Abstract: A vacuum insulating glazing unit is described. The vacuum insulating glazing unit has a first glass pane and a second glass pane; a set of discrete spacers positioned between the first and second glass panes, maintaining a distance between the first and the second glass panes; a hermetically bonding seal sealing the distance between the first and second glass panes over a perimeter thereof; an internal volume defined by the first and second glass panes and the set of discrete spacers and closed by the hermetically bonding seal, where the internal volume has an absolute vacuum pressure of less than 0.1 mbar. The outer pane face of the second glass pane is laminated to at least one glass sheet by at least one polymer interlayer forming a laminated assembly.

Abstract: A vacuum insulating glazing unit includes a first glass pane having a thickness Z1, and a second glass pane made of prestressed glass having a thickness, Z2, where Z1 is greater than Z2 (Z1>Z2) The glazing unit also includes a set of discrete spacers positioned between the first and second glass panes and a hermetically bonding seal sealing the distance between the first and second glass panes over a perimeter. A vacuum of pressure less than 0.1 mbar is created in an internal volume V. A thickness ratio, Z1/Z2, of the thickness of the first glass pane, Z1, to the thickness of the second glass pane, Z2, is equal to or greater than 1.30 (Z1/Z2?1.30).

Abstract: A glass panel includes a first glass substrate, a second glass substrate, a spacer profile at the periphery of the glass panel between the first and the second glass substrate. There is an intermediate substrate in the intermediate space between the first and the second glass substrates, the substrate having a first coefficient of thermal expansion, and means to maintain the intermediate substrate within the intermediate space. The panel also includes a second profile, having a second coefficient of thermal expansion, positioned facing the inner face of the spacer profile within the intermediate space between the first and second glass substrates of the glass panel. The second profile carries the means to maintain the intermediate substrate within the intermediate space. A difference between the first coefficient of thermal expansion and the second coefficient of thermal expansion is less than or equal to 20%.

Abstract: An antenna unit used by being attached to window glass for a building includes a radiating element, a wave directing member arranged on an outdoor side with respect to the radiating element, and a conductor arranged on an indoor side with respect to the radiating element, wherein where a distance between the radiating element and the wave directing member is denoted as a, and where a relative permittivity of a medium constituted by a dielectric member between the radiating element and the wave directing member is denoted as ?r, the distance a is (2.11×?r?1.82) mm or more.

Abstract: An integrated glazing unit (IGU) includes a first pane, an electronic laminate that includes an electronic device provided between first and second substrates, a plurality of terminals coupled to the electronic device, and the first substrate being attached to the first pane. The IGU also includes a second pane coupled to the electronic laminated assembly by a spacer, the spacer being recessed with respect to the laminate edge and the second pane edge, forming an interpane volume, R, between the first and second panes. The IGU further includes a gutter having an open face and giving access to an inner volume, Vi. The gutter is positioned within the interpane volume, R, with the open face being recessed from, flush with or extending by less than 10 mm from the second pane edge. The gutter is suitable for receiving the male and/or female electric connector of a cable harness in the inner volume, Vi.

Abstract: The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.

Abstract: A transparent substrate with a laminated film, which comprises a transparent substrate and a laminated film formed on at least one surface of the transparent substrate, wherein the laminated film has a first dielectric layer, a crystallinity-improving layer, a functional layer and a second dielectric layer in this order from the transparent substrate side, the crystallinity-improving layer contains ZrNx (wherein x is higher than 1.2 and at most 2.0), the functional layer contains at least one metal nitride selected from the group consisting of titanium nitride, chromium nitride, niobium nitride, molybdenum nitride and hafnium nitride, and the concentration of oxygen atoms at a boundary between the crystallinity-improving layer and the functional layer, is at most 20 atom %.

Abstract: The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.

Abstract: A system for a vehicle includes a window assembly adapted to be installed within the front opening of the vehicle frame. The window assembly includes an inner transparent sheet, an outer transparent sheet, and an interlayer of polymer disposed between the inner transparent sheet and the outer transparent sheet. The interlayer is configured wherein a first portion of the interlayer has a first variable thickness profile and wherein a second portion of the interlayer has a second variable thickness profile, with the first portion of the interlayer distinct from the second portion of the interlayer. The system also includes a front-facing camera positioned within the vehicle for receiving light transmissions from an object located outside the vehicle through the first portion. The system may also include a head up display—associated with the second portion of the interlayer.

Abstract: The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: A method of extracting and accelerating ions is provided. The method includes providing a ion source. The ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice, the first and second hollow cathodes being disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The method further includes generating a plasma using the first hollow cathode and the second hollow cathode.

Abstract: A heat treatable solar control glazing showing low-emissivity properties, and possibly also anti-solar properties, and methods to manufacture such a glazing. The glazing comprises a transparent substrate coated with a stack of thin layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n?1, each functional layer being surrounded by dielectric layers. At least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide deposited by PECVD, and the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it.

Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.

Abstract: The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).

Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.

Abstract: A method of extracting and accelerating ions is provided. The method includes providing a ion source. The ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice, the first and second hollow cathodes being disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The method further includes generating a plasma using the first hollow cathode and the second hollow cathode.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.