Abstract: A fastening apparatus for fastening a first device to a second device is disclosed. The apparatus comprises a standoff member disposed through a through hole of the first device; a clamp member having a clamp portion for clamping the standoff member; a sleeve member having a hollow body and enclosing the clamp member, wherein the clamp member is compressed in the hollow body; a resilient member wrapping around the sleeve member; a rotatable cam member pivotly coupled to the clamp member; and a cap member arranged between the rotatable cam member and the resilient member, wherein the rotatable cam member is rotated to a first location to compress the resilient member for causing a first preload force exerted on the second device.

Abstract: An embodiment of the invention provides a method of creating local metallization in a semiconductor structure, and the use of local metallization so created in semiconductor structures. In one respect, the method includes forming an insulating layer on top of a semiconductor substrate; creating a plurality of voids inside the insulating layer, with the plurality of voids spanning across a predefined area and being substantially confined within a range of depth below a top surface of the insulating layer; creating at least one via hole in the insulating layer, with the via hole passing through the predefined area; and filling the via hole, and the plurality of voids inside the insulating layer through at least the via hole, with a conductive material to form a local metallization. A semiconductor structure having the local metallization is also provided.

Abstract: The present invention is directed to a method and apparatus for establishing documents relationship based on user's operation upon search result. When a user uses search engine to search for documents with a query in repository, the search result may be a list of ranked documents, and these documents may contain a lot of relationship in term of the specific query. If the user clicks some search result further, and if the click and open operation meet certain conditions, for example exceed a period of time, the clicked document could be deemed as related to the search query. Furthermore it could be inferred that there is a strong relationship between different documents clicked by the user. The present invention records the relationship between documents and presents it to the user when necessary.

Abstract: A method is provided for making a FET device in which a nitride layer overlies the PFET gate structure, where the nitride layer has a compressive stress with a magnitude greater than about 2.8 GPa. This compressive stress permits improved device performance in the PFET. The nitride layer is deposited using a high-density plasma (HDP) process, wherein the substrate is disposed on an electrode to which a bias power in the range of about 50 W to about 500 W is supplied. The bias power is characterized as high-frequency power (supplied by an RF generator at 13.56 MHz). The FET device may also include NFET gate structures. A blocking layer is deposited over the NFET gate structures so that the nitride layer overlies the blocking layer; after the blocking layer is removed, the nitride layer is not in contact with the NFET gate structures. The nitride layer has a thickness in the range of about 300-2000 ?.

Abstract: Embodiments of the present invention provide a microcomputer on which a plurality of ICs (Integrated Circuits) connected from one another by a source-synchronous interface is mounted.

Abstract: Disclosed is a process of an integration method to form an air gap in an interconnect. On top of a metal wiring layer on a semiconductor substrate is deposited a dielectric cap layer followed by a sacrificial dielectric layer and pattern transfer layers. A pattern is transferred through the pattern transfer layers, sacrificial dielectric layer, dielectric cap layer and into the metal wiring layer. The presence of the sacrificial dielectric layer aids in controlling the thickness and profile of the dielectric cap layer which in turn affects reliability of the interconnect.

Abstract: Embodiments of the present invention provide a test structure for inspection of integrated circuits. The test structure may be fabricated on a semiconductor wafer together with one or more integrated circuits. The test structure may include a common reference point for voltage reference; a plurality of voltage dropping devices being connected to the common reference point; and a plurality of electron-collecting pads being connected, respectively, to a plurality of contact points of the plurality of voltage dropping devices. A brightness shown by the plurality of electron-collecting pads during an inspection of the integrated circuits may be associated with a pre-determined voltage.

Abstract: A method and an apparatus are provided in which non-directional and directional metal (e.g. Ni) deposition steps are performed in the same process chamber. A first plasma is formed for removing material from a target; a secondary plasma for increasing ion density in the material is formed in the interior of an annular electrode (e.g. a Ni ring) connected to an RF generator. Material is deposited non-directionally on the substrate in the absence of the secondary plasma and electrical biasing of the substrate, and deposited directionally when the secondary plasma is present and the substrate is electrically biased. Nickel silicide formed from the deposited metal has a lower gate polysilicon sheet resistance and may have a lower density of pipe defects than NiSi formed from metal deposited in a solely directional process, and has a lower source/drain contact resistance than NiSi formed from metal deposited in a solely non-directional process.

Abstract: A method for self-aligned gate patterning is disclosed. Two masks are used to process adjacent semiconductor components, such as an nFET and pFET that are separated by a shallow trench isolation region. The mask materials are chosen to facilitate selective etching. The second mask is applied while the first mask is still present, thereby causing the second mask to self align to the first mask. This avoids the undesirable formation of a stringer over the shallow trench isolation region, thereby improving the yield of a semiconductor manufacturing operation.

Abstract: A method is provided in which a stress present in a film is reduced in magnitude by oxidizing the film through atomic oxygen supplied to a surface of the film. In an embodiment, a mask is used to selectively block portions of the film so that the stress is relaxed only in areas exposed to the oxidation process. A method is further provided in which a film having a stress is formed over source and drain regions of an NFET and a PFET. The stress present in the film over the source and drain regions of either the NFET or the PFET is then relaxed by oxidizing the film through exposure to atomic oxygen to provide enhanced mobility in at least one of the NFET or the PFET while maintaining desirable mobility in the other of the NFET and PFET.

