Patents Assigned to ASML Holding N.V.
  • Publication number: 20080285428
    Abstract: A system and method form a nanodisk that can be used to form isolated data bits on a memory disk. The imprint stamp is formed from first and second overlapping patterns, where the patterns are selectively etched. The selective etching leaves either pits or posts on the imprint stamp. The pits or posts are imprinted on the memory disk, leaving either pits or posts on the memory disk. The pits or posts on the memory disk are processed to form relatively small and dense isolated data bits. Instability of the isolated data bits caused by outside magnetic and thermal influences is substantially eliminated.
    Type: Application
    Filed: May 28, 2008
    Publication date: November 20, 2008
    Applicant: ASML Holding N.V.
    Inventor: Harry SEWELL
  • Publication number: 20080280539
    Abstract: A method of fabricating or preparing an optical component, such as a mirror, using an amorphous oxide coated substrate is presented. An amorphous oxide coating is applied to an optical substrate. An assessment of surface roughness of the coated surface is performed. The coated surface is polished based on the assessment. Initial assessments can be conducted and polishing can be performed based on those initial assessments prior to applying the coating to better prepare the surface for the coating. Each assessment can assess the surface's Mid-Spatial Frequency Roughness (MSFR), High-Spatial Frequency Roughness (HSFR), or both. The performing of the assessments, polishing and/or coating can be computer-controlled. This process is ideal in the fabrication of an optical component formed from a substrate with a near-zero coefficient of thermal expansion. An optical component fabricated in this manner is also presented.
    Type: Application
    Filed: May 11, 2007
    Publication date: November 13, 2008
    Applicant: ASML Holding N.V.
    Inventors: Joseph Paul Luc Girard, Louis Andrew Marchetti, Robert N. Kestner, James Kennon
  • Publication number: 20080278813
    Abstract: A beamsplitter includes a first fluoride prism and a second fluoride prism. A coating interface is between the first and second fluoride prisms, wherein an overall R(s)*T(p) function of the beamsplitter varies no more than ±2.74% in the range of 40-50 degrees of incidence.
    Type: Application
    Filed: July 23, 2008
    Publication date: November 13, 2008
    Applicant: ASML Holding N.V.
    Inventor: Ronald A. Wilklow
  • Patent number: 7445883
    Abstract: The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.
    Type: Grant
    Filed: August 14, 2006
    Date of Patent: November 4, 2008
    Assignee: ASML Holding N.V.
    Inventors: Nabila Baba-Ali, Justin Kreuzer, Harry Sewell
  • Patent number: 7443514
    Abstract: The present invention is directed to a system and method for using a spatial light modulator (SLM) to perform a null test of an (aspheric) optical surface. In an embodiment, such a system includes an interferometer, an optical element, and an SLM. The interferometer provides electromagnetic radiation. The optical element conditions the electromagnetic radiation to provide a first beam of radiation and a second beam of radiation. The SLM shapes a wavefront of the first beam of radiation resulting in a shaped wavefront corresponding to an optical surface. The shaped wavefront is incident on and conditioned by the optical surface. The shape of the optical surface is analyzed based on a fringe pattern resulting from interference between the shaped wavefront mapped by the optical surface and the second beam of radiation. The system may also include an optical design module that converts a null corrector design corresponding to the optical surface into instructions for the SLM.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: October 28, 2008
    Assignee: ASML Holding N.V.
    Inventors: Nora-Jean Harned, Robert D. Harned
  • Patent number: 7437911
    Abstract: Provided are a method and system for measuring a distance to an object. The system includes an air gauge configured to sense a distance to a surface of the object and a sensor configured to measure at least one from the group including (i) a relative position of the air gauge and (ii) a relative position of the surface of the object. Outputs of the air gauge and the sensor are combined to produce a combined air gauge reading.
    Type: Grant
    Filed: December 15, 2004
    Date of Patent: October 21, 2008
    Assignee: ASML Holding N.V.
    Inventors: Daniel N. Galburt, Boguslaw F. Gajdeczko
  • Publication number: 20080231937
    Abstract: A spatial light modulator (SLM) includes an integrated circuit actuator that can be fabricated using photolithography or other similar techniques. The actuator includes actuator elements, which can be made from piezoelectric materials. An electrode array is coupled to opposite walls of each of the actuator elements is an electrode array. Each array of electrodes can have one or more electrode sections. The array of reflective devices forms the SLM.
    Type: Application
    Filed: June 3, 2008
    Publication date: September 25, 2008
    Applicant: ASML Holding N.V.
    Inventors: Pradeep K. GOVIL, James G. Tsacoyeanes
  • Publication number: 20080224251
    Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 18, 2008
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T. Westeinde
  • Patent number: 7426076
    Abstract: A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: September 16, 2008
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Cheng-Qun Gui, Pieter Willem Herman De Jager, Robert D. Harned, Nora-Jean Harned
  • Patent number: 7426034
    Abstract: A system for measuring an index of refraction that has a light emitting diode and a plurality of reference fibers not in contact with a sample to be measured and that receive light from the light emitting diode. A plurality of sensing fibers with different-shaped plasmon sensors are in contact with the sample and receive light from the light emitting diode. Detectors sense an output of the light from the fibers. The sensing fibers can be arrayed in a planar arrangement, or in a bundle. A cylindrical lens can be used for directing light into the fibers. A plurality of light emitting diodes can be used, each directing its light output into a corresponding fiber. A ball lens can be used for directing the light into the reference fiber. A plurality of wavelength filters can be placed between the light emitting diode and the sensing fiber, and a wavelength of the light entering the fiber may be selected using the filters.
