Abstract: A switchover system and method is described. The invention preferably operates in a data packet switching system for transmitting through a switching arrangement data packets that comprise at least a data packet identifier. The switching arrangement comprises at least an active switch card associated to a backup switch card. And the active switch card and the backup switch card receive simultaneously at least a data packet and transmit it to a network adapter device. The switchover system comprises active and backup means for respectively storing at an active and backup data packet address the transmitted at least data packet. It also comprises switchover detecting means coupled to the active and backup storing means for detecting a switchover event, and control means coupled to the active and backup storing means and to the switchover detecting means for setting the backup storing means when a switchover event is detected.

Abstract: The present invention relates to a method of selectively fabricating metal gate electrodes in one or more device regions by fully siliciding (FUSI) the gate electrode. The selective formation of FUSI enables metal gate electrodes to be fabricated on devices that are compatible with workfunctions that are different from conventional n+ and p+ doped poly silicon electrodes. Each device region consists of at least one Field Effect Transistor (FET) device which consists of either a polysilicon gate electrode or a fully silicided (FUSI) gate electrode. A gate electrode comprised of silicon and a Ge containing layer is used in combination with a selective removal process of the Ge containing layer. The Ge containing layer is not removed on devices with threshold voltages that are not compatible with the FUSI workfunction. Devices that are compatible with the FUSI workfunction have the Ge containing layer removed prior to the junction silicidation step.

Abstract: An integrated circuit is provided including an FET gate structure formed on a substrate. This structure includes a gate dielectric on the substrate, and a metal nitride layer overlying the gate dielectric and in contact therewith. This metal nitride layer is characterized as MNx, where M is one of W, Re, Zr, and Hf, and x is in the range of about 0.7 to about 1.5. Preferably the layer is of WNx, and x is about 0.9. Varying the nitrogen concentration in the nitride layer permits integration of different FET characteristics on the same chip. In particular, varying x in the WNx layer permits adjustment of the threshold voltage in the different FETs. The polysilicon depletion effect is substantially reduced, and the gate structure can be made thermally stable up to about 1000° C.

Abstract: A structure for a chip or chip package is disclosed, with final passivation and terminal metallurgy which are mechanically decoupled but electrically coupled to the multilayer on-chip interconnects. This decoupling allows the chip to survive packaging stresses in the final passivation region, with strain relief from the decoupling region and compliant leads therein, so that on-chip interconnect levels do not feel these external packaging or other stresses. This structure is particularly preferred for on-chip interconnects consisting of Cu and low-k dielectric, the latter having inferior mechanical properties relative to SiO2. The decoupled region extends over all chips on the wafer. It may also extend into the edgeseal or dicing channel region so as to allow chip dicing and retention of this mechanical decoupling all around every chip on the wafer.

Abstract: Embodiments of the present invention provide a thin-film coil assembly. The coil assembly includes a substrate, at least two layers of conductive material on top of the substrate, and one layer of insulating material between the two layers of conductive material, wherein the two layers of conductive material are in contact with two interconnects, respectively, which extends substantially vertical to the substrate.

Abstract: A process for forming a semiconductor device having an oxide beanie structure (an oxide cap overhanging an underlying portion of the device). An oxide layer is first provided covering that portion, with the layer having a top surface and a side surface. The top and side surfaces are then exposed to an oxide deposition bath, thereby causing deposition of oxide on those surfaces. Deposition of oxide on the top surface causes growth of the cap layer in a vertical direction and deposition of oxide on the side surface causes growth of the cap layer in a horizontal direction, thereby forming the beanie structure.

Abstract: A method is disclosed for forming a strained Si layer on SiGe, where the SiGe layer has improved thermal conductivity. A first layer of Si or Ge is deposited on a substrate in a first depositing step; a second layer of the other element is deposited on the first layer in a second depositing step; and the first and second depositing steps are repeated so as to form a combined SiGe layer having a plurality of Si layers and a plurality of Ge layers. The respective thicknesses of the Si layers and Ge layers are in accordance with a desired composition ratio of the combined SiGe layer (so that a 1:1 ratio typically is realized with Si and Ge layers each about 10 ? thick). The combined SiGe layer is characterized as a digital alloy of Si and Ge having a thermal conductivity greater than that of a random alloy of Si and Ge.

