Abstract: The present invention relates to a method for forming an optical device. The method includes providing a glass aggregate. Typically, the glass aggregate is a mixture of fine glass soot particles and coarser ground or milled glass powder. The glass particles are mixed with a liquid to form a slurry which is cast in a mold to form a porous pre-form. Subsequently, the porous pre-form is consolidated into a glass object by heating the pre-form at a relatively high temperature. The method of the present invention produces optical components having substantially no striae. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from the optical blank.

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: The present invention relates to a method for forming an optical blank. The method includes providing a green body that has a non-porous exterior portion and a porous interior portion. The interior portion is evacuated to create a vacuum in the interior portion. The green body is then pressed using a hot isostatic pressing technique to densify the green body into a solid glass optical blank. This method produces homogeneous optical blanks having substantially no striae. The method also produces dense, inclusion free glass. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from optical blank employing the method of the present invention.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: Articles and methods for manufacturing pigtailed planar optical devices are disclosed. The articles and methods include providing a tool including a substrate having a stepped region. The tool is capable of forming elements such as grippers or waveguides on a device substrate having different heights.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: A method for fabricating an integrated optical isolator includes depositing a wire grid material on a magneto-optical substrate and depositing a resist film on the wire grid material. The method further includes bringing a mold with a wire grid pattern on contact with the resist film and compressing the mold and resist film together so as to emboss the wire grid pattern in the resist film. The method further includes transferring the wire grid pattern in the resist film to the wire grid material on the magneto-optical substrate by etching.

Abstract: A method of making glass tubing includes assembling together a first glass rod having at least one bore and a second glass rod having at least one bore to form a single glass unit, shaping an outer surface of the glass unit to a desired cross-section, and drawing the glass unit to form a glass tubing having a predetermined outer and inner dimension.

Abstract: Articles and methods for securing or aligning objects on substrates are disclosed. The articles and methods include a gripping element disposed on a substrate that includes a groove and flexible gripping elements. The articles and methods are particularly useful for securing optical fibers in arrays and manufacturing optical devices.

Abstract: Methods for improving the strength of alumina refractory materials are disclosed. The method involves exposing the alumina material to a halogen gas. The treated materials can be used in furnaces for producing fused silica optical members.

Abstract: Methods of manufacturing stoichiometric lithium niobate elements are provided. The method involves heating lithium niobate substrates in the presence of a monolithic sintered source of lithium and/or niobium. The method is useful for producing lithium niobate optical elements such as waveguides, switches and modulators.

Abstract: Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.

Abstract: A method of writing a light guiding structure in a bulk glass substrate including selecting a bulk glass substrate made from a soft silica-based material; and focusing an excimer laser beam at a focus within said substrate while translating the focus relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path relative to that of the unexposed material while incurring substantially no laser induced breakdown of the material along the scan path. Various optical devices, including waveguides can be made in this way.

Abstract: An oven controlled crystal oscillator has an onboard processor containing an algorithm used to generate a frequency compensating signal based on a predetermined relationship and a monitored current consumption of a heater.

Abstract: A grinding assembly for shaping an inlet or outlet face of a ceramic catalyst substrate provides for forming a predetermined face on the substrate, the substrate having a circular or non-circular cross-sectional profile. A grinding head is rotated about a grinding axis, and the grinding axis is selectively translated about an orbital path.

Abstract: A method for producing lenses includes assembling a plurality of glass rods having a desired length into a single unit and cutting the single unit into multiple slices, each slice having a plurality of individual lenses. The method further includes finishing the slices to a desired thickness and surface finish and extracting the individual lenses from the slices.

Abstract: Polarizing glass articles and methods of manufacturing polarizing glass articles are disclosed. Optical isolators using the polarizing glass articles have reduced coupling and surface losses when compared with conventional optical isolators.

Abstract: A method and furnace are described for producing a fused oxide body by decomposing a precursor compound of the oxide in a flame to form molten oxide particles and collecting those particles in a furnace constructed of a refractory material to form a fused oxide body, the improvement in the method comprising treating the refractory material with a strong acid in liquid form to react with, and thereby remove, contaminants from at least the surface of the refractory material.

Abstract: A method of making an EUV lithography stage structure includes depositing a layer of a Ti doped SiO2 glass powder in a confined region to provide an underlying layer; applying a binder to form a primitive with the binder bonding the glass powder together at one or more selected regions; depositing an above layer of the glass powder above the deposited layer; applying the binder to the above layer with the binder bonding the glass powder together at one or more selected regions; repeating the deposition and binding steps to produce a number of successive layers with the binder bonding the successive layers together; and removing the unbonded glass powder to provide a bonded glass powder lithography stage structure which is then sintered and densified into a densified nonpowder glass lithography stage.

Abstract: A method for automating measurement of an optical property of a sample includes selecting a measurement aperture around a reference point on the sample (38), generating a set of grid nodes that fall within the measurement aperture (68), calculating the radial distance of each node with respect to a reference point within the measurement aperture, and calculating the angular position of each node with respect to the vertical. The method also includes moving a light source (32) and a light detector along the vertical and rotating the sample to measurement positions in which the light source and the light detector are aligned with one of the nodes in the measurement aperture, and measuring the optical property at the measurement position by energizing the light source and interrogating the detector. The calculated radial distances and angular positions are used to control positioning of the light source and the light detector and rotation of the sample.