Patents Represented by Attorney Smith, Gambrell & Russell
  • Patent number: 8274538
    Abstract: The emission intensity of a laser beam source, at a time when a laser beam emitted from the laser beam source and scanned by an optical scanning device becomes incident to a laser beam detector provided in a predetermined position on the scanning path of the laser beam in order to hold a position of an electrostatic latent image formed on a photoreceptor constant in the main scanning direction, while at the same time, changing the emission intensity of the laser beam, is set so as to become the consistently same emission intensity regardless of a change in emission intensity at the time of electrostatic latent image formation onto a photoreceptor. This allows the detection timing of a laser beam by a laser beam detector to be kept constant.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: September 25, 2012
    Assignee: Kyocera Mita Corporation
    Inventor: Masanori Okada
  • Patent number: 8275289
    Abstract: A fixing unit is provided with a heat roller having a plurality of heaters provided therein for applying heat to a toner image formed on a sheet of paper, an upper-side casing for holding the heat roller, a holding member detachably fitted to the upper-side casing, and a plurality of fitting portions that are provided in the holding member and to which first to third terminal portions of the plurality of heaters can be detachably fitted from a same direction.
    Type: Grant
    Filed: March 1, 2010
    Date of Patent: September 25, 2012
    Assignee: Kyocera Mita Corporation
    Inventor: Terumitsu Noso
  • Patent number: 8267041
    Abstract: A plasma treating apparatus adapted to provide a predetermined plasma treatment to an object W to be treated comprises a processing chamber 12 configured to be capable of being vacuumed, an object holding means 20 adapted to hold the object to be treated, a high frequency power source 58 adapted to generate high frequency voltage, a plasma gas supplying means 38 adapted to supply a plasma generating gas to be treated to generate plasma to the processing chamber, a pair of plasma electrodes 56, 56B connected to the output side of the high frequency power source via wirings 60 to generate plasma in the processing chamber, the pair of plasma electrodes being brought into an excited electrode state. In addition, a high frequency matching means 72 is provided in the middle of the wirings. In this case, each of the plasma electrodes 56A, 56B is not grounded. Thus, the plasma density can be increased, and the efficiency of generating plasma can be enhanced.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: September 18, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Toshiji Abe, Toshiki Takahashi, Hiroyuki Matsuura
  • Patent number: 8268540
    Abstract: A method of manufacturing a light receiving device 1 includes: providing a resin layer 14 containing a photo curing resin on a transparent substrate 13 where a plurality of transparent substrate portions 13A are integrated so that the resin layer covers the transparent substrate 13; selectively irradiating the resin layer 14 with light, followed by a developing process, so that the resin layer 14 remains in regions of the transparent substrate 13 which surround portions corresponding to regions facing light receiving portions 11 in the transparent substrate portions 13A; dividing the transparent substrate 13 into units of transparent substrate portions 13A so that a plurality of transparent substrate portions 13A are obtained; dividing the base substrate 12 into units of base substrate portions 12A so that a plurality of base substrate portions 12A are obtained; and joining the base substrate portions 12A and the transparent substrate portions 13A via the resin layer 14.
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: September 18, 2012
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Toyosei Takahashi, Junya Kusunoki, Kazuto Oonami, Mitsuo Sugino, Masakazu Kawata, Rie Takayama, Seiji Oohashi
  • Patent number: 8269332
    Abstract: A semiconductor element mounting board includes: aboard having surfaces; a semiconductor element mounted on one of the surfaces of the board; a first layer into which the semiconductor element is embedded, the first layer being provided on the one surface of the board; a second layer provided on the other surface of the board, the second layer being constituted from the same material as that of the first layer, the constituent material of the second layer having the same composition ratio as that of the constituent material of the first layer; and surface layers provided on the first and second layers, respectively, each of the surface layers being formed from at least a single layer. In such a semiconductor element mounting board, each of the surface layers has rigidity higher than that of each of the first and second layers. It is preferred that in the case where a Young's modulus of each surface layer at 25° C. is defined as X GPa and a Young's modulus of the first layer at 25° C.
    Type: Grant
    Filed: October 15, 2008
    Date of Patent: September 18, 2012
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Mitsuo Sugino, Hideki Hara, Toru Meura
  • Patent number: 8269990
    Abstract: An image forming apparatus according to the present invention includes a storage part which, to save read image data, saves image data not subjected to image processing together with processing data for image processing to be performed by an image processing part at later image formation. Then, the image forming apparatus, at the time of printing out the image data, subjects the image data to image processing only once by using the processing data in accordance with setting.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: September 18, 2012
    Assignee: Kyocera Mita Corporation
    Inventor: Tomohiro Kuwahara
  • Patent number: 8266820
    Abstract: A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.