Abstract: A startup system using a boot code includes an external memory storing a boot code, a buffer connected to an external memory for storing the boot code transferred from the external memory, a DMA controller for commanding transfer of the boot code from the external memory to the buffer, and a mapping circuit connected to the buffer for mapping the boot code stored in the buffer onto a CPU. Accordingly, a flash ROM for storing the boot code may be eliminated, thereby reducing system cost.

Abstract: A region of a semiconductor wafer is converted to an SOI structure by etching a set of isolation trenches for each transistor active area and oxidizing the sidewalls of the trenches to a depth that leaves a pillar of semiconductor that forms a body contact extending from the active area downward to the bulk semiconductor. A self-aligned gate is then formed above the body contact.

Abstract: A structure and method are provided in which a stress present in a film is reduced in magnitude by oxidizing the film through atomic oxygen supplied to a surface of the film. In an embodiment, a mask is used to selectively block portions of the film so that the stress is relaxed only in areas exposed to the oxidation process. A structure and method are further provided in which a film having a stress is formed over source and drain regions of an NFET and a PFET. The stress present in the film over the source and drain regions of either the NFET or the PFET is then relaxed by oxidizing the film through exposure to atomic oxygen to provide enhanced mobility in at least one of the NFET or the PFET while maintaining desirable mobility in the other of the NFET and PFET.

Abstract: As disclosed herein, an FEOL line conductor stack is formed including a base conductor layer, an overlying layer of tungsten, and an optional gate capping layer. The stack, including layers from the optional capping layer down to the base conductor layer are directionally etched until an underlying layer is exposed. Then, the substrate is exposed to one or the other or both of: 1) a silicon-containing ambient to form a self-aligned layer of tungsten silicide on sidewalls of the tungsten layer; and 2) a source of nitrogen to form a thin layer of tungsten nitride on sidewalls of the tungsten layer. Such tungsten silicide and/or tungsten nitride layers serves to protect the tungsten during subsequent processing, among which may include sidewall oxidation (e.g. for a polysilicon base conductor layer) and/or the forming of silicon nitride spacers on sidewalls of the gate stack.

Abstract: A process is provided for forming a trench capacitor, such as used in a DRAM memory cell, in which the required number of polysilicon deposition steps and planarization steps are reduced. A first region of a first material is formed in the bottom portion of the trench, and a dielectric material for the collar structure is subsequently formed above this region on a portion of the trench sidewalls. A removable material, such as a resist or spin-on glass, is then provided in the trench, overlying the first material and in contact with the lower portion of the collar dielectric material. The upper portion of the collar structure is then removed, after which the removable material is removed to again expose the upper surface of the first region. A second region of a second material, overlying and in contact with the first region, is then formed; the second region has an upper surface below the surface of the substrate. The first and second materials are conducting materials, typically polysilicon.

Abstract: A method for the manufacture of sub-wavelength structures on substrates is provided, wherein a deformable photoresist is arranged on a substrate. A hydrophilic stamp (made of a material having a higher refractive index than the photoresist) is used to imprint wave guiding structures into the deformable photoresist. Light is coupled into the wave guiding structures to create evanescent waves to expose the photoresist. By imprinting critical dimensions on the substrate and subsequently exposing the resist by means of optical structures integrated in the stamp, those critical dimensions can be further reduced.

Abstract: A method for forming a gate dielectric for an integrated circuit device. In an exemplary embodiment of the invention, the method includes forming an initial oxynitride layer upon a substrate material, the oxynitride layer having an initial physical thickness. The initial oxynitride layer is then subjected to a plasma nitridation, the plasma nitridation resulting in final oxynitride layer having a final physical thickness.

Abstract: A method is described for configuring a system having a plurality of processors to provide the system with at least one cluster of processors, where each cluster has one service point. A distance is computed from each processor to other processors in the system. A plurality of total distances is then computed, where each total distance is associated with one processor. A minimum total distance is determined from the plurality of total distances. One processor is assigned to be the service point; this processor is the processor having the minimum total distance associated therewith.