Patents Assigned to ASML Netherlands B.V.
-
Patent number: 11846879Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: November 7, 2022Date of Patent: December 19, 2023Assignee: ASML NETHERLAND B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
-
Patent number: 11846889Abstract: A diffraction pattern guided source mask optimization (SMO) method that includes determining a source variable region from a diffraction pattern. The source variable region corresponds to one or more areas of a diffraction pattern in a pupil for which one or more pupil variables are to be adjusted. The source variable region in the diffraction pattern includes a plurality of pixels in an image of a selected region of interest in the diffraction pattern. Determining the source variable region can include binarization of the plurality of pixels in the image such that individual pixels are either included in the source variable region or excluded from the source variable region. The method can include adjusting the one or more pupil variables for the one or more areas of the pupil that correspond to the source variable region; and rendering a final pupil based on the adjusted one or more pupil variables.Type: GrantFiled: February 20, 2020Date of Patent: December 19, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Duan-Fu Stephen Hsu, Dezheng Sun
-
Patent number: 11847570Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data comprising an input image of at least a part of a substrate having a plurality of features and a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation of the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.Type: GrantFiled: June 10, 2022Date of Patent: December 19, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Adrianus Cornelis Matheus Koopman, Scott Anderson Middlebrooks, Antoine Gaston Marie Kiers, Mark John Maslow
-
Patent number: 11846867Abstract: A broadband radiation source device configured for generating a broadband output radiation upon receiving pump radiation, the device including: a hollow-core photonic crystal fiber (HC-PCF) including at least one structurally varied portion having at least one structural parameter of the HC-PCF varied with respect to one or more main portions of the HC-PCF, wherein the at least one structurally varied portion includes at least a structurally varied portion located downstream of a position along the length of the HC-PCF where the pump radiation will be spectrally expanded by a modulation instability dominated nonlinear optical process, and wherein the at least one structurally varied portion is configured and located such that the broadband output radiation includes wavelengths in the ultraviolet region.Type: GrantFiled: December 1, 2021Date of Patent: December 19, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Janneke Ravensbergen, Patrick Sebastian Uebel, Willem Richard Pongers
-
Patent number: 11846887Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.Type: GrantFiled: April 7, 2022Date of Patent: December 19, 2023Assignee: ASML Netherlands B.V.Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
-
Publication number: 20230400785Abstract: There is provided a conditioning system for a lithographic apparatus, said conditioning system being configured to condition one or more optical elements of the lithographic apparatus, wherein the conditioning system is configured to have a sub-atmospheric pressure at the one or more optical elements.Type: ApplicationFiled: October 14, 2021Publication date: December 14, 2023Applicant: ASML Netherlands B.V.Inventors: Antonius Johannus VAN DER NET, Martinus Cornelis Maria VERHAGEN, Johannes Henricus Wilhelmus JACOBS, Laurentius Johannes Adrianus VAN BOKHOVEN, Jeroen Peterus Johannes VAN LIPZIG
-
Publication number: 20230400783Abstract: An object table including: a holding surface for holding an object; and an actuator arrangement configured to exert a holding force on the object for holding the object to the holding surface, wherein the actuator arrangement is further configured to decrease a strain in the object caused by the holding force by sequentially detaching and re-attaching portions of the object from the holding surface, while the object is held to the holding surface.Type: ApplicationFiled: September 27, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Michael Marinus Anna STEUR, Bas JANSEN, Andre Bernardus JEUNINK, Johannes Adrianus Cornelis Maria PIJNENBURG
-
Publication number: 20230401694Abstract: A method and apparatus for identifying locations to be inspected on a substrate is disclosed. A defect location prediction model is trained using a training dataset associated with other substrates to generate a prediction of defect or non-defect and a confidence score associated with the prediction for each of the locations based on process-related data associated with the substrates. Those of the locations determined by the defect location prediction model as having confidences scores satisfying a confidence threshold are added to a set of locations to be inspected by an inspection system. After the set of locations are inspected, the inspection results data is obtained, and the defect location prediction model is incrementally trained by using the inspection results data and process-related data for the set of locations as training data.Type: ApplicationFiled: November 2, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Chenxi LIN, Yi ZOU, Tanbir HASAN, Huina XU, Ren-Jay KOU, Nabeel Noor MOIN, Kourosh NAFISI
-
Publication number: 20230401727Abstract: A method for aligning a measured image of a pattern printed on a substrate with a design layout. The method includes: obtaining a design layout of a pattern to be printed on a substrate and a measured image of the pattern printed on the substrate; performing a simulation process to generate a plurality of simulated contours of the design layout for a plurality of process conditions of a patterning process; identifying a set of disfavored locations based on the simulated contours; and performing an image alignment process to align the measured image with a selected contour of the simulated contours using locations other than the set of disfavored locations.Type: ApplicationFiled: October 19, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventor: Te-Sheng WANG
-
Publication number: 20230400778Abstract: A method to infer a current sampling scheme for one or more current substrates is provided, the method including: obtaining a first model trained to infer an optimal sampling scheme based on inputting context and/or pre-exposure data associated with one or more previous substrates, wherein the first model is trained in dependency of an outcome of a second model configured to discriminate between the inferred optimal sampling scheme and a pre-determined optimal sampling scheme; and using the obtained first model to infer the current sampling scheme based on inputting context and/or pre-exposure data associated with the one or more current substrate.Type: ApplicationFiled: October 26, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Roy WERKMAN, Jochem Sebastiaan WILDENBERG, Reza SAHRAEIAN
