Patents Assigned to Asahi Kasei Kogyo Kabushiki Kaisha
  • Patent number: 6165363
    Abstract: A hollow fiber filter membrane where the inner surface comprises a three-dimensional network structure having thick trunks of 10-30 .mu.m in maximum diameter and the average pore diameter of a minimum pore diameter layer of the membrane is 0.01 .mu.m or more and less than 1 .mu.m.
    Type: Grant
    Filed: June 18, 1998
    Date of Patent: December 26, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Teruhiko Oishi, Hiroyoshi Ohya
  • Patent number: 6162580
    Abstract: The present invention provides photosensitive compositions which comprise polyimide precursors having a chemical structure selected from several specific chemical structures and/or specific amide bond density and are adjusted so that the film obtained by applying and drying the composition may exhibit a specific absorbance to light. The polyimide film obtained by heat-curing the above photosensitive composition exhibits excellent physical properties and water resistance, and has high adhesive strength to epoxy resins, inorganic materials and metals.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: December 19, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yoshio Matsuoka, Kanichi Yokota, Yasuhiro Kataoka
  • Patent number: 6162729
    Abstract: A method of forming a wiring of an aluminum material having a low-temperature sputtering process for sputtering an aluminum material (aluminum or an alloy composed mainly of aluminum) at a temperature of below 300.degree. C. and a high-temperature sputtering process for sputtering at or above 300.degree. C., a film thickness (A) obtained by the low-temperature sputtering process is larger than a film thickness (B) obtained by the high-temperature sputtering process, and a deposition rate at high temperature sputtering is a rate which does not deteriorate the shape of a registration accuracy measurement mark, preferably 200 nm/min or less.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: December 19, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Toyohiko Kuno, Kenichi Kitamura, Ken Tanaka
  • Patent number: 6160185
    Abstract: Provided is a process for high purification of methylal by removing water and methanol present as impurities from the methylal. The process for purification of methylal comprises subjecting a methylal gas containing water and methanol and a polyalkylene glycol or a derivative thereof to gas-liquid counter current contact to remove the water and methanol.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: December 12, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yoshio Tanaka, Shigeru Yamamoto
  • Patent number: 6156834
    Abstract: The present invention provides a polyacetal resin composition improved, when molded, in environmental stress cracking resistance and in the physical properties of the weld portion. Environmental stress cracking resistance and physical properties of the weld portion before a heat aging resistance test can be improved by adding, to 100 parts by weight of a polyacetal resin, 0.001 to 1.0 part by weight of a difatty acid alkaline earth metal salt produced using two or more kinds of fatty acid and an alkaline earth metal. Also, the physical properties of the weld portion after a heat aging resistance test can be improved by further adding particular fatty acid ester compounds.
    Type: Grant
    Filed: March 17, 1999
    Date of Patent: December 5, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Toshiharu Seyama, Mikio Oka, Makoto Doki
  • Patent number: 6153107
    Abstract: A process for treating a development waste liquor containing a photosensitive resin and a surface active agent, which includes subjecting the waste liquor to a treatment for diminishing the efficacy of the surface active agent, thereby separating the resin component from the development waste liquor, thereafter irradiating the development waste liquor with an ultraviolet ray having a wavelength of 300 to 400 nanometers to cure the resin component in the development waste liquor, and then removing the resulting solids.
    Type: Grant
    Filed: August 11, 1998
    Date of Patent: November 28, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Nobuo Ogawa, Tsutomu Kojima, Shin Ashizuka, Andre Dheur
  • Patent number: 6153749
    Abstract: Disclosed is a method for producing an acyl group-containing hexaazaisowurtzitane derivative represented by the following formula (1),WA.sub.n H.sub.(6-n) (1)wherein n represents an integer of 4 or 6, each A independently represents an acyl group having 1 to 10 carbon atoms, H represents a hydrogen atom, and W represents a hexavalent hexaazaisowurtzitane residue represented by the following formula (2): ##STR1## which comprises: providing a composition system comprising a mixed solvent of a first solvent and a second solvent respectively having high and low dissolving abilities for the desired compound, wherein the mixed solvent has the desired compound dissolved therein; and removing the first solvent having a high dissolving ability from the composition system to thereby deposit crystals of the desired compound. The desired compound, which is useful as a precursor of high performance explosive additive, i.e.
    Type: Grant
    Filed: January 11, 1999
    Date of Patent: November 28, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Tamotsu Kodama, Haruyuki Minoura, Nobuhisa Miyake, Setsuo Yamamatsu, Tsutomu Katsumata
  • Patent number: 6153895
    Abstract: A p-type semiconductor composed basically of an Ib-IIIb-VIb.sub.2 group compound semiconductor (especially CuInS.sub.2) which is improved in carrier concentration and has advantages in manufacture and performance. In order to obtain the p-type semiconductor mentioned above, p-type CuInS.sub.2 is formed by adding both P (p-type impurity) and Sn (n-type impurity) to CuInS.sub.2. The carrier concentration of the p-type semiconductor is 5.times.10.sup.17 cm.sup.-3 which is larger than the value (5.times.10.sup.16 cm.sup.-3) obtained when P and In are added or another value (3.times.10.sup.15 cm.sup.-3) obtained when only P is added. A thin film solar cell characterized by a glass substrate (2), an Mo electrode (1), a p-type semiconductor layer (3), an n-type semiconductor layer composed of a CdS layer (4), and an ITO electrode (5) is manufactured by using the CuInS.sub.2 layer containing P and Sn as the p-type semiconductor (3).
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: November 28, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Takayuki Watanabe, Tetsuya Yamamoto, Hiroshi Yoshida
  • Patent number: 6149999
    Abstract: A phase-change recording medium having a recording layer (4) made of a Ge--Sb--Te alloy, comprises an interface reflection control layer (3) provided on a laser beam incident side of the recording layer (4). The interface reflection control layer (3) has an extinction coefficient k and a refractive index n, simultaneously satisfying: k.gtoreq.0.22n+0.14, k.ltoreq.0.88n-0.19, and n.ltoreq.2.8. From the foregoing, it follows that the intensity ratio between the reflected wave from and the incident wave on the interface between the recording layer (4) and the interface reflection control layer (3) is led to a specified range.As a result, for the recording layer (4) the ratio (Ac/Aa) of the light absorption rate (Ac) in the crystalline state to the light absorption rate (Aa) in the amorphous state increases. Furthermore, the optical contrast also has a sufficiently high value. It is therefore possible to produce a high quality readout signal in recording by overwriting.
    Type: Grant
    Filed: August 28, 1998
    Date of Patent: November 21, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Toshio Suzuki, Isao Morimoto
  • Patent number: 6147146
    Abstract: Disclosed are an oxymethylene polymer resin composition comprising an oxymethylene polymer, a sterically hindered phenol compound, a low-density polyethylene having a melt index of 0.2 to 100 g/10 minutes, a calcium salt of a fatty acid having 10 to 36 carbon atoms, wherein the calcium salt of a fatty acid has a calcium ion content of not larger than 50 ppm by weight and a chlorine ion content of not larger than 100 ppm by weight, and at least one formaldehyde-reactive substance selected from the group consisting of a non-polymeric compound containing a formaldehyde-reactive nitrogen atom and a polymer containing a formaldehyde-reactive nitrogen atom, and an extrusion molded article obtained from the above resin composition.
    Type: Grant
    Filed: March 25, 1999
    Date of Patent: November 14, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Mitsuhiro Horio, Toshiharu Seyama
  • Patent number: 6146577
    Abstract: An economical method for facilitating injection molding of a thermoplastic resin by reducing the viscosity of a molten resin without impairing the physical properties of the resin, the surface appearance of the molded article and productivity. In the method for injection molding of a thermoplastic resin, a thermoplastic resin in which not less than 0.2% by weight of carbon dioxide is dissolved is injected into a mold cavity pressurized with a gas beforehand to at least a pressure where foaming does not take place in the flow front of the molten resin.
    Type: Grant
    Filed: January 20, 1999
    Date of Patent: November 14, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hiroshi Yamaki, Yoshimasa Matsuura, Hiroshi Kataoka
  • Patent number: 6143916
    Abstract: An ammoxidation catalyst comprising a compound oxide of Mo, V, Nb, and at least one element selected from the group consisting of Te and Sb, wherein the compound catalyst exhibits an X-ray diffraction pattern satisfying the following relationship:0.40.ltoreq.R.ltoreq.0.75wherein R represents the intensity ratio defined by the following formula:R=P.sub.1 /(P.sub.1 +P.sub.2)wherein P.sub.1 and P.sub.2 represent the intensities of peak 1 and peak 2 appearing at diffraction angles (2.theta.) of 27.3.+-.0.3.degree. and 28.2.+-.0.3.degree., respectively.By the use of the ammoxidation catalyst of the present invention, not only can acrylonitrile or methacrylonitrile be produced in high yield, but also oxidative decomposition of ammonia feedstock into nitrogen can be effectively suppressed, thereby enabling an improved utilization of ammonia as a feedstock.
    Type: Grant
    Filed: December 3, 1999
    Date of Patent: November 7, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hidenori Hinago, Satoru Komada
  • Patent number: 6143385
    Abstract: The present invention relates to a method for hollow injection molding. More particularly, it concerns a method for hollow injection molding a shaft-unified type resin rotator with excellent productivity. The molded article obtained by the present invention is excellent in dimensional accuracy, strength, surface appearance and recyclability of materials.
    Type: Grant
    Filed: March 18, 1997
    Date of Patent: November 7, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Norihiko Furuya, Kimihiro Kubo, Masaaki Kondo
  • Patent number: 6143690
    Abstract: An ammoxidation catalyst for use in producing acrylonitrile or methacrylonitrile from propane or isobutane, which comprises a compound oxide and a silica carrier having supported thereon the compound oxide, wherein the compound oxide comprises molybdenum, vanadium, niobium and at least one element selected from the group consisting of tellurium and antimony, and wherein the alkali metal content of the ammoxidation catalyst is extremely small or substantially zero, and a process for producing acrylonitrile or methacrylonitrile by using the ammoxidation catalyst. By the use of the ammoxidation catalyst of the present invention, acrylonitrile or methacrylonitrile can be produced in high yield, as compared to the yield achieved by conventional ammoxidation catalysts containing a silica carrier.
    Type: Grant
    Filed: May 5, 1999
    Date of Patent: November 7, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Satoru Komada, Masatoshi Kaneta
  • Patent number: 6139804
    Abstract: A process for producing a polyoxymethylene using a reactor having a discharging port having a weir, which process comprises introducing trioxane or a mixture of trioxane and a compound reactive therewith into the reactor from its feeding port and continuously recovering the powdery polyoxymethylene formed, from said discharging port having a weir. Owing to the presence of the weir, the residence time of reaction mixture in reactor is long, making high the conversion of the monomer.
    Type: Grant
    Filed: April 24, 1997
    Date of Patent: October 31, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yukio Tanigawa, Hiromasa Matumoto
  • Patent number: 6133379
    Abstract: The present invention relates to a method for producing a thermoplastic resin composition by melt mixing Thermoplastic Resin (A) with Thermoplastic Resins (B) and (C) having a lower melting temperature or glass transition point than Thermoplastic Resin (A) by 10.degree. C. or more. The method comprises feeding Thermoplastic Resin (A) containing volatile components having a molecular weight of 300 or less at an amount of 500 to 30,000 ppm and Thermoplastic Resin (B) containing fewer volatile components than Component A from a top supply port of a melt kneader, removing volatile components under reduced pressure, and feeding Thermoplastic Resin (C) from a side supply port. According to the present invention, it is possible to produce a thermoplastic resin composition which satisfies inconsistent properties, i.e., improved impact strength and fewer volatile components, while at the same time having advantages in energy consumption and operation.
    Type: Grant
    Filed: February 10, 1998
    Date of Patent: October 17, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventor: Miki Yamagishi
  • Patent number: 6130280
    Abstract: An oxymethylene polymer resin shaped article having high flexural modulus, which is produced by molding an oxymethylene polymer resin, wherein the oxymethylene polymer resin is selected from the group consisting of an oxymethylene homopolymer resin, an oxymethylene copolymer resin and a mixture thereof. The oxymethylene copolymer resin comprises a copolymer of an oxymethylene monomer and a comonomer copolymerizable therewith, wherein the amount of the comonomer is extremely limited. The shaped article has the following characteristics: (1) a crystallinity of 72% or more; (2) an average crystallite size of 150 .ANG. or more; (3) 70% by volume or more of the whole volume of the shaped article being comprised of spherulites each having a diameter of 60 .mu.m or less; and (4) a thickness of 1 mm or more.
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: October 10, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hiroshi Yokoyama, Hajime Nagahara
  • Patent number: 6127438
    Abstract: A polyethylene microporous film excellent in mechanical strength, permeability and productivity and having a very high reliability such that the safety of a battery may be secured even under severe circumstances which film has a crosslinked structure and has a porosity of 20-80%, a gel fraction of 1% or more, and an average pore diameter determined by the permeation method of 0.001-0.1 .mu.m, and a process for producing the polyethylene microporous film.
    Type: Grant
    Filed: August 26, 1997
    Date of Patent: October 3, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Takuya Hasegawa, Takahiko Kondo
  • Patent number: 6127339
    Abstract: Disclosed is a peptide for binding thereto a low density lipoprotein, which has an amino acid sequence represented by the formula (I) or (II) and which has an electric charge (E) satisfying the following requirement: +1.ltoreq.E.ltoreq.+4 wherein E is defined by the formula: E=(the number of positive functional groups present in the peptide)-(the number of negative functional groups present in the peptide): ##STR1## wherein each a is independently Phe or Trp; each p is independently Arg or Lys; each X.sup.1, each X.sup.2 and each X.sup.3 are individually, independently an arbitrary amino acid residue; and m, n, p, q and r satisfy the following requirement: 2.ltoreq.m+n+p+q+r.ltoreq.10, wherein m and n satisfy the following requirements: 2.ltoreq.m+n.ltoreq.10 and 1.ltoreq.m, n.ltoreq.9, and p, q and r satisfy the following requirements: 0.ltoreq.p+q+r.ltoreq.8, 0.ltoreq.p, r.ltoreq.8 and 0.ltoreq.q.ltoreq.5.
    Type: Grant
    Filed: December 18, 1997
    Date of Patent: October 3, 2000
    Assignees: Asahi Kasei Kogyo Kabushiki Kaisha, Asahi Medical Co., Ltd.
    Inventors: Yoshihiro Hatanaka, Masaharu Aritomi
  • Patent number: 6127090
    Abstract: A process for producing a photosensitive resin printing plate comprising a step of forming a liquid photosensitive resin into a layer by applying the same to a substrate with a bucket, wherein a forming speed variation point for said layer is set at a position which is 30 to 80% of the forming distance of said layer, and wherein the liquid photosensitive resin is formed into a layer by successively reducing the forming speed thereafter.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: October 3, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Shinichi Kawatsuji, Mitsuhiro Watanabe