Abstract: A method of extracting and accelerating ions is provided. The method includes providing a ion source. The ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice, the first and second hollow cathodes being disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The method further includes generating a plasma using the first hollow cathode and the second hollow cathode.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: A method of extracting and accelerating ions is provided. The method includes providing a ion source. The ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice, the first and second hollow cathodes being disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The method further includes generating a plasma using the first hollow cathode and the second hollow cathode.

Abstract: A heat treatable solar control glazing showing low-emissivity properties, and possibly also anti-solar properties, and methods to manufacture such a glazing. The glazing comprises a transparent substrate coated with a stack of thin layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n?1, each functional layer being surrounded by dielectric layers. At least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide deposited by PECVD, and the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it.

Abstract: A plasma source is provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third hollow cathode is electrically connected to the third output wave. Electrical current flows between the at least three hollow cathodes that are out of electrical phase.

Abstract: A system for a vehicle includes a window assembly adapted to be installed within the front opening of the vehicle frame. The window assembly includes an inner transparent sheet, an outer transparent sheet, and an interlayer of polymer disposed between the inner transparent sheet and the outer transparent sheet. The interlayer is configured wherein a first portion of the interlayer has a first variable thickness profile and wherein a second portion of the interlayer has a second variable thickness profile, with the first portion of the interlayer distinct from the second portion of the interlayer. The system also includes a front-facing camera positioned within the vehicle for receiving light transmissions from an object located outside the vehicle through the first portion. The system may also include a head up display—associated with the second portion of the interlayer.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: An encapsulated glass assembly includes a plastic frame having at least three sides and corners, with the frame having a channel extending within its outer frame surface that includes a lower wall portion connected to a side wall portion. The outer frame surface further includes at least one upper wall portion extending from the side wall portion and extending along at least one side of the frame, each one of the at least one upper wall portions further defining a portion of the channel as a C-shaped channel. A glass panel coupled to the frame is retained within the C-shaped channel along at least one side of the frame such that the edge of the panel is adjacent to the side wall portion. An encapsulant having a Shore hardness less than the frame is bonded onto the panel and onto the frame to secure the panel to the frame.

Abstract: A dimming laminate (10) includes: a dimming substrate (18) in which a dimming function material (16) is provided between two first transparent substrates (12) and (14); and a second transparent substrate (22) that is bonded to one first transparent substrate (12) through an adhesive layer (20). Each of the first transparent substrates (12) and (14) has a different average thermal expansion coefficient at 50-350° C. from that of the second transparent substrate (22). In the dimming laminate (10), a third transparent substrate (26) is bonded to the other first transparent substrate (14) through an adhesive layer (24), and an average thermal expansion coefficient at 50-350° C. is equal between the third transparent substrate (26) and the second transparent substrate (22).

Abstract: An antenna includes a ground element defining a straight edge extending along a first axis. A radiating element is spaced apart from the ground element. A feeding element has a first conductor coupled to the ground element and a second conductor coupled to the radiating element. The radiating element includes two radiating segments extending substantially parallel to one another along a second axis transverse to the first axis with each radiating segment defining a width measured perpendicular to the second axis. The width of one radiating segment is greater than the width of the other radiating segment. A coupling portion connects the radiating segments and includes a straight edge facing the straight edge of the ground element. The straight edge of the coupling portion extends along a third axis that is transverse to the first axis. When combined with a substrate, the antenna is a component of a window assembly.

Abstract: An ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice. The first and second hollow cathodes are disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The first hollow cathode and the second hollow cathode are configured to alternatively function as electrode and counter-electrode to generate a plasma.

Abstract: A laminated substrate for an electrochromic dimmer element includes a glass substrate; and a transparent conductive film. The glass substrate includes a silicon oxide, an aluminum oxide, a boron oxide, an alkaline earth metal oxide, and an alkali metal oxide in a total amount of 90 mol % or more, and includes the alkali metal oxide in a total amount of 12 mol % or less. The transparent conductive film includes an indium oxide film containing tin, and a tin oxide film containing at least one of tantalum, antimony and fluorine, in this order from a glass substrate side. The indium oxide film is formed directly on the glass substrate, a refractive index and an extinction coefficient of the indium oxide film at a wavelength of 1.3 ?m is less than 0.4, and greater than 0.4, respectively. A film thickness of the tin oxide film is greater than 35 nm.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.

Abstract: An encapsulated glass assembly includes a glass panel and a plastic frame and a clip. The frame has at least three frame sides and has a lower wall portion extending from an outer wall surface along each of the at least three frame sides. The clip has a C-shaped clip channel and is coupled to a first frame side of the frame such that a portion of the panel is retained within the C-shaped clip channel. An optional clip can be coupled to a second frame side. The plastic frame can alternatively include a C-shaped channel on the second frame side, wherein another portion of the panel is retained within the C-shaped channel. An encapsulant is bonded onto the panel, the frame, and the clip to secure the frame to the panel. The encapsulant has a Shore hardness less than the Shore hardness of the frame.

Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.