Abstract: Addition of compounds of formula I ##STR1## in which R.sup.1 to R.sup.4 are each hydroxyl or C.sub.1-6 -alkoxy and R.sup.5 to R.sup.10 are each hydrogen or C.sub.1-6 -alkyl,to positive photoresist compositions based on a diazoquinone/novolak resin effectively suppresses stray radiation and halation effects in corresponding photoresist coatings, in particular if these coatings have been applied to highly reflective substrates.

Abstract: Storage-stable suspension comprised of a solid or liquid epoxy resin hardener and a solid or liquid toughener suspended therein is distinguished by excellent homogeneous dispersion of the toughener in the epoxy resin hardener and are suitable for preparing suspensions of curable epoxy resin compositions.

Abstract: Compounds of formula (I) ##STR1## wherein R.sub.1 is hydrogen, methyl or halogen, n is 2 or 3, and R is C.sub.1 -C.sub.6 alkyl, benzyl, 2-tetrahydrofuranyl, 2-tetrahydropyranyl, C.sub.1 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or benzyloxycarbonyl, or, if two substituents OR are ortho-positioned to each other, two substituents R together form an ethylene group which may be substituted by up to four C.sub.1 -C.sub.6 alkyl groups, or form a C.sub.2 -C.sub.6 alkylidene group, can be polymerized in the absence or presence of other unsaturated comonomers to polymers having a molecular weight M.sub.w of 10.sup.3 to 10.sup.6 and which are suitable for producing positive photoresists with high resolution and very good contrast.

Abstract: The invention relates to the use of polyglycidyl compounds as hardeners in powder coating compositions based on polyester resins which react with epoxy groups, which compounds are polyglycidyl esters of formula (I) or (II) ##STR1## wherein in formula (I) R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each independently of one another hydrogen, C.sub.1 -C.sub.4 alkyl or radicals of formula (III) ##STR2## wherein A is a polymethylene group of 2 to 4 carbon atoms, and R.sub.5 and R.sub.6 are each independently of each other hydrogen, C.sub.1 -C.sub.4 alkyl or radicals of formula (III) or, when taken together, are an unsubstituted or a C.sub.1 -C.sub.4 alkyl-substituted methylene or polymethylene group of 2 to 7 carbon atoms, but with the proviso that at least two of the substituents R.sub.1 to R.sub.6 are radicals of formula (III),and, in formula (II)n is an integer from 2 to 6,R.sub.

Abstract: Novel compounds of the formula (I) ##STR1## in which X is oxygen or sulfur, R and R.sub.1 independently of one another are C.sub.3 -C.sub.30 alkyl, R.sub.2 is C.sub.4 -C.sub.18 alkyl and R.sub.3, R.sub.4, R.sub.5 and R.sub.6 independently of one another are H, C.sub.1 -C.sub.20 alkyl, C.sub.3 -C.sub.20 alkenyl, benzyl, phenyl or phenyl which is substituted by C.sub.1 -C.sub.12 alkyl, and in which R.sub.5 and R.sub.6 can also be a direct bond, or R.sub.3 and R.sub.4 together are trimethylene, tetramethylene, ##STR2## and R.sub.5 and R.sub.6 are a direct bond or H, or in each case R.sub.3 and R.sub.6 together are a group .dbd.CH.sub.2 and R.sub.4 and R.sub.5 are H, or R.sub.4 and R.sub.5 together are a group .dbd.CH.sub.2 and R.sub.3 and R.sub.6 are H, or R.sub.3, R.sub.4, R.sub.5 and R.sub.6 together are ##STR3## and salts of these compounds, are described.

Abstract: Compounds of formula ##STR1## wherein R, L, X and Y are as defined in claim 1, are very suitable for use as UV absorbers in pressure-sensitive or heat-sensitive recording materials.

Abstract: A compound of formula ##STR1## wherein R.sub.0, R.sub.1, R.sub.2, R.sub.3, R.sub.6 and X are as defined in claim 1, are suitable for use as UV absorbers for protecting light-sensitive organic materials.

Abstract: Titanocenes of the formula I ##STR1## in which R.sup.1 are cyclopentadienyl.sup..crclbar. groups and R.sup.2 and R.sup.3 are aromatic radicals which are substituted in both ortho-positions by fluorine and, in addition, are substituted by an acyloxy group are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds.

Abstract: A compound having the formula (I): ##STR1## in which n is an integer ranging from 2 to 6; X is the residue of an optionally substituted primary or secondary aliphatic or cycloaliphatic polyol of formula II:X(OH).sub.n IIin which X and n have their previous significance; and Z is a group of formula:--CH.sub.2 --CH(CH.sub.2 OY)--in which Y is the residue of an optionally substituted primary or secondary aliphatic or cycloaliphatic monohydric alcohol, or Z is a group of formula: ##STR2## in which W is an optionally substituted aliphatic carbon chain, which may contain one or more heteroatoms, or Z is a group of formula--CH.sub.2 --CH(T)--in which T is an aliphatic or cycloaliphatic alkyl group.

Abstract: Compounds of the formula ##STR1## wherein R.sub.o, is hydrogen or alkylene-COOR where R is alkyl or hydroxyalkyl, R.sub.1 is hydrogen, alkyl, hydroxyalkyl, alkenyl or acyl, R.sub.2 and R.sub.3 are independently hydrogen, alkyl, alkenyl or alkoxy, R.sub.6 is hydrogen or alkyl, and X is --CH.sub.2 --, --NH--, --S-- or --O--, are suitable as UV absorbers for use in photosensitive organic materials in combination with a sterically hindered amine or hydroxyphenylbenzotriazole derivative.

