Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract: A discharge lamp, such as a neon lamp, comprising a laminated envelope having a gas-discharge channel and at least one external electrode in communication with the gas-discharge channel, the laminated envelope having a front surface and a back surface integrated together to form a unitary envelope body essentially free of any sealing materials. The external electrode comprises an electrode surface integral with the laminated envelope and a conductive medium disposed on the electrode surface. The conductive medium may be conductive tape, conductive ink, conductive coatings, frit with conductive filler or conductive epoxies. The discharge lamp may comprise a laminated envelope including a plurality of separate gas-discharge channels and external electrodes in communication with the gas-discharge channels, whereby the discharge is driven in parallel.

Abstract: Disclosed is a process for sealing component assembly to an electrical lighting device using induction healing. The assembly comprises the component, such as an electrode lead wire, and a solder glass perform. The process is useful, for example, in hermetically sealing and affixing lamp components, such as electrical lead wires and exhaust tubulation, to a low-pressure fluorescent discharge lamp envelope having phosphor coating already applied thereto without causing to damage other lamp components sensitive to high temperature. The present invention is particularly suitable for lamp envelopes made of borosilicate glass having a CTE form 0 to 300° C. in the range of 30–45×10?7° C.?1.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: Optical isolators and methods of manufacturing optical isolators are disclosed. The optical isolators are manufactured by directly bonding the parts of the isolators without the use of adhesive or mechanical devices to hold the individual parts together.

Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser. The articles also exhibit improved off-axis refractive index homogeneity.

Abstract: The invention relates to glass-ceramic plates, hotplates incorporating them and their fabrication process. The glass-ceramic plate of the invention is of the type having a bottom substrate layer and a top coating layer and is characterized in that the top coating layer covers at least the external top surface of the bottom glass-ceramic layer and is a layer of a hard substrate material chosen from the group constituted by silicon carbide, silicon oxycarbide, silicon nitride, silicon oxynitride and hydrogenated amorphous carbons. The invention finds an application in the fabrication of coated glass-ceramic plates and in particular in the fabrication of glass-ceramic hotplates.

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation ? from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation ? produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation ?. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

Abstract: Objects of the present invention are: a lead-free enamel composition comprising finely divided glass particles, finely divided pigment particles and an organic binder, characterised in that the glass of said particles is a lead-free mineral glass, essentially having the composition below, which is expressed in percentages by weight of oxides: SiO2 45-60 CaO ?0-12 B2O3 ?0-10 BaO 13-27 Al2O3 ?6-17 ZnO ?3-17 Na2O 0- 7 MgO 0- 9 K2O 0-7 TiO2 0-2 Li2O 0- 7 ZrO2 0- 7 with Na2O + K2O + Li2O > 4 the enamel able to be obtained by firing of said composition; glass-ceramic articles, which are decorated with said enamel; and new lead-free mineral glasses.

Abstract: Two-layer protective coating system for glass surfaces is disclosed. The base coating comprises at least one polysaccharide, and the top coating has a lower solubility in water than the base coating. The coating system provides good protection against contaminants and glass chips, good removability in mild cleaning condition, and extra water resistance during process steps where water is used as a cooling agent.

Abstract: The invention relates to a melt-formed, high-silver, alkali-free, borosilicate glass that can be used for fabricating optical devices. For gradient index lenses, the glass can be subjected to an ion exchange process in order to introduce a less polarizable ion onto the glass surface having a higher refractive index on the surface relative to the center of the glass. The glass is unique in that the silver ions are not introduced by ion exchange. Rather, the high silver content of the glass is achieved during melting. As melted, the transparent alkali-free, borosilicate glass produced by the inventive method contains a high concentration of silver, exhibits a high refractive index and negligible attenuation at wavelengths longer than about 400 nm, making it particularly suitable for high performance fiber optic components such as gradient index or so-called GRIN lenses.

Abstract: The present invention provides an electro-optic ceramic material including lead, magnesium, niobium and titanium having a propagation loss of less than about 3 dB/cm and a quadratic electro-optic coefficient of greater than about 2×10?16 m2/V2 at 20° C. at a wavelength of 1550 nm. The present invention also provides electro-optic devices including an electro-optic ceramic material including lead, magnesium, niobium and titanium having a propagation loss of less than about 3 dB/cm and a quadratic electro-optic coefficient of greater than about 2×10?16 m2/V2 at 20° C. at a wavelength of 1550 nm. The materials and devices of the present invention are useful in optical communications applications such as intensity and phase modulation, switching, and polarization control.

Abstract: Polarized glass articles having a wavelength range that is broadened for high contrast-ratio applications. A method that imparts to a glass article a high contrast ratio of at least 40 dB for use as dichroic glass polarizers over a wavelength range of 880 nm to 1,690 nm while keeping a high transmission value. The method comprises the step of heating the glass article at a temperature ranging from 400 to 450° C. in a reducing atmosphere for a period of time ranging from 12 to 30 hours. Preferably, the reducing atmosphere is hydrogen at atmospheric pressure.

Abstract: A reflecting mirror comprising a sheet of an alkali metal-zinc-borosilicate glass bonded to a reflecting surface, the glass sheet having a thickness less than 0.5 mm, and being doped with Nd2O3 in an amount sufficient to substantially reduce the spectral transmission of the glass in the wavelength range of 565-595 nm.

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ?10 ppm, a F wt. % concentration ?0.5 wt. %.

Abstract: Methods of bonding optical components are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. The invention is useful for bonding optical fibers together and for bonding optical fiber arrays to lens arrays.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: Disclosed is a photochromic plastic ophthalmic lenses having polymer matrices with an effective amount of at least one photochromic agent distributed therein, applied thereto or associated therewith and at least one ophthalmic filtering dye applied thereto, associated therewith or distributed therein the lens. A group of the filter lenses have dominant wavelengthes between 570 and 605 nm and color purity between 50% and 75%. Another lens product of the present invention is particularly suitable for patients suffering from retinitis pigmentosa. The lenses of the present invention are particularly suitable for individuals bothered by strong or variable illumination intensity.

Abstract: Optical isolators and methods of manufacturing optical isolators are disclosed. The optical isolators are manufactured by directly bonding the parts of the isolators without the use of adhesive or mechanical devices to hold the individual parts together.