Patents Assigned to ASML Netherlands
  • Method and apparatus to determine a patterning process parameter
    Patent number: 10782617
    Abstract: A method, including: measuring a first plurality of instances of a metrology target on a substrate processed using a patterning process to determine values of at least one parameter of the patterning process using a first metrology recipe for applying radiation to, and detecting radiation from, instances of the metrology target; and measuring a second different plurality of instances of the metrology target on the same substrate to determine values of the at least one parameter of the patterning process using a second metrology recipe for applying radiation to, and detecting radiation from, instances of the metrology target, wherein the second metrology recipe differs from the first metrology recipe in at least one characteristic of the applying radiation to, and detecting radiation from, instances of the metrology target.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: September 22, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Anagnostis Tsiatmas, Elliott Gerard McNamara
  • Lithography apparatus and a method of manufacturing a device
    Patent number: 10782618
    Abstract: An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: September 22, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jorge Alberto Vieyra Salas, Auke Juriaan Been, Victor Manuel Blanco Carballo
  • SUBSTRATE HOLDER AND A METHOD OF MANUFACTURING A DEVICE
    Publication number: 20200292947
    Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.
    Type: Application
    Filed: October 11, 2018
    Publication date: September 17, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas POIESZ, Satish ACHANTA, Jeroen BOUWKNEGT, Abraham Alexander SOETHOUDT
  • Radiation Source
    Publication number: 20200296817
    Abstract: A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the plasma; an imaging system configured to capture an image of the target; one or more markers at the collector and within a field of view of the imaging system; and a controller. The controller receives data representative of the image; and controls operation of the radiation source in dependence on the data.
    Type: Application
    Filed: August 16, 2018
    Publication date: September 17, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS
  • SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
    Publication number: 20200294841
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Application
    Filed: September 19, 2018
    Publication date: September 17, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
  • Method and system for inspecting an EUV mask
    Patent number: 10775325
    Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: September 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Guochong Weng, Youjin Wang, Chiyan Kuan, Chung-Shih Pan
  • Lithographic apparatus and method
    Patent number: 10775707
    Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: September 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Güneş Nakìbo{hacek over (g)}lu, Manon Elise Will, Sander Catharina Reinier Derks, Johannes Wilhelmus Mollen
  • Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein
    Patent number: 10775704
    Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302?, 304?) of both the first radiation and second radiation.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: September 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Marinus Johannes Maria Van Dam
  • Patterning stack optimization
    Patent number: 10775705
    Abstract: A method of tuning a patterning stack, the method including: defining a function that measures how a parameter representing a physical characteristic pertaining to a pattern transferred into a patterning stack on a substrate is affected by change in a patterning stack variable, the patterning stack variable representing a physical characteristic of a material layer of the patterning stack; varying, by a hardware computer system, the patterning stack variable and evaluating, by the hardware computer system, the function with respect to the varied patterning stack variable, until a termination condition is satisfied; and outputting a value of the patterning stack variable when the termination condition is satisfied.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: September 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Jozef Maria Finders, Orion Jonathan Pierre Mouraille, Anton Bernhard Van Oosten
  • Projection System and Mirror and Radiation Source for a Lithographic Apparatus
    Publication number: 20200285155
    Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.
    Type: Application
    Filed: May 22, 2020
    Publication date: September 10, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Marcus Adrianus VAN DE KERKHOF, Anton Bernhard VAN OOSTEN, Hans BUTLER, Erik Roelof LOOPSTRA, Marc Wilhelmus Maria VAN DER WIJST, Koen Jacobus Johannes Maria ZAAL
  • EXTRACTION BODY FOR LITHOGRAPHIC APPARATUS
    Publication number: 20200285154
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Application
    Filed: May 21, 2020
    Publication date: September 10, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
  • METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
    Publication number: 20200285157
    Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
    Type: Application
    Filed: May 22, 2020
    Publication date: September 10, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Sergey TARABRIN
  • SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGRAPHIC PROCESS
    Publication number: 20200284578
    Abstract: A substrate having a plurality of features for use in measuring a parameter of a device manufacturing process and associated methods and apparatus. The measurement is by illumination of the features with measurement radiation from an optical apparatus and detecting a signal arising from interaction between the measurement radiation and the features. The plurality of features include first features distributed in a periodic fashion at a first pitch, and second features distributed in a periodic fashion at a second pitch, wherein the first pitch and second pitch are such that a combined pitch of the first and second features is constant irrespective of the presence of pitch walk in the plurality of features.