Abstract: The present invention relates to a negative photoresist consisting essentially of a process for the production of relief structures usinga) at least one solid film-forming polyphenol,b) at least one compound which contains at least two epoxide groups or at least two vinyl ether groups or at least one epoxide and vinyl ether group in the molecule,c) at least one cationic photoinitiator for component b) andd) if appropriate customary additives.The resist can be developed under aqueous-alkaline conditions.

Abstract: The present document describes the use of an inhibitor for cationic polymerization as an additive to a thermocurable composition based on at least one cationically polymerizable organic material and an initiator for cationic polymerization in the form of an onium compound or a compound of the formula (I)[M.sup.+n (L).sub.x ].sup.n+ nX.sup.- (I),in which n is 2 or 3, M is a metal cation selected from the group comprising Zn.sup.2+, Mg.sup.2+, Fe.sup.2+, Co.sup.2+, Ni.sup.2+, Cr.sup.2+, Ru.sup.2+, Mn.sup.2+, Sn.sup.2+, VO.sup.2+, Fe.sup.3+, Al.sup.3+ and Co.sup.3+, X.sup.- is an anion selected from the group comprising PF.sub.6.sup.-, AsF.sub.6.sup.-, SbF.sub.6.sup.-, BiF.sub.6.sup.-, derivatives of these anions in which at least one fluorine atom has been replaced by a hydroxyl group, and CF.sub.3 SO.sub.3.sup.-, or in which up to 50% of the anions X.sup.-, based on the total amount of anions, may be any desired anions, L is water or an organic .sigma.

Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.

Abstract: In an electrophoretic separating device, a channel defining a separating path is constructed in the form of a closed loop. A sample to be separated is introduced via a feed opening into an electrolytic carrier medium that is moved with the aid of an electric field through the channel, which is provided in the region of its ends with inlet and outlet openings for the carrier medium, and is separated into individual components by the electric field. The electric field is generated in the channel by connecting electrodes in the region of the inlet and outlet openings to different potentials of a voltage source. The procedure for carrying out the method according to the invention is distinguished especially by the fact that the carrier medium and the sample are moved along the substantially closed separating path formed by the channel which is constructed in the form of a closed loop.

Abstract: There is disclosed a solid composition of polyglycidyl compounds having a molecular weight of less than 1500, which composition consists of one or more than one solid polyglycidyl compound and altogether not less than 5% by weight of one or of a mixture of more than one polyglycidyl compound, which compound or mixture is normally in liquid form, said amount being based on the total amount of all polyglycidyl compounds in the composition, which composition contains the said solid polyglycidyl compounds or at least part of the said solid polyglycidyl compounds in form of one or a mixture of more than one solid mixed phase, which solid mixed phase or mixture of more than one solid mixed phase essentially comprises the total amount of the polyglycidyl compounds which are normally in liquid form as additional component or components.

Abstract: The novel compounds of formula ##STR1## wherein n and R are as defined in claim 1, are very suitable for use as UV absorbers in layers of photographic materials.

Abstract: Liquid highly active photoinitiators are obtained by dissolving a solid photoinitiator of the titanocene type in liquid photoinitiators of the acetal or ketal type. The liquid mixtures have a long dark storage stability.

Abstract: An aqueous coating composition comprising a) an aqueous film-forming binder; and b) as corrosion inhibitor, a corrosion inhibiting amount of a product produced by reacting i) a mono- or di-aldehyde having the formula I:R--(CHO).sub.1 or 2 Iin which R is a C.sub.1 -C.sub.20 alkyl or alkylene group, optionally interrupted by one or more O- and/or N-atoms, or substituted by one or more hydroxy or cyano groups, or a C.sub.6 or C.sub.10 aryl or arylene group optionally substituted by one or more C.sub.1 -C.sub.10 alkyl groups, C.sub.1 -C.sub.10 alkoxy groups, hydroxy or nitro groups, or halogen atoms, with ii) a mono- or di-amine having the formula II:R.sub.1 --(NH.sub.2).sub.1 or 2 IIin which R.sub.1 is a C.sub.1 -C.sub.20 alkyl or alkylene group which is optionally interrupted by one or more O- and/or N-atoms, or substituted by one or more hydroxy or cyano groups, a C.sub.5 -C.sub.7 cycloalkyl or cycloalkylene group, a C.sub.6 or C.sub.10 aryl or arylene group or a C.sub.7 -C.sub.

Abstract: Photocurable and solvent-developable compositions based on photopolymerizable (meth)acrylates, a photoinitiator for (meth)acrylates, an organic polymeric binder which comprises free carboxyl groups and has an acid number of at least 60, a blocked polyisocyanate crosslinking agent which has a cleavage temperature of at least 100.degree. C., and an inert solvent in an amount such that the photocurable composition is pourable, are described.

Abstract: Bis(4-cyanatophenyl)-1,1-ethane, a low viscosity liquid, which is useful in wet filament winding, resin transfer molding and pultrusion processes is made by reacting cyanogen chloride dissolved in methylisobutylketone with a methylisobutylketone solution of bis(4-hydroxylphenyl)-1,1-ethane and a tertiary amine.