Abstract: A device for flowing a liquid on a surface comprises: a flow path. A first port supplies the liquid to one end of the flow path and applies a first port pressure for retaining the liquid when the flow path is remote from the surface. A second port receives the liquid from the other end of the flow path and applies a second port pressure such that the difference between the first and second negative port pressures is oriented to promote flow of the liquid from the first port to the second port via the flow path in response to the flow path being located proximal to the surface and the liquid in the device contacting the surface. The first and second port pressures are such that the liquid is drawn towards at least the second port in response to withdrawal of the flow path from the surface. Such devices may employ microfluidic technology and find application in surface patterning.

Abstract: The present invention provides a method of manufacturing a printed circuit board. The method includes the steps of preparing an insulating substrate having a front surface and a back surface and a layer of metal foil formed on each of the front surface and the back surface; selectively forming a plating layer for forming a land on at least one of the metal foils; adjusting a thickness of the plating layer; and forming the metal foils into lines.

Abstract: A method is provided of forming a conductive via in contact with a bulk semiconductor region of a semiconductor-on-insulator (“SOI”) substrate. A first opening is formed in a conformal layer overlying a trench isolation region. The trench isolation region may share an edge with an SOI layer of the substrate. Desirably, a dielectric layer is deposited over a top surface of the conformal layer and the trench isolation region. A second opening can then be formed which extends through the dielectric layer and the first opening in the conformal layer. Desirably, portions of the bulk semiconductor region and the top surface of the conformal layer are exposed within the second opening. The second opening can then be filled with at least one of a metal or a semiconductor to form a conductive element contacting the exposed portions of the bulk semiconductor region and the top surface of the conformal layer.

Abstract: The present invention provides a method and apparatus of generating browsing paths for data, a method for browsing data and a computer program product. According to one aspect of the invention, there is provided a method of generating browsing paths for data. Firstly, a plurality of candidate browsing paths based on a data model describing the data structure is generated; next for each of the plurality of candidate browsing paths, importance of the browsing path based on a portion of data corresponding to the browsing path in the data is calculated; and at least one of the plurality of candidate browsing paths based on the importance is selected.

Abstract: Embodiments of the present invention provide a method of forming gate stacks for field-effect-transistors.

Abstract: Embodiments of the invention provide a method of forming embedded silicon germanium (eSiGe) in source and drain regions of a p-type field-effect-transistor (pFET) through a disposable spacer process; depositing a gap-filling layer directly on the eSiGe in the source and drain regions in a first process; depositing a layer of offset spacer material on top of the gap-filling layer in a second process different from the first process; etching the offset spacer material and the gap-filling layer, thus forming a set of offset spacers and exposing the eSiGe in the source and drain regions of the pFET; and finishing formation of the pFET.

Abstract: Embodiments of the invention provide a semiconductor device including a collector in an active region; a first and a second sub-collector, the first sub-collector being a heavily doped semiconductor material adjacent to the collector and the second sub-collector being a silicided sub-collector next to the first sub-collector; and a silicided reach-through in contact with the second sub-collector, wherein the first and second sub-collectors and the silicided reach-through provide a continuous conductive pathway for electrical charges collected by the collector from the active region. Embodiments of the invention also provide methods of fabricating the same.

Abstract: A process is described for forming a fully multiple silicided gate for complementary MOSFET (CMOS) devices. A silicidation process is performed on a gate structure, which includes a gate material overlying a gate dielectric disposed on a substrate. A layer of insulating material is formed which covers the gate structure; the thickness of this layer is less at sidewalls of the gate structure than on a top surface of the gate structure. A portion of the layer of insulating material is then removed, so that the sidewalls of the gate structure are exposed. A layer of metal is formed which covers the gate structure so that the metal is in contact with the sidewalls of the gate structure. The silicidation process is then performed, in which a metal silicide is formed from the gate material and the metal; the gate material is thereby fully silicided.

Abstract: A field effect transistor (“FET”) is provided which includes a gate stack overlying a single-crystal semiconductor region of a substrate, a pair of first spacers disposed over sidewalls of said gate stack, and a pair of regions consisting essentially of a single-crystal semiconductor alloy which are disposed on opposite sides of the gate stack. Each of the semiconductor alloy regions is spaced a first distance from the gate stack. The source region and drain region of the FET are at least partly disposed in respective ones of the semiconductor alloy regions, such that the source region and the drain region are each spaced a second distance from the gate stack by a first spacer of the pair of first spacers, the second distance being different from the first distance.

Abstract: A digital inverter formed by three carbon nanotubes (CNTs) extending vertically from a substrate, one CNT functioning as first source (S1) and having a first logic signal applied to it, another CNT functioning as second source (S2) and having a second logic signal applied to it, a third CNT functioning as gate (G), and disposed between the two sources (S1, S2). A drain (D) contact is associated with the gate (G). A logic signal applied to the gate (G) causes one or the other of the sources (S1, S2) to deflect, contacting the drain (D) and transferring its logic signal thereto—such as logic “0” on the gate resulting in logic “1” (from one of the sources) being transferred to the drain (D), and logic “1” on the gate resulting in logic “0” (from the other of the sources) being transferred to the drain (D).