    Type: Application
    Filed: May 26, 2020
    Publication date: September 10, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Alok VERMA, Hugo Augustinus Joseph CRAMER, Thomas THEEUWES, Anagnostis TSIATMAS, Bert VERSTRAETEN
  • Encoder, position measurement system and lithographic apparatus involving an enclosing device
    Patent number: 10768025
    Abstract: An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: September 8, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Onno Pril, Jan Peter Baartman, Allard Eelco Kooiker, Suzanne Johanna Antonetta Geertruda Cosijns, Bryan Tong-Minh
  • Lithographic apparatus and device manufacturing method
    Patent number: 10768536
    Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
    Type: Grant
    Filed: November 12, 2018
    Date of Patent: September 8, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
  • Lithographic apparatus and device manufacturing method
    Patent number: 10768538
    Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: September 8, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Helmar Van Santen, Aleksey Yurievich Kolesnychenko
  • Support apparatus, a lithographic apparatus and a device manufacturing method
    Patent number: 10768535
    Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: September 8, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andre Bernardus Jeunink, Robbert De Jong, Martinus Hendrikus Antonius Leenders, Evelyn Wallis Pacitti, Thomas Poiesz, Frank Pieter Albert Van Den Berkmortel
  • APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
    Publication number: 20200278613
    Abstract: A process of characterizing a process window of a patterning process, the process including: obtaining a set of inspection locations for a pattern, the pattern defining features to be applied to a substrate with a patterning process, the set of inspection locations corresponding to a set of the features, the set of features being selected from among the features according to sensitivity of the respective features to variation in one or more process characteristics of the patterning process; patterning one or more substrates under varying process characteristics of the patterning process; and determining, for each of the variations in the process characteristics, whether at least some of the set of features yielded unacceptable patterned structures on the one or more substrates at corresponding inspection locations.
    Type: Application
    Filed: May 15, 2020
    Publication date: September 3, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Te-Sheng WANG, Xiang Wan
  • METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APPARATUSES
    Publication number: 20200278614
    Abstract: A method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method including: determining the plurality of corrections including a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer, wherein the determining includes determining corrections for each layer simultaneously in terms of a matching parameter.
    Type: Application
    Filed: November 9, 2018
    Publication date: September 3, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roy WERKMAN, Bijoy RAJASEKHARAN, Lydia Marianna VERGAIJ-HUIZER, Jochem Sebastiaan WILDENBERG, Ronald VAN ITTERSUM, Pieter Gerardus Jacobus SMORENBERG, Robertus Wilhelmus VAN DER HEIJDEN, Xiuhong WEI, Hadi YAGUBIZADE
  • POSITIONING DEVICE, MAGNETIC SUPPORT SYSTEM AND LITHOGRAPHIC APPARATUS
    Publication number: 20200278616
    Abstract: A positioning device configured to position an object, the positioning device including: an object table configured to hold the object; an electromagnetic motor configured to displace the object table, the electromagnetic motor including: a coil assembly mounted to the object table, a superconductor assembly configured to co-operate with the coil assembly to generate a driving force on the object table, and a cryogenic enclosure configured to enclose the superconductor assembly and maintain the superconductor assembly in a superconductive state; a support for supporting the electromagnetic motor; and an electromagnetic support configured to suspend the cryogenic enclosure relative to the support, thereby maintaining a gap between the cryogenic enclosure and the support.
    Type: Application
    Filed: September 24, 2018
    Publication date: September 3, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hessel Bart KOOLMEES, Johannes Petrus Marfinus Bemardus VERMEULEN