    Type: Grant
    Filed: August 15, 2011
    Date of Patent: September 18, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hideki Nishimura, Mikio Nakashima
  • Patent number: 8263498
    Abstract: Disclosed is a semiconductor device fabricating method. A substrate is provided thereon with: an inorganic insulating film; a first inorganic sacrifice film stacked on the inorganic insulating film and having components different from those of the inorganic insulating film; a second sacrifice film formed of an inorganic insulative film stacked on the first sacrifice film, wherein a pattern for forming grooves for wiring embedment is formed in the second sacrifice film; and an organic layer including a photoresist film, wherein a pattern for forming holes for wiring embedment is formed in the organic film. According to the present invention, the thickness of the organic layer is set to be greater than the sum of the thicknesses of etch target films, i.e., the insulating film, the first sacrifice film and the second sacrifice film; the etch target films are etched in a selectivity-less manner by using plasma generated from a mixed gas of CF4 gas and CHF3 gas.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: September 11, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Ryukichi Shimizu, Akihiro Kikuchi, Toshihiko Shindo
  • Patent number: 8265807
    Abstract: An automatic takeoff and landing apparatus for an aircraft for realizing a takeoff run and performing an ascending flight of the aircraft up to a target altitude at takeoff; and for realizing an approaching flight and performing a landing run of the aircraft at landing.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: September 11, 2012
    Assignee: Fuji Jukogyo Kabushiki Kaisha
    Inventors: Akihiro Yamane, Mitsuru Kono, Takahiro Kumamoto
  • Patent number: 8263290
    Abstract: The invention is directed to iridium oxide based catalysts for use as anode catalysts in PEM water electrolysis. The claimed composite catalyst materials comprise iridium oxide (IrO2) and optionally ruthenium oxide (RuO2) in combination with a high surface area inorganic oxide (for example TiO2, Al2O3, ZrO2 and mixtures thereof). The inorganic oxide has a BET surface area in the range of 50 to 400 m2/g, a water solubility of lower than 0.15 g/l and is present in a quantity of less than 20 wt. % based on the total weight of the catalyst. The claimed catalyst materials are characterized by a low oxygen overvoltage and long lifetime in water electrolysis. The catalysts are used in electrodes, catalyst-coated membranes and membrane-electrode-assemblies for PEM electrolyzers as well as in regenerative fuel cells (RFC), sensors, and other electrochemical devices.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: September 11, 2012
    Assignee: Umicore AG & Co. KG
    Inventors: Marco Lopez, Andreas Schleunung, Peter Biberbach
  • Patent number: 8263036
    Abstract: The present invention relates to a method for manufacturing nitric acid wherein a gaseous mixture, including air and ammonia, is transported on a catalyst including platinum to carry out catalytic oxidation of the ammonia, and is characterized in that a sulfurated component is added to the gaseous mixture.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: September 11, 2012
    Assignee: Arkema France
    Inventors: Jean-Luc Dubois, Paul-Guillaume Schmitt
  • Patent number: 8262957
    Abstract: The present invention is a method for producing a ceramic porous body with high porosity and continuous macropores, which comprises mixing a ceramic powder with an aqueous solution of a gelable water-soluble polymer to form a slurry, gelling for a while to fix the tissue structure, freezing it to produce ice crystals in the gel tissue and creating structures that become continuous pores, thawing the ice by controlled atmospheric substitution-type drying method with the resulting water being replaced without damaging the gel, and then sintering it to produce a ceramic porous body having various porosities, pore diameters and pore shapes, while conventionally cracks and contraction were likely to occur during drying when the solids concentration of the slurry is less than 20 vol %, with the method of the present invention it is possible to control these problems even at a solids concentration of 10 vol % or less, manufacture and provide a ceramic porous body with a porosity of 72% to 99% and a compression stren
    Type: Grant
    Filed: February 20, 2008
    Date of Patent: September 11, 2012
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Manabu Fukushima, Masayuki Nakata, Yuichi Yoshizawa
  • Patent number: 8258428
    Abstract: A laser beam processing machine comprising a chuck table for holding a workpiece, a laser beam application means for applying a laser beam to the workpiece held on the chuck table, a processing feed means for moving the chuck table and the laser beam application means relative to each other in a processing-feed direction and an indexing-feed means for moving the chuck table and the laser beam application means in an indexing-feed direction perpendicular to the processing-feed direction, wherein the laser beam application means comprises a first laser beam application means for applying a first pulse laser beam having an energy density per one pulse of 20 to 60 J/cm2 and a second laser beam application means for applying a second pulse laser beam having an energy density per one pulse of 3 to 20 J/cm2.
