method of making and using same; as well as a method of improving thermal conductivity of polymer and resin systems.Type: GrantFiled: January 30, 2001Date of Patent: August 12, 2003Assignee: Honeywell International Inc.Inventors: My Nguyen, James Grundy, Carl Edwards
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Patent number: 6605362Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.Type: GrantFiled: November 5, 2001Date of Patent: August 12, 2003Assignee: Honeywell International Inc.Inventors: Teresa Baldwin, Mary Richey, James S. Drage, Hui-Jung Wu, Richard Spear
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Patent number: 6600229Abstract: An electronic component contemplated comprises a) a substrate layer, b) a dielectric layer coupled to the substrate layer, c) a barrier layer coupled to the dielectric layer, d) a conductive layer coupled to the barrier layer, and e) a protective layer coupled to the conductive layer. The electronic component contemplated herein can be produced by a) providing a substrate; b) coupling a dielectric layer to the substrate; c) coupling a barrier layer to the dielectric layer; d) coupling a conductive layer to the barrier layer; and e) coupling a protective layer to the conductive layer. The protective layer may then be cured to a desirable hardness.Type: GrantFiled: May 1, 2001Date of Patent: July 29, 2003Assignee: Honeywell International Inc.Inventors: Shyama Mukherjee, Joseph Levert, Donald DeBear
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Patent number: 6596391Abstract: Disclosed is a metal-clad laminate product having a carrier film, a aqueous soluble release or parting layer deposited onto the carrier film and which can be mechanically separated from the carrier film, and an ultra thin metal layer deposited onto the parting layer. Also disclosed is a method for making the metal-clad laminate product.Type: GrantFiled: May 11, 1998Date of Patent: July 22, 2003Assignee: Honeywell International Inc.Inventor: Gordon C. Smith
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Patent number: 6565920Abstract: Methods are provided for removing edge beads from spin-on films. A spin-on film is removed from a region of a surface of a spin-coated substrate adjacent to an edge of the surface by spinning the spin-coated substrate, expanding a fluid through a nozzle to form a cryogenic aerosol stream, and directing the cryogenic aerosol stream against the spin-on film in the region as the substrate spins. In another aspect of the invention, a film is formed on a surface of a substrate by dispensing a liquid composition onto the surface, spinning the substrate to distribute the liquid composition to form a substantially uniform film on the surface, expanding a fluid through a nozzle to form a cryogenic aerosol stream, and directing the cryogenic aerosol stream against the film in a region of the surface adjacent to an edge of the surface as the substrate spins. The film may include an alkoxysilane and a low volatility solvent. The fluid may consists essentially of liquid carbon dioxide.Type: GrantFiled: June 8, 2000Date of Patent: May 20, 2003Assignee: Honeywell International Inc.Inventor: Denis H. Endisch
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Patent number: 6562449Abstract: A nanoporous polymer comprises hollow structures fabricated from crosslinked polymeric strands. The hollow structures are further coupled to other crosslinked polymeric strands by a covalent bond. Particularly contemplated nanoporous polymers have a Tg of no less than 400° C. and a dielectric constant k of no more than 2.5.Type: GrantFiled: February 22, 2001Date of Patent: May 13, 2003Inventor: Jim Drage
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Patent number: 6547965Abstract: A modularized filtration system includes multiple production modules mechanically coupled in series to form a production chain, and fluidly coupled by parallel feed fluid, waste fluid, and product fluid flowpaths. The system also includes a turbine, work exchange unit, or other energy recovery device to extract energy from the waste fluid. The system may also advantageously include a pressurization device for pressurizing a feed fluid, and provide a common drive shaft for the energy recovery and pressurization devices.Type: GrantFiled: September 19, 2000Date of Patent: April 15, 2003Assignee: Nate InternationalInventor: Dennis Chancellor
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Patent number: 6544650Abstract: A method of designing an electronic component comprises: a) modeling a first material with respect to a characteristic of the first material in a sufficient detail to at least partially account for a first value for the characteristic; b) modeling a second material with respect to a characteristic of the second material in a sufficient detail to at least partially account for a second value for the characteristic; c) modeling an interface between the first material and the second material such that in at least some instances the characteristic of the interface does not have an obvious characteristic or obvious value of between the first value and the second value; and d) generating a set of evaluation data from the modeling of the interface.Type: GrantFiled: November 29, 2000Date of Patent: April 8, 2003Assignee: Honeywell International Inc.Inventor: Nancy E. Iwamoto
