Abstract: A Robot Position Calibration Tool (RPCT) is used to accurately calibrate a robot position for a reticle hand-off to a transfer station in a lithography tool with minimized particle generation and outgassing. Method(s), system(s) and computer program product(s) are described to calibrate the robot with minimal sensor usage and minimal slippage of a payload leading to minimized particle generation and outgassing inside a vacuum chamber of a lithography tool.

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract: A method for measuring a wavefront of an optical system. A first step of the method includes directing electromagnetic radiation uniformly at an object plane having a first grating positioned therein. Lines of the first grating comprise a plurality of dots. A second step of the method includes projecting an image of the first grating onto a focal plane having a second grating positioned therein. A third step of the method includes measuring the wavefront of the optical system based on a fringe pattern produced by the second grating.

Abstract: A system is provided to form illumination light beams having desirable divergence and directivity. For instance, the system can include an optical element and a relay. The optical element can include a pupil defining element. Further, the relay can have a first and second lens array arranged in series and configured to receive the plurality of beams and to re-image the plurality of beams into a corresponding plurality of beams in an image plane. Each of the plurality of corresponding beams can have a numerical aperture less than a numerical aperture of each of the plurality of beams.

Abstract: A grating includes an absorptive substrate and a plurality of reflective lines on the absorptive substrate. Each reflective line is formed by a plurality of reflective areas. The reflective areas can be arranged in a regular pattern. The reflective areas are between 70 nm and 120 nm in diameter. The reflective areas can be circular. The reflective areas can have a random height distribution.

Abstract: Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The method includes generating an ideal mask layout representative of image characteristics associated with a desired image. Next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout.

Abstract: A method and system as used to calibrate a reflective SLM. The system can include the SLM having an array of pixels and a projection optical system resolving individual pixels and having an apodized pupil. During a calibration operation, the pixels of the SLM receive varying voltage values to move them through various angles. Light reflecting from the pixels during these movements forms individual images for each pixel at each angle. The light passes through the apodized pupil and is received on one or more sections of a detector. The apodization pattern is selected so that individual pixels remain well resolved with strong sensitivity to the pixel mirror tilt. The light intensity received for each pixel at each angle is correlated to the voltage value received at the pixel to tilt the pixel to that angle producing a result signal used by a control device to calibrate the SLM.

Abstract: A gas gauge for sensing distance to an object includes a gas supply system and a nozzle that supplies the gas from the gas supply system to a space between the nozzle and the object. For example, the gas supply system supplies the gas with a flow rate that corresponds to a flow in a transitional region between laminar flow and turbulent flow. A surface of the nozzle may be roughened so as to increase a friction factor across the surface, which increases gas pressure drop and also a gain of the nozzle. Noise generated by the increased flow rate may be attenuated using one or more strategically placed Helmholtz attenuators and/or snubbers.

Abstract: An alignment target with geometry designs provides a desired alignment offset for processes (both symmetric and asymmetric) on a wafer substrate. The alignment target includes one or more sub-targets, where each sub-target is defined as having a left portion and a right portion having a different geometric pattern, and where the left portion has a geometry density and the right portion has a geometry density.

Abstract: An optical position measuring system (e.g., an interferometer) includes a superluminescent device (SLD) (e.g., a laser diode having at least one anti-reflective coated surface) and a detector. The SLD generates a light beam having a short coherence length (e.g., about 0.1 mm to about 0.5 mm, less than the optical path length of an optical element, and/or less than a spacing between optical elements). Through use of the short coherence length light beam, interference effects from spurious or ghost reflections that exist in conventional position measuring systems are substantially reduced or eliminated.

Abstract: The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.

Abstract: In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.

Abstract: A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.

Abstract: A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.

Abstract: Angular deviation of illumination beam is measured with high accuracy for an expanded continuous range of angles using grating sensors that are configured to exhibit Surface Plasmon Resonance effects at actinic wavelengths. The beam deviation measurement systems and procedures are applicable to both mask-based and maskless lithography tools. A control system adopts an appropriate calibration algorithm based on whether the SPR effect is detected or not. Relative intensity shift in an SPR-affected diffractive order, and/or relative position and slope change in non-SPR-affected diffractive orders are used as a basis of the adopted calibration algorithm.

Abstract: A choked-flow orifice gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the gas gauge proximity sensor of the present invention replaces the use of a mass flow controller with a choked flow orifice. The use of a choked flow orifice provides for reduced equipment cost and improved system reliability. A gas supply forces gas into the proximity sensor. The gas is forced through the choked flow orifice to achieve sonic conditions at which time the mass flow rate becomes largely independent of pressure variations. The flow of gas proceeds from the choked flow orifice into a sensor channel system. A mass flow sensor within the sensor channel system monitors flow rates to detect measurement standoffs that can be used to initiate a control action.

Abstract: A method, system and computer program product to control position of an error control module in a lithography apparatus using a servo control loop is described herein. The system comprises a filter, a servo controller coupled to the filter and configured to receive a control signal and an actuator coupled to the servo controller and configured to control the position of the error control module. The filter is configured to filter the control signal by modulating the amplitude and phase of the control signal in a desired frequency range, prior to the servo control loop.

Abstract: The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

Abstract: A maskless pattern generating system for use in lithographic processing includes a liquid crystal pixel array. The system generates a light beam and applies a voltage level to each pixel of the pixel array to modulate a polarization state of the light beam so as to create a pattern image. The voltage levels correspond to greyscale levels assigned to the pixels. The system can receive a control signal input based on pattern information that defines the pattern image. The setting of the individual voltage levels can allow the liquid crystal pixel array to act as a phase shift mask, can allow the pattern image to be shifted, and can allow the manipulation of a pattern image edge. This maskless pattern writing system acts as a light valve to control pattern imagery, on a pixel by pixel basis, for the purposes of direct writing patterns.

Abstract: The present invention relates to an apparatus for polarizing an incident light beam. In embodiments, a tile wave plate assembly is provided. The tile wave plate includes a layered structure having a substrate plate and two layers of mosaic tiles. The layers of the apparatus are mechanically separated to form a controlled gap spacing. The mosaic tiles can be configured to form a pseudo or true zero order wave plate.