    Type: Grant
    Filed: July 9, 2007
    Date of Patent: September 4, 2012
    Assignee: Disco Corporation
    Inventor: Hiroshi Morikazu
  • Patent number: 8256798
    Abstract: A substantially vertically extending concave portion is provided at a middle part of an impact absorbing face of an airbag body that deploys under a windshield so as to face a front seat occupant. With this configuration, an occupant who is seated in a regular seating position and wearing a seatbelt can be properly protected by preventing the neck area or the like of the occupant from being damaged. In addition, a bulging portion configured to bulge under the windshield and at an upper part of the concave portion is provided to the airbag body. With this configuration, it is possible to properly prevent the head area of an occupant who is not wearing a seatbelt from being damaged directly by the windshield.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: September 4, 2012
    Assignee: Fuji Jukogyo Kabushiki Kaisha
    Inventor: Yasuharu Yamazaki
  • Patent number: 8252141
    Abstract: Disclosed herein is a method for recovering a low sodium content lignin from spent kraft cooking liquor without the use a of strong mineral acid for acidulation.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: August 28, 2012
    Assignee: Andritz Oy
    Inventors: Lars Stigsson, Curt Lindstrom
  • Patent number: 8255082
    Abstract: The present invention is intended to achieve more accurate and facilitated positioning of a carrier onto a table, in a substrate processing apparatus configured for placing the carrier storing multiple sheets of wafers therein, on the table, by using a carrier arm. Before the carrier is actually carried by the carrier arm, a carrier jig having the same shape as the carrier is held by a holding part provided to the carrier arm. The carrier jig is provided with a camera, such that a central position of a region of an image taken by the camera will be coincident with a central position of an opening formed in the table, if the carrier jig is accurately located in an ideal position above the table. First, the carrier arm is actuated to move the holding part of the carrier arm to a preset lowering start position. Then, the image of the region including the opening is taken by the camera.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: August 28, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Takashi Asakawa, Haruoki Nakamura, Masayuki Enomoto
  • Patent number: 8252863
    Abstract: Rubber mixtures, including at least one rubber, a filler, an organosilicon compound of the formula I one rubber accelerator and one co-accelerator. The rubber mixtures are prepared by mixing at least one rubber, a filler, an organosilicon compound of the formula I, one rubber accelerator and one co-accelerator. The rubber mixtures can be used for production of moldings. Also disclosed is a process for preparation of the organosilicon compound of the formula I via transesterification.
    Type: Grant
    Filed: January 9, 2007
    Date of Patent: August 28, 2012
    Assignee: Evonik Degussa GmbH
    Inventors: Andre Hasse, Karsten Korth, Ingo Kiefer, Susann Witzsche, Philipp Albert, Oliver Klockmann
  • Patent number: 8252354
    Abstract: A method is used to separate fractions from a seed. This can be done by: a) Physically breaking down the Chia seed into smaller particles; b) Adding a liquid carrier to the broken Chia seed to form a Chia liquid carrier blend; c) Optionally providing further processing of the Chia liquid carrier blend to further reduce the particle size of the Chia particles d) Optionally centrifuging the Chia liquid carrier blend; e) Optionally forming at least three discernible layers of materials within the centrifuged Chia liquid carrier blend; f) Optionally separating the composition of at least one layer from remaining layers; and g) Optionally combining the separated layers together into a desired combination/ratios h) Drying the separated layers or combined layers into a flowable powder.
    Type: Grant
    Filed: June 4, 2010
    Date of Patent: August 28, 2012
    Assignee: MAS Marketing Holding Company, LLC
    Inventors: John M. Finney, Christopher J. Rueb, William A. Hendrickson, Daniel R. Roesler, Robert G. Bowman, David A. Canfield
  • Patent number: 8252853
    Abstract: Rubber mixtures are prepared by using, alongside the other constituents, pyrogenically prepared silicon dioxide in the form of crusts whose tamped bulk density (to DIN EN ISO 787-11) is from 185 to 700 g/l.
    Type: Grant
    Filed: January 2, 2007
    Date of Patent: August 28, 2012
    Assignee: Evonik Degussa GmbH
    Inventors: Rainer Friehmelt, Joachim Fröhlich, Werner Niedermeier, Ralph Hofmann, Uwe Schachtely
  • Patent number: D666614
    Type: Grant
    Filed: April 29, 2011
    Date of Patent: September 4, 2012
    Assignee: EBSCO Industries, Inc.
    Inventor: Jimmy Ding