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Patent number: 6530147Abstract: This invention concerns electronic substrates comprising a non-woven filler material and a resin material. The present invention also includes electronic products manufactured from the electronic substrates of this invention including, but not limited to prepregs, metal clad laminates, and printed wiring boards with and without lased via holes. The present invention further includes a method of manufacturing printed built-up wiring boards including the steps of forming a prepreg and forming at least one via in the prepreg.Type: GrantFiled: November 7, 2000Date of Patent: March 11, 2003Assignee: Honeywell International Inc.Inventors: David R. Haas, Chengzeng Xu, Mavyn McAuliffe
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Patent number: 6524657Abstract: Aromatic aliphatic ether solvents, such as anisole, methylanisole, and phenetole, have been found useful in formulating coating solutions of polymeric dielectric materials and as a clean up solvent in the coating process. A process for forming a dielectric film on a substrate includes depositing a coating solution of a dielectric material in a formulation solvent onto a surface of the substrate and depositing an aromatic aliphatic ether solvent onto an edge portion of the surface of the substrate. The process is used to form films of dielectric materials including arylene ether dielectric polymers, hydridosiloxane resins, organohydridosiloxane resins, spin-on-glass materials, partially hydrolyzed and partially condensed alkoxysilane compositions which are cured to form a nanoporous dielectric silica material, and poly(perhydrido)silazanes.Type: GrantFiled: May 7, 2002Date of Patent: February 25, 2003Assignee: Honeywell International Inc.Inventors: Oana M. Leonte, Tadashi Nakano, Kelly M. Beres, Kreisler Lau
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Patent number: 6517951Abstract: A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.Type: GrantFiled: December 12, 2000Date of Patent: February 11, 2003Assignee: Honeywell International Inc.Inventors: Nigel Hacker, Todd Krajewski, Richard Spear
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Patent number: 6512071Abstract: An organohydridosiloxane polymer having a cage conformation, at least approximately 40 Mole percent carbon containing substituents and a dielectric constant of less than about 2.7 is presented. Each silicon atom of the cage polymer is bonded to at least three oxygen atoms and to either a hydrogen atom or an organic substituent. By providing such a caged structure with essentially no hydroxyl or alkoxy substituents, either on the polymer backbone or at terminal silicon atoms, essentially no chain lengthening polymerization can occur in solution. Such organohydridosiloxane resins having a molecular weight in the range from about 400 to about 200,000 atomic mass units were formed using a dual phase solvent system and either a solid phase or phase transfer catalyst to assist the condensation of hydridotrihalosilane with at least one organotrihalosilane.Type: GrantFiled: June 30, 2000Date of Patent: January 28, 2003Assignee: Honeywell International Inc.Inventors: Nigel P. Hacker, Scott Lefferts, Lisa Figge
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Patent number: 6509063Abstract: Novel polyindanebisphenols or PIBPs for the preparation of new and improved thermosetting polymers having the general formula of are provided. Also disclosed are thermoplastic or thermoset compositions prepared using the novel compounds of the invention, as well as methods of making and using the same. When copolymerized or reactive with other commercial resins such as, e.g., epoxy compounds, PIBP based polymers are characterized by high glass transition temperature (“Tg”), low dielectric constant, low moisture absorption, low coefficient of expansion, low cost, and can be processed on equipment typically used for the production of epoxy based laminates.Type: GrantFiled: September 6, 2000Date of Patent: January 21, 2003Assignee: Honeywell International Inc.Inventors: Thomas Fitzgerald McCarthy, David Schwind, Gordon Smith
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Patent number: 6509415Abstract: A low dielectric constant material has a first backbone with an aromatic moiety and a first reactive group, and a second backbone with an aromatic moiety and a second reactive group, wherein the first and second backbones are crosslinked via the first and second reactive groups in a crosslinking reaction without an additional crosslinker, and wherein a cage structure having at least 10 atoms is covalently bound to at least one of the first and second backbone.Type: GrantFiled: April 7, 2000Date of Patent: January 21, 2003Assignee: Honeywell International Inc.Inventors: Kreisler Lau, Feng Quan Liu, Boris Korolev, Emma Brouk, Rusian Zherebin, Roger Leung