-
Patent number: 11843069Abstract: The present disclosure describes a detector used in critical dimension scanning electron microscopes (CD-SEM) and review SEM systems. In one embodiment, the detector includes a semiconductor structure having a p-n junction and a hole through which a scanning beam is passed to a target. The detector also includes a top electrode for the p-n junction (e.g., anode or cathode) that provides an active area for detecting electrons or electromagnetic radiation (e.g., backscattering from the target). The top electrode has a doped layer and can also have a buried portion beneath the doped layer to reduce a series resistance of the top electrode without changing the active area. In another embodiment, an isolation structure can be formed in the semiconductor structure near sidewalls of the hole to electrically isolate the active area from the sidewalls. A method for forming the buried portion of the top electrode is also described.Type: GrantFiled: December 4, 2019Date of Patent: December 12, 2023Assignee: ASML Netherlands B.V.Inventors: Gianpaolo Lorito, Stoyan Nihtianov, Xinqing Liang, Kenichi Kanai
-
Patent number: 11842420Abstract: A method for aligning a wafer image with a reference image, comprising: searching for a targeted reference position on the wafer image for aligning the wafer image with the reference image; and in response to a determination that the targeted reference position does not exist: defining a current lock position and an area that encloses the current lock position on the wafer image; computing an alignment score of the current lock position; comparing the alignment score of the current lock position with stored alignment scores of positions previously selected in relation to aligning the wafer image with the reference image; and aligning the wafer image with the reference image based on the comparison.Type: GrantFiled: April 15, 2022Date of Patent: December 12, 2023Assignee: ASML Netherlands B.V.Inventors: Wei Fang, Lingling Pu
-
Publication number: 20230393458Abstract: A method for generating a mask pattern for a patterning process. The method includes obtaining (i) a subset of target features (e.g., features too close) within a target pattern, the subset of target features having physical characteristic values below a threshold value, and (ii) an initial mask pattern (e.g., using an existing OPC process) associated with the target pattern; and modifying, based on a mask manufacturing constraint and a performance metric of the patterning process, one or more features of the initial mask pattern corresponding to the subset of target features to generate the mask pattern, the modifying including applying a curvature to a portion of the one or more features of the initial mask pattern.Type: ApplicationFiled: September 27, 2021Publication date: December 7, 2023Applicant: ASML NETHERLANDS B.V.Inventor: Jaiin MOON
-
Publication number: 20230393487Abstract: A method for modeling measurement data over a substrate area relating to a substrate in a lithographic process. The method includes obtaining measurement data relating to the substrate and performing a combined fitting to fit to the measurement data: at least a first interfield model which describes distortion over the substrate and a field distortion model which describes distortion within an exposure field; wherein either: the at least a first interfield model includes a radial basis function model or an elastic energy minimizing spline model; or the method further includes fitting a radial basis function model or an elastic energy minimizing spline model to a distortion residual of the combined fit of a different interfield model and the field distortion model.Type: ApplicationFiled: November 9, 2021Publication date: December 7, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Gijs TEN HAAF, Shreya ADYANTHAYA
-
Publication number: 20230393490Abstract: A computer program product causes a processor to execute a process of causing an optical system to illuminate at least one structure on a substrate that comprises first repetitive features at a first pitch in a first layer and second repetitive features at a second pitch in a second layer, the first repetitive features at least partially overlapping with the second repetitive features. The first pitch is different from the second pitch. The processor causes the optical system to receive radiation scattered by the at least one structure and transmit a portion of the received scattered radiation to a sensor arranged in an image plane of the optical system or in a plane conjugate with the image plane for detecting the received scattered radiation and configured to detect a characteristic of radiation impinging on the sensor. The processor then determines a characteristic of interest of the structure.Type: ApplicationFiled: August 22, 2023Publication date: December 7, 2023Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey DEN BOEF, Ronald Joseph Antonius VAN DEN OETELAAR
-
Publication number: 20230395352Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.Type: ApplicationFiled: July 31, 2023Publication date: December 7, 2023Applicant: ASML Netherlands B.V.Inventors: Ning YE, Jun JIANG, Jian ZHANG, Yixiang WANG
-
Patent number: 11837431Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).Type: GrantFiled: June 25, 2018Date of Patent: December 5, 2023Assignee: ASML Netherlands B.V.Inventors: Shuai Li, Zhongwei Chen
-
Patent number: 11835862Abstract: A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the design variables, from a distribution of the values of the characteristic for that set of values of the design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the design variables.Type: GrantFiled: August 3, 2021Date of Patent: December 5, 2023Assignee: ASML NETHERLANDS B.V.Inventor: Steven George Hansen
-
Patent number: 11837931Abstract: An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pm1 in a first direction and a pitch Pm2 in a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio R1 of a coil pitch Pc1 in the first coil set in the first direction over Pm1 is different from a ratio R2 of a coil pitch Pc2 in the second coil set in the second direction over Pm2.Type: GrantFiled: March 9, 2022Date of Patent: December 5, 2023Assignee: ASML Netherlands B.V.Inventors: Maarten Hartger Kimman, Dave Braaksma, Peter Michel Silvester Maria Heijmans, Christiaan Alexander Hoogendam
-
Patent number: 11835106Abstract: The invention relates a method for manufacturing a damper device including a first part and a second part, said method comprising the following steps: a) providing a damping material in a space in between the first part and the second part, such that the damping material is in a compressed state in the space; and b) heating the device to a predetermined temperature in order to adhere the damping material to the first part and the second part.Type: GrantFiled: November 15, 2018Date of Patent: December 5, 2023Assignee: ASML Netherlands B.V.Inventors: Derk Ten Hoopen, Francois-Xavier Debiesme, Eric Pierre-Yves Vennat