Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content<0.5 weight percent. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae.

Abstract: Disclosed are radically polymerisable compositions which contain at least one monofunctional monomer and at least one difunctional monomer; resins which are obtainable by radical copolymerisation of said compositions, it being possible for the resins to be photochromic or not; articles, notably ophthalmic articles, which are constituted totally or in part of such resins; and new monofunctional monomers.

Abstract: A method for creating refractive index changes in a substrate is provided by irradiating the substrate with infrared (IR) or visible light radiation. Ultra-violet (UV) radiation is generated in the substrate responsive to the IR or visible light radiation such that the change in the refractive index of the substrate is generated responsive to the UV radiation. Preferably, the substrate comprises a glass doped with rare earth ions.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: The present invention provides an electro-optic ceramic material including lead, zinc and niobium having a propagation loss of less than about 3 dB/cm and a quadratic electro-optic coefficient of greater than about 1×10−6 m2/V2 at 20° C. at a wavelength of 1550 nm. The present invention also provides electro-optic devices including an electro-optic ceramic material including lead, zinc and niobium having a propagation loss of less than about 3 dB/cm and a quadratic electro-optic coefficient of greater than about 1×10−16 m2 V at 20° C. at a wavelength of 1550 nm. The materials and devices of the present invention are useful in optical communications applications such as intensity and phase modulation, switching, and polarization control.

Abstract: The present invention relates to novel compounds of the naphthopyran type with a fused heterocycle in the 5,6-position. These compounds have formula (I) or (II) given below: These compounds (I) or (II) have valuable photochromic properties. The invention further relates to their preparation, to their applications as photochromic substances, and to the (co)polymer compositions and matrices containing them.

Abstract: The present invention relates to: a glass-ceramic which is opaque which has a low, or zero thermal expansion coefficient, which contains a solid solution of &bgr;-quartz as crystalline phase, which has a specific composition; and, to a process for obtaining said glass-ceramic.

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser.

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content<0.5 weight percent. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: Disclosed is a zinc phosphate glass consisting essentially, expressed in terms of mole percent on the oxide basis, of 31-34% P2O5, 0-2% Al2O3, 5-11% Li2O, 5-13% Na2O, 3-7% K2O, with Li2O+Na2O+K2O being 10-28%, 20-45% ZnO, 0-10% CaO, 0-10% BaO, 0-10% SrO, with CaO+BaO+SrO being 3-12%, and 0-2% SiO2, said glass exhibiting a stable glass transition temperature below 450° C., a working temperature below 500° C., and a water durability of no more than 5×10−7 g/cm2/min after immersion in water at 95° C. for 24 hours. The low-temperature glass of the present invention is particularly useful for producing glass/polymer blends. Glass/polymer blends containing the glass of the present invention are also disclosed.

Abstract: The invention relates to novel naphthopyran-type compounds, which are annelated in position C5-C6 with a seven-membered carbocycle, and which are of formula (I) given below: These compounds (I) possess interesting photochromic properties. The invention also relates to their preparation, their applications as photochromes as well as the compositions and (co)polymer matrices containing them.

Abstract: The present invention is directed towards a thin, flat glass envelope having an enclosed, internal channel and a molded edge for affixing attachments directly to the glass envelope. Suitable attachments include filters, i.e., diffusion, polarizing, glare reducing, brightness enhancing, liquid crystal display screens and masking components. The channeled envelope has a front and a back surface laminated and integrated together to form a unitary body essentially free of any sealing materials. A lightweight, light-emitting device or low-pressure discharge lamp can be formed from this channeled envelope, suitable for employment in the fields of LCD backlighting, automotive lighting, and general lighting.

Abstract: Polarizing glass having localized regions or patterns of non-polarizing glass is disclosed. The glass is formed by use of reducing gas-blocking material, by local thermal heating of the glass, or by an etching technique.

Abstract: The method herein shapes a thin glass article (10), as well as a thin glass interface (20, 22) between two laminated sheets (16, 18) as they seal together to form the glass article (10). This process changes the shape of the article (10) and modifies the internal interface (20, 22) at the juncture where the glass sheets (16, 18) meet to make the channels (12). As a result, the juncture is very thin and very little or no slope. The process uses the mechanical motion of a plunger combined with plunger vacuum and internal gas pressure to make these changes. The technique reduces the contact area between glass layers (16, 18). A reduced contact area can reduce the optical interference caused by the joining of two layers of glass (16, 18). The technique also makes the front surface of each channel (12) thinner. The glass thinness also allows for thinner products with substantially reduced light distortion at the juncture.

Abstract: This invention provides a TIR (total internal reflecting) lens to capture and redirect light from multiple light sources, such as neon or fluorescent lamps, to generate a light of uniform brightness across the lens face.

Abstract: Glassy coatings that isolate metal surfaces from carbon particles, and a method of applying the coatings. The coatings composed of essentially K2O, SiO2, and Al2O3, and has a CTE of at least 80×10−7/° C. These glassy coatings, which adhere well to metals, employ a potassium-silicate glass composition in three forms: a pure glass, a glass loaded with inert filler having a CTE higher than the glass itself, and a precursor frit that when “reactive-cerammed” produces a predominantly leucite crystalline phase and forms the glassy coating in-situ on the metal surface, creating a protective layer between the exposed metal surface and corrosive chemical-processing environments.

Abstract: A component of a thermal processing apparatus for a fluid stream of hydrocarbons, a precursor glass for a glass-ceramic coating on such component and a method of inhibiting deposition of a material, such as carbon, on a surface of the component.

Abstract: This light scattering technique for size measurement is based on the fact that an illuminated particle (inclusion) serves as a secondary radiation source in a manner which is related to its size. This technique allows for detection of inclusions in the interior of a transparent sheet. When illuminated with a beam of monochromatic light such as a laser beam as the primary light source, the angular distribution of the scattered intensity originated from the inclusion in the micron to submicron range, is a function of intensity, wavelength and index of refraction. The primary beam of light passes through the sheet on a straight line path parallel to a horizontal axis. A detector positioned at an angle to the horizontal axis detects the secondary scattered light.