    Type: Grant
    Filed: August 6, 2007
    Date of Patent: September 16, 2008
    Assignee: ASML Holding N.V.
    Inventor: Todd R. Downey
  • Publication number: 20080219562
    Abstract: A method of calculating an aerial image of a spatial light modulator array includes calculating pair-wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pair-wise interference and the effective graytones. The graytones depend only on the modulation states of the pixels. The pair-wise interference depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pair-wise interference can be represented by a matrix of functions. The pair-wise interference can be represented by a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.
    Type: Application
    Filed: May 22, 2008
    Publication date: September 11, 2008
    Applicant: ASML Holding N.V.
    Inventor: Azat M. Latypov
  • Patent number: 7423732
    Abstract: A lithography system comprises an illumination system that supplies radiation and a projection system comprising an optical system and a patterning device located at a pupil plane. The patterning device patterns the radiation and the optical system projects the patterned radiation onto a target portion of a substrate. In one example, an additional patterning device is located at an object plane of the lithography system and patterns the radiation before the patterning device at the pupil plane.
    Type: Grant
    Filed: August 2, 2005
    Date of Patent: September 9, 2008
    Assignee: ASML Holding N.V.
    Inventors: Matthew Lipson, Azat M. Latypov
  • Patent number: 7420722
    Abstract: A method of combining output of a plurality of light sources includes arranging a plurality of light sources in the same plane and having their beams directed at a first mirror, rotating the first mirror in the plane so as to direct the beams towards the same direction, and pulsing the light sources in synchronization with the rotation of the first mirror. The light sources can include, for example, pulsed lasers or lamps. The method can further include directing the beams from the first mirror towards a second counter-rotating mirror, wherein rotation of the second counter-rotating mirror compensates for angular displacement of the beams due to rotation of the first mirror. The method can also include orienting the first mirror at about 45 degrees relative to an incident path of the beams. This method can be used, for example, to expose a substrate in a lithography system.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: September 2, 2008
    Assignee: ASML Holding N.V.
    Inventors: Robert D. Harned, Noreen Harned
  • Publication number: 20080198363
    Abstract: A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. A first frequency of light, such as visible light, is used to detect alignment patterns on the surface layer and a second frequency of light, such as infrared light, is used to detect patterns one layer below the surface. For example, reflected light of a first frequency and transmitted light of a second frequency are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems.
    Type: Application
    Filed: April 24, 2008
    Publication date: August 21, 2008
    Applicant: ASML Holding N.V.
    Inventors: Pankaj Raval, Walter H. Augustyn, Lev Ryzhikov
  • Publication number: 20080198343
    Abstract: An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes a gas supply device and a gas discharge device that produce a flow of cleaning gas into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.
    Type: Application
    Filed: February 15, 2007
    Publication date: August 21, 2008
    Applicant: ASML Holding N.V.
    Inventors: Harry Sewell, Louis John Markoya
  • Patent number: 7414785
    Abstract: A beamsplitter includes a first fluoride prism and a second fluoride prism. A coating interface is between the first and second fluoride prisms, wherein an overall R(s)*T(p) function of the beamsplitter varies no more than ±2.74% in the range of 40-50 degrees of incidence.
    Type: Grant
    Filed: June 11, 2003
    Date of Patent: August 19, 2008
    Assignee: ASML Holding N.V.
    Inventor: Ronald A Wilklow
  • Patent number: 7414701
    Abstract: A method and system for correcting optical aberrations in a maskless lithography system. Adjusters move individual spatial light modulators (SLMs) in an SLM array so that the surface of the SLM array deviates from a flat plane. The deviation compensates for aberrations in the lithography system, such as total focus deviation. In an embodiment, an individual SLM can be tilted, bent, and/or have its elevation changed. Multiple SLMs in the SLM array can move in different ways depending on the compensation to be made. The adjusters can be either actively or passively controlled. The method may be performed only during initial setup of the maskless lithography system, periodically as needed for maintenance of the lithography system, or prior to each exposure in the lithography system.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: August 19, 2008
    Assignee: ASML Holding N.V.
    Inventor: Peter Kochersperger
  • Patent number: 7411652
    Abstract: One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
    Type: Grant
    Filed: September 22, 2004
    Date of Patent: August 12, 2008
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Peter C. Kochersperger, Kars Zeger Troost
  • Patent number: 7410591
    Abstract: Provided is a method and system for manufacturing a nano-plate. The method includes depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers. Next, the deposited film layers are sectioned to expose a patterned surface. Finally, the patterned surface is then planarized and selectively etched to form a relief pattern which can be used as an imprint stamp.
    Type: Grant
    Filed: December 16, 2004
    Date of Patent: August 12, 2008
    Assignee: ASML Holding N.V.
    Inventor: Harry Sewell
  • Patent number: 7411687
    Abstract: A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: August 12, 2008
    Assignee: ASML Holding N.V.
    Inventors: Richard A. Gontin, Yuli